Liquid crystal display device and manufacturing method of liquid crystal display device
    51.
    发明申请
    Liquid crystal display device and manufacturing method of liquid crystal display device 有权
    液晶显示装置及液晶显示装置的制造方法

    公开(公告)号:US20080151174A1

    公开(公告)日:2008-06-26

    申请号:US11986012

    申请日:2007-11-19

    IPC分类号: G02F1/1333

    摘要: Disclosed herein is a liquid crystal display device including a plurality of pixels each having a reflecting section and a transmitting section, the pixels each including a plurality of sub-pixels resulting from alignment division, the liquid crystal display device including: an element layer formed on a substrate; an insulating film formed on the substrate so as to cover the element layer; a pixel electrode formed on the insulating film so as to be connected to the element layer; a gap adjusting layer formed on the insulating film on the element layer including a region of connection between the element layer and the pixel electrode; and a dielectric formed on a connecting part for making an electric connection between the sub-pixels.

    摘要翻译: 本发明公开了一种液晶显示装置,它包括多个像素,每个像素具有反射部分和透射部分,每个像素包括由对准分割产生的多个子像素,该液晶显示装置包括: 底物; 形成在所述基板上以覆盖所述元件层的绝缘膜; 形成在所述绝缘膜上以与元件层连接的像素电极; 形成在元件层上的绝缘膜上的间隙调整层,包括元件层和像素电极之间的连接区域; 以及形成在用于在子像素之间进行电连接的连接部分上的电介质。

    Device and method for monitoring process exhaust gas, semiconductor manufacturing device, and system and method for controlling semiconductor manufacturing device
    53.
    发明授权
    Device and method for monitoring process exhaust gas, semiconductor manufacturing device, and system and method for controlling semiconductor manufacturing device 有权
    用于监控工艺废气的装置和方法,半导体制造装置以及用于控制半导体制造装置的系统和方法

    公开(公告)号:US07229843B2

    公开(公告)日:2007-06-12

    申请号:US11062470

    申请日:2005-02-22

    IPC分类号: H01L21/00

    摘要: Process exhaust gas is sampled, and the components of the process exhaust gas are analyzed by a Fourier-transform infrared spectroscope (FT-IR) (26). The analysis result is compared with a reference analysis result obtained from an analysis of process exhaust gas generated in an operation performed under reference process conditions. If the amount of a gas component changes to an amount that is outside a predetermined range set around a reference value obtained from the reference analysis result, a signal indicating a process error is outputted. Instead of the output of the signal indicating a process error, the process conditions can be automatically adjusted.

    摘要翻译: 对工艺废气进行采样,并通过傅里叶变换红外分光仪(FT-IR)(26)分析工艺废气的成分。 将分析结果与通过在参考工艺条件下执行的操作中产生的工艺废气的分析获得的参考分析结果进行比较。 如果气体组分的量变化到围绕从参考分析结果获得的参考值设定的预定范围之外的量,则输出指示处理误差的信号。 代替输出指示过程错误的信号,可以自动调整过程条件。

    Heating/cooling system
    54.
    发明授权
    Heating/cooling system 失效
    加热/冷却系统

    公开(公告)号:US07228700B2

    公开(公告)日:2007-06-12

    申请号:US11055072

    申请日:2005-02-11

    IPC分类号: F25B15/00

    摘要: An object is to provide a heating/cooling system capable of achieving reduction of power consumption, and enhancement of performance in a heating/cooling system usable in such a manner as to be switched to be hot/cold. The heating/cooling system having a storage chamber usable in such a manner as to be switched to be hot/cold, comprises: a refrigerant circuit comprising a compressor, a gas cooler, a pressure reducing device, an evaporator and the like, containing carbon dioxide sealed as a refrigerant therein, and having a supercritical pressure on a high-pressure side; a radiator through which the refrigerant flowing out of the gas cooler flows before entering the pressure reducing device; and an air blower which sends air through the gas cooler, the inside of the storage chamber is heated by the radiator, the inside of the storage chamber is cooled by the evaporator, and the air blower is stopped in a case where the inside of the storage chamber is heated by the radiator.

    摘要翻译: 本发明的目的是提供一种能够实现能够降低功耗的加热/冷却系统,并且能够以能够切换为热/冷的方式使用的加热/冷却系统中的性能的提高。 具有可以切换为热/冷的方式使用的储存室的加热/冷却系统包括:制冷剂回路,包括压缩机,气体冷却器,减压装置,蒸发器等,其含有碳 二氧化碳作为制冷剂密封,在高压侧具有超临界压力; 在进入减压装置之前,从气体冷却器流出的制冷剂通过该散热器流动; 以及通过气体冷却器送风的鼓风机,储存室的内部由散热器加热,储存室的内部由蒸发器冷却,在鼓风机内部停止的情况下, 储存室由散热器加热。

    Merchandise sales data processing apparatus
    55.
    发明申请
    Merchandise sales data processing apparatus 失效
    商品销售数据处理装置

    公开(公告)号:US20060095330A1

    公开(公告)日:2006-05-04

    申请号:US11260869

    申请日:2005-10-27

    申请人: Hiroshi Nishikawa

    发明人: Hiroshi Nishikawa

    IPC分类号: G06Q20/00

    摘要: A receipt issuance facility included in a receipt printer incorporated in a merchandise sales data processing apparatus is utilized in order to print a role assigned to a key together with a frame matched with the size of the key.

    摘要翻译: 使用包含在商品销售数据处理装置中的收据打印机中所包含的收据发行设施,以便打印分配给密钥的角色以及与密钥大小匹配的帧。

    Image forming apparatus and image reading apparatus

    公开(公告)号:US20060077484A1

    公开(公告)日:2006-04-13

    申请号:US11020171

    申请日:2004-12-27

    IPC分类号: H04N1/04

    摘要: An image forming apparatus capable of controlling movement of a transparent member suitably depending on various situations by including a transparent member, a feeding unit that feeds an original document to the transparent member, a reading unit that reads an image of the document fed on the transparent member via the transparent member, a moving unit that reciprocates the transparent member in a prescribed direction, and a controller that moves the transparent member forward in one direction from a home position while one document passes through a reading position, and stops the transparent member and then moves the transparent member backward to the home position when an interruption event of reading the document occurs.

    Method and apparatus for vacuum treatment
    60.
    发明授权
    Method and apparatus for vacuum treatment 有权
    真空处理方法和装置

    公开(公告)号:US06553277B1

    公开(公告)日:2003-04-22

    申请号:US09959764

    申请日:2001-11-06

    IPC分类号: H05H100

    摘要: A method of vacuum treatment is performed using a vacuum treatment system (1) comprising a vacuum treatment unit (31) for treating a wafer (W) placed on a wafer stage (10) and a controller (51) for controlling the vacuum treatment unit (31). A sensor wafer (11) of substantially the same shape and size as a wafer (W), which includes a detector element (11d) for detecting data about the state of a vacuum treatment and a data processing element (11p) for processing the detected data, is placed on the wafer stage (10) and treated in a vacuum by the vacuum treatment unit (31). While the sensor wafer (11) is subjected to a vacuum treatment, data on the state of the vacuum treatment is detected and processed. Based on the processed data, the controller (51) controls the vacuum treatment unit (31) to treat the wafer (W).

    摘要翻译: 使用真空处理系统(1)进行真空处理的方法,真空处理系统(1)包括用于处理放置在晶片台(10)上的晶片(W)的真空处理单元(31)和用于控制真空处理单元 (31)。 一种与晶片(W)基本相同形状和尺寸的传感器晶片(11),其包括用于检测关于真空处理状态的数据的检测器元件(11d)和用于处理检测到的数据处理元件(11p) 数据放置在晶片台(10)上,并通过真空处理单元(31)在真空中进行处理。 在对传感器晶片(11)进行真空处理的同时,检测并处理真空处理状态的数据。 基于处理数据,控制器(51)控制真空处理单元(31)来处理晶片(W)。