公开(公告)号：US20180019346A1

公开(公告)日：2018-01-18

申请号：US15718778

申请日：2017-09-28

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Jincheng GAO ,  Bin Zhang ,  Xiaolong He ,  Xiangchun Kong ,  Qi Yao ,  Zhanfeng Cao ,  Zhengliang Li

IPC: H01L29/786 ,  H01L29/66 ,  H01L29/45 ,  H01L27/12

CPC classification number: H01L29/78606 ,  H01L27/1225 ,  H01L27/127 ,  H01L29/45 ,  H01L29/66969 ,  H01L29/78618 ,  H01L29/7869 ,  H01L29/78693 ,  H01L29/78696

Abstract: A thin film transistor, a method of fabricating the same, an array substrate and a display device are disclosed. The method of fabricating the thin film transistor comprises: forming a semiconductor layer; forming a conductive film that does not react with acid solution on the semiconductor layer to be employed as a protective layer; forming a source electrode and a drain electrode on the protective layer; and removing a portion of the protective layer between the source electrode and the drain electrode to expose a portion of the semiconductor layer between the source electrode and the drain electrode.

公开(公告)号：US09812469B2

公开(公告)日：2017-11-07

申请号：US15150549

申请日：2016-05-10

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Zhanfeng Cao ,  Feng Zhang ,  Bin Zhang ,  Xiaolong He ,  Jincheng Gao ,  Qi Yao ,  Zhengliang Li ,  Xiangchun Kong

IPC: H01L27/12 ,  H01L29/423 ,  H01L29/417

CPC classification number: H01L27/124 ,  H01L29/41733 ,  H01L29/42384

Abstract: An array substrate and a display device are disclosed. The array substrate includes a peripheral area in which a plurality of gate electrode material lines, a plurality of source-drain electrode material lines and a plurality of first metal lines are disposed. Overlapping areas are provided between or among the gate electrode material lines, the source-drain material lines and the first metal lines; a number of the overlapping areas of the source-drain material lines and the first metal lines is less than a number of the overlapping areas of the source-drain material lines and the gate electrode material lines; the gate electrode material lines, the source-drain material lines and the first metal lines are configured as connecting lines of circuits in the peripheral area.

公开(公告)号：US20170098714A1

公开(公告)日：2017-04-06

申请号：US14905251

申请日：2015-08-05

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Zhengliang Li ,  Qi Yao ,  Zhanfeng Cao ,  Bin Zhang ,  Xiaolong He ,  Jincheng Gao ,  Xiangchun Kong ,  Wei Zhang

IPC: H01L29/786 ,  H01L21/28 ,  H01L29/49 ,  H01L27/12 ,  H01L29/45

CPC classification number: H01L29/78606 ,  H01L21/28 ,  H01L27/1262 ,  H01L29/45 ,  H01L29/4908

Abstract: Embodiments of the present invention disclose a thin film transistor and a manufacturing method thereof, an array substrate, and a display device, which relates to the field of display technology, and solves the problem that the adhesion of the electrode thin film with the adjacent thin film layer in the thin film transistor of the prior art is relatively bad. More specifically, an embodiment of the present invention provides a thin film transistor, comprising a gate, a source, a drain and a buffer layer, the buffer layer is located at one side or two sides of the gate, the source or the drain, the material of the buffer layer is a copper alloy material, the copper alloy material contains nitrogen element or oxygen element, the copper alloy material further contains aluminum element.