公开(公告)号：US06942891B2

公开(公告)日：2005-09-13

申请号：US10760581

申请日：2004-01-21

Applicant: Kiyoshi Komiyama ,  Takahiro Shimoda ,  Hiroshi Nishikawa

Inventor： Kiyoshi Komiyama ,  Takahiro Shimoda ,  Hiroshi Nishikawa

IPC: C23C16/44 ,  C23C16/52 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  B05D5/12

CPC classification number: C23C16/52 ,  C23C16/44 ,  C23C16/4412

Abstract: Process exhaust gas is sampled, and the components of the process exhaust gas are analyzed by a Fourier-transform infrared spectroscope (FT-IR) (26). The analysis result is compared with a reference analysis result obtained from an analysis of process exhaust gas generated in an operation performed under reference process conditions. If the amount of a gas component changes to an amount that is outside a predetermined range set around a reference value obtained from the reference analysis result, a signal indicating a process error is outputted. Instead of the output of the signal indicating a process error, the process conditions can be automatically adjusted.

Abstract translation: 对工艺废气进行采样，并通过傅里叶变换红外分光仪（FT-IR）（26）分析工艺废气的成分。 将分析结果与通过在参考工艺条件下执行的操作中产生的工艺废气的分析获得的参考分析结果进行比较。 如果气体组分的量变化到围绕从参考分析结果获得的参考值设定的预定范围之外的量，则输出指示处理误差的信号。 代替输出指示过程错误的信号，可以自动调整过程条件。

公开(公告)号：US07229843B2

公开(公告)日：2007-06-12

申请号：US11062470

申请日：2005-02-22

Applicant: Kiyoshi Komiyama ,  Takahiro Shimoda ,  Hiroshi Nishikawa

Inventor： Kiyoshi Komiyama ,  Takahiro Shimoda ,  Hiroshi Nishikawa

IPC: H01L21/00

CPC classification number: C23C16/52 ,  C23C16/44 ,  C23C16/4412

Abstract: Process exhaust gas is sampled, and the components of the process exhaust gas are analyzed by a Fourier-transform infrared spectroscope (FT-IR) (26). The analysis result is compared with a reference analysis result obtained from an analysis of process exhaust gas generated in an operation performed under reference process conditions. If the amount of a gas component changes to an amount that is outside a predetermined range set around a reference value obtained from the reference analysis result, a signal indicating a process error is outputted. Instead of the output of the signal indicating a process error, the process conditions can be automatically adjusted.

Abstract translation: 对工艺废气进行采样，并通过傅里叶变换红外分光仪（FT-IR）（26）分析工艺废气的成分。 将分析结果与通过在参考工艺条件下执行的操作中产生的工艺废气的分析获得的参考分析结果进行比较。 如果气体组分的量变化到围绕从参考分析结果获得的参考值设定的预定范围之外的量，则输出指示处理误差的信号。 代替输出指示过程错误的信号，可以自动调整过程条件。

公开(公告)号：US20050159899A1

公开(公告)日：2005-07-21

申请号：US11062470

申请日：2005-02-22

Applicant: Kiyoshi Komiyama ,  Takahiro Shimoda ,  Hiroshi Nishikawa

Inventor： Kiyoshi Komiyama ,  Takahiro Shimoda ,  Hiroshi Nishikawa

IPC: C23C16/44 ,  C23C16/52 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  G06F19/00

CPC classification number: C23C16/52 ,  C23C16/44 ,  C23C16/4412

Abstract: Process exhaust gas is sampled, and the components of the process exhaust gas are analyzed by a Fourier-transform infrared spectroscope (FT-IR) (26). The analysis result is compared with a reference analysis result obtained from an analysis of process exhaust gas generated in an operation performed under reference process conditions. If the amount of a gas component changes to an amount that is outside a predetermined range set around a reference value obtained from the reference analysis result, a signal indicating a process error is outputted. Instead of the output of the signal indicating a process error, the process conditions can be automatically adjusted.

公开(公告)号：US06716477B1

公开(公告)日：2004-04-06

申请号：US10111481

申请日：2002-04-25

Applicant: Kiyoshi Komiyama ,  Takahiro Shimoda ,  Hiroshi Nishikawa

Inventor： Kiyoshi Komiyama ,  Takahiro Shimoda ,  Hiroshi Nishikawa

IPC: B05D512

CPC classification number: C23C16/52 ,  C23C16/44 ,  C23C16/4412

Abstract: Process exhaust gas is sampled, and the components of the process exhaust gas are analyzed by a Fourier-transform infrared spectroscope (FT-IR) (26). The analysis result is compared with a reference analysis result obtained from an analysis of process exhaust gas generated in an operation performed under reference process conditions. If the amount of a gas component changes to an amount that is outside a predetermined range set around a reference value obtained from the reference analysis result, a signal indicating a process error is outputted. Instead of the output of the signal indicating a process error, the process conditions can be automatically adjusted.

Abstract translation: 对工艺废气进行采样，并通过傅里叶变换红外分光仪（FT-IR）（26）分析工艺废气的成分。 将分析结果与通过在参考工艺条件下执行的操作中产生的工艺废气的分析获得的参考分析结果进行比较。 如果气体组分的量变化到围绕从参考分析结果获得的参考值设定的预定范围之外的量，则输出指示处理误差的信号。 代替输出指示过程错误的信号，可以自动调整过程条件。

公开(公告)号：US5704981A

公开(公告)日：1998-01-06

申请号：US626454

申请日：1996-04-02

Applicant: Shunji Kawakami ,  Yoji Mizutani ,  Yutaka Miura ,  Takahiro Shimoda

Inventor： Shunji Kawakami ,  Yoji Mizutani ,  Yutaka Miura ,  Takahiro Shimoda

IPC: G02F1/136 ,  C23C16/44 ,  C23C16/455 ,  G02F1/1368 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  C23C16/00

CPC classification number: C23C16/45565 ,  C23C16/455 ,  C23C16/45578

Abstract: A partition member with a buffer plate disposed on the top surface thereof is disposed in a region belonging to a surface-to-be-processed of a substrate-to-be-processed held in a processing apparatus. An injector having cross-sectional areas decreasing toward the forward end thereof is disposed in the partition member. The injector has a number of injection holes formed length-wise therein at a constant pitch and in the same bore, whereby a processing gas can be injected very uniformly in the longitudinal direction and diffuse in the partition member. Then the processing gas is passed through vent holes formed in the buffer plate uniformly into the processing chamber. The processing gas can be fed uniformly onto the surface-to-be-processed of the substrate-to-be-processed, and a deposited thin film can have high intra-surface thickness uniformity.

Abstract translation: 具有设置在其顶表面上的缓冲板的分隔构件设置在属于处理装置中保持的待处理基板的表面处理区域中。 具有朝向其前端减小的截面积的喷射器设置在分隔构件中。 喷射器具有一定数量的注入孔，其中以恒定的间距和相同的孔形成在其中，从而可以在纵向方向上非常均匀地注入处理气体并且在分隔构件中扩散。 然后将处理气体均匀地通过形成在缓冲板中的通气孔进入处理室。 可以将处理气体均匀地供给到被处理基板的待表面处理，并且沉积的薄膜可以具有高的表面内厚度均匀性。

公开(公告)号：US06805135B1

公开(公告)日：2004-10-19

申请号：US09700704

申请日：2000-11-24

Applicant: Kenichi Hirota ,  Hitoshi Yamada ,  Kiyoshi Yuasa ,  Eiji Yamaguchi ,  Shinichi Kawaguchi ,  Takahiro Shimoda ,  Nobuyuki Nagayama

Inventor： Kenichi Hirota ,  Hitoshi Yamada ,  Kiyoshi Yuasa ,  Eiji Yamaguchi ,  Shinichi Kawaguchi ,  Takahiro Shimoda ,  Nobuyuki Nagayama

IPC: C32G100

CPC classification number: H01L21/02052 ,  C11D3/2068 ,  C11D3/28 ,  C11D11/0041 ,  Y10S438/905

Abstract: A cleaning solution is used to remove a byproduct derived from a decomposed substance of a process gas containing C and F. The cleaning solution contains 75 wt % N-methyl-2-pyrrolidone, 15 wt % ethylene glycol monobutyl ether, 0.5 wt % surfactant, and 9.5 wt % water. The content of an alkali metal in the cleaning solution is set to be less than 10 ppb.

Abstract translation: 使用清洁溶液除去源自含有C和F的工艺气体的分解物质的副产物。清洗溶液含有75重量％的N-甲基-2-吡咯烷酮，15重量％的乙二醇单丁醚，0.5重量％的表面活性剂 ，和9.5重量％的水。 清洗液中碱金属的含量设定为小于10ppb。