利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

13 条记录 (耗时 0.017 秒)

    SYNTHESIZED SILICA GLASS FOR OPTICAL COMPONENT
    2.
    发明申请
    SYNTHESIZED SILICA GLASS FOR OPTICAL COMPONENT 有权
    用于光学组件的合成二氧化硅玻璃

    公开(公告)号：US20120182622A1

    公开(公告)日：2012-07-19

    申请号：US13367780

    申请日：2012-02-07

    申请人： Masaaki TAKATA ,  Long Shao ,  Kei Iwata ,  Tomonori Ogawa

    发明人： Masaaki TAKATA ,  Long Shao ,  Kei Iwata ,  Tomonori Ogawa

    IPC分类号： G02B27/12 ,  C03B25/00 ,  B82Y20/00

    CPC分类号： C03B19/1453 ,  C03B2201/04 ,  G03F7/70966 ,  Y02P40/57

    摘要： The present invention provides a synthetic silica glass for an optical member in which not only a fast axis direction in an optical axis direction is controlled, and a birefringence in an off-axis direction is reduced, but a magnitude of a birefringence in the optical axis direction is controlled to an arbitrary value, such that an average value of a value BR cos 2θxy defined from a birefringence BR and a fast axis direction θxy as measured from a parallel direction to the principal optical axis direction is defined as an average birefringence AveBR cos 2θxy, and when a maximum value of a birefringence measured from a vertical direction to the principal optical axis direction of the optical member is defined as a maximum birefringence BRmax in an off-axis direction, the following expression (1-1) and expression (2-1) are established: −1.0≦AveBR cos 2θxy

    摘要翻译： 本发明提供一种用于光学构件的合成石英玻璃，其不仅控制光轴方向上的快轴方向，并且减少偏轴双折射，而且在光轴上具有双折射的大小 方向被控制为任意值，使得从平行方向到主光轴方向测量的从双折射BR和快轴方向＆yt; xy定义的值BR cos 2＆amp; t s; xy的平均值被定义为 平均双折射度AveBR cos 2＆amp; t s; xy，并且当从垂直方向测量到光学构件的主光轴方向的双折射的最大值被定义为在偏轴方向上的最大双折射率BRmax时，以下表达式（1 -1）和表达式（2-1）：-1.0＆nlE; AveBR cos 2＆thetas; xy <0.0（1-1）0.0＆nlE; BRmax＆nlE; 1.0（2-1）。

    BASE STATION AND CONTROL METHOD OF BASE STATION
    3.
    发明申请
    BASE STATION AND CONTROL METHOD OF BASE STATION 有权
    基站的基站和控制方法

    公开(公告)号：US20110300863A1

    公开(公告)日：2011-12-08

    申请号：US13202749

    申请日：2010-02-25

    申请人： Kei Iwata

    发明人： Kei Iwata

    IPC分类号： H04W60/00 ,  H04W36/00

    CPC分类号： H04W48/08 ,  H04W8/18 ,  H04W36/08 ,  H04W52/0206 ,  H04W60/00 ,  H04W88/08 ,  Y02D70/122 ,  Y02D70/1244 ,  Y02D70/1262 ,  Y02D70/142

    摘要： Provided is a base station which uses a pilot beacon to prompt a terminal to perform handoff from a macrocell and is capable of avoiding interference with the macrocell. A base station (FAP) of a mobile communication system has a transmission unit (122) for transmitting a pilot beacon to allow a mobile terminal to detect the base station, a registration unit (141) for registering information on a mobile terminal to use the base station or information on a user corresponding to the mobile terminal, and a control unit (110) for controlling a transmission unit (122) to stop transmission of the pilot beacon if a mobile terminal corresponding to the information registered with the registration unit (141) performs handoff to the base station.

    摘要翻译： 提供了一种基站，其使用导频信标来提示终端从宏小区执行切换，并且能够避免与宏小区的干扰。 移动通信系统的基站（FAP）具有发送单元（122），用于发送导频信标以允许移动终端检测基站;登记单元（141），用于在移动终端上登记信息以使用 基站或对应于移动终端的用户的信息;以及控制单元（110），用于控制发送单元（122）停止发送导频信标，如果移动终端对应于登记单元（141）登记的信息 ）执行到基站的切换。

    Process and apparatus for producing porous quartz glass base
    4.
    发明授权
    Process and apparatus for producing porous quartz glass base 失效
    生产多孔石英玻璃基底的方法和设备

    公开(公告)号：US07810356B2

    公开(公告)日：2010-10-12

    申请号：US11835668

    申请日：2007-08-08

    申请人： Kei Iwata ,  Takao Uto ,  Takuya Sakuma

    发明人： Kei Iwata ,  Takao Uto ,  Takuya Sakuma

    IPC分类号： C03B37/18

    CPC分类号： C03B19/1446 ,  C03B37/0144 ,  Y02P40/57

    摘要： The present invention provides a process for producing a porous quartz glass base, which comprises hydrolyzing a silicon compound in an oxyhydrogen flame in a reaction furnace to generate and deposit fine silica particles on a starting member, thereby forming a porous quartz glass base, wherein a gas discharge pipe for discharging an unnecessary gas from the reaction furnace is heated. According to the present invention, fine silica particles can be prevented from adhering to a gas discharge pipe for discharging the unnecessary hydrogen chloride gas generated in producing a porous quartz glass base.

    摘要翻译： 本发明提供一种多孔石英玻璃基底的制造方法，该方法包括在反应炉中水解含氢氢火焰中的硅化合物，以在起始部件上产生并沉积二氧化硅微粒，从而形成多孔石英玻璃基底，其中， 用于从反应炉排出不需要的气体的排气管被加热。 根据本发明，可以防止二氧化硅微粒附着在用于排出生产多孔石英玻璃基底中产生的不必要的氯化氢气体的排气管。

    PROCESS AND APPARATUS FOR PRODUCING POROUS QUARTZ GLASS BASE
    5.
    发明申请
    PROCESS AND APPARATUS FOR PRODUCING POROUS QUARTZ GLASS BASE 失效
    用于生产多孔石英玻璃基底的方法和装置

    公开(公告)号：US20080006058A1

    公开(公告)日：2008-01-10

    申请号：US11835668

    申请日：2007-08-08

    申请人： Kei IWATA ,  Takao Uto ,  Takuya Sakuma

    发明人： Kei IWATA ,  Takao Uto ,  Takuya Sakuma

    IPC分类号： C03B37/00

    CPC分类号： C03B19/1446 ,  C03B37/0144 ,  Y02P40/57

    摘要： The present invention provides a process for producing a porous quartz glass base, which comprises hydrolyzing a silicon compound in an oxyhydrogen flame in a reaction furnace to generate and deposit fine silica particles on a starting member, thereby forming a porous quartz glass base, wherein a gas discharge pipe for discharging an unnecessary gas from the reaction furnace is heated. According to the present invention, fine silica particles can be prevented from adhering to a gas discharge pipe for discharging the unnecessary hydrogen chloride gas generated in producing a porous quartz glass base.

    摘要翻译： 本发明提供一种多孔石英玻璃基底的制造方法，该方法包括在反应炉中水解含氢氢火焰中的硅化合物，以在起始部件上产生并沉积二氧化硅微粒，从而形成多孔石英玻璃基底，其中， 用于从反应炉排出不需要的气体的排气管被加热。 根据本发明，可以防止二氧化硅微粒附着在用于排出生产多孔石英玻璃基底中产生的不必要的氯化氢气体的排气管。

    DISPLAY DEVICE AND DISPLAY METHOD
    6.
    发明申请
    DISPLAY DEVICE AND DISPLAY METHOD 审中-公开
    显示装置和显示方法

    公开(公告)号：US20140236741A1

    公开(公告)日：2014-08-21

    申请号：US14347691

    申请日：2012-07-19

    申请人： Masaki Hashiura ,  Masahiro Ueda ,  Kei Iwata ,  Yoshiharu Yoshimoto

    发明人： Masaki Hashiura ,  Masahiro Ueda ,  Kei Iwata ,  Yoshiharu Yoshimoto

    IPC分类号： G06Q30/02

    CPC分类号： G06Q30/0277

    摘要： When a processing unit generates a display screen based on display data generated from a plurality of respective content data, and causes a display unit to display a predetermined area of the display screen, the processing unit reads stored previous arrangements of the content data in the display screen, and changes the arrangements of the plurality of respective content data in the display screen at predetermined timing, in accordance with a preset rule. Then, the processing unit stores the arrangements.

    摘要翻译： 当处理单元基于从多个相应内容数据生成的显示数据生成显示屏幕并且使得显示单元显示显示屏幕的预定区域时，处理单元读取存储在显示器中的内容数据的先前排列 并且根据预设规则在预定定时改变显示屏幕中的多个相应内容数据的排列。 然后，处理单元存储布置。

    Base station and control method of base station
    7.
    发明授权
    Base station and control method of base station 有权
    基站基站和控制方法

    公开(公告)号：US08509771B2

    公开(公告)日：2013-08-13

    申请号：US13202749

    申请日：2010-02-25

    申请人： Kei Iwata

    发明人： Kei Iwata

    IPC分类号： H04W4/00

    CPC分类号： H04W48/08 ,  H04W8/18 ,  H04W36/08 ,  H04W52/0206 ,  H04W60/00 ,  H04W88/08 ,  Y02D70/122 ,  Y02D70/1244 ,  Y02D70/1262 ,  Y02D70/142

    摘要： Provided is a base station which uses a pilot beacon to prompt a terminal to perform handoff from a macrocell and is capable of avoiding interference with the macrocell. A base station (FAP) of a mobile communication system has a transmission unit (122) for transmitting a pilot beacon to allow a mobile terminal to detect the base station, a registration unit (141) for registering information on a mobile terminal to use the base station or information on a user corresponding to the mobile terminal, and a control unit (110) for controlling a transmission unit (122) to stop transmission of the pilot beacon if a mobile terminal corresponding to the information registered with the registration unit (141) performs handoff to the base station.

    摘要翻译： 提供了一种基站，其使用导频信标来提示终端从宏小区执行切换，并且能够避免与宏小区的干扰。 移动通信系统的基站（FAP）具有发送单元（122），用于发送导频信标以允许移动终端检测基站;登记单元（141），用于在移动终端上登记信息以使用 基站或对应于移动终端的用户的信息;以及控制单元（110），用于控制发送单元（122）停止发送导频信标，如果移动终端对应于登记单元（141）登记的信息 ）执行到基站的切换。

    Synthesized silica glass for optical component
    8.
    发明授权
    Synthesized silica glass for optical component 有权
    用于光学部件的合成石英玻璃

    公开(公告)号：US08498056B2

    公开(公告)日：2013-07-30

    申请号：US13367780

    申请日：2012-02-07

    申请人： Masaaki Takata ,  Long Shao ,  Kei Iwata ,  Tomonori Ogawa

    发明人： Masaaki Takata ,  Long Shao ,  Kei Iwata ,  Tomonori Ogawa

    IPC分类号： G02B27/12 ,  C03B11/08 ,  C03B23/22

    CPC分类号： C03B19/1453 ,  C03B2201/04 ,  G03F7/70966 ,  Y02P40/57

    摘要： The present invention provides a synthetic silica glass for an optical member in which not only a fast axis direction in an optical axis direction is controlled, and a birefringence in an off-axis direction is reduced, but a magnitude of a birefringence in the optical axis direction is controlled to an arbitrary value, such that an average value of a value BR cos2θxy defined from a birefringence BR and a fast axis direction θxy as measured from a parallel direction to the principal optical axis direction is defined as an average birefringence AveBR cos2θxy, and when a maximum value of a birefringence measured from a vertical direction to the principal optical axis direction of the optical member is defined as a maximum birefringence BRmax in an off-axis direction, the following expression (1-1) and expression (2-1) are established: −1.0≦AveBR cos2θxy

    摘要翻译： 本发明提供一种用于光学构件的合成石英玻璃，其不仅控制光轴方向上的快轴方向，并且减少偏轴双折射，而且在光轴上具有双折射的大小 方向被控制为任意值，使得从平行方向到主光轴方向测量的从双折射BR和快轴方向三角形定义的值BR cos2thetaxy的平均值被定义为平均双折射AveBR cos2thetaxy， 并且当将从光学构件的垂直方向到主光轴方向测量的双折射的最大值定义为离轴方向上的最大双折射BRmax时，下列表达式（1-1）和表达式（2- 1）建立：-1.0@AveBR cos2thetaxy <0.0（1-1）0.0 @ BRmax @ 1.0（2-1）。

    SYNTHETIC QUARTZ GLASS WITH FAST AXES OF BIREFRINGENCE DISTRIBUTED IN CONCENTRIC-CIRCLE TANGENT DIRECTIONS AND PROCESS FOR PRODUCING THE SAME
    10.
    发明申请
    SYNTHETIC QUARTZ GLASS WITH FAST AXES OF BIREFRINGENCE DISTRIBUTED IN CONCENTRIC-CIRCLE TANGENT DIRECTIONS AND PROCESS FOR PRODUCING THE SAME 审中-公开

    公开(公告)号：US20080292882A1

    公开(公告)日：2008-11-27

    申请号：US12182361

    申请日：2008-07-30

    申请人： Noriyuki AGATA ,  Masaaki TAKATA ,  Tomonori OGAWA ,  Kei IWATA

    发明人： Noriyuki AGATA ,  Masaaki TAKATA ,  Tomonori OGAWA ,  Kei IWATA

    IPC分类号： C03C12/00 ,  C03B37/005

    CPC分类号： C03B19/1453 ,  C03B2201/02 ,  C03B2201/04 ,  C03C3/06 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/23 ,  C03C2203/44 ,  Y02P40/57 ,  Y10T428/2982

    摘要： The present invention provides a synthetic quartz glass having a diameter of 100 mm or more for using in an optical apparatus comprising a light source emitting a light having a wavelength of 250 nm or less, the synthetic quartz glass having, in a region located inward from the periphery thereof by 10 mm or more in a plane perpendicular to the optical axis of the synthetic quartz glass: a birefringence of 0.5 nm or less per thickness of 1 cm with respect to a light having a wavelength of 193 nm; an OH group concentration of 60 ppm or less; an averaged differential OH group concentration from the center of the synthetic quartz glass toward a peripheral direction thereof, normalized with respect to the radius of the synthetic quartz glass, of −8 to +60 ppm; and an unbiased standard deviation a of a differential OH group concentration from the center of the synthetic quartz glass toward a peripheral direction thereof, normalized with respect to the radius of the synthetic quartz glass, of 10 ppm or less, the unbiased standard deviation a being determined with the following formula (1): σ = ∑ i = 1 n  ( X i - X _ ) 2 n - 1   providing  ;   X i = Δ   n _ OH   i Δ   r i * = n _ OH   i - n _ OH   i + 1  r i * -  r i + 1 * ( 1 ) : differential OH group concentration at measurement point i normalized with respect to the radius R of the synthetic quartz glass; n _ OH   i = n OH   i - 1 + n OH   i + n OH   i + 1 3 : OH group concentration at measurement point i in terms of moving average for three points including the two points before and after the measurement point i;  r i * = r i R : radius at measurement point i normarized with respect to the radius R of the synthetic quartz glass; X : average of OH group concentrations Xi in the whole evaluation region; and n : number of measurement points in the evaluation region (integer of 2 or more).