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    SEMICONDUCTOR CHARGE PUMP USING MOS (METAL OXIDE SEMICONDUCTOR) TRANSISTOR FOR CURRENT RECTIFIER DEVICE
    62.
    发明申请
    SEMICONDUCTOR CHARGE PUMP USING MOS (METAL OXIDE SEMICONDUCTOR) TRANSISTOR FOR CURRENT RECTIFIER DEVICE 审中-公开
    使用用于电流整流器器件的MOS（金属氧化物半导体）晶体管的半导体充电泵

    公开(公告)号：US20070103224A1

    公开(公告)日：2007-05-10

    申请号：US11556810

    申请日：2006-11-06

    申请人： Toshimasa Namekawa ,  Hiroshi Ito

    发明人： Toshimasa Namekawa ,  Hiroshi Ito

    IPC分类号： G05F1/10

    CPC分类号： H02M3/073 ,  H02M2003/075 ,  H02M2003/077

    摘要： A semiconductor charge pump includes a plurality of P-channel MOS transistors being connected in series, a plurality of first pumping capacitors one electrode of each of which is connected to a connection point of each of the P-channel MOS transistors, a clock signal generating circuit which generates first and second clock signals whose phases are different from each other by 180 degrees, the first and second clock signals being alternately supplied to the other electrodes of the first pumping capacitors. The semiconductor charge pump further includes a plurality of dynamic level converter circuits each including a resistor element and a second pumping capacitor and connected to each of gates of the P-channel MOS transistors.

    摘要翻译： 半导体电荷泵包括串联连接的多个P沟道MOS晶体管，多个第一泵浦电容器，其中每一个的一个电极连接到每个P沟道MOS晶体管的连接点，产生时钟信号 电路，其产生相位彼此相差180度的第一和第二时钟信号，第一和第二时钟信号被交替地提供给第一泵浦电容器的其他电极。 半导体电荷泵还包括多个动态电平转换器电路，每个动态电平转换器电路各自包括电阻元件和第二泵浦电容器，并连接到P沟道MOS晶体管的每个栅极。

    EXPOSURE APPARATUS
    64.
    发明申请
    EXPOSURE APPARATUS 失效
    曝光装置

    公开(公告)号：US20070070317A1

    公开(公告)日：2007-03-29

    申请号：US11537071

    申请日：2006-09-29

    申请人： Makoto MIZUNO ,  Hiroshi Ito

    发明人： Makoto MIZUNO ,  Hiroshi Ito

    IPC分类号： G03B27/42

    CPC分类号： G03B27/42 ,  G03F7/70341

    摘要： An exposure apparatus includes a projection optical system for projecting a pattern of a reticle onto a substrate to be exposed, via a liquid that is filled in a space between the substrate and a final lens that is closest to the substrate, a movement restricting part for restricting a movement of the liquid by forming a interval between the movement restricting part and the substrate, the interval is smaller than a interval of the space, and a moving part for moving the movement restricting part so that the interval between the movement restricting part and the substrate increases.

    摘要翻译： 曝光装置包括：投影光学系统，用于通过填充在基板和最靠近基板的最终透镜之间的空间中的液体将掩模版图案投影到待曝光的基板上;移动限制部件，用于 通过在所述移动限制部和所述基板之间形成间隔来限制所述液体的移动，所述间隔小于所述间隔的间隔，以及移动部，其使所述移动限制部移动，使得所述移动限制部与所述移动限制部之间的间隔， 衬底增加。

    Transfer Device, Waste Toner Transporting Device and Image Forming Apparatus
    67.
    发明申请
    Transfer Device, Waste Toner Transporting Device and Image Forming Apparatus 失效
    转印装置，废粉转印装置和成像装置

    公开(公告)号：US20070003299A1

    公开(公告)日：2007-01-04

    申请号：US11531201

    申请日：2006-09-12

    申请人： Hiroshi Ito ,  Hiroshi Ue ,  Saburo Furukawa ,  Shigeo Fujita ,  Toshihiko Yamazaki ,  Tatsuro Osawa

    发明人： Hiroshi Ito ,  Hiroshi Ue ,  Saburo Furukawa ,  Shigeo Fujita ,  Toshihiko Yamazaki ,  Tatsuro Osawa

    IPC分类号： G03G21/00

    CPC分类号： G03G15/1685 ,  G03G2215/1614

    摘要： A transfer device includes a pair of transfer frames, a belt member, a pair of transfer roller levers which are respectively arranged on inner sides of the transfer frames pivotably, a transfer roller which is provided between first ends of the transfer roller levers rotatably, a pair of first urging members, which are respectively provided on second ends of the transfer roller levers to energize the transfer roller toward the belt member and a pair of transfer pressure controlling members which are respectively provided on the transfer frames movably to control urging power of the first urging members.

    摘要翻译： 转印装置包括一对转印框架，带构件，可转动地分别布置在转印框架的内侧上的一对转印辊杆，转印辊可旋转地设置在转印辊杆的第一端之间，转印辊 一对第一推动构件，其分别设置在转印辊杆的第二端上，以使转印辊朝向带构件传递;以及一对转印压力控制构件，其分别设置在转印框上，以便控制转印辊的推动力 首先敦促会员

    Preparation of topcoat compositions and methods of use thereof
    68.
    发明申请
    Preparation of topcoat compositions and methods of use thereof 失效

    公开(公告)号：US20060292484A1

    公开(公告)日：2006-12-28

    申请号：US11159477

    申请日：2005-06-23

    申请人： Hiroshi Ito ,  Linda Sundberg

    发明人： Hiroshi Ito ,  Linda Sundberg

    IPC分类号： G03C1/00

    CPC分类号： G03F7/2041 ,  G03F7/0046 ,  G03F7/11

    摘要： A topcoat composition that includes a fluorine-containing polymer and a casting solvent selected from an alcohol is provided. Also provided is a method of forming an image on a photoresist that includes forming a photoresist over a substrate; applying a topcoat composition, the topcoat composition comprising at least one fluorine-containing polymer and a casting solvent, onto the photoresist; removing the casting solvent of the topcoat composition resulting in the formation of a topcoat material over the photoresist; exposing the photoresist to radiation, the radiation changing a chemical composition of the regions of the photoresist exposed to the radiation, forming exposed and unexposed regions in the photoresist; and removing i) the topcoat material and ii) the exposed regions of the photoresist or the unexposed regions of the photoresist.

    Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions
    69.
    发明申请
    Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions 审中-公开
    氟化乙烯基醚，其共聚物，并用于平版印刷光刻胶组合物

    公开(公告)号：US20060287558A1

    公开(公告)日：2006-12-21

    申请号：US11503356

    申请日：2006-08-10

    申请人： Richard DiPietro ,  Hiroshi Ito

    发明人： Richard DiPietro ,  Hiroshi Ito

    IPC分类号： C07C41/00

    CPC分类号： C07C43/178 ,  C07C43/196 ,  C07C2602/42 ,  C08F16/24 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392

    摘要： Fluorinated vinyl ethers are provided having the structure of formula (I) the structure of formula (I) wherein at least one of X and Y is a fluorine atom, and L, R1, R2, R3, R4 are as defined herein. Also provided are copolymers prepared by radical polymerization of (I) and a second monomer that may not be fluorinated. The polymers are useful in lithographic photoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviolet (DUV) radiation, and are thus useful in DUV lithographic photoresist compositions. A method for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.

    摘要翻译： 提供具有式（I）结构的式（I）结构的氟化乙烯基醚，其中X和Y中的至少一个是氟原子，L，R 1，R 2， R 2，R 4，R 4如本文所定义。 还提供了通过（I）的自由基聚合和可以不被氟化的第二单体制备的共聚物。 聚合物可用于平版印刷光刻胶组合物，特别是化学增强抗蚀剂。 在优选的实施方案中，聚合物对深紫外（DUV）辐射基本上是透明的，因此可用于DUV平版光刻胶组合物。 还提供了使用该组合物在基板上产生抗蚀剂图像的方法，即在集成电路等的制造中。