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    Lithographic projection apparatus and method of compensating perturbation factors
    1.
    发明授权
    Lithographic projection apparatus and method of compensating perturbation factors 有权
    光刻投影仪和补偿扰动因子的方法

    公开(公告)号：US08570489B2

    公开(公告)日：2013-10-29

    申请号：US12741960

    申请日：2008-11-07

    申请人： Jan Bernard Plechelmus Van Schoot ,  Antonius Johannes Josephus Van Dijsseldonk ,  Hans Van Der Laan ,  Diederik Jan Maas

    发明人： Jan Bernard Plechelmus Van Schoot ,  Antonius Johannes Josephus Van Dijsseldonk ,  Hans Van Der Laan ,  Diederik Jan Maas

    IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/54

    CPC分类号： G03F7/70291 ,  G03F7/70208 ,  G03F7/70941

    摘要： A lithographic projection apparatus including a support structure configured to support a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate holder configured to hold a substrate; a projection system configured to expose the patterned beam of radiation on a target portion of the substrate; and a system configured to compensate one or more perturbation factors by providing an additional beam of radiation to be exposed on the target portion of the substrate, the additional beam of radiation being imparted in its cross-section with an additional pattern which is based on the pattern of the patterning device and on lithographic projection apparatus property data, the lithographic projection apparatus property data characterizing a level and nature of one or more systematic perturbation factors of different lithographic apparatus.

    摘要翻译： 一种光刻投影设备，包括被配置为支撑图案形成装置的支撑结构，所述图案形成装置被配置为在其横截面中赋予图案的辐射束; 衬底保持器，其构造成保持衬底; 投影系统，被配置为将所述图案化的辐射束暴露在所述基板的目标部分上; 以及被配置为通过提供待暴露在所述基板的目标部分上的另外的辐射束来补偿一个或多个扰动因子的系统，所述附加辐射束在其横截面中被赋予附加图案，所述另外的图案基于 图案形成装置的图案和光刻投影装置的属性数据，光刻投影装置的属性数据表征不同光刻装置的一个或多个系统扰动因子的水平和性质。

    Test pattern, inspection method, and device manufacturing method
    2.
    发明授权
    Test pattern, inspection method, and device manufacturing method 有权
    测试模式，检验方法和器件制造方法

    公开(公告)号：US07312860B2

    公开(公告)日：2007-12-25

    申请号：US11594075

    申请日：2006-11-08

    申请人： Arie Jeffrey Den Boef ,  Hans Van Der Laan ,  Antonius Johannes Josephus Van Dijsseldonk ,  Mircea Dusa ,  Antoine Gaston Marie Kiers

    发明人： Arie Jeffrey Den Boef ,  Hans Van Der Laan ,  Antonius Johannes Josephus Van Dijsseldonk ,  Mircea Dusa ,  Antoine Gaston Marie Kiers

    IPC分类号： G01B9/00

    CPC分类号： G03F7/706

    摘要： In a method according to one embodiment of the invention, aberrations in a lithographic apparatus are detected by printing a test pattern having at least one degree of symmetry and being sensitive to a particular aberration in the apparatus, and using a scatterometer to derive information concerning the aberration. The test structure may comprise a two-bar grating, in which case the inner and outer duty ratios can be reconstructed to derive information indicative of comatic aberration. Alternatively, a hexagonal array of dots can be used, such that scatterometry data can be used to reconstruct dot diameters indicative of 3-wave aberration.

    摘要翻译： 在根据本发明的一个实施例的方法中，通过印刷具有至少一个对称度并对装置中的特定像差敏感的测试图案来检测光刻设备中的像差，并且使用散射仪来得到关于 像差 测试结构可以包括双杆格栅，在这种情况下，可以重建内部和外部占空比以导出指示彗形像差的信息。 或者，可以使用六边形点阵列，使得散射测量数据可以用于重建指示3波像差的点直径。

    Lithographic apparatus and device manufacturing method
    3.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07253880B2

    公开(公告)日：2007-08-07

    申请号：US10995536

    申请日：2004-11-24

    申请人： Erik Roelof Loopstra ,  Petrus Rutgerus Bartray ,  Antonius Johannes Josephus Van Dijsseldonk ,  Paulus Martinus Maria Liebregts

    发明人： Erik Roelof Loopstra ,  Petrus Rutgerus Bartray ,  Antonius Johannes Josephus Van Dijsseldonk ,  Paulus Martinus Maria Liebregts

    IPC分类号： G03B27/52 ,  G03B27/42

    CPC分类号： G03F7/70141 ,  G03F7/70091

    摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation and projection system configured to project the radiation beam onto a target portion of a substrate. At least one of the illumination system and the projection system includes a focusing element for reflecting or refracting the beam. A plurality of stop discs is provided, each having an aperture therethrough, together with a disc positioner configured to place one of the stop discs adjacent the focusing element to control the numerical aperture (NA) of the projection system or illumination system. The apparatus further includes a disc changer configured to select one of the stop discs and provide the selected stop disc to the disc positioner, the disc changer being external to the projection system or illumination system.

    摘要翻译： 光刻设备包括被配置为提供辐射束和投影系统的照明系统，其配置成将辐射束投影到基板的目标部分上。 照明系统和投影系统中的至少一个包括用于反射或折射光束的聚焦元件。 提供了多个止动盘，每个具有穿过其中的孔，以及配置成将止动盘中的一个邻近聚焦元件放置以控制投影系统或照明系统的数值孔径（NA）的盘定位器。 该装置还包括一个换盘器，其被配置为选择一个停止盘并将所选择的停止盘提供给盘定位器，换盘器位于投影系统或照明系统的外部。

    Lithographic apparatus with autofocus system
    8.
    发明授权
    Lithographic apparatus with autofocus system 有权

    公开(公告)号：US07136149B2

    公开(公告)日：2006-11-14

    申请号：US11015727

    申请日：2004-12-20

    申请人： Uwe Mickan ,  Antonius Johannes Josephus Van Dijsseldonk

    发明人： Uwe Mickan ,  Antonius Johannes Josephus Van Dijsseldonk

    IPC分类号： G03B27/52 ,  G03B27/68 ,  G03B27/42

    CPC分类号： G03F9/7026 ,  G03F9/7065 ,  G03F9/7088

    摘要： A lithographic apparatus having a projection system that includes a plurality of mirrors arranged to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further includes an autofocus system having a light source, a position sensitive detector, and a light directing arrangement for directing a first portion of light from the light source to the position sensitive detector. The light directing arrangement further directs a second portion of light from the light source into the projection system and, after the second portion of light has traveled through the projection system to the substrate and back through the projection system to the light directing arrangement, the second portion of light is directed onto the position sensitive detector.

    Lithographic apparatus and device manufacturing method
    9.
    发明授权
    Lithographic apparatus and device manufacturing method 失效
    平版印刷设备和器件制造方法

    公开(公告)号：US07023524B2

    公开(公告)日：2006-04-04

    申请号：US10738129

    申请日：2003-12-18

    申请人： Antonius Johannes Josephus Van Dijsseldonk ,  Marcel Mathijs Theodore Marie Dierichs ,  Harm-Jan Voorma

    发明人： Antonius Johannes Josephus Van Dijsseldonk ,  Marcel Mathijs Theodore Marie Dierichs ,  Harm-Jan Voorma

    IPC分类号： G03B27/52 ,  G03B27/72

    CPC分类号： G03F7/70216 ,  G03F7/70275 ,  G03F7/70308

    摘要： A lithographic apparatus including a radiation attenuator or a variable aperture system, such as masking blades, arranged in or adjacent an intermediate focus of the projection system. Besides a radiation attenuator or a variable aperture system, a measuring system may be arranged in the intermediate focus. By placing one or more of such systems in or adjacent the intermediate focus of the projection system, instead of adjacent the reticle in the illumination system, fewer design restrictions occur because of more space available, resulting in a lower design cost.

    摘要翻译： 包括布置在投影系统的中间焦点中或邻近投影系统的中间焦点的辐射衰减器或可变孔径系统（例如掩模刀片）的光刻设备。 除了辐射衰减器或可变孔径系统之外，测量系统可以布置在中间焦点中。 通过将一个或多个这样的系统放置在投影系统的中间焦点中或邻近投影系统的中间焦点，而不是靠近照明系统中的掩模版，由于更多的可用空间，出现了更少的设计限制，导致较低的设计成本。