公开(公告)号：US07635889B2

公开(公告)日：2009-12-22

申请号：US11333701

申请日：2006-01-17

申请人： Toshiyuki Isa ,  Gen Fujii ,  Masafumi Morisue ,  Ikuko Kawamata

发明人： Toshiyuki Isa ,  Gen Fujii ,  Masafumi Morisue ,  Ikuko Kawamata

IPC分类号： H01L23/48

CPC分类号： H01L21/288 ,  H01L21/02672 ,  H01L21/76838 ,  H01L27/12 ,  H01L27/124 ,  H01L27/1285 ,  H01L27/1292 ,  H01L27/3248 ,  H01L27/3276 ,  H01L51/0019 ,  H01L51/0022 ,  H01L51/0023 ,  H01L2924/0002 ,  Y02P80/30 ,  H01L2924/00

摘要： Conductive layers having knots are adjacently formed with uniform distance therebetween. Droplets of the conductive layers are discharged to stagger centers of the droplets in a length direction of wirings so that the centers of the discharged droplets are not on the same line in a line width direction between the adjacent conductive layers. Since the centers of the droplets are staggered, parts of the conductive layers each having a widest line width (the widest width of knot) are not connected to each other, and the conductive layers can be formed adjacently with a shorter distance therebetween.

摘要翻译： 具有结的导电层相邻地形成，其间具有均匀的距离。 导电层的液滴在布线的长度方向上被排出到液滴的错开中心，使得排出的液滴的中心在相邻导电层之间的线宽方向上不在相同的线上。 由于液滴的中心是错开的，所以每个具有最宽的线宽（结的最宽的宽度）的导电层的部分彼此不连接，导电层可以以较短的距离相邻地形成。

公开(公告)号：US20070295973A1

公开(公告)日：2007-12-27

申请号：US11705828

申请日：2007-02-14

申请人： Yasuhiro Jinbo ,  Masafumi Morisue ,  Hajime Kimura ,  Shunpei Yamazaki

发明人： Yasuhiro Jinbo ,  Masafumi Morisue ,  Hajime Kimura ,  Shunpei Yamazaki

IPC分类号： H01L33/00 ,  H01L21/30

CPC分类号： H01L27/1266 ,  G02F1/133305 ,  G02F1/133603 ,  H01L21/6835 ,  H01L27/1214 ,  H01L27/153 ,  H01L33/0079 ,  H01L33/62 ,  H01L51/003 ,  H01L2221/68318 ,  H01L2221/68386

摘要： The present invention provides a manufacturing technique of a semiconductor device and a display device using a peeling process, in which a transfer process can be conducted with a good state in which a shape and property of an element before peeling are kept. Further, the present invention provides a manufacturing technique of more highly reliable semiconductor devices and display devices with high yield without complicating the apparatus and the process for manufacturing. According to the present invention, an organic compound layer including a photocatalyst substance is formed over a first substrate having a light-transmitting property, an element layer is formed over the organic compound layer including a photocatalyst substance, the organic compound layer including a photocatalyst substance is irradiated with light which has passed through the first substrate, and the element layer is peeled from the first substrate.

摘要翻译： 本发明提供一种使用剥离工艺的半导体器件和显示装置的制造技术，其中可以以保持剥离之前元件的形状和特性的良好状态进行转印处理。 此外，本发明提供了一种更高可靠性的高可靠性的半导体器件和显示器件的制造技术，而不会使器件和制造过程复杂化。 根据本发明，在具有透光性的第一基板上形成包含光催化剂物质的有机化合物层，在包含光催化剂物质的有机化合物层上形成元素层，所述有机化合物层包含光催化剂物质 被穿过第一衬底的光照射，并且元件层从第一衬底剥离。

公开(公告)号：US20060169973A1

公开(公告)日：2006-08-03

申请号：US11333646

申请日：2006-01-17

申请人： Toshiyuki Isa ,  Masafumi Morisue ,  Ikuko Kawamata

发明人： Toshiyuki Isa ,  Masafumi Morisue ,  Ikuko Kawamata

IPC分类号： H01L29/08

CPC分类号： H01L29/7869 ,  H01L27/124 ,  H01L27/1285 ,  H01L27/1292 ,  H01L51/0022 ,  H01L2924/0002 ,  H01L2924/00

摘要： To provide a semiconductor device and a display device which can be manufactured through a simplified process and the manufacturing technique. Another object is to provide a technique by which a pattern of wirings or the like which is partially constitutes a semiconductor device or a display device can be formed with a desired shape with controllability.

公开(公告)号：US20060113894A1

公开(公告)日：2006-06-01

申请号：US11271800

申请日：2005-11-14

申请人： Gen Fujii ,  Masafumi Morisue

发明人： Gen Fujii ,  Masafumi Morisue

IPC分类号： H05B33/00 ,  H01J1/62

CPC分类号： H01L29/4908 ,  H01L27/1292 ,  H01L29/458 ,  H01L2924/0002 ,  H01L2924/00

摘要： The purpose of the present invention is to provide a semiconductor device or a display device that can be manufactured by improving the use efficiency of a material as well as simplifying the manufacturing process, and a manufacturing technique of those devices. Also, another purpose of the present invention is to provide a technique for forming a pattern of wirings, etc., constituting the semiconductor device or the display device, in a desired shape and with good adhesiveness. The adhesiveness between first and second conductive layers is increased by forming a conductive buffer layer including at least one pore between them. The second conductive layer is formed by filling the pores of the buffer layer including at least one pore with a particle shaped conductive material which is solidified by baking. The conductive layer solidified in the pores functions like a wedge, and the second conductive layer is formed over the first conductive layer with good adhesiveness and stability.

公开(公告)号：US20060040435A1

公开(公告)日：2006-02-23

申请号：US11195725

申请日：2005-08-03

申请人： Masafumi Morisue ,  Gen Fujii

发明人： Masafumi Morisue ,  Gen Fujii

IPC分类号： H01L21/84

CPC分类号： H01L27/1285 ,  H01L27/1292

摘要： It is an object of the present invention to provide a method for manufacturing a substrate having film patterns such as an insulating film, a semiconductor film, and a conductive film in simple processes. It is another object of the invention to provide a method for manufacturing a semiconductor device with high throughput and high yield at low cost. A method for manufacturing a semiconductor device including the steps of: forming a first film over a substrate; discharging a solution containing a mask material to the first film thereby forming a mask over the first film; patterning the first film with the use of the mask thereby forming low wettability regions and a high wettability region over the substrate; removing the mask; and discharging a solution containing a material of an insulating film, a semiconductor film, or a conductive film to the high wettability region provided between the low wettability regions thereby forming a pattern of the insulating film, the semiconductor film, or the conductive film.

摘要翻译： 本发明的目的是提供一种在简单的工艺中制造具有绝缘膜，半导体膜和导电膜等膜图案的基板的方法。 本发明的另一个目的是提供一种以低成本生产高产量和高产率的半导体器件的方法。 一种制造半导体器件的方法，包括以下步骤：在衬底上形成第一膜; 将含有掩模材料的溶液排放到第一膜上，从而在第一膜上形成掩模; 通过使用掩模图案化第一膜，从而在衬底上形成低润湿性区域和高润湿性区域; 去除面膜; 并且将包含绝缘膜，半导体膜或导电膜的材料的溶液排出到设置在低润湿性区域之间的高润湿性区域，从而形成绝缘膜，半导体膜或导电膜的图案。