Pressure type flow rate control device
    51.
    发明授权
    Pressure type flow rate control device 有权
    压力式流量控制装置

    公开(公告)号:US09574917B2

    公开(公告)日:2017-02-21

    申请号:US13483328

    申请日:2012-05-30

    IPC分类号: G05D7/06 G01F1/36 G01F15/02

    摘要: A pressure type flow rate control device provides flow rate control for gas at 100-500° C. with an error not more than 1.0% F.S. The pressure type flow rate control device includes a valve body with a fluid passage, a valve portion interposed in the passage, a valve drive unit driving the valve portion to open/close the passage, a restriction mechanism on the downstream side of the valve portion in the passage, a temperature detector detecting gas temperature between the valve portion and restriction mechanism, a pressure detector detecting gas pressure between the valve portion and restriction mechanism, and an arithmetic control device controlling flow rate of gas in the restriction mechanism based on values detected by the temperature detector and the pressure detector, wherein the temperature detector is inserted in an attachment hole of the valve body at a position just above an outlet side fluid passage.

    摘要翻译: 压力式流量控制装置为100-500℃的气体提供流量控制,误差不超过1.0%F.S. 压力式流量控制装置包括具有流体通道的阀体,插入通道中的阀部分,驱动阀部分以打开/关闭通道的阀驱动单元,在阀部分的下游侧的限制机构 在通道中,检测器检测阀部分和限制机构之间的气体温度,检测阀部分和限制机构之间的气体压力的压力检测器以及根据检测到的值控制限制机构中的气体流量的算术控制装置 通过温度检测器和压力检测器,其中温度检测器被插入在阀体的安装孔中,恰好在出口侧流体通道的正上方。

    GAS SUPPLY SYSTEM FOR SEMICONDUCTOR MANUFACTRUING FACILITIES
    52.
    发明申请
    GAS SUPPLY SYSTEM FOR SEMICONDUCTOR MANUFACTRUING FACILITIES 有权
    用于半导体制造设备的气体供应系统

    公开(公告)号:US20100192854A1

    公开(公告)日:2010-08-05

    申请号:US12680159

    申请日:2008-07-17

    IPC分类号: H01L51/40

    摘要: A gas supply system includes a main gas supply line; a vent gas supply line; a plurality of gas supply mechanisms disposed in middle of both gas supply lines; a pressure type flow-rate control system disposed on an inlet side of the main gas supply line so a flow of carrier gas is supplied to the main gas supply line; a pressure control system disposed on an inlet side of the vent gas supply line, a carrier gas having a predetermined pressure is supplied to the vent gas supply line while the pressure control system performs a pressure adjustment, a gas pressure of the main gas supply line detected downstream from an orifice of the pressure type flow-rate control system and a gas pressure of the vent gas supply line are compared, and the gas pressure of the vent gas supply line is adjusted so a difference therebetween becomes zero.

    摘要翻译: 气体供应系统包括主气供应管线; 排气供气管线; 设置在两个气体供给管线的中间的多个气体供给机构; 压力型流量控制系统,设置在主气体供给管线的入口侧,从而将载气流供应到主气体供应管线; 设置在排出气体供给管路的入口侧的压力控制系统,在压力控制系统进行压力调节,主气体供给管线的气体压力的情况下,将具有规定压力的载气供给到排气供给管线 从压力式流量控制系统的孔口下游检测出气体供给管路的气体压力,调整排出气体供给管路的气体压力,使其间的差为零。

    Piezoelectrically driven valve and piezoelectrically driven flow rate control device
    53.
    发明授权
    Piezoelectrically driven valve and piezoelectrically driven flow rate control device 有权
    压电阀和压电驱动流量控制装置

    公开(公告)号:US09163743B2

    公开(公告)日:2015-10-20

    申请号:US13505620

    申请日:2010-11-04

    摘要: A piezoelectrically driven valve and a piezoelectrically driven fluid control device are provided that may control a fluid even if the temperature of the fluid is higher than an operating temperature range of a piezoelectric actuator. The piezoelectrically driven valve includes a valve element for opening and closing a fluid passage, a piezoelectric actuator for driving the valve element by utilizing extension of a piezoelectric element, and a radiation spacer that lifts and supports the piezoelectric actuator away from the fluid passage, and radiates heat that is transferred from fluid flowing in the fluid passage to the piezoelectric actuator, and preferably further includes a support cylinder that houses and supports both of the piezoelectric actuator and the radiation spacer, wherein the support cylinder is made of a material with the same thermal expansion coefficient as that of the radiation spacer, at least at a portion for housing the radiation spacer.

    摘要翻译: 提供了一种压电驱动阀和压电驱动的流体控制装置,其可以控制流体,即使流体的温度高于压电致动器的工作温度范围。 压电驱动阀包括用于打开和关闭流体通道的阀元件,通过利用压电元件的延伸来驱动阀元件的压电致动器,以及将压电致动器提升和支撑远离流体通道的辐射间隔件,以及 辐射从在流体通道中流动的流体转移到压电致动器的热量,并且优选地还包括容纳和支撑压电致动器和辐射间隔物的支撑筒,其中支撑筒由具有相同材料的材料制成 至少在用于容纳辐射间隔物的部分处,与辐射间隔物的热膨胀系数相同。

    MIXED GAS SUPPLY APPARATUS
    54.
    发明申请
    MIXED GAS SUPPLY APPARATUS 有权
    混合气体供应装置

    公开(公告)号:US20130025718A1

    公开(公告)日:2013-01-31

    申请号:US13520824

    申请日:2010-10-22

    IPC分类号: F17D1/00

    摘要: A mixed gas supply device includes a plurality of gas supply lines arranged in parallel that include flow rate control devices and outlet side switching valves, wherein gas outlets of respective outlet side switching valves communicate with a manifold, and another gas supply line at a position close to a mixed gas outlet of the manifold supplies a low flow rate gas, wherein an outlet side of the flow rate control device and an inlet side of the outlet side switching valve are hermetically connected via an outlet side connecting fitting of the flow rate control device and a mounting table having a gas passage, wherein a small hole portion is provided at a part of a flow passage at the outlet side connecting fitting and/or a flow passage, which makes the outlet side switching valve and a mixed gas flow passage in the manifold communicate with one another.

    摘要翻译: 混合气体供给装置包括并列布置的多个气体供给管线,包括流量控制装置和出口侧切换阀,其中各个出口侧切换阀的气体出口与歧管连通,另一个气体供给管线位于关闭位置 到歧管的混合气体出口供给低流量气体,其中流量控制装置的出口侧和出口侧切换阀的入口侧经由流量控制装置的出口侧连接配件气密地连接 以及具有气体通道的安装台,其中在出口侧连接配件和/或流路的流路的一部分处设置有小孔部,其使出口侧切换阀和混合气体流路成为 歧管彼此通信。

    Gas supply system for semiconductor manufacturing facilities
    56.
    发明授权
    Gas supply system for semiconductor manufacturing facilities 有权
    半导体制造设备供气系统

    公开(公告)号:US08601976B2

    公开(公告)日:2013-12-10

    申请号:US12680159

    申请日:2008-07-17

    摘要: A gas supply system includes a main gas supply line; a vent gas supply line; a plurality of gas supply mechanisms disposed in middle of both gas supply lines; a pressure type flow-rate control system disposed on an inlet side of the main gas supply line so a flow of carrier gas is supplied to the main gas supply line; a pressure control system disposed on an inlet side of the vent gas supply line, a carrier gas having a predetermined pressure is supplied to the vent gas supply line while the pressure control system performs a pressure adjustment, a gas pressure of the main gas supply line detected downstream from an orifice of the pressure type flow-rate control system and a gas pressure of the vent gas supply line are compared, and the gas pressure of the vent gas supply line is adjusted so a difference therebetween becomes zero.

    摘要翻译: 气体供应系统包括主气供应管线; 排气供气管线; 设置在两个气体供给管线的中间的多个气体供给机构; 压力型流量控制系统,设置在主气体供给管线的入口侧,从而将载气流供应到主气体供应管线; 设置在排出气体供给管路的入口侧的压力控制系统,在压力控制系统进行压力调整,主气体供给管线的气体压力的情况下,将具有规定压力的载气供给到排气供给管线 从压力式流量控制系统的孔口下游检测出气体供给管路的气体压力,调整排出气体供给管路的气体压力,使其间的差为零。

    Fluid control valve and fluid supply/exhaust system
    57.
    发明授权
    Fluid control valve and fluid supply/exhaust system 有权
    流体控制阀和流体供应/排气系统

    公开(公告)号:US06394415B1

    公开(公告)日:2002-05-28

    申请号:US09627784

    申请日:2000-07-27

    IPC分类号: F16K3102

    摘要: A fluid control valve, which can control a fluid having a pressure in the order of 10 kg/cm2, has a response time in the order of several milliseconds can be made small in size, and a fluid supply/exhaust system that provides less gas counter flow in the event of a plurality of valves being used. A fluid control valve of the invention controls a fluid moving in a valve body by closing and opening a portion between a valve seat and a valve holder by use of a drive unit. The drive unit has a rod-shaped shaft for application of pressure through the valve seat and the valve holder, and a member “a” fixed around the rod-shaped shaft. The member “a” is made from a magnetic material, and has a space between it and the shaft. A coil provided in parallel to the shaft, moves the shaft via the member “a” up and down by electromagnetic induction, and makes use of a spring force to close and open a portion between the valve seat and the valve holder.

    摘要翻译: 可以控制具有10kg / cm 2量级的压力的流体的流体控制阀具有大约几毫秒数量级的响应时间,并且可以使得提供较少气体的流体供应/排出系统 在使用多个阀的情况下的逆流。 本发明的流体控制阀通过使用驱动单元闭合和打开阀座和阀座之间的部分来控制在阀体中移动的流体。 驱动单元具有用于通过阀座和阀保持器施加压力的杆状轴和围绕杆状轴固定的构件“a”。 构件“a”由磁性材料制成,并且在其与轴之间具有空间。 平行于轴设置的线圈通过电磁感应使组件“a”上下移动,并利用弹簧力来封闭和打开阀座与阀座之间的一部分。

    Fluid control valve and fluid supply/exhaust system
    58.
    发明授权
    Fluid control valve and fluid supply/exhaust system 有权
    流体控制阀和流体供应/排气系统

    公开(公告)号:US06193212B1

    公开(公告)日:2001-02-27

    申请号:US09308922

    申请日:1999-07-23

    IPC分类号: F16K3102

    摘要: A fluid control valve, which can control a fluid having a pressure in the order of 10 kg/cm2, has a response time in the order of several milliseconds can be made small in size, and a fluid supply/exhaust system that provides less gas counter flow in the event of a plurality of valves being used. A fluid control valve of the invention controls a fluid moving in a valve body by closing and opening a portion between a valve seat and a valve holder by use of a drive unit. The drive unit has a rod-shaped shaft for application of pressure through the valve seat and the valve holder, and a member “a” fixed around the rod-shaped shaft. The member “a” is made from a magnetic material, and has a space between it and the shaft. A coil provided in parallel to the shaft, moves the shaft via the member “a” up and down by electromagnetic induction, and makes use of a spring force to close and open a portion between the valve seat and the valve holder.

    摘要翻译: 可以控制具有10kg / cm 2量级的压力的流体的流体控制阀具有大约几毫秒数量级的响应时间,并且可以使得提供较少气体的流体供应/排出系统 在使用多个阀的情况下的逆流。 本发明的流体控制阀通过使用驱动单元闭合和打开阀座和阀座之间的部分来控制在阀体中移动的流体。 驱动单元具有用于通过阀座和阀保持器施加压力的杆状轴和围绕杆状轴固定的构件“a”。 构件“a”由磁性材料制成,并且在其与轴之间具有空间。 平行于轴设置的线圈通过电磁感应使组件“a”上下移动,并利用弹簧力来封闭和打开阀座与阀座之间的一部分。

    Piezoelectric element driven metal diaphragm control valve
    59.
    发明授权
    Piezoelectric element driven metal diaphragm control valve 有权
    压电元件驱动金属隔膜控制阀

    公开(公告)号:US08191856B2

    公开(公告)日:2012-06-05

    申请号:US12852220

    申请日:2010-08-06

    IPC分类号: F16K31/02

    摘要: A control valve has a body that forms a valve chamber and a valve seat, a metal diaphragm installed inside the valve chamber and making contact with and departing from the valve seat, an actuator box fixed to the side of the body, a piezoelectric element installed inside the actuator box to thrust the metal diaphragm through mediation of a metal diaphragm presser by elongating downward when voltage is applied, a conical spring mechanism that absorbs elongation of the piezoelectric element at the time when the metal diaphragm makes contact with the valve seat and a prescribed thrust is applied to the valve seat and the like, and a preload mechanism that applies upward compressive force to the piezoelectric element all the time wherein the compressive force applied to the piezoelectric element is externally adjustable.

    摘要翻译: 控制阀具有形成阀室和阀座的主体,安装在阀室内部并与阀座接触和离开的金属隔膜,固定在主体侧的致动器盒,安装在压缩元件侧的压电元件 在致动器箱内部,通过金属隔膜压板的调节,通过在施加电压时向下延伸来推动金属隔膜;锥形弹簧机构,其在金属隔膜与阀座接触时吸收压电元件的伸长, 规定的推力被施加到阀座等,以及预压机构,其向压电元件施加向上的压缩力,其中施加到压电元件的压缩力是外部可调节的。

    Normally open type piezoelectric element driven metal diaphragm control valve
    60.
    发明授权
    Normally open type piezoelectric element driven metal diaphragm control valve 有权
    常开式压电元件驱动金属隔膜控制阀

    公开(公告)号:US08181932B2

    公开(公告)日:2012-05-22

    申请号:US12161549

    申请日:2006-11-13

    IPC分类号: F16K31/02

    摘要: A control valve has a body that forms a valve chamber and a valve seat, a metal diaphragm installed inside the valve chamber and making contact with and departing from the valve seat, an actuator box fixed to the side of the body, a piezoelectric element installed inside the actuator box to thrust the metal diaphragm through mediation of a metal diaphragm presser by elongating downward when voltage is applied, a conical spring mechanism that absorbs elongation of the piezoelectric element at the time when the metal diaphragm makes contact with the valve seat and a prescribed thrust is applied to the valve seat and the like, and a preload mechanism that applies upward compressive force to the piezoelectric element all the time wherein the compressive force applied to the piezoelectric element is externally adjustable.

    摘要翻译: 控制阀具有形成阀室和阀座的主体,安装在阀室内部并与阀座接触和离开的金属隔膜,固定在主体侧的致动器盒,安装在压缩元件侧的压电元件 在致动器箱内部,通过金属隔膜压板的调节,通过在施加电压时向下延伸来推动金属隔膜;锥形弹簧机构,其在金属隔膜与阀座接触时吸收压电元件的伸长, 规定的推力被施加到阀座等,以及预压机构,其向压电元件施加向上的压缩力,其中施加到压电元件的压缩力是外部可调节的。