Percutaneous spine distraction implant systems and methods
    61.
    发明申请
    Percutaneous spine distraction implant systems and methods 审中-公开
    经皮脊髓牵引植入系统及方法

    公开(公告)号:US20050165398A1

    公开(公告)日:2005-07-28

    申请号:US11041570

    申请日:2005-01-24

    Applicant: Mark Reiley

    Inventor: Mark Reiley

    Abstract: Systems and methods for treating spinal stenosis insert a guide element percutaneously into proximity with the adjacent spinous processes. The systems and methods direct an implant device over the guide element to a position resting between the adjacent spinous processes. The device is sized and configured to distend the adjacent spinous processes. The implant device itself can be variously constructed. It can, e.g., possess threaded lands and/or a notched region in which a spinous process can rest. The implant device has a lumen to accommodate passage of the guide element, so that the device can be passed percutaneously over the guide element for implantation between adjacent spinous processes.

    Abstract translation: 用于治疗脊柱狭窄的系统和方法将导向元件经皮插入邻近的棘突。 系统和方法将植入装置引导到引导元件上至位于相邻棘突之间的位置。 该装置的尺寸和配置可以扩大相邻的棘突。 植入装置本身可以是各种构造的。 它可以例如具有螺纹的平台和/或棘突可以休息的缺口区域。 植入装置具有容纳引导元件的通道的内腔,使得该装置能够经皮穿过引导元件,用于在相邻棘突之间植入。

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