公开(公告)号：US08302556B2

公开(公告)日：2012-11-06

申请号：US12855534

申请日：2010-08-12

申请人： Masami Akimoto ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

发明人： Masami Akimoto ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

IPC分类号： B05C5/02 ,  B05C11/02

CPC分类号： H01L21/67184 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67207 ,  H01L21/67745

摘要： Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks. Unit blocks for application which a wafer goes through are determined depending on the layering positional relationship between an antireflective film and a resist film. An exposed wafer goes only through the unit block for development without going through any one of the unit blocks for application.

摘要翻译： 提供一种由多个单元块组成的涂层显影装置。 第一单位块堆叠和第二单位块堆叠被布置在相对于前后方向的不同位置。 用于显影的单元块，每个包括多个处理单元，包括执行曝光之后的显影处理的显影单元和在处理单元之间传送基板的转印装置布置在最下层。 用于应用或涂布的单元块包括多个处理单元，其包括在曝光之前进行施加处理的涂覆单元和在处理单元之间传送基板的转印装置，布置在用于显影的单位块上方。 用于应用的单元块被布置在第一和第二单元块堆叠中。 根据防反射膜和抗蚀剂膜之间的层叠位置关系确定晶片通过的应用单元块。 暴露的晶片仅通过单元块进行开发，而不经过用于应用的单元块中的任何一个。

公开(公告)号：US08231285B2

公开(公告)日：2012-07-31

申请号：US12610907

申请日：2009-11-02

申请人： Kunie Ogata ,  Koki Nishimuko ,  Hiroshi Tomita ,  Yoshio Kimura ,  Ryouichi Uemura ,  Michio Tanaka

发明人： Kunie Ogata ,  Koki Nishimuko ,  Hiroshi Tomita ,  Yoshio Kimura ,  Ryouichi Uemura ,  Michio Tanaka

IPC分类号： G03D5/00 ,  G03B27/53

CPC分类号： H01L21/67253 ,  G03F7/162 ,  G03F7/3021 ,  H01L21/6715

摘要： A resist pattern forming method using a coating and developing apparatus and an aligner being connected thereto which are controlled to form a resist film on a surface of a substrate with a base film and a base pattern formed thereon, followed by inspecting at least one of a plurality of measurement items selected from: reflection ratio and film thickness of the base film and the resist film, line width after a development, an accuracy that the base pattern matches with a resist pattern, a defect on the surface after the development, etc. A parameter subject to amendment is selected based on corresponding data of each measurement item, such as the film thickness of the resist and the line width after the development, and amendment of the parameter is performed. This results in a reduced workload of an operator, and the appropriate amendment can be performed.

摘要翻译： 使用涂覆和显影装置和对准器连接的抗蚀剂图案形成方法被控制以在其上形成有基膜和基底图案的基板的表面上形成抗蚀剂膜，然后检查至少一个 选自以下的多个测量项目：基膜和抗蚀剂膜的反射率和膜厚度，显影后的线宽度，基底图案与抗蚀剂图案匹配的精度，显影后的表面上的缺陷等。 基于每个测量项目的对应数据（例如抗蚀剂的膜厚度和显影后的线宽度）来选择修改参数，并且修改参数。 这导致操作者的工作量减少，并且可以执行适当的修改。

公开(公告)号：US20110020590A1

公开(公告)日：2011-01-27

申请号：US12934557

申请日：2009-03-24

申请人： Hisao Yoneda ,  Yoshio Kimura ,  Yoshiaki Wakimoto ,  Kiyohiko Miyauchi

发明人： Hisao Yoneda ,  Yoshio Kimura ,  Yoshiaki Wakimoto ,  Kiyohiko Miyauchi

IPC分类号： B32B9/02 ,  D06N3/14 ,  B32B5/02 ,  B32B27/40 ,  B32B37/16

CPC分类号： C14B7/04 ,  B32B5/022 ,  B32B5/08 ,  B32B7/12 ,  B32B9/025 ,  B32B9/047 ,  B32B25/02 ,  B32B25/10 ,  B32B25/14 ,  B32B2260/021 ,  B32B2260/046 ,  B32B2262/0207 ,  B32B2262/0238 ,  B32B2262/0253 ,  B32B2262/0261 ,  B32B2262/0276 ,  B32B2262/12 ,  B32B2307/3065 ,  B32B2307/50 ,  B32B2307/54 ,  B32B2307/5825 ,  B32B2307/718 ,  B32B2307/72 ,  B32B2437/00 ,  B32B2439/06 ,  B32B2439/46 ,  B32B2479/00 ,  B32B2605/003 ,  C14B7/02 ,  Y10T428/2395 ,  Y10T428/2495 ,  Y10T428/24967 ,  Y10T442/614

摘要： An aspect of the invention is a split leather product provided with a base material comprising split leather, and a skin layer laminated on a surface of the base material. The skin layer comprises a composite body of an entangled nonwoven fabric formed from microfine fibers, and a polymeric elastomer that impregnates the gaps in the entangled nonwoven fabric. The entangled nonwoven fabric in such a split leather product has the effect of increasing physical strength without detracting from a leather-like texture, in the same way as the longitudinally and transversally crisscrossing collagen fibers in the reticular layer. It is thus possible to obtain a split leather product that resembles leather not only in outward appearance but also in the feel derived from wrinkles and the like resulting when the leather is bent.

摘要翻译： 本发明的一个方面是提供有包括裂皮的基材的层压皮革制品和层压在基材表面上的表层。 表皮层包括由微细纤维形成的缠结非织造织物的复合体和浸渍缠结无纺织物中的间隙的聚合物弹性体。 这种分裂皮革制品中的缠结非织造织物具有与网状层中的纵向和横向交叉的胶原纤维相同的方式增加体力而不会降低皮革样织构的效果。 因此，可以获得类似皮革的分裂皮革制品，不仅外观而且在皮革弯曲时产生的褶皱等感觉。

公开(公告)号：US07780366B2

公开(公告)日：2010-08-24

申请号：US11831622

申请日：2007-07-31

申请人： Kunie Ogata ,  Koki Nishimuko ,  Hiroshi Tomita ,  Yoshio Kimura ,  Ryouichi Uemura ,  Michio Tanaka

发明人： Kunie Ogata ,  Koki Nishimuko ,  Hiroshi Tomita ,  Yoshio Kimura ,  Ryouichi Uemura ,  Michio Tanaka

IPC分类号： G03D5/00 ,  G03B27/32

CPC分类号： H01L21/67253 ,  G03F7/162 ,  G03F7/3021 ,  H01L21/6715

摘要： A resist pattern forming method using a coating and developing apparatus and an aligner being connected thereto which are controlled to form a resist film on a surface of a substrate with a base film and a base pattern formed thereon, followed by inspecting at least one of a plurality of measurement items selected from: reflection ratio and film thickness of the base film and the resist film, line width after a development, an accuracy that the base pattern matches with a resist pattern, a defect on the surface after the development, etc. A parameter subject to amendment is selected based on corresponding data of each measurement item, such as the film thickness of the resist and the line width after the development, and amendment of the parameter is performed. This results in a reduced workload of an operator, and the appropriate amendment can be performed.

摘要翻译： 使用涂覆和显影装置和对准器连接的抗蚀剂图案形成方法被控制以在其上形成有基膜和基底图案的基板的表面上形成抗蚀剂膜，然后检查至少一个 选自以下的多个测量项目：基膜和抗蚀剂膜的反射率和膜厚度，显影后的线宽度，基底图案与抗蚀剂图案匹配的精度，显影后的表面上的缺陷等。 基于每个测量项目的对应数据（例如抗蚀剂的膜厚度和显影后的线宽度）来选择修改参数，并且修改参数。 这导致操作者的工作量减少，并且可以执行适当的修改。

公开(公告)号：US20100116293A1

公开(公告)日：2010-05-13

申请号：US12690747

申请日：2010-01-20

申请人： Yoshio Kimura ,  Takahiro Okubo

发明人： Yoshio Kimura ,  Takahiro Okubo

IPC分类号： B08B3/02

CPC分类号： H01L21/67178 ,  H01L21/67184 ,  H01L21/6719

摘要： A process system includes a plurality of processing modules each processing a substrate with a process liquid. There is disposed a dispensing mechanism that dispenses the process liquid to the vertically arranged modules. The dispensing mechanism is provided with a process liquid supply source, and pumps corresponding to the respective processing modules. Each pump temporarily stores therein the process liquid which has been pressure-fed through a riser piping from the process liquid supply source by a pressing apparatus, and delivers the process liquid from an outlet. There are disposed nozzles each having a discharge port and discharging the process liquid to the corresponding processing module. Delivery pipings connecting the outlets of the pumps with the discharge ports of the corresponding nozzles have identical length to each other.

摘要翻译： 处理系统包括多个处理模块，每个处理模块用处理液处理衬底。 设置了将处理液体分配给垂直排列的模块的分配机构。 分配机构设置有处理液体供应源和对应于各个处理模块的泵。 每个泵临时存储已经通过加压装置从处理液体供给源通过提升管道进给的处理液体，并且从出口输送处理液体。 设有各自具有排出口并且将处理液体排出到相应的处理模块的喷嘴。 将泵的出口与相应喷嘴的排出口连接的输送管道彼此具有相同的长度。

公开(公告)号：US07580152B2

公开(公告)日：2009-08-25

申请号：US11074635

申请日：2005-03-09

申请人： Yoshio Kimura

发明人： Yoshio Kimura

IPC分类号： G06F15/00 ,  G06K15/02 ,  H04N1/46 ,  G06F3/12 ,  G06K15/10

CPC分类号： G06K15/00 ,  H04N1/4078

摘要： A printing system which can obtain a print result at a proper quality without a variation in quality from any printer while freely corresponding to a fluctuation of output image characteristics of each printer is provided. A density correction processor obtains correction data to correct the output image characteristics from a printer, forms a density correction table to correct an output density of print information from each data processing apparatus every printer, stores each of the formed density correction tables into a memory medium, and manages them.

摘要翻译： 提供了能够以与各打印机的输出图像特性的波动自由对应的，能够以适当的质量获得打印结果的打印结果，而没有任何打印机质量变化的打印结果。 密度校正处理器获得校正数据以校正来自打印机的输出图像特性，形成密度校正表，以校正每个打印机的每个数据处理设备的打印信息的输出密度，将每个形成的浓度校正表存储到存储介质中 ，并管理它们。

公开(公告)号：US20090207445A1

公开(公告)日：2009-08-20

申请号：US12388213

申请日：2009-02-18

申请人： Yoshio Kimura

发明人： Yoshio Kimura

IPC分类号： G06F3/12 ,  H04B7/00

CPC分类号： G06F3/1236 ,  G06F3/1209 ,  G06F3/1292 ,  H04L63/08 ,  H04N1/00307 ,  H04N1/00347 ,  H04N2201/0036 ,  H04N2201/0039 ,  H04N2201/0044 ,  H04N2201/0046 ,  H04N2201/0055 ,  H04N2201/0094

摘要： A technique for providing a first information processing apparatus configured to acquire first identification information as information for identifying the information processing apparatus, searching for a second information processing apparatus capable of wireless communication, acquiring a second identification information as information for identifying the second information processing apparatus that was found, comparing the first identification information and the second identification information, changing the first identification information when the first identification information and the second identification information are identical, and notifying when the first identification information is changed.

摘要翻译： 一种用于提供第一信息处理设备的技术，被配置为获取第一识别信息作为用于识别信息处理设备的信息，搜索能够进行无线通信的第二信息处理设备，获取第二识别信息作为用于识别第二信息处理设备的信息 比较第一识别信息和第二识别信息，当第一识别信息和第二识别信息相同时，改变第一识别信息，并通知第一识别信息何时改变。

公开(公告)号：US20090125949A1

公开(公告)日：2009-05-14

申请号：US12174555

申请日：2008-07-16

申请人： Yoshio Kimura

发明人： Yoshio Kimura

IPC分类号： H04N5/445 ,  H04N7/173

CPC分类号： H04L12/2838 ,  H04L2012/2849 ,  H04N21/43615

摘要： A stream supplying apparatus includes: a tuner that receives a broadcast signal; a decoder that decodes the broadcast signal and outputs the decoded broadcast signal as a data stream; a memory that stores apparatus information that pertains to the stream supplying apparatus; and a network interface that transmits the apparatus information stored in the memory to a content reproducing apparatus, which is connected to the stream supplying apparatus via a network, in response to a state collecting command output from the content reproducing apparatus.

摘要翻译： 流提供装置包括：接收广播信号的调谐器; 解码器，其对广播信号进行解码并输出解码的广播信号作为数据流; 存储器，其存储与流供给装置有关的装置信息; 以及网络接口，响应于从内容再现装置输出的状态收集命令，将存储在存储器中的装置信息发送到内容再现装置，该内容再现装置经由网络连接到流提供装置。

公开(公告)号：US20080174817A1

公开(公告)日：2008-07-24

申请号：US12013159

申请日：2008-01-11

申请人： Junko Nemoto ,  Yoshio Kimura

发明人： Junko Nemoto ,  Yoshio Kimura

IPC分类号： G06F3/12

CPC分类号： H04N1/00411 ,  G06F3/1204 ,  G06F3/122 ,  G06F3/1222 ,  G06F3/127 ,  G06F3/1273 ,  G06F3/1274 ,  G06F3/1288 ,  H04N1/00432 ,  H04N1/00472 ,  H04N1/00474 ,  H04N1/00482 ,  H04N1/00954 ,  H04N1/32358 ,  H04N2201/0094 ,  H04N2201/3202 ,  H04N2201/3274 ,  H04N2201/3295

摘要： When a user logs in and inputs document data into a box, a usage history of the box as used by the user is determined by referring to a user information management table. If there is a record, process attributes are set, and a process associated with the box is executed. If there is no record, a message indicating that there is no record is displayed. If execution is selected in response to this display, the process is executed. Once the process has ended, the usage record of the box as used by the user is updated to “used”.

摘要翻译： 当用户登录并将文档数据输入到框中时，通过参考用户信息管理表来确定用户使用的框的使用历史。 如果有记录，则设置进程属性，并且执行与该框相关联的进程。 如果没有记录，则显示表示没有记录的消息。 如果响应于此显示选择执行，则执行该过程。 一旦过程结束，用户使用的框的使用记录被更新为“已使用”。

公开(公告)号：US07241061B2

公开(公告)日：2007-07-10

申请号：US11336990

申请日：2006-01-23

申请人： Masami Akimoto ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

发明人： Masami Akimoto ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

IPC分类号： G03D5/00

CPC分类号： H01L21/6715 ,  H01L21/00 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/6719

摘要： A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system is capable of coping with either of a case where antireflection films are formed and a case where any antireflection film is not formed and needs simple software. Film forming unit blocks, namely, a TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks, namely, DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a simple carrying program and simple software.

摘要翻译： 涂覆显影系统包括：抗蚀剂膜形成单元块和层叠的抗反射膜形成单元块，以形成抗蚀剂膜和抗反射膜下面的抗反射膜以及在小空间中覆盖抗蚀剂膜的抗反射膜。 涂层显影系统能够应对形成防反射膜的情况和没有形成任何抗反射膜的情况，并且需要简单的软件。 成膜单位块，即TCT层B 3，COT层B 4和BCT层B 5以及显影单元块，即DEV层B 1和B 2，层叠在处理块S 2。 在形成防反射膜的情况下，选择性地使用TCT层B 3，COT层B 4和BCT层B 5以及未形成任何抗反射膜的情况。 涂层和显影系统由简单的携带程序和简单的软件控制。