公开(公告)号：US20070212884A1

公开(公告)日：2007-09-13

申请号：US11672230

申请日：2007-02-07

申请人： Taro Yamamoto ,  Hideharu Kyouda

发明人： Taro Yamamoto ,  Hideharu Kyouda

IPC分类号： H01L21/311

CPC分类号： H01L21/67017 ,  G03F7/11 ,  G03F7/168 ,  G03F7/2041 ,  G03F7/70341 ,  H01L21/67051 ,  H01L21/6715

摘要： Disclosed is a technique for preventing a water-repellent protective film formed on a resist film from peeling off during immersion exposure. A resist film is formed on the front surface of a substrate and then the peripheral edge portion of the resist film is removed. Before forming a water-repellent protective film onto the resist film, an adhesion-improving fluid, preferably hexamethyldisilazane gas, for improving the adhesion of the water-repellent protective film, is supplied to the region from which the resist film is removed.

摘要翻译： 公开了一种防止在浸渍曝光期间形成在抗蚀剂膜上的防水保护膜被剥离的技术。 在基板的前表面上形成抗蚀剂膜，然后除去抗蚀剂膜的周边部分。 在抗蚀剂膜上形成防水保护膜之前，为了提高防水性保护膜的粘附性，提供了粘附改善液，优选六甲基二硅氮烷气体，其中除去抗蚀剂膜的区域。

公开(公告)号：US20070134600A1

公开(公告)日：2007-06-14

申请号：US11608426

申请日：2006-12-08

申请人： Seiki Ishida ,  Taro Yamamoto

发明人： Seiki Ishida ,  Taro Yamamoto

IPC分类号： H01L21/027

CPC分类号： G03F7/2041 ,  H01L21/6715 ,  H01L21/67225 ,  H01L21/67276

摘要： A coating and developing apparatus comprises a washing section for washing the surface of a substrate after it has been subjected to a dipping exposure process in an exposing apparatus, and a first substrate carrying means adapted to transfer the substrate carried out from the exposing apparatus after the dipping exposure process to the washing section. The first substrate carrying means is controlled by a control means. Namely, the control means controls the first substrate carrying means such that the substrate can be washed in the washing section in a period of time prior to a time zone in which the size of liquid drops remaining on the substrate due to the dipping exposure process becomes smaller quite rapidly, based on a carrying-out ready signal for the substrate from the exposing apparatus, by using a relationship between the time elapsed from the end of the dipping exposure process and the size of liquid drops remaining on the substrate due to the dipping exposure process.

摘要翻译： 一种涂料和显影装置，包括：洗涤部分，用于在曝光装置中进行浸渍曝光处理之后对基材的表面进行清洗;以及第一基材输送装置，其适于将经曝光装置执行的基板转印 浸渍曝光过程到洗涤部分。 第一基板承载装置由控制装置控制。 也就是说，控制装置控制第一基板承载装置，使得可以在由于浸渍曝光处理而残留在基板上的液滴的尺寸变成为的时间段之前的一段时间内在洗涤部分中洗涤基板 基于来自曝光装置的基板的准备就绪信号，通过使用从浸渍曝光处理结束之后的时间与由于浸渍而残留在基板上的液滴的尺寸之间的关系而相对快速地更小 曝光过程。

公开(公告)号：US20060231206A1

公开(公告)日：2006-10-19

申请号：US11374953

申请日：2006-03-15

申请人： Hiroyuki Nagasaka ,  Taro Yamamoto ,  Osamu Hirakawa

发明人： Hiroyuki Nagasaka ,  Taro Yamamoto ,  Osamu Hirakawa

IPC分类号： C23F1/00 ,  H01L21/306

CPC分类号： G03F7/70341

摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate via a projection optical system and a liquid. The exposure apparatus includes a liquid supply device which supplies liquid onto the substrate from above the substrate through a first and second supply ports disposed in a vicinity of a projection area onto which the pattern image is projected, and a liquid recovery device which recovers liquid on the substrate from above the substrate through an inside recovery port disposed outside the first and second supply ports and an outside the second recovery port disposed outside the inside recovery port.

摘要翻译： 曝光装置通过投影光学系统和液体将图案图像投影到基板上来曝光基板。 曝光装置包括：液体供给装置，其通过布置在投影图案图像的投影区域附近的第一和第二供给口从基板的上方供给液体;液体回收装置，其将液体回收到 所述基板从所述基板的上方经由设置在所述第一和第二供给口的外侧的内部回收口和设置在所述内侧回收口的外部的所述第二回收口的外部。

公开(公告)号：US06991385B2

公开(公告)日：2006-01-31

申请号：US10943840

申请日：2004-09-20

申请人： Kousuke Yoshihara ,  Keiichi Tanaka ,  Taro Yamamoto ,  Hideharu Kyouda ,  Hirofumi Takeguchi ,  Atsushi Ookouchi

发明人： Kousuke Yoshihara ,  Keiichi Tanaka ,  Taro Yamamoto ,  Hideharu Kyouda ,  Hirofumi Takeguchi ,  Atsushi Ookouchi

IPC分类号： G03D5/00 ,  G03D5/04

CPC分类号： H01L21/6715 ,  G03D3/06 ,  G03F7/3021

摘要： In a developing processing of a wafer having a resist film low in the dissolving rate in a developing solution formed thereon and subjected to an exposure treatment, a developing solution of a low concentration is supplied first onto a wafer and the wafer is left to stand for a prescribed time to permit a developing reaction to proceed, followed by further supplying a developing solution having a concentration higher than that of the developing solution supplied first onto the wafer, leaving the substrate to stand and subsequently rinsing the wafer, thereby improving the uniformity of the line width in the central portion and the peripheral portion of the wafer.

公开(公告)号：US06709174B2

公开(公告)日：2004-03-23

申请号：US10271588

申请日：2002-10-17

申请人： Taro Yamamoto ,  Akihiro Fujimoto ,  Kousuke Yoshihara ,  Hideharu Kyouda ,  Hirofumi Takeguchi

发明人： Taro Yamamoto ,  Akihiro Fujimoto ,  Kousuke Yoshihara ,  Hideharu Kyouda ,  Hirofumi Takeguchi

IPC分类号： G03D500

CPC分类号： H01L21/6715 ,  B05C5/0208 ,  B05C5/0254 ,  B05C11/08 ,  G03F7/3021

摘要： A solution-receiving plate having solution-passing holes for passing a developer solution therethrough toward the back side of the plate is provided. Respective surfaces of the solution-receiving plate and a substrate are at the same height, and the solution-receiving plate is placed on the front-end side of the substrate and separated slightly from the front end of the substrate. A supply nozzle is moved to apply a developer solution. Accordingly, when the developer solution extended continuously between the perimeter of the substrate and the supply nozzle is severed, the severed developer solution is prevented from returning to the developer solution already spread over the substrate and thus flow and waves are prevented from occurring in the developer solution spread on the surface of the substrate. A resist pattern with a highly uniform line width is thus produced.

摘要翻译： 提供一种溶液接收板，其具有用于使显影剂溶液通过其朝向板的背面的溶液通过孔。 溶液接收板和基板的相应表面处于相同的高度，并且溶液 - 接收板被放置在基板的前端侧并与基板的前端稍微分离。 移动供应喷嘴以施加显影剂溶液。 因此，当在基板的周边和供给喷嘴之间连续延伸的显影剂溶液被切断时，切断的显影剂溶液被防止返回已经铺展在基板上的显影剂溶液，从而防止在显影剂中发生波浪 溶液扩散在基材的表面上。 因此产生具有高度均匀线宽的抗蚀剂图案。

公开(公告)号：US06625400B2

公开(公告)日：2003-09-23

申请号：US09845163

申请日：2001-05-01

申请人： Akihiro Sanda ,  Taro Yamamoto

发明人： Akihiro Sanda ,  Taro Yamamoto

IPC分类号： G03B1724

CPC分类号： G03B17/245

摘要： A Brownie film is wound about a spool such that a leader covers outside. A filmstrip has first and second lateral side portions. Upon manufacturing the filmstrip, film information is printed as latent images in the first lateral side portion. The first lateral side portion comes to upper side of the filmstrip when the filmstrip is pulled from the spool to leftward, viewed from a base surface side of the filmstrip. A data exposure head of the camera imprints photographic information as individual printing patterns.

摘要翻译： 布朗尼电影围绕线轴缠绕，使领导者覆盖在外面。 胶片具有第一和第二侧面侧部分。 在制造胶卷时，将胶片信息作为潜像印刷在第一横向侧部分中。 当从胶片的基面侧观察时，当胶卷从卷轴向左拉时，第一横向侧部分到达胶片的上侧。 相机的数据曝光头将照片信息印记为单独的打印图案。

公开(公告)号：US08980013B2

公开(公告)日：2015-03-17

申请号：US13486084

申请日：2012-06-01

申请人： Kousuke Yoshihara ,  Yuichi Yoshida ,  Taro Yamamoto

发明人： Kousuke Yoshihara ,  Yuichi Yoshida ,  Taro Yamamoto

IPC分类号： B08B3/08 ,  G03F7/16 ,  B08B3/02 ,  G03F7/30 ,  H01L21/67

CPC分类号： G03F7/168 ,  B08B3/024 ,  G03F7/3021 ,  H01L21/67051

摘要： A substrate cleaning method that includes: a step in which, while a substrate holder is being continuously rotated, a to-be-discharged position of the cleaning liquid on the substrate is changed to an eccentric position deviated from the central part of the substrate, and a gas is discharged from a gas nozzle to the central part of the substrate so as to form a dried area of the cleaning liquid under a condition in which a shortest distance between an edge of a cleaning liquid flow output from the cleaning-liquid nozzle and an edge of a gas flow output from the gas nozzle is set between 9 mm and 15 mm.

摘要翻译： 一种基板清洗方法，其特征在于，包括：在基板保持件持续旋转的同时，将基板上的清洗液的排出位置变更为偏离基板的中心部的偏心位置， 气体从气体喷嘴排出到基板的中心部分，以便在从清洗液喷嘴输出的清洗液流的边缘之间的最短距离的条件下形成清洁液体的干燥区域 并且从气体喷嘴输出的气流的边缘被设定在9mm和15mm之间。

公开(公告)号：US08758855B2

公开(公告)日：2014-06-24

申请号：US13424011

申请日：2012-03-19

申请人： Nobuhiro Ogata ,  Hiroichi Inada ,  Taro Yamamoto ,  Akihiro Fujimoto

发明人： Nobuhiro Ogata ,  Hiroichi Inada ,  Taro Yamamoto ,  Akihiro Fujimoto

IPC分类号： B05D3/12 ,  B08B3/04

CPC分类号： H01L21/67051

摘要： A coating film forming apparatus that holds a substrate upon a spin chuck and forms a coating film by supplying a chemical liquid upon a top surface of said substrate comprises: an outer cup provided detachably to surround the spin chuck; an inner cup provided detachably to surround a region underneath the substrate held upon the chuck; a cleaning nozzle configured to supply a cleaning liquid for cleaning a peripheral edge part of the substrate, such that the cleaning liquid is supplied to a peripheral part of a bottom surface of the substrate; a cutout part for nozzle mounting, the cutout part being provided to the inner cup to engage with the cleaning nozzle; and a cleaning liquid supply tube connected to the cleaning nozzle, the cleaning nozzle being detachable to the cutout part in a state in which the cleaning liquid supply tube is connected.

摘要翻译： 一种涂膜形成装置，其将基板保持在旋转卡盘上并通过在所述基板的顶表面上提供化学液体而形成涂膜，包括：可拆卸地设置以围​​绕旋转卡盘的外杯; 内杯，可拆卸地设置成围绕保持在卡盘上的基底下方的区域; 清洗喷嘴，其构造成供给清洗所述基板的周缘部的清洗液，使得所述清洗液被供给到所述基板的底面的周边部; 用于喷嘴安装的切口部分，所述切口部分设置到所述内杯以与所述清洁喷嘴接合; 以及连接到清洁喷嘴的清洗液供给管，清洗喷嘴在连接清洗液供给管的状态下可拆卸到切口部。

公开(公告)号：US20120234362A1

公开(公告)日：2012-09-20

申请号：US13486084

申请日：2012-06-01

申请人： Kousuke Yoshihara ,  Yuichi Yoshida ,  Taro Yamamoto

发明人： Kousuke Yoshihara ,  Yuichi Yoshida ,  Taro Yamamoto

IPC分类号： B08B7/04 ,  B08B3/02 ,  B08B5/02

CPC分类号： G03F7/168 ,  B08B3/024 ,  G03F7/3021 ,  H01L21/67051

摘要： A substrate cleaning method that includes: a step in which, while a substrate holder is being continuously rotated, a to-be-discharged position of the cleaning liquid on the substrate is changed to an eccentric position deviated from the central part of the substrate, and a gas is discharged from a gas nozzle to the central part of the substrate so as to form a dried area of the cleaning liquid under a condition in which a shortest distance between an edge of a cleaning liquid flow output from the cleaning-liquid nozzle and an edge of a gas flow output from the gas nozzle is set between 9 mm and 15 mm.

摘要翻译： 一种基板清洗方法，其特征在于，包括：在基板保持件持续旋转的同时，将基板上的清洗液的排出位置变更为偏离基板的中心部的偏心位置， 气体从气体喷嘴排出到基板的中心部分，以便在从清洗液喷嘴输出的清洗液流的边缘之间的最短距离的条件下形成清洁液体的干燥区域 并且从气体喷嘴输出的气流的边缘被设定在9mm和15mm之间。

公开(公告)号：US08262300B2

公开(公告)日：2012-09-11

申请号：US13025300

申请日：2011-02-11

申请人： Yasushi Takiguchi ,  Taro Yamamoto ,  Hiroshi Arima ,  Kousuke Yoshihara ,  Yuichi Yoshida

发明人： Yasushi Takiguchi ,  Taro Yamamoto ,  Hiroshi Arima ,  Kousuke Yoshihara ,  Yuichi Yoshida

IPC分类号： G03B13/00 ,  G03D5/00

CPC分类号： G03B27/52 ,  G03F7/3021 ,  H01L21/6715 ,  H01L21/67178 ,  H01L21/6719 ,  H01L21/67745 ,  H01L21/67748 ,  H01L21/68742 ,  H01L21/68785

摘要： A coating and developing apparatus develops a substrate of which surface is coated with resist and exposed to lights. The coating and developing apparatus includes a developing module; a cleaning module; and a transfer mechanism configured to transfer a substrate developed by the developing module to the cleaning module. The developing module includes an airtightly sealed processing vessel configured to form a processing atmosphere; a temperature control plate provided in the processing vessel and mounts thereon the substrate and cools the substrate; and an atmosphere gas supply unit configured to supply an atmosphere gas including mist of a developing solution to a surface of the substrate within the processing vessel. The cleaning module includes a mounting table configured to mount thereon the substrate; and a cleaning solution supply unit configured to supply a cleaning solution to the substrate mounted on the mounting table.

摘要翻译： 涂层和显影设备开发其表面被抗蚀剂涂覆并暴露于光的基底。 涂料和显影装置包括显影模块; 清洁模块; 以及传送机构，其构造成将由显影模块显影的基板传送到清洁模块。 显影模块包括构造成形成处理气氛的气密密封处理容器; 设置在处理容器中并安装在其上的温度控制板并冷却基板; 以及气氛气体供给单元，被构造成将处理容器内的显影液的气雾气体气体供给至基板的表面。 清洁模块包括：安装台，其安装在其上; 以及清洗液供给单元，其构造成将清洗液供给到安装在所述安装台上的基板。