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    METHOD FOR PRODUCING A LARGE QUARTZ-GLASS TUBE
    52.
    发明申请
    METHOD FOR PRODUCING A LARGE QUARTZ-GLASS TUBE 审中-公开
    用于生产大型石英玻璃管的方法

    公开(公告)号：US20160168005A1

    公开(公告)日：2016-06-16

    申请号：US14904308

    申请日：2014-07-08

    Applicant: HERAEUS QUARZGLAS GMBH & CO. KG

    Inventor： Boris GROMANN ,  Burtchard OBERLE ,  Christian SCHENK ,  Gero FISCHER ,  Pèlagie DECLERCK ,  Bemhard FRANZ ,  Ulrich LEIN ,  Alexander LAAZ ,  Achim HOFMANN

    IPC: C03B23/053 ,  C03B23/08 ,  C03B23/043 ,  C03B23/07

    CPC classification number: C03B23/053 ,  C03B19/14 ,  C03B23/043 ,  C03B23/045 ,  C03B23/07 ,  C03B23/08 ,  C03B2201/04 ,  C03C3/06 ,  C03C2203/44

    Abstract: A method for producing a large quartz-glass pipe is provided. In a first forming step, an intermediate cylinder made of quartz glass and having an intermediate-cylinder wall thickness and outside diameter is formed by using a forming tool and is then cooled. In a second shaping step, at least one length segment of the cooled intermediate cylinder is fed to a heating zone, heated to a softening temperature zone by zone therein, and, while rotating about the longitudinal axis of the intermediate cylinder, shaped into the large quartz-glass pipe having a final wall thickness and outside diameter. The quartz glass is synthetically produced and has an average hydroxyl group content of 10 ppm by weight or less. If the intermediate cylinder is divided into length segments of 1 cm, adjacent length segments have a difference of less than 2 ppm by weight in the average hydroxyl group content thereof.

    Abstract translation: 提供一种生产大型石英玻璃管的方法。 在第一成形步骤中，通过使用成形工具形成由石英玻璃制成并具有中间筒壁厚和外径的中间圆筒，然后冷却。 在第二成形步骤中，冷却的中间圆筒的至少一个长度段被供给到加热区，通过其中的区域被加热到软化温度区域，并且围绕中间圆柱体的纵向轴线旋转，成形为大的 具有最终壁厚和外径的石英玻璃管。 合成生产石英玻璃，其平均羟基含量为10重量ppm以下。 如果中间圆筒被分成1cm的长度段，则相邻长度段的平均羟基含量的差异小于2ppm。

    Synthesized silica glass for optical component
    55.
    发明授权
    Synthesized silica glass for optical component 有权
    用于光学部件的合成石英玻璃

    公开(公告)号：US08498056B2

    公开(公告)日：2013-07-30

    申请号：US13367780

    申请日：2012-02-07

    Applicant: Masaaki Takata ,  Long Shao ,  Kei Iwata ,  Tomonori Ogawa

    Inventor： Masaaki Takata ,  Long Shao ,  Kei Iwata ,  Tomonori Ogawa

    IPC: G02B27/12 ,  C03B11/08 ,  C03B23/22

    CPC classification number: C03B19/1453 ,  C03B2201/04 ,  G03F7/70966 ,  Y02P40/57

    Abstract: The present invention provides a synthetic silica glass for an optical member in which not only a fast axis direction in an optical axis direction is controlled, and a birefringence in an off-axis direction is reduced, but a magnitude of a birefringence in the optical axis direction is controlled to an arbitrary value, such that an average value of a value BR cos2θxy defined from a birefringence BR and a fast axis direction θxy as measured from a parallel direction to the principal optical axis direction is defined as an average birefringence AveBR cos2θxy, and when a maximum value of a birefringence measured from a vertical direction to the principal optical axis direction of the optical member is defined as a maximum birefringence BRmax in an off-axis direction, the following expression (1-1) and expression (2-1) are established: −1.0≦AveBR cos2θxy

    Abstract translation: 本发明提供一种用于光学构件的合成石英玻璃，其不仅控制光轴方向上的快轴方向，并且减少偏轴双折射，而且在光轴上具有双折射的大小 方向被控制为任意值，使得从平行方向到主光轴方向测量的从双折射BR和快轴方向三角形定义的值BR cos2thetaxy的平均值被定义为平均双折射AveBR cos2thetaxy， 并且当将从光学构件的垂直方向到主光轴方向测量的双折射的最大值定义为离轴方向上的最大双折射BRmax时，下列表达式（1-1）和表达式（2- 1）建立：-1.0@AveBR cos2thetaxy <0.0（1-1）0.0 @ BRmax @ 1.0（2-1）。

    Method and device for producing a blank mold from synthetic quartz glass by using a plasma-assisted deposition method
    57.
    发明授权
    Method and device for producing a blank mold from synthetic quartz glass by using a plasma-assisted deposition method 有权
    通过使用等离子体辅助沉积法从合成石英玻璃制造空白模具的方法和装置

    公开(公告)号：US08336337B2

    公开(公告)日：2012-12-25

    申请号：US10519016

    申请日：2003-07-07

    Applicant: Richard Schmidt ,  Karsten Bräuer

    Inventor： Richard Schmidt ,  Karsten Bräuer

    IPC: C03B37/018

    CPC classification number: H05H1/30 ,  C03B37/01426 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2201/12

    Abstract: The invention relates to a method for producing a blank mold from synthetic quartz glass by using a plasma-assisted deposition method, according to which a hydrogen-free media flow containing a glass starting material and a carrier gas is fed to a multi-nozzle deposition burner. The glass starting material is introduced into a plasma zone by the deposition burner and is oxidized therein while forming SiO2 particles, and the SiO2 particles are deposited on a deposition surface while being directly vitrified. In order to increase the deposition efficiency, the invention provides that the deposition burner (1) focuses the media flow toward the plasma zone (4) by. A multi-nozzle plasma burner, which is suited for carrying out the method and which is provided with a media nozzle for feeding a media flow to the plasma zone, is characterized in that the media nozzle (7) is designed so that it is focussed toward the plasma zone (4). The focussing is effected by a tapering (6) of the media nozzle (7).

    Abstract translation: 本发明涉及一种通过使用等离子体辅助沉积方法从合成石英玻璃制造空白模具的方法，根据该方法，将含有玻璃原料和载气的无氢介质流进料到多喷嘴沉积 刻录机。 玻璃原料通过沉积燃烧器引入等离子体区域，并在其中被氧化，同时形成SiO 2颗粒，并且SiO 2颗粒沉积在沉积表面上同时被直接玻璃化。 为了提高沉积效率，本发明提供了沉积燃烧器（1）将介质流聚焦到等离子体区（4）。 适用于执行该方法并且具有用于将介质流供给到等离子体区域的介质喷嘴的多喷嘴等离子燃烧器的特征在于，介质喷嘴（7）被设计成使其聚焦 朝向等离子体区（4）。 聚焦由介质喷嘴（7）的锥形（6）实现。

    Fused silica glass and process for producing the same
    59.
    发明授权
    Fused silica glass and process for producing the same 有权
    熔融石英玻璃及其制造方法

    公开(公告)号：US08211817B2

    公开(公告)日：2012-07-03

    申请号：US12440683

    申请日：2007-09-11

    Applicant: Kazuyoshi Arai ,  Tsutomu Takahata ,  Shinkichi Hasimoto ,  Masahito Uchida ,  Nobusuke Yamada ,  Yoshinori Harada ,  Hideharu Horikoshi

    Inventor： Kazuyoshi Arai ,  Tsutomu Takahata ,  Shinkichi Hasimoto ,  Masahito Uchida ,  Nobusuke Yamada ,  Yoshinori Harada ,  Hideharu Horikoshi

    IPC: C03C3/06 ,  C03C10/16 ,  C03B27/012 ,  C03B19/01 ,  C03B19/00

    CPC classification number: C03C4/0085 ,  C03B19/066 ,  C03B20/00 ,  C03B2201/03 ,  C03B2201/04 ,  C03C3/06 ,  C03C4/10 ,  C03C2201/23 ,  C03C2201/50 ,  C03C2201/54 ,  Y02P40/57

    Abstract: Fused silica glass having an internal transmittance of UV with 245 nm wavelength, being at least 95% at 10 mm thickness, a OH content of not larger than 5 ppm, and a content of Li, Na, K, Mg, Ca and Cu each being smaller than 0.1 ppm. Preferably the glass has a viscosity coefficient at 1215° C. of at least 1011.5 Pa·s; and a Cu ion diffusion coefficient of not larger than 1×10−10 cm2/sec in a depth range of greater than 20 μm up to 100 μm, from the surface, when leaving to stand at 1050° C. in air for 24 hours. The glass is made by cristobalitizing powdery silica raw material; then, fusing the cristobalitized silica material in a non-reducing atmosphere. The glass exhibits a high transmittance of ultraviolet, visible and infrared rays, has high purity and heat resistance, and exhibits a reduced diffusion rate of metal impurities, therefore, it is suitable for various optical goods, semiconductor-production apparatus members, and liquid crystal display production apparatus members.

    Abstract translation: 具有245nm波长的UV的内部透射率，10mm厚度至少95％，OH含量不大于5ppm，Li，Na，K，Mg，Ca和Cu的含量的熔融石英玻璃 小于0.1ppm。 优选地，玻璃的1215℃下的粘度系数至少为1011.5Pa·s; 在大于20μm至100μm的深度范围内的Cu离子扩散系数不大于1×10 -10 cm 2 / sec，在1050℃在空气中放置24小时时， 。 玻璃由粉状二氧化硅原料碎片化制成; 然后将非平衡二氧化硅材料在非还原气氛中熔融。 该玻璃的紫外线，可见光和红外线的透射率高，纯度高，耐热性高，金属杂质的扩散速度降低，因此适用于各种光学制品，半导体制造装置部件和液晶 展示生产设备成员。

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