公开(公告)号：US08027020B2

公开(公告)日：2011-09-27

申请号：US11707027

申请日：2007-02-16

申请人： Hiroyuki Nagasaka

发明人： Hiroyuki Nagasaka

IPC分类号： G03B27/42

CPC分类号： G03F7/70275 ,  G03F7/70208 ,  G03F7/70283 ,  G03F9/7026 ,  G03F9/7088

摘要： An exposure apparatus includes a projection optical system which forms an image of a first pattern in a first exposure area and which forms an image of a second pattern in a second exposure area; and an adjusting device which adjusts a surface positional relationship between a surface of the substrate and a first image plane for forming the image of the first pattern thereon and which adjusts a surface positional relationship between the surface of the substrate and a second image plane for forming the image of the second pattern thereon when a shot area on the substrate is subjected to multiple exposure with the image of the first pattern and the image of the second pattern via the projection optical system. The substrate can be subjected to the multiple exposure satisfactorily and efficiently.

摘要翻译： 曝光装置包括：投影光学系统，其在第一曝光区域中形成第一图案的图像，并且在第二曝光区域中形成第二图案的图像; 以及调整装置，其调整所述基板的表面和用于形成所述第一图案的图像的第一图像面之间的表面位置关系，并且调整所述基板的表面与形成所述第二图像的第二图像面之间的表面位置关系 当通过投影光学系统利用第一图案的图像和第二图案的图像对基板上的拍摄区域进行多次曝光时，其上的第二图案的图像。 可以令人满意地高效地对基片进行多次曝光。

公开(公告)号：US20110216301A1

公开(公告)日：2011-09-08

申请号：US13022518

申请日：2011-02-07

申请人： Gerben Frank DE LANGE ,  Johannes Catharinus Hubertus Mulkens

发明人： Gerben Frank DE LANGE ,  Johannes Catharinus Hubertus Mulkens

IPC分类号： G03B27/58

CPC分类号： G03B27/54 ,  G03F7/70066 ,  G03F7/70208

摘要： A lithographic apparatus includes a first support to support a first patterning device; a second support to support a second patterning device, each of the first and the second patterning device capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system to project the patterned radiation beam onto a target portion of the substrate; a controller to drive the first support and the second support and arranged to: drive the first support to perform a scanning movement; drive the second support to accelerate during at least part of the scanning movement of the first support; and drive the second support to perform a scanning movement upon completion of the scanning movement of the first support, so as to scan a die adjacent a die previously scanned during the scanning movement of the first support.

摘要翻译： 光刻设备包括支撑第一图案形成装置的第一支撑件; 用于支撑第二图案形成装置的第二支撑件，所述第一和第二图案形成装置中的每一个能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，用于将图案化的辐射束投影到基板的目标部分上; 驱动所述第一支撑件和所述第二支撑件的控制器，并且被布置成：驱动所述第一支撑件以执行扫描运动; 驱动第二支撑件以在第一支撑件的扫描运动的至少一部分期间加速; 并且驱动所述第二支撑件以在完成所述第一支撑件的扫描运动时执行扫描运动，以便在所述第一支撑件的扫描运动期间扫描与先前扫描的管芯相邻的管芯。

公开(公告)号：US20100321657A1

公开(公告)日：2010-12-23

申请号：US12741960

申请日：2008-11-07

申请人： Jan Bernard Plechelmus VAN SCHOOT ,  Diederik Jan Maas ,  Antonius Johannes Josephus Van Dijsseldonk ,  Hans Van Der Laan

发明人： Jan Bernard Plechelmus VAN SCHOOT ,  Diederik Jan Maas ,  Antonius Johannes Josephus Van Dijsseldonk ,  Hans Van Der Laan

IPC分类号： G03B27/52

CPC分类号： G03F7/70291 ,  G03F7/70208 ,  G03F7/70941

摘要： A lithographic projection apparatus including a support structure configured to support a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate holder configured to hold a substrate; a projection system configured to expose the patterned beam of radiation on a target portion of the substrate; and a system configured to compensate one or more perturbation factors by providing an additional beam of radiation to be exposed on the target portion of the substrate, the additional beam of radiation being imparted in its cross-section with an additional pattern which is based on the pattern of the patterning device and on lithographic projection apparatus property data, the lithographic projection apparatus property data characterizing a level and nature of one or more systematic perturbation factors of different lithographic apparatus.

摘要翻译： 一种光刻投影设备，包括被配置为支撑图案形成装置的支撑结构，所述图案形成装置被配置为在其横截面中赋予图案的辐射束; 衬底保持器，其构造成保持衬底; 投影系统，被配置为将所述图案化的辐射束暴露在所述基板的目标部分上; 以及被配置为通过提供待暴露在所述基板的目标部分上的另外的辐射束来补偿一个或多个扰动因子的系统，所述附加辐射束在其横截面中被赋予附加图案，所述另外的图案基于 图案形成装置的图案和光刻投影装置的属性数据，光刻投影装置的属性数据表征不同光刻装置的一个或多个系统扰动因子的水平和性质。

公开(公告)号：US20100183984A1

公开(公告)日：2010-07-22

申请号：US12600193

申请日：2008-02-19

申请人： Peter Choi

发明人： Peter Choi

IPC分类号： G03F7/20 ,  G03B27/52 ,  G21G4/00

CPC分类号： G03F7/70391 ,  G03F7/70033 ,  G03F7/70041 ,  G03F7/7005 ,  G03F7/70091 ,  G03F7/70208

摘要： A process and related apparatus for generating an output radiation through an output aperture, including generating pulsed radiations by a plurality of radiation sources, each source being arranged for respectively (i) generating within a respective plasma a respective pulsed elementary radiation whose wavelengths include a respective desired range, and (ii) directing rays of its respective elementary radiation on the output aperture. For each source, refractive indices of rays are distributed in a respective control region through which its respective elementary radiation passes and located in its respective plasma, to selectively deviate rays of its respective elementary radiation as a function of their wavelength, and temporally multiplexing the radiation sources to obtain at the output aperture the output radiation.

摘要翻译： 一种用于通过输出孔产生输出辐射的过程和相关装置，包括通过多个辐射源产生脉冲辐射，每个源被分别布置成（i）在相应等离子体内产生相应的脉冲基本辐射，其波长包括相应的 期望的范围，和（ii）将其各自的基本辐射的光线引导到输出孔上。 对于每个光源，光线的折射率分布在其相应的基本辐射通过并位于其各自的等离子体中的相应控制区域中，以选择性地偏离其各自的基本辐射的光线作为其波长的函数，并且时间上多路复用辐射 来源在输出孔径处获得输出辐射。

公开(公告)号：US20100173250A1

公开(公告)日：2010-07-08

申请号：US12725223

申请日：2010-03-16

申请人： Ralf Scharnweber

发明人： Ralf Scharnweber

IPC分类号： G03F7/20 ,  G03B27/42

CPC分类号： G03F7/70208 ,  G03F7/70275 ,  G03F7/70991

摘要： In a method for multiply exposing at least one substrate coated with a photosensitive layer, a first exposure is carried out in accordance with a first set of exposure parameters on a first projection system (17), and a second exposure is carried out in accordance with a second set of exposure parameters on a second projection system (18) spatially separated from the first projection system (17). The projection systems are integrated in a common projection exposure installation (1). The first exposure can be carried out, for example, with an amplitude mask (6), the second exposure with a phase mask (9). The use of a number of projection systems enables multiple exposure that is performed in parallel and is therefore timesaving.

摘要翻译： 在用感光层涂覆的至少一个基底进行多次曝光的方法中，根据第一投影系统（17）上的第一组曝光参数进行第一曝光，并且根据 在与第一投影系统（17）空间分离的第二投影系统（18）上的第二组曝光参数。 投影系统集成在通用投影曝光装置（1）中。 可以例如利用幅度掩模（6）进行第一曝光，用相位掩模（9）进行第二次曝光。 使用多个投影系统可以实现并行执行的多次曝光，因此节省时间。

公开(公告)号：US07741622B2

公开(公告)日：2010-06-22

申请号：US12148339

申请日：2008-04-18

申请人： Duk Lee ,  Jun Ishikawa

发明人： Duk Lee ,  Jun Ishikawa

IPC分类号： G21K5/00 ,  G01J1/42

CPC分类号： G03F7/70791 ,  G03F7/7005 ,  G03F7/70208 ,  G03F7/70275 ,  G03F7/70291

摘要： The present invention presents an exposure device, which includes an optical source for emitting a UV ray, a lighting system for shaping the UV ray into a collimated light beam, an aperture member for producing rectangular first and second light beams based on the light beam from lighting system by using the first and second rectangular windows, first and second spatial light modulators for spatially modulating the first and second light beams, respectively, and first and second projection lighting systems for guiding the modulated first and second light beams to the object.

摘要翻译： 本发明提供了一种曝光装置，其包括用于发射紫外线的光源，用于将紫外线成形为准直光束的照明系统，用于根据来自光束的光束产生矩形第一和第二光束的光圈部件 通过使用第一和第二矩形窗口的照明系统，分别用于空间调制第一和第二光束的第一和第二空间光调制器，以及用于将调制的第一和第二光束引导到物体的第一和第二投影照明系统。

公开(公告)号：US07528932B2

公开(公告)日：2009-05-05

申请号：US11312629

申请日：2005-12-21

申请人： Tomas Lock

发明人： Tomas Lock

IPC分类号： G03B27/42 ,  G02B26/00

CPC分类号： G03F7/70291 ,  G03F7/70208 ,  G03F7/70275

摘要： The present invention relates to an apparatus (100) for patterning a workpiece arranged at an image plane and sensitive to electromagnetic radiation, comprising a source emitting electromagnetic radiation onto an object plane and at least two spatial light modulators each comprising numerous of object pixels, adapted to receive said electromagnetic radiation at said object plane and to relay said electromagnetic radiation toward said workpiece, wherein said electromagnetic radiation is split into at least two beams, which beams will impinge on different spatial light modulators, by a beam splitting device arranged at an optical plane between said spatial light modulators and an illuminator pupil or a conjugate optical plane. The invention also relates to a method for patterning a workpiece with a plurality of spatial light modulators.

摘要翻译： 本发明涉及一种用于对排列在图像平面上并对电磁辐射敏感的工件图案化的装置（100），其包括将物体平面上发射电磁辐射的源和至少两个空间光调制器，每个空间光调制器包括许多物体像素， 以在所述物体平面处接收所述电磁辐射并将所述电磁辐射中继到所述工件，其中所述电磁辐射被分成至少两束，所述至少两束光束将通过布置在光学上的光束分离装置撞击在不同的空间光调制器上 所述空间光调制器与照明器光瞳或共轭光学平面之间的平面。 本发明还涉及一种用多个空间光调制器对工件图案化的方法。

公开(公告)号：US20090040490A1

公开(公告)日：2009-02-12

申请号：US12252586

申请日：2008-10-16

申请人： Koji SHIGEMATSU ,  Osamu TANITSU

发明人： Koji SHIGEMATSU ,  Osamu TANITSU

IPC分类号： G03B27/54 ,  G03B27/72 ,  G03B27/70

CPC分类号： G03F7/70108 ,  G03F7/70091 ,  G03F7/70208 ,  G03F7/70466

摘要： An illumination optical apparatus is able to quickly perform switching of illumination conditions between illumination in a first region and illumination in a second region. The illumination optical apparatus of the present invention to illuminate an illumination target surface on the basis of light from a light source comprises: a path switching member arranged in an optical path between the light source and the illumination target surface and switching an optical path of an exiting beam between a first optical path and a second optical path; a path combining member combining the first optical path and the second optical path; a first pupil distribution forming member arranged in the first optical path and forming a predetermined light intensity distribution on an illumination pupil; and a second pupil distribution forming member arranged in the second optical path and forming a predetermined light intensity distribution on the illumination pupil.

摘要翻译： 照明光学装置能够快速地执行第一区域中的照明和第二区域中的照明之间的照明条件的切换。 基于来自光源的光照射照明目标表面的本发明的照明光学装置包括：路径切换部件，其布置在光源和照射目标表面之间的光路中，并且切换光源 在第一光路和第二光路之间退出光束; 组合所述第一光路和所述第二光路的路径组合部件; 布置在所述第一光路中并在照明光瞳上形成预定的光强度分布的第一光瞳分布形成部件; 以及布置在所述第二光路中并在所述照明光瞳上形成预定的光强度分布的第二光瞳分布形成部件。

公开(公告)号：US20090039292A1

公开(公告)日：2009-02-12

申请号：US12079502

申请日：2008-03-27

申请人： Duk Lee ,  Daisuke Yamashita ,  Masaaki Matsuda ,  Jun Ishikawa

发明人： Duk Lee ,  Daisuke Yamashita ,  Masaaki Matsuda ,  Jun Ishikawa

IPC分类号： G21K5/00

CPC分类号： G02B13/143 ,  G03F7/70208 ,  G03F7/70283 ,  G03F7/70291

摘要： The present invention presents an exposure device, which includes an optical source for emitting a UV ray, a first lighting system for shaping the UV ray into a collimated light beam, an aperture member for producing rectangular first and second light beams based on the light beam from first lighting system by using the first and second rectangular windows, first and second spatial light modulators for spatially modulating the first and second light beams, respectively, and first and second projection lighting systems for guiding the modulated first and second light beams to the object.

摘要翻译： 本发明提供了一种曝光装置，其包括用于发射紫外线的光源，用于将紫外线成形为准直光束的第一照明系统，用于产生基于光束的矩形第一和第二光束的光圈部件 从第一照明系统通过使用第一和第二矩形窗口，分别用于空间调制第一和第二光束的第一和第二空间光调制器和用于将调制的第一和第二光束引导到物体的第一和第二投影照明系统 。

公开(公告)号：US20080311526A1

公开(公告)日：2008-12-18

申请号：US12142138

申请日：2008-06-19

申请人： Ralf Scharnweber

发明人： Ralf Scharnweber

IPC分类号： G03C5/00

CPC分类号： G03F7/70208 ,  G03F7/70275 ,  G03F7/70991

摘要： In a method for multiply exposing at least one substrate coated with a photosensitive layer, a first exposure is carried out in accordance with a first set of exposure parameters on a first projection system, and a second exposure is carried out in accordance with a second set of exposure parameters on a second projection system spatially separated from the first projection system. The projection systems are integrated in a common projection exposure installation. The first exposure can be carried out, for example, with an amplitude mask, the second exposure with a phase mask. The use of a number of projection systems enables multiple exposure that is performed in parallel and is therefore timesaving.

摘要翻译： 在用感光层涂覆的至少一个基底进行多次曝光的方法中，根据第一投影系统上的第一组曝光参数进行第一曝光，并且根据第二组执行第二曝光 在与第一投影系统空间分离的第二投影系统上的曝光参数。 投影系统集成在通用投影曝光装置中。 第一曝光可以例如用幅度掩模进行，第二次曝光是用相位掩模进行的。 使用多个投影系统可以实现并行执行的多次曝光，因此节省时间。