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113 条记录 (耗时 0.017 秒)

    Positive photoresist composition and pattern making method using the same
    61.
    发明授权
    Positive photoresist composition and pattern making method using the same 有权
    正光致抗蚀剂组合物和使用其的图案制造方法

    公开(公告)号：US07202015B2

    公开(公告)日：2007-04-10

    申请号：US10921962

    申请日：2004-08-20

    申请人： Shinichi Kanna ,  Kazuyoshi Mizutani ,  Tomoya Sasaki

    发明人： Shinichi Kanna ,  Kazuyoshi Mizutani ,  Tomoya Sasaki

    IPC分类号： G03F7/004 ,  G03C5/00

    CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0392 ,  Y10S430/108

    摘要： A positive photoresist composition containing: (A) a resin which contains at least one of a repeating unit represented by the formula (IA) defiend herein and a repeating unit represented by the formula (IB) defined herein, and is decomposed by an action of an acid and shows an increase in a solubility in an alkali developer; and (B) as compounds capable of generating an acid upon irradiation with one of an actinic ray and a radiation, at least two compounds selected from the compounds (B1), (B2), (B3) and (B4) as defiend herein.

    摘要翻译： 一种正性光致抗蚀剂组合物，其含有：（A）含有本文所述的由式（IA）表示的重复单元和本文定义的式（IB）表示的重复单元中的至少一种的树脂，并且通过 酸显示出在碱性显影剂中的溶解度的增加; 和（B）作为能够在用光化学射线和辐射之一照射时产生酸的化合物，至少两种选自化合物（B1），（B2），（B3）和（B4）的化合物，如本文所述。

    Positive photoresist composition
    64.
    发明授权
    Positive photoresist composition 有权
    正光致抗蚀剂组合物

    公开(公告)号：US06485883B2

    公开(公告)日：2002-11-26

    申请号：US09769375

    申请日：2001-01-26

    申请人： Kunihiko Kodama ,  Shinichi Kanna ,  Toshiaki Aoai

    发明人： Kunihiko Kodama ,  Shinichi Kanna ,  Toshiaki Aoai

    IPC分类号： G03F7039

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/126

    摘要： A positive photoresist composition which comprises (A) a resin having a group which decomposes by the action of an acid to increase solubility in an alkaline developing solution, and (B) a compound which generates an aliphatic or aromatic carboxylic acid substituted with at least one fluorine atom upon irradiation with an actinic ray or radiation. The positive photoresist composition of the present invention is improved in resolution and process allowance such as exposure margin and depth of focus in a lithographic technology using a light source having a short wavelength capable of conducting the ultra fine fabrication and a chemical amplification-type positive photoresist. Further, it exhibits the excellent performance when an electron beam is used as a light source for exposure.

    摘要翻译： 一种正型光致抗蚀剂组合物，其包含（A）具有通过酸的作用分解以提高在碱性显影液中的溶解度的基团的树脂，和（B）产生被至少一个 通过光化射线或辐射照射，本发明的正性光致抗蚀剂组合物在使用具有短波长能够导电的光源的光刻技术中的分辨率和工艺容限（例如曝光余量和焦深）方面得到改善 超精细制造和化学放大型正性光致抗蚀剂。 此外，当使用电子束作为曝光用光源时，其表现出优异的性能。

    Positive resist composition and method of pattern formation with the same
    65.
    发明授权
    Positive resist composition and method of pattern formation with the same 有权
    积极的抗蚀剂组成和图案形成方法相同

    公开(公告)号：US09057952B2

    公开(公告)日：2015-06-16

    申请号：US13345978

    申请日：2012-01-09

    申请人： Hiromi Kanda ,  Shinichi Kanna ,  Haruki Inabe

    发明人： Hiromi Kanda ,  Shinichi Kanna ,  Haruki Inabe

    IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/26 ,  G03F7/20

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

    摘要： A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (F) a solvent, and a method of pattern formation with the composition: (x) an alkali-soluble group; (y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and (z) a group which decomposes by an action of an acid.

    摘要翻译： 一种正型抗蚀剂组合物，其包含：（A）通过酸的作用在碱性显影液中具有增强的溶解度的树脂; （B）在用光化射线或辐射照射时产生酸的化合物; （C）含有选自（x）〜（z）中的至少一种基团的含氟化合物; 和（F）溶剂，以及组合物的图案形成方法：（x）碱溶性基团; （y）通过碱性显影液的作用分解以提高在碱性显影液中的溶解度的基团; 和（z）通过酸的作用分解的基团。

    Positive resist composition and pattern-forming method
    67.
    发明授权
    Positive resist composition and pattern-forming method 有权
    正抗蚀剂组成和图案形成方法

    公开(公告)号：US08877421B2

    公开(公告)日：2014-11-04

    申请号：US12058055

    申请日：2008-03-28

    申请人： Shinichi Kanna

    发明人： Shinichi Kanna

    IPC分类号： G03F7/039 ,  G03F7/075 ,  G03F7/20 ,  G03F7/30

    CPC分类号： G03F7/0046 ,  G03F7/0397 ,  G03F7/0758

    摘要： A positive resist composition includes: (A) a resin capable of increasing the solubility in an alkali developing solution by the action of an acid, including: (a1) a repeating unit selected from repeating units represented by following formulae (a1-1) to (a1-3); (a2) a repeating unit represented by a following formula (a2); and (a3) a repeating unit selected from repeating units represented by following formulae (a3-1) to (a3-4); (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom, and being insoluble in an alkali developing solution; and (D) a solvent, wherein the formulae above are defined in the specification.

    摘要翻译： 正性抗蚀剂组合物包括：（A）能够通过酸的作用增加在碱性显影液中的溶解度的树脂，其包括：（a1）选自下式（a1-1）至 （a1-3）; （a2）由下式（a2）表示的重复单元; 和（a3）选自由下式（a3-1）〜（a3-4）表示的重复单元的重复单元; （B）能够在用光化射线或辐射照射时能够产生酸的化合物; （C）具有氟原子和硅原子中的至少一个的不溶于碱显影液的树脂; 和（D）溶剂，其中上述式在本说明书中定义。

    Pattern forming method
    69.
    发明授权
    Pattern forming method 有权
    图案形成方法

    公开(公告)号：US08389200B2

    公开(公告)日：2013-03-05

    申请号：US12618365

    申请日：2009-11-13

    申请人： Shinichi Kanna ,  Haruki Inabe ,  Hiromi Kanda

    发明人： Shinichi Kanna ,  Haruki Inabe ,  Hiromi Kanda

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/20 ,  G03F7/40

    CPC分类号： G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

    摘要： A pattern forming method which uses a positive resist composition comprises: (A) a fluorine-free resin capable of increasing its solubility in an alkaline developer under action of an acid; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a fluorine-containing resin having at least one group selected from the group consisting of (X) an alkali-soluble group, (XI) a group capable of decomposing under action of an alkali developer and increasing solubility of the resin (C) in an alkaline developer and (XII) a group capable of decomposing under action of an acid and increasing solubility of the resin (C) in an alkaline developer; and (D) a solvent, the method comprising: (i) a step of applying the positive resist composition to a substrate to form a resist coating; (ii) a step of exposing the resist coating to light via an immersion liquid; (iii) a step of removing the immersion liquid remaining on the resist coating; (iv) a step of heating the resist coating; and (v) a step of developing the resist coating.

    摘要翻译： 使用正性抗蚀剂组合物的图案形成方法包括：（A）能够在酸的作用下增加其在碱性显影剂中的溶解度的无氟树脂; （B）能够在用光化射线或辐射照射时能产生酸的化合物; （C）具有选自（X）碱溶性基团（XI）中的至少一种基团的含氟树脂，（XI）能够在碱性显影剂的作用下分解的基团和增加树脂的溶解度（C ）和（XII）能够在酸的作用下分解并增加树脂（C）在碱性显影剂中的溶解度的基团; 和（D）溶剂，所述方法包括：（i）将正性抗蚀剂组合物施加到基材以形成抗蚀剂涂层的步骤; （ii）通过浸没液体使抗蚀剂涂层曝光的步骤; （iii）去除残留在抗蚀剂涂层上的浸渍液体的步骤; （iv）加热抗蚀剂涂层的步骤; 和（v）开发抗蚀剂涂层的步骤。