公开(公告)号：US20050093041A1

公开(公告)日：2005-05-05

申请号：US10930302

申请日：2004-08-31

申请人： Wolfgang Singer ,  Johannes Wangler ,  Eric Sohmen

发明人： Wolfgang Singer ,  Johannes Wangler ,  Eric Sohmen

IPC分类号： G21K1/06 ,  G02B19/00 ,  G03F7/20 ,  G21K5/02 ,  H01L21/027 ,  H01L29/76

CPC分类号： B82Y10/00 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G03F7/70108 ,  G03F7/70166

摘要： There is provided an illumination system. The illumination system includes a source for light having a wavelength ≦193 nm, a field plane, and a collector having a mirror shell for receiving a part of the light. The mirror shell is arranged so that a real image of the source is formed and comes to lie in a plane that is defocused relative to the field plane by more than 30 mm, so that the field plane is illuminated in a predetermined region, substantially homogeneously.

摘要翻译： 提供照明系统。 照明系统包括波长<= 193nm的光源，场平面和具有用于接收一部分光的镜壳的收集器。 镜壳布置成使得源的真实图像形成并且位于相对于场平面散焦大于30mm的平面中，使得场平面基本上均匀地被照射在预定区域中 。

公开(公告)号：US20050002090A1

公开(公告)日：2005-01-06

申请号：US10876898

申请日：2004-06-25

申请人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler

发明人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler

IPC分类号： G03F7/20 ,  G02B17/00

CPC分类号： B82Y10/00 ,  G03B27/54 ,  G03F7/70083 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G21K2201/061

摘要： There is provided an illumination system. The illumination system includes a source of light having a wavelength of less than or equal to about 193 nm, a first facet, a second facet, and a reflective element. The light is incident on the first facet via a first path, propagates from the first facet to the second facet via a second path, and propagates from the second facet to the reflective element via a third path. The second path and the third path are in substantially opposite directions from one another and substantially parallel to each other.

摘要翻译： 提供照明系统。 照明系统包括波长小于或等于约193nm的光源，第一刻面，第二刻面和反射元件。 光通过第一路径入射在第一刻面上，经由第二路径从第一刻面传播到第二刻面，并且经由第三路径从第二面传播到反射元件。 第二路径和第三路径彼此基本上相反的方向并且基本上彼此平行。

公开(公告)号：US20100195077A1

公开(公告)日：2010-08-05

申请号：US12758554

申请日：2010-04-12

申请人： Jess KOEHLER ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

发明人： Jess KOEHLER ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

IPC分类号： G03B27/54

CPC分类号： G03F7/70116 ,  G03F7/702

摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

摘要翻译： 用于微光刻投影曝光装置的照明系统用于利用来自主光源（11）的光照亮照明场。 照明系统具有从主光源接收光的光分配装置（25），并且从该光产生二维强度分布，其可以可变地设置在照明系统的瞳孔成形表面（31）中 。 配光装置具有至少一个光学调制装置（20），其具有能独立控制的各个元件（21）的二维阵列，以便改变入射在光调制装置上的光的角分布。 该装置允许在不更换光学部件的情况下可变地设置不同的照明模式。

公开(公告)号：US20090316128A1

公开(公告)日：2009-12-24

申请号：US12547135

申请日：2009-08-25

申请人： Hans-Juergen Mann ,  Wolfgang Singer ,  Joerg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Martin Antoni ,  Wilhelm Ulrich

发明人： Hans-Juergen Mann ,  Wolfgang Singer ,  Joerg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Martin Antoni ,  Wilhelm Ulrich

IPC分类号： G03B27/70

CPC分类号： G21K1/06 ,  B82Y10/00 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358

摘要： There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.

摘要翻译： 提供一种用于投影曝光装置的投影物镜，其具有用于发射具有波长<= 193nm的主射线的电磁辐射的主光源。 投影物镜包括物平面，第一镜，第二镜，第三镜，第四镜; 和一个图像平面。 物体平面，第一反射镜，第二反射镜，第三反射镜，第四反射镜和像平面以围绕公共光轴的中心布置布置。 第一镜，第二镜，第三镜和第四镜位于物平面和像平面之间。 当从主光源方向入射到物平面中的物体上时，主光线远离公共光轴倾斜。

公开(公告)号：US20090073410A1

公开(公告)日：2009-03-19

申请号：US12257910

申请日：2008-10-24

申请人： Hans-Juergen Mann ,  Wolfgang Singer ,  Joerg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Martin Antoni ,  Wilhelm Ulrich

发明人： Hans-Juergen Mann ,  Wolfgang Singer ,  Joerg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Martin Antoni ,  Wilhelm Ulrich

IPC分类号： G03B27/70

CPC分类号： G21K1/06 ,  B82Y10/00 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358

摘要： There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.

摘要翻译： 提供一种用于投影曝光装置的投影物镜，其具有用于发射具有波长<= 193nm的主射线的电磁辐射的主光源。 投影物镜包括物平面，第一镜，第二镜，第三镜，第四镜; 和一个图像平面。 物体平面，第一反射镜，第二反射镜，第三反射镜，第四反射镜和像平面以围绕公共光轴的中心布置布置。 第一镜，第二镜，第三镜和第四镜位于物平面和像平面之间。 当从主光源方向入射到物平面中的物体上时，主光线远离公共光轴倾斜。

公开(公告)号：US20080212327A1

公开(公告)日：2008-09-04

申请号：US11660754

申请日：2005-08-23

申请人： Wolfgang Singer ,  Johannes Wangler ,  Rafael Egger ,  Wilhelm Ulrich

发明人： Wolfgang Singer ,  Johannes Wangler ,  Rafael Egger ,  Wilhelm Ulrich

IPC分类号： F21V7/00

CPC分类号： G03F7/70108 ,  G03F7/70183

摘要： An illumination system of a microlithographic exposure apparatus has an optical axis and a beam transforming device. This device includes a first mirror with a first reflective surface having a shape that is defined by rotating a straight line, which is inclined with respect to the optical axis, around the optical axis. The device further includes a second mirror with a second reflective surface having a shape that is defined by rotating a curved line around the optical axis. At least one of the mirrors has a central aperture containing the optical axis. This device may form a zoom-collimator for an EUV illumination system that transforms a diverging light bundle into a collimated light bundle of variable shape and/or diameter.

摘要翻译： 微光刻曝光装置的照明系统具有光轴和光束变换装置。 该装置包括具有第一反射表面的第一反射镜，该第一反射表面具有围绕光轴旋转相对于光轴倾斜的直线所限定的形状。 该装置还包括具有第二反射表面的第二反射镜，其具有通过围绕光轴旋转曲线而限定的形状。 至少一个反射镜具有包含光轴的中心孔。 该装置可以形成EUV照明系统的变焦准直器，其将发散的光束变换成可变形状和/或直径的准直光束。

公开(公告)号：US20070165202A1

公开(公告)日：2007-07-19

申请号：US10571475

申请日：2004-09-13

申请人： Jess Koehler ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

发明人： Jess Koehler ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

IPC分类号： G03B27/54

CPC分类号： G03F7/70116 ,  G03F7/702

摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

摘要翻译： 用于微光刻投影曝光装置的照明系统用于利用来自主光源（11）的光照亮照明场。 照明系统具有从主光源接收光的光分配装置（25），并且从该光产生二维强度分布，其可以可变地设置在照明系统的瞳孔成形表面（31）中 。 配光装置具有至少一个光学调制装置（20），其具有能独立控制的各个元件（21）的二维阵列，以便改变入射在光调制装置上的光的角分布。 该装置允许在不更换光学部件的情况下可变地设置不同的照明模式。

公开(公告)号：US07109497B2

公开(公告)日：2006-09-19

申请号：US10381945

申请日：2001-09-28

申请人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

发明人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

IPC分类号： G21G6/00

CPC分类号： G21K1/06 ,  B82Y10/00 ,  G03F7/70075

摘要： There is provided an illumination system, particularly for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane producing a plurality of images being superimposed at least partially on a field in the image plane. The plurality of first raster elements have negative optical power.

摘要翻译： 提供了一种照明系统，特别适用于波长<= 193nm的微光刻。 照明系统包括主光源，第一光学部件，第二光学部件，图像平面和出射光瞳。 第一光学部件将初级光源转换成由出射光瞳中的第二光学部件成像的多个次级光源。 第一光学部件包括具有多个第一光栅元件的第一光学元件，其被成像到图像平面中，产生至少部分地叠加在图像平面中的场上的多个图像。 多个第一光栅元件具有负光焦度。

公开(公告)号：US06947120B2

公开(公告)日：2005-09-20

申请号：US10381626

申请日：2001-09-28

申请人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

发明人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

IPC分类号： G03F7/20 ,  G21K1/06 ,  G03B27/42 ,  G03B27/54 ,  G21K5/00

CPC分类号： B82Y10/00 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G21K1/06

摘要： There is provided an illumination system for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed at least partially on a field in the image plane. The second optical component comprises a first optical system that includes at least a third field mirror with positive optical power and a second optical system that includes at least a second field mirror with positive optical power. The first optical system images the plurality of secondary light sources in a plane between the first optical system and the second optical system, forming a plurality of tertiary light sources, and the second optical system images the plurality of tertiary light sources in the exit pupil.

摘要翻译： 提供了一种用于微波光刻的照明系统，其波长<= 193nm。 照明系统包括主光源，第一光学部件，第二光学部件，图像平面和出射光瞳。 第一光学部件将初级光源转换成由出射光瞳中的第二光学部件成像的多个次级光源。 第一光学部件包括具有成像到图像平面中的多个第一光栅元件的第一光学元件，产生至少部分地叠加在图像平面中的场上的多个图像。 第二光学部件包括第一光学系统，其包括具有正光焦度的至少第三场反射镜和包括至少具有正光焦度的第二场反射镜的第二光学系统。 第一光学系统在第一光学系统和第二光学系统之间的平面内成像多个次级光源，形成多个第三光源，并且第二光学系统在出射光瞳中成像多个第三光源。

公开(公告)号：US06858853B2

公开(公告)日：2005-02-22

申请号：US10381624

申请日：2001-09-28

申请人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

发明人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

IPC分类号： G03F7/20 ,  G21K1/06 ,  G21K5/00 ,  G21K5/04

CPC分类号： G21K1/06 ,  B82Y10/00 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G02B27/0905 ,  G02B27/0983 ,  G03F7/70083 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358

摘要： There is provided an illumination system for microlithography with wavelengths≦193 nm that includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical element and the second optical element are reflective. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed, at least partially, on a field in the image plane. The first optical component includes a collector unit and a second optical element having a plurality of second raster elements. The illumination system also includes a first optical axis between the collector unit and the first optical element, a second optical axis between the first optical element and the second optical element, and a third optical axis between the second optical element and the second optical component. A directional vector of the first optical axis and a directional vector of the second optical axis define a plane and wherein the first and second optical elements are tilted to cause a crossing of the projection of the third optical axis in to the plane and the first optical axis.

摘要翻译： 提供了包括初级光源，第一光学部件，第二光学部件，图像平面和出射光瞳的波长<= 193nm的微光刻照明系统。 第一光学部件将初级光源转换成由出射光瞳中的第二光学部件成像的多个次级光源。 第一光学元件和第二光学元件是反射性的。 第一光学部件包括具有成像到图像平面中的多个第一光栅元件的第一光学元件，至少部分地叠加在图像平面中的场上产生多个图像。 第一光学部件包括收集器单元和具有多个第二光栅元件的第二光学元件。 所述照明系统还包括在所述收集单元与所述第一光学元件之间的第一光轴，所述第一光学元件和所述第二光学元件之间的第二光轴以及所述第二光学元件和所述第二光学元件之间的第三光轴。 第一光轴的方向矢量和第二光轴的方向矢量限定一个平面，并且其中第一和第二光学元件被倾斜以使第三光轴的投影与平面交叉，并且第一光学 轴。