Plasma CVD apparatus
    51.
    发明授权
    Plasma CVD apparatus 失效
    等离子体CVD装置

    公开(公告)号:US4998968A

    公开(公告)日:1991-03-12

    申请号:US397353

    申请日:1989-08-23

    申请人: Teruo Misumi

    发明人: Teruo Misumi

    摘要: A plasma CVD apparatus for forming a deposition film on a base by causing a discharge in a space between the base and an electrode has an auxiliary member removably arranged in electrical contact to the electrode on a face of the electrode which contributes to the discharge. The auxiliary member thus acts as the electrode.

    摘要翻译: 用于通过在基体和电极之间的空间中的放电而在基底上形成沉积膜的等离子体CVD装置具有辅助部件,该辅助部件在有助于放电的电极的表面上可电连接地布置成与电极电接触。 因此辅助部件用作电极。