Process for forming a ceramic layer
    8.
    发明授权
    Process for forming a ceramic layer 有权
    陶瓷层形成工艺

    公开(公告)号:US08663337B2

    公开(公告)日:2014-03-04

    申请号:US13413145

    申请日:2012-03-06

    摘要: A process for forming a ceramic layer comprising a compound of a metal on a deposition surface of a workpiece comprises providing a reactive gas, selecting the amounts of a vapor of the metal and ions of the metal relative to each other, generating the metal vapor, and projecting an ion beam of the metal ions. The metal vapor, the metal ions, and the reactive gas form the ceramic layer with a desired structure. The process may include the step of controlling a deposition surface temperature. In one embodiment, the metal vapor comprises zirconium vapor and the ion beam comprises zirconium ions. The relative amounts of the zirconium vapor and the zirconium ions are selected to form a zirconia ceramic layer on the deposition surface. The zirconia may have multiple crystal phases that are formed according to a predetermined ratio.

    摘要翻译: 在工件的沉积表面上形成包含金属化合物的陶瓷层的方法包括提供反应气体,选择金属的蒸汽量和金属离子相对于彼此的量,产生金属蒸气, 并投射金属离子的离子束。 金属蒸气,金属离子和反应气体形成具有所需结构的陶瓷层。 该方法可以包括控制沉积表面温度的步骤。 在一个实施方案中,金属蒸气包含锆蒸气,离子束包含锆离子。 选择锆蒸气和锆离子的相对量以在沉积表面上形成氧化锆陶瓷层。 氧化锆可以具有根据预定比例形成的多个结晶相。