公开(公告)号：US09625753B2

公开(公告)日：2017-04-18

申请号：US14147150

申请日：2014-01-03

Applicant: Samsung Display Co., Ltd.

Inventor： Yeun Tae Kim ,  Koichi Sugitani ,  Jung Wook Lee ,  Hoon Kang ,  Min Su Kim ,  Seon-Il Kim ,  Hee-Keun Lee

IPC: G02F1/1333 ,  G02F1/1335 ,  G02F1/1362 ,  G02F1/1341

CPC classification number: G02F1/133377 ,  G02F1/133512 ,  G02F1/1341 ,  G02F1/136227

Abstract: A liquid crystal display device includes: a substrate; a thin film transistor disposed on the substrate; a pixel electrode connected with the thin film transistor; and a roof layer disposed to face the pixel electrode, wherein a plurality of microcavities having respective liquid crystal injection holes are formed between the pixel electrode and the roof layer, and the microcavities are filled with electrically orientatable liquid crystal molecules, wherein a light blocking layer disposed adjacent to the injection holes is formed and covering the thin film transistor, wherein the light blocking layer is covered by a passivation layer.

公开(公告)号：US09594307B2

公开(公告)日：2017-03-14

申请号：US14226621

申请日：2014-03-26

Applicant: Samsung Display Co., Ltd.

Inventor： Cha-Dong Kim ,  Hoon Kang ,  Chang-Hoon Kim ,  Sang-Hyun Yun ,  Jung-In Park ,  Woo-Yong Sung ,  Ki-Beom Lee ,  Hi-Kuk Lee ,  Jae-Hyuk Chang

IPC: G03B27/68 ,  G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/70508 ,  G03F7/7055

Abstract: An exposure apparatus includes a light source, an illuminating member, a projecting member, a stage, an inspecting member, and an information processing member. The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation. The illuminating member is configured to change the light into point lights. The projecting member is configured to project the point lights according to a photoresist shape extending in various directions. The point lights are projected on the stage. The inspecting member is configured to inspect a photoresist pattern formed by the projected point lights. The information processing member is configured to analyze different photoresist patterns corresponding to different PEGs to select one PEG from the different PEGs. The one PEG being associated with a minimum error in the various directions.

Abstract translation: 曝光装置包括光源，照明构件，突出构件，台，检查构件和信息处理构件。 光源被配置为根据表示光辐射周期的脉冲事件生成（PEG）提供光。 照明构件被配置为将光改变为点光。 突出构件被配置为根据在各个方向上延伸的光致抗蚀剂形状来投射点光源。 点灯投射在舞台上。 检查构件被配置为检查由投影点光形成的光致抗蚀剂图案。 信息处理构件被配置为分析对应于不同PEG的不同光刻胶图案，以从不同的PEG中选择一个PEG。 一个PEG与各个方向上的最小误差相关联。

公开(公告)号：US09594206B2

公开(公告)日：2017-03-14

申请号：US14488445

申请日：2014-09-17

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Yang-Ho Jung ,  Hoon Kang ,  Chul-Won Park ,  Jin-Ho Ju

IPC: H01L21/4763 ,  F21V8/00 ,  G02B5/04 ,  G02B5/30 ,  G02B3/00 ,  G02F1/1335

CPC classification number: G02B6/0056 ,  G02B3/0037 ,  G02B5/045 ,  G02B5/3058 ,  G02B6/0053 ,  G02B6/0065 ,  G02F1/133528 ,  G02F2001/133548 ,  G02F2001/133565

Abstract: A complex substrate for a display apparatus, the complex substrate includes a lower base substrate including convex and concave patterns, the convex and concave patterns being integral with an upper side of the lower base substrate, a planarizing layer on the lower base substrate, the planarizing layer being integral with the convex and concave patterns, and the planarizing layer having different refractivity from the lower base substrate, and a wire grid pattern on the planarizing layer, the wire grid pattern including a plurality of nano wire metal patterns, each of the nano wire metal patterns having a width of no more than a micrometer.

Abstract translation: 一种显示装置用复合基板，所述复合基板包括下基板，所述下基板包括凸凹图案，所述凸凹图案与所述下基板的上侧一体，所述下基板上的平坦化层， 层与凸形图案和凹形图案成一体，并且具有与下基底基板不同的折射率的平坦化层，以及平面化层上的线栅图案，线栅图案包括多个纳米线金属图案，每个纳米线 具有不超过千分尺的宽度的金属丝图案。

公开(公告)号：US09244302B2

公开(公告)日：2016-01-26

申请号：US14036961

申请日：2013-09-25

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Tae Woo Lim ,  Hee-Keun Lee ,  Hoon Kang ,  Sung Ju Kim ,  Yeun Tae Kim ,  Yu Deok Seo ,  Koichi Sugitani ,  Chae Kyung Tae ,  Cha-Dong Kim

IPC: G02F1/1343 ,  G02F1/1333

CPC classification number: G02F1/133377 ,  G02F1/134363 ,  G02F2001/133302

Abstract: The present invention relates to a display device and a method of manufacturing the display device. The display device according to an exemplary embodiment of the present invention includes a substrate. A pixel electrode is formed on the substrate. A roof layer is formed on the pixel electrode. A first micro-cavity and a second micro-cavity are disposed between the pixel electrode and the roof layer. A liquid crystal fills the first and second micro-cavities. The first and second micro-cavities are connected to each other by a path. The path penetrates the roof layer.

Abstract translation: 本发明涉及一种显示装置及其制造方法。 根据本发明的示例性实施例的显示装置包括基板。 在基板上形成像素电极。 在像素电极上形成屋顶层。 第一微腔和第二微腔设置在像素电极和屋顶层之间。 液晶填充第一和第二微腔。 第一和第二微腔通过路径相互连接。 路径穿透屋顶层。

公开(公告)号：US20150200214A1

公开(公告)日：2015-07-16

申请号：US14490355

申请日：2014-09-18

Applicant: Samsung Display Co., Ltd.

Inventor： Koichi Sugitani ,  Hoon Kang ,  Yeun Tae Kim ,  Kyung Tae Chae

IPC: H01L27/12 ,  G02F1/1334 ,  G02F1/1362 ,  G02F1/1335 ,  G02F1/1333 ,  G02F1/1368 ,  G02F1/1343

CPC classification number: H01L27/1288 ,  G02F1/133377 ,  G02F1/1334 ,  G02F1/13439 ,  G02F1/136209 ,  G02F2201/07 ,  H01L27/1214

Abstract: A method of manufacturing a liquid crystal display includes: forming a sacrificial layer by stacking a non-photosensitive resin; initiating formation of an etch stop layer on the sacrificial layer; forming a photoresist pattern; completing the etch stop layer using the photoresist pattern; ashing the photoresist pattern and the sacrificial layer by using the completed etch stop layer as a mask; forming a microcavity by removing the sacrificial layer; and forming a liquid crystal layer in the microcavity. The horizontal area occupied by the sacrificial layer is reduced by forming the common electrode or the etch stop layer at an upper side, thereby increasing the aperture ratio. Further, the vertical electric field is generated without distortion by horizontally forming the common electrode on the sacrificial layer and forming no common electrode on the sidewall thereof.

Abstract translation: 一种制造液晶显示器的方法包括：通过堆叠非感光树脂形成牺牲层; 在所述牺牲层上引发蚀刻停止层的形成; 形成光致抗蚀剂图案; 使用光致抗蚀剂图案完成蚀刻停止层; 通过使用完成的蚀刻停止层作为掩模来灰化光致抗蚀剂图案和牺牲层; 通过去除牺牲层形成微腔; 并在微腔中形成液晶层。 通过在上侧形成公共电极或蚀刻停止层来减小由牺牲层占据的水平面积，从而增加开口率。 此外，垂直电场通过在牺牲层上水平形成公共电极而在其侧壁上不形成公共电极而产生失真。