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96 条记录 (耗时 0.041 秒)

    Ultra-fast beam dithering with surface acoustic wave modulator
    51.
    发明授权
    Ultra-fast beam dithering with surface acoustic wave modulator 有权
    超声波抖动与表面声波调制器

    公开(公告)号：US07548364B2

    公开(公告)日：2009-06-16

    申请号：US11461395

    申请日：2006-07-31

    申请人： Dean Jennings

    发明人： Dean Jennings

    IPC分类号： G02F1/11 ,  G02F1/33

    CPC分类号： G02F1/125 ,  G02F1/11 ,  G02F2203/24

    摘要： An apparatus for processing a coherent light pulse comprises a piezoelectric material having an optical interface surface and a surface acoustic wave (SAW) producing device disposed on the piezoelectric material. A coherent light pulse is dithered at a high frequency when it is reflected off of or transmitted through the optical interface surface. The SAW-producing device may be adapted to generate a travelling SAW or a standing SAW on the optical interface surface.

    摘要翻译： 用于处理相干光脉冲的装置包括具有光学界面表面的压电材料和设置在压电材料上的表面声波（SAW）产生装置。 当相干光脉冲从光学界面反射出或透过光学界面时，会以高频抖动。 SAW产生装置可以适于在光学界面表面上产生行进的SAW或立体SAW。

    HIGH SPEED PHASE SCRAMBLING OF A COHERENT BEAM USING PLASMA
    52.
    发明申请
    HIGH SPEED PHASE SCRAMBLING OF A COHERENT BEAM USING PLASMA 有权
    使用等离子体的相干光束的高速相位扫描

    公开(公告)号：US20090091817A1

    公开(公告)日：2009-04-09

    申请号：US11868933

    申请日：2007-10-08

    申请人： Dean Jennings ,  Bruce E. Adams ,  Timothy N. Thomas ,  Stephen Moffatt

    发明人： Dean Jennings ,  Bruce E. Adams ,  Timothy N. Thomas ,  Stephen Moffatt

    IPC分类号： G02B26/08 ,  B23K26/00

    CPC分类号： H01L21/67115

    摘要： A laser beam is modulated at a very high frequency to produce uniform radiant flux densities on substrate surface processing regions during thermal processing. Beam modulation is achieved by passing the laser beam through a plasma which causes phase randomization within the laser beam. This method may be used for any application where intense, uniform illumination is desired, such as pulsed laser annealing, ablating, and wafer stepper illuminating.

    摘要翻译： 激光束以非常高的频率被调制，以在热处理期间在衬底表面处理区域上产生均匀的辐射通量密度。 通过使激光束通过等离子体来实现光束调制，其引起激光束内的相位随机化。 该方法可以用于需要强烈均匀照明的任何应用，例如脉冲激光退火，烧蚀和晶片步进照明。

    Multiple band pass filtering for pyrometry in laser based annealing systems
    53.
    发明申请
    Multiple band pass filtering for pyrometry in laser based annealing systems 有权
    在激光基退火系统中进行高频测量的多带通滤波

    公开(公告)号：US20090084986A1

    公开(公告)日：2009-04-02

    申请号：US12283615

    申请日：2008-09-12

    申请人： Bruce E. Adams ,  Dean Jennings ,  Aaron M. Hunter ,  Abhilash J. Mayur ,  Vijay Parihar ,  Timothy N. Thomas

    发明人： Bruce E. Adams ,  Dean Jennings ,  Aaron M. Hunter ,  Abhilash J. Mayur ,  Vijay Parihar ,  Timothy N. Thomas

    IPC分类号： G01J5/00 ,  G21G1/00

    CPC分类号： G02B5/281 ,  G01J5/06 ,  H01S5/005 ,  H01S5/4012

    摘要： A thermal processing system includes a source of laser radiation emitting at a laser wavelength, beam projection optics disposed between the reflective surface and a substrate support capable of holding a substrate to be processed, a pyrometer responsive to a pyrometer wavelength, and a wavelength responsive optical element having a first optical path for light in a first wavelength range including the laser wavelength, the first optical path being between the source of laser radiation and the beam projection optics, and a second optical path for light in a second wavelength range including the pyrometer wavelength, the second optical path being between the beam projection optics and the pyrometer. The system can further include a pyrometer wavelength blocking filter between the source of laser radiation and the wavelength responsive optical element.

    摘要翻译： 热处理系统包括以激光波长发射的激光辐射源，设置在反射表面和能够保持要处理的衬底的基板支撑件之间的光束投影光学器件，响应于高温计波长的高温计和波长响应光学 元件，其具有用于包括激光波长的第一波长范围内的光的第一光路，所述第一光路位于激光辐射源和光束投影光学器件之间，以及用于在包括高温计的第二波长范围内的光的第二光路 波长，第二光路位于光束投影光学器件和高温计之间。 该系统还可以包括在激光辐射源和波长响应光学元件之间的高温计波长阻挡滤波器。

    Single axis light pipe for homogenizing slow axis of illumination systems based on laser diodes
    55.
    发明授权
    Single axis light pipe for homogenizing slow axis of illumination systems based on laser diodes 有权
    基于激光二极管的照明系统慢轴均匀单轴光管

    公开(公告)号：US07129440B2

    公开(公告)日：2006-10-31

    申请号：US11185649

    申请日：2005-07-20

    申请人： Bruce E. Adams ,  Dean Jennings ,  Abhilash J. Mayur ,  Vijay Parihar ,  Joseph M. Ranish

    发明人： Bruce E. Adams ,  Dean Jennings ,  Abhilash J. Mayur ,  Vijay Parihar ,  Joseph M. Ranish

    IPC分类号： B23K26/06 ,  G02B6/10

    CPC分类号： G02B6/003 ,  G02B6/0046 ,  G02B6/0056 ,  G02B6/0068

    摘要： Apparatus for thermally processing a semiconductor wafer includes an array of semiconductor laser emitters arranged in plural parallel rows extending along a slow axis, plural respective cylindrical lenses overlying respective ones of the rows of laser emitters for collimating light from the respective rows along a fast axis generally perpendicular to the slow axis, a homogenizing light pipe having an input face at a first end for receiving light from the plural cylindrical lenses and an output face at an opposite end, the light pipe comprising a pair of reflective walls extending between the input and output faces and separated from one another along the direction of the slow axis, and scanning apparatus for scanning light emitted from the homogenizing light pipe across the wafer in a scanning direction parallel to the fast axis.

    摘要翻译： 用于热处理半导体晶片的装置包括布置成沿着慢轴延伸的多个平行列的半导体激光发射器的阵列，多个相应的柱形透镜，覆盖相应行的激光发射器，用于沿着快轴准直来自相应行的光 垂直于慢轴的均质化光管，其具有在第一端处的输入面用于接收来自多个柱面透镜的光和相对端的输出面，所述光管包括在输入和输出之间延伸的一对反射壁 并且沿着慢轴的方向彼此分离;以及扫描装置，用于在平行于快轴的扫描方向上扫描从均匀化光管发射的光，跨过晶片。

    Methods and devices for measuring a concentrated light beam
    56.
    发明申请
    Methods and devices for measuring a concentrated light beam 失效
    用于测量集中光束的方法和装置

    公开(公告)号：US20060158641A1

    公开(公告)日：2006-07-20

    申请号：US11261439

    申请日：2005-10-28

    申请人： Timothy Thomas ,  Bruce Adams ,  Dean Jennings

    发明人： Timothy Thomas ,  Bruce Adams ,  Dean Jennings

    IPC分类号： G01J1/00

    CPC分类号： G01J1/58 ,  G01J1/4257

    摘要： Methods and devices are provided for profiling a beam of light that includes a wavelength λ. The beam of light is received. Secondary light is generated at a wavelength λ′ different from wavelength λ by fluorescing a material with the received beam of light. The secondary light is separated from the received beam of light. The separated secondary light is optically directed to a sensor.

    摘要翻译： 提供了用于对包括波长λ的光束进行成像的方法和装置。 光束被接收。 通过用接收的光束发射材料，在与波长λ不同的波长λ'处产生二次光。 二次光从接收的光束分离。 被分离的二次光被光学地指向传感器。

    Autofocus for high power laser diode based annealing system
    57.
    发明申请
    Autofocus for high power laser diode based annealing system 有权
    基于大功率激光二极管的退火系统的自动对焦

    公开(公告)号：US20060105585A1

    公开(公告)日：2006-05-18

    申请号：US11198660

    申请日：2005-08-05

    申请人： Dean Jennings ,  Timothy Thomas

    发明人： Dean Jennings ,  Timothy Thomas

    IPC分类号： H01L21/324 ,  H01L21/26 ,  H01L21/42 ,  H01L21/477

    CPC分类号： H01L21/67115

    摘要： Apparatus for thermally processing a substrate includes a source of laser radiation comprising a plurality diode lasers arranged along a slow axis, optics directing the laser radiation from the source to the substrate, and an array of photodetectors arranged along a fast axis perpendicular to the slow axis and receiving portions of the laser radiation reflected from the substrate through the optics.

    摘要翻译： 用于热处理衬底的设备包括激光辐射源，其包括沿着慢轴布置的多个二极管激光器，将激光辐射从源极引导到衬底的光学器件，以及沿着垂直于慢轴的快轴布置的光电检测器阵列 以及接收通过光学器件从衬底反射的激光辐射的部分。

    System and method for lamp split zone control
    58.
    发明授权
    System and method for lamp split zone control 有权
    灯分区控制系统及方法

    公开(公告)号：US06570137B1

    公开(公告)日：2003-05-27

    申请号：US10092275

    申请日：2002-03-04

    申请人： Dean Jennings

    发明人： Dean Jennings

    IPC分类号： F27B514

    CPC分类号： C30B31/12

    摘要： An operating voltage is supplied to first and second groups in accordance with a recipe for thermally processing a semiconductor wafer. It is then determined that the operating voltage is an undesired voltage in a range of voltages between a predetermined lower voltage and a predetermined upper voltage. Subsequently, a first voltage is applied to the first group of heating lamps and a second voltage is delivered to the second group of heating lamps. The first voltage is above the predetermined upper voltage, while the second voltage is below the predetermined lower voltage. Also, a weighted average of the first and second voltages approximates the undesired voltage. In the meantime, the operational voltage is supplied to a remainder of the array of heating lamps in accordance with the recipe, where the operational voltage is below the predetermined upper voltage.

    摘要翻译： 根据用于热处理半导体晶片的配方，将工作电压提供给第一组和第二组。 然后确定工作电压是在预定的较低电压和预定的上限电压之间的电压范围内的不需要的电压。 随后，将第一电压施加到第一组加热灯，并且将第二电压输送到第二组加热灯。 第一电压高于预定的上限电压，而第二电压低于预定的较低电压。 此外，第一和第二电压的加权平均值接近不需要的电压。 同时，根据配方，将工作电压提供给加热灯阵列的其余部分，其中工作电压低于预定的上限电压。