-
51.发明授权Temperature measurement with combined photo-luminescent and black body sensing techniques 失效使用组合光发光和黑体感测技术的温度测量
公开(公告)号：US5112137A
公开(公告)日：1992-05-12
申请号：US683258
申请日：1991-04-10
CPC分类号： G01J5/28 , G01J1/58 , G01J5/041 , G01J5/08 , G01J5/0821 , G01J5/0846 , G01J5/0887 , G01K11/3213 , G01J5/046 , G01J5/048
摘要： High temperature range black body techniques are combined with lower temperature range photoluminescent techniques to provide an optical method and apparatus for measuring temperature over a very wide range. Various optical probe configurations are disclosed which combine the black body and photoluminescent technologies. Signal detection and processing can be combined, and temperature measurements made by the photoluminescent technique within an overlap of the two temperature ranges can be used to calibrate measurements made in the higher range by the black body technique.
摘要翻译： 高温范围黑体技术与较低温度范围的光致发光技术结合，以提供用于在非常宽的范围内测量温度的光学方法和装置。 公开了组合黑体和光致发光技术的各种光学探针构型。 可以组合信号检测和处理，并且通过在两个温度范围内重叠的光致发光技术进行的温度测量可用于通过黑体技术校准在较高范围内进行的测量。
-
公开(公告)号：US09579750B2
公开(公告)日：2017-02-28
申请号：US13619749
申请日：2012-09-14
CPC分类号： B23K26/127 , B23K26/142 , B23K26/1464
摘要： The present invention generally relates to a laser processing systems for thermally processing substrates. The laser processing systems include a shield disposed between an energy source of the laser processing system and a substrate which is to be thermally processed. The shield includes an optically transparent window disposed adjacent to a cavity within the shield. The optically transparent window allows annealing energy to pass therethrough and to illuminate the substrate. The shield also includes one or more gas inlets and one or more gas outlets for introducing and removing a purge gas from the cavity within the shield. The purge gas is utilized to remove volatized or ablated components during thermal processing, and to provide a gas of predetermined composition, such as oxygen-free, to the thermally processed area.
摘要翻译： 本发明一般涉及一种用于热处理衬底的激光加工系统。 激光处理系统包括设置在激光加工系统的能量源和待热处理的基板之间的屏蔽。 屏蔽件包括邻近屏蔽件内的空腔布置的光学透明窗口。 光学透明窗口允许退火能量通过并照射基板。 屏蔽还包括一个或多个气体入口和一个或多个气体出口，用于从罩内的空腔引入和去除净化气体。 吹扫气体用于在热处理过程中除去挥发的或消融的组分，并且向热处理区域提供诸如无氧的预定组成的气体。
-
公开(公告)号：US07906402B2
公开(公告)日：2011-03-15
申请号：US12573139
申请日：2009-10-04
申请人： Joseph M. Ranish , Bruce E. Adams
发明人： Joseph M. Ranish , Bruce E. Adams
IPC分类号： H01L21/336 , H01L21/331 , H01L21/00
摘要： Methods for compensating for a thermal profile in a substrate heating process are provided herein. In some embodiments, a method of processing a substrate includes determining an initial thermal profile of a substrate that would result from subjecting the substrate to a process; determining a compensatory thermal profile based upon the initial thermal profile and a desired thermal profile; imposing the compensatory thermal profile on the substrate prior to performing the process on the substrate; and performing the process to create the desired thermal profile on the substrate. The initial substrate thermal profile can also be compensated for by adjusting a local mass heated per unit area, a local heat capacity per unit area, or an absorptivity or reflectivity of a component proximate the substrate prior to performing the process. Heat provided by an edge ring to the substrate may be controlled prior to or during the substrate heating process.
摘要翻译： 本文提供了补偿基板加热过程中的热分布的方法。 在一些实施例中，处理衬底的方法包括确定由衬底经受过程而导致的衬底的初始热分布; 基于初始热分布和期望的热分布确定补偿热分布; 在对衬底进行处理之前在衬底上施加补偿热分布; 并执行该过程以在衬底上产生所需的热分布。 也可以通过调整在每单位面积加热的局部质量，每单位面积的局部热容量，或者在执行该过程之前靠近该衬底的部件的吸收性或反射率来补偿初始衬底热分布。 由边缘环向衬底提供的热量可以在衬底加热过程之前或期间被控制。
-
54.发明授权
公开(公告)号：US5166080A
公开(公告)日：1992-11-24
申请号：US692578
申请日：1991-04-29
CPC分类号： G01B11/0658 , G01J5/0003 , G01J5/0007 , G01N21/474 , G01N21/8422 , G01N2021/4742
摘要： The thickness of a thin film on a substrate surface is determined by measuring its emissivity and temperature with a non-contact optical technique and then calculating the film thickness from these measurements. The thickness of the film can be determined by this technique in situ, while it is being formed and substantially in real time, thus allowing the measurement to control the film forming process. This has application to controlling the formation of dielectric and other material layers on a semiconductor substrate in the course of manufacturing electornic integrate circuits, including automatically terminating the process at its endpoint when the layer has reached a desired thickness.
摘要翻译： 通过使用非接触光学技术测量其发射率和温度，然后从这些测量计算膜厚度来确定衬底表面上的薄膜的厚度。 薄膜的厚度可以通过这种技术原位确定，同时它被形成并基本上实时地进行，从而允许测量来控制成膜过程。 这适用于在制造电性集成电路的过程中控制在半导体衬底上的电介质层和其它材料层的形成，包括当层已经达到所需厚度时在其端点自动终止该工艺。
-
公开(公告)号：US08461022B2
公开(公告)日：2013-06-11
申请号：US12763400
申请日：2010-04-20
IPC分类号： H01L21/00
CPC分类号： H01L21/68
摘要： Methods and apparatus for aligning a substrate in a process chamber are provided herein. In some embodiments, an apparatus may include a process chamber having an interior volume for processing a substrate therein; and a substrate positioning system configured to determine a substrate position within the interior volume, wherein the substrate positioning system determines the substrate position in two dimensions by the interaction of a first position and a second position along an edge of a substrate with two beams of electromagnetic radiation provided by the substrate positioning system. In some embodiments, a method for aligning a substrate may include placing a substrate in the interior volume of a process chamber; directing electromagnetic radiation into the interior volume in a first beam along a first path and in a second beam along a second path; and determining the position of the substrate in two dimensions by interaction of the first and second beams of electromagnetic radiation with an edge of the substrate proximate a first position and a second position.
摘要翻译： 本文提供了用于在处理室中对准衬底的方法和装置。 在一些实施例中，装置可以包括具有用于在其中处理衬底的内部容积的处理室; 以及衬底定位系统，其被配置为确定所述内部体积内的衬底位置，其中所述衬底定位系统通过沿着衬底的边缘的第一位置和第二位置与两个电磁束的相互作用来确定所述衬底位置的二维 由基板定位系统提供的辐射。 在一些实施例中，用于对准衬底的方法可包括将衬底放置在处理室的内部容积中; 沿着第一路径将电磁辐射引导到第一光束中的内部空间中，并且沿着第二路径将电磁辐射引导到第二光束中; 以及通过第一和第二电磁辐射束与靠近第一位置和第二位置的衬底的边缘的相互作用来确定衬底在两个维度中的位置。
-
公开(公告)号：US20130087547A1
公开(公告)日：2013-04-11
申请号：US13619749
申请日：2012-09-14
IPC分类号： F27D11/00
CPC分类号： B23K26/127 , B23K26/142 , B23K26/1464
摘要： The present invention generally relates to a laser processing systems for thermally processing substrates. The laser processing systems include a shield disposed between an energy source of the laser processing system and a substrate which is to be thermally processed. The shield includes an optically transparent window disposed adjacent to a cavity within the shield. The optically transparent window allows annealing energy to pass therethrough and to illuminate the substrate. The shield also includes one or more gas inlets and one or more gas outlets for introducing and removing a purge gas from the cavity within the shield. The purge gas is utilized to remove volatized or ablated components during thermal processing, and to provide a gas of predetermined composition, such as oxygen-free, to the thermally processed area.
摘要翻译： 本发明一般涉及一种用于热处理衬底的激光加工系统。 激光处理系统包括设置在激光加工系统的能量源和待热处理的基板之间的屏蔽。 屏蔽件包括邻近屏蔽件内的空腔布置的光学透明窗口。 光学透明窗口允许退火能量通过并照射基板。 屏蔽还包括一个或多个气体入口和一个或多个气体出口，用于从罩内的空腔引入和去除净化气体。 吹扫气体用于在热处理过程中除去挥发的或消融的组分，并且向热处理区域提供诸如无氧的预定组成的气体。
-
公开(公告)号：US08330040B2
公开(公告)日：2012-12-11
申请号：US12628451
申请日：2009-12-01
申请人： Bruce E. Adams
发明人： Bruce E. Adams
IPC分类号： H01L31/00
CPC分类号： H01L31/03921 , H01L31/022425 , H01L31/035281 , H01L31/046 , H01L31/0465 , Y02E10/50
摘要： Photovoltaic cells and methods for the manufacture of photovoltaic cells are described. Operative layers of the photovoltaic cell are deposited onto a superstrate having a plurality of spaced ramps, allowing for the individual cells to be connected in series with minimal loss of the efficiency due to dead space between the cells.
摘要翻译： 描述了用于制造光伏电池的光伏电池和方法。 光伏电池的操作层被沉积到具有多个间隔的斜面的衬底上，允许单个电池串联连接，由于电池之间的死空间而导致的效率的最小损失。
-
公开(公告)号：US08147137B2
公开(公告)日：2012-04-03
申请号：US12273809
申请日：2008-11-19
IPC分类号： H01L21/00 , H01L21/02 , H01L21/324 , H01J5/00
CPC分类号： H01L21/67248
摘要： A substrate processing system includes a processing chamber, a pedestal for supporting a substrate disposed within the processing chamber, and an optical pyrometry assembly coupled to the processing chamber to measure an emitted light originating substantially from a portion of the pedestal or substrate. The optical pyrometry assembly further includes a light receiver, and an optical detector. The optical pyrometry assembly receives a portion of the emitted light, and a temperature of the substrate is determined from an intensity of the portion of the emitted light near at least one wavelength.
摘要翻译： 基板处理系统包括处理室，用于支撑设置在处理室内的基板的基座和耦合到处理室的光学高温测量组件，以测量基本上从基座或基板的一部分发出的发射光。 光学高温测量组件还包括光接收器和光学检测器。 光学高温计组件接收一部分发射的光，并且基于发射光的至少一个波长附近的部分的强度确定衬底的温度。
-
59.发明授权Temperature measurement and control of wafer support in thermal processing chamber 有权热处理室中晶片支架的温度测量和控制公开(公告)号：US07860379B2
公开(公告)日：2010-12-28
申请号：US11623238
申请日：2007-01-15
CPC分类号： H01L21/67248 , H01L21/67115
摘要： The present invention provides apparatus and methods for achieving uniform heating to a substrate during a rapid thermal process. More particularly, the present invention provides apparatus and methods for controlling the temperature of an edge ring supporting a substrate during a rapid thermal process to improve temperature uniformity across the substrate.
摘要翻译： 本发明提供了用于在快速热处理期间实现对衬底的均匀加热的装置和方法。 更具体地，本发明提供了用于在快速热处理期间控制支撑衬底的边缘环的温度的装置和方法，以改善穿过衬底的温度均匀性。
-
公开(公告)号：US20100193020A1
公开(公告)日：2010-08-05
申请号：US12628451
申请日：2009-12-01
申请人： Bruce E. Adams
发明人： Bruce E. Adams
IPC分类号： H01L31/0224 , H01L31/00 , H01L31/18
CPC分类号： H01L31/03921 , H01L31/022425 , H01L31/035281 , H01L31/046 , H01L31/0465 , Y02E10/50
摘要： Photovoltaic cells and methods for the manufacture of photovoltaic cells are described. Operative layers of the photovoltaic cell are deposited onto a superstrate having a plurality of spaced ramps, allowing for the individual cells to be connected in series with minimal loss of the efficiency due to dead space between the cells.
摘要翻译： 描述了用于制造光伏电池的光伏电池和方法。 光伏电池的操作层被沉积到具有多个间隔开的斜面的顶板上，从而允许各个单元串联连接，由于电池之间的死空间而导致效率的最小损失。
-
-
-
-
-
-
-
-
-
搜索结果
73 条记录 (耗时 0.032 秒)
