公开(公告)号：US20050219748A1

公开(公告)日：2005-10-06

申请号：US10816062

申请日：2004-03-31

申请人： Hung-Chin Guthrie ,  Edward Pong Lee ,  Aron Pentek

发明人： Hung-Chin Guthrie ,  Edward Pong Lee ,  Aron Pentek

IPC分类号： G11B5/147 ,  G11B5/187 ,  G11B5/23 ,  G11B5/31

CPC分类号： G11B5/23 ,  G11B5/187 ,  G11B5/3116 ,  G11B5/313

摘要： A method for manufacturing an inductive write head having a metal write gap layer. The method reduces the number of necessary process steps and avoids corrosion of other write head elements such as magnetic back gap.

摘要翻译： 一种用于制造具有金属写入间隙层的电感写入头的方法。 该方法减少了必要的处理步骤的数量，并避免了其他写头元件（如磁背隙）的腐蚀。

公开(公告)号：US07675709B2

公开(公告)日：2010-03-09

申请号：US11525789

申请日：2006-09-21

申请人： Hung-Chin Guthrie ,  Wen-Chien David Hsiao ,  Jyh-Shuey Lo ,  Aron Pentek

发明人： Hung-Chin Guthrie ,  Wen-Chien David Hsiao ,  Jyh-Shuey Lo ,  Aron Pentek

IPC分类号： G11B5/31 ,  G11B5/187

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3163

摘要： A magnetic write head structure that maximizes write field strength while minimizing stray fields. The write pole structure maximizes write field strength by minimizing saturation of the magnetic pole tips, and minimizes stray field writing by preventing magnetic fields from extending laterally from the sides of the magnetic pole. The write head structure includes a write pole having a pole tip configured with a stair notched shape and a steep shouldered base beneath the stair notched portion. This configuration maximizes the amount of flux that can be delivered to the pole tip while also avoiding stray fields. The magnetic pole can also be configured with wing shaped extensions that extend laterally from the pole tip region but which are recessed from the ABS by a desired amount. The magnetic write head structure can be manufactured by forming a magnetic pole with a raised portion, depositing a write gap material over the magnetic pole and then forming a magnetic pedestal over the magnetic pole and write gap, the pedestal having a width significantly smaller than the width of the raised portion of the magnetic pole, a first ion mill can then be performed to notch and trim the magnetic pole. Then a non-magnetic layer such as alumina can be deposited and a second ion mill performed to form a stair notched configuration. An alumina bump can be formed prior to ion milling to provide a mask for forming the laterally extending, recessed wings in the pole tip of the magnetic pole.

摘要翻译： 磁写头结构，使写入场强度最大化，同时最小化杂散场。 写磁极结构通过最小化磁极尖端的饱和度来最大化写入场强度，并且通过防止磁场从磁极的侧面横向延伸来最小化杂散磁场写入。 写头结构包括具有构造为具有阶梯形切口形状的极尖的写入极和在阶梯切口部下方的陡峭的肩部基座。 该配置最大化可以传送到极尖的通量，同时也避免杂散场。 磁极还可以配置有翼形延伸部，其从极尖区域横向延伸，但是从ABS凹入所需量。 可以通过形成具有凸起部分的磁极来制造磁性写入头结构，在磁极上沉积写入间隙材料，然后在磁极和写入间隙上形成磁性基座，该基座具有明显小于 磁极的凸起部分的宽度，然后可以执行第一离子磨机来切割和修整磁极。 然后可以沉积诸如氧化铝的非磁性层，并且执行第二离子磨，以形成阶梯形缺口构型。 可以在离子研磨之前形成氧化铝凸块，以提供用于在磁极的极尖中形成横向延伸的凹入的翼的掩模。

公开(公告)号：US20080074782A1

公开(公告)日：2008-03-27

申请号：US11525789

申请日：2006-09-21

申请人： Hung-Chin Guthrie ,  Wen-Chien David Hsiao ,  Jyh-Shuey Lo ,  Aron Pentek

发明人： Hung-Chin Guthrie ,  Wen-Chien David Hsiao ,  Jyh-Shuey Lo ,  Aron Pentek

IPC分类号： G11B5/127

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3163

摘要： A magnetic write head structure that maximizes write field strength while minimizing stray fields. The write pole structure maximizes write field strength by minimizing saturation of the magnetic pole tips, and minimizes stray field writing by preventing magnetic fields from extending laterally from the sides of the magnetic pole. The write head structure includes a write pole having a pole tip configured with a stair notched shape and a steep shouldered base beneath the stair notched portion. This configuration maximizes the amount of flux that can be delivered to the pole tip while also avoiding stray fields. The magnetic pole can also be configured with wing shaped extensions that extend laterally from the pole tip region but which are recessed from the ABS by a desired amount. The magnetic write head structure can be manufactured by forming a magnetic pole with a raised portion, depositing a write gap material over the magnetic pole and then forming a magnetic pedestal over the magnetic pole and write gap, the pedestal having a width significantly smaller than the width of the raised portion of the magnetic pole, a first ion mill can then be performed to notch and trim the magnetic pole. Then a non-magnetic layer such as alumina can be deposited and a second ion mill performed to form a stair notched configuration. An alumina bump can be formed prior to ion milling to provide a mask for forming the laterally extending, recessed wings in the pole tip of the magnetic pole.

摘要翻译： 磁写头结构，使写入场强度最大化，同时最小化杂散场。 写磁极结构通过最小化磁极尖端的饱和度来最大化写入场强度，并且通过防止磁场从磁极的侧面横向延伸来最小化杂散磁场写入。 写头结构包括具有构造为具有阶梯形切口形状的极尖的写入极和在阶梯切口部下方的陡峭的肩部基座。 该配置最大化可以传送到极尖的通量，同时也避免杂散场。 磁极还可以配置有翼形延伸部，其从极尖区域横向延伸，但是从ABS凹入所需量。 可以通过形成具有凸起部分的磁极来制造磁性写入头结构，在磁极上沉积写入间隙材料，然后在磁极和写入间隙上形成磁性基座，该基座具有明显小于 磁极的凸起部分的宽度，然后可以执行第一离子磨机来切割和修整磁极。 然后可以沉积诸如氧化铝的非磁性层，并且执行第二离子磨，以形成阶梯形缺口构型。 可以在离子研磨之前形成氧化铝凸块，以提供用于在磁极的极尖中形成横向延伸的凹入的翼的掩模。

公开(公告)号：US20070245544A1

公开(公告)日：2007-10-25

申请号：US11380189

申请日：2006-04-25

申请人： Donald Allen ,  Amanda Baer ,  Michael Feldbaum ,  Hung-Chin Guthrie ,  Aron Pentek

发明人： Donald Allen ,  Amanda Baer ,  Michael Feldbaum ,  Hung-Chin Guthrie ,  Aron Pentek

IPC分类号： G11B5/127

CPC分类号： G11B5/3163 ,  G11B5/112 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  Y10T29/49021 ,  Y10T29/49039 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A method for making a write pole in a perpendicular magnetic recording write head uses a metal mask to pattern the primary resist and only ion milling during the subsequent patterning steps. A layer of primary resist is deposited over the magnetic write pole material and a metal mask layer is deposited on the primary resist layer. An imaging resist layer is formed on the metal mask layer and lithographically patterned generally in the desired shape of the write pole. Ion milling without a reactive gas is then performed over the imaging resist pattern to pattern the underlying metal mask layer, which is then used as the mask to define the shape of the primary resist pattern. Ion milling with oxygen is then performed over the metal mask pattern to pattern the underlying primary resist. Ion milling without a reactive gas is then performed over the primary resist pattern to form the underlying write pole.

摘要翻译： 用于在垂直磁记录写头中制作写极的方法使用金属掩模对主抗蚀剂进行图案化，并且在随后的图案化步骤期间仅使用离子铣削。 一层主抗蚀剂沉积在磁写磁极材料上，并且金属掩模层沉积在主抗蚀剂层上。 在金属掩模层上形成成像抗蚀剂层，并且通常以写入极的所需形状进行光刻图案化。 然后在成像抗蚀剂图案上进行无反应气体的离子研磨以对下面的金属掩模层进行图案化，然后将其用作掩模以限定主抗蚀剂图案的形状。 然后在金属掩模图案上进行用氧离子研磨以对下面的主抗蚀剂进行图案化。 然后在主抗蚀剂图案上执行没有反应气体的离子研磨以形成下面的写极。

公开(公告)号：US07215511B2

公开(公告)日：2007-05-08

申请号：US10816062

申请日：2004-03-31

申请人： Hung-Chin Guthrie ,  Edward Hin Pong Lee ,  Aron Pentek

发明人： Hung-Chin Guthrie ,  Edward Hin Pong Lee ,  Aron Pentek

IPC分类号： G11B5/31 ,  G11B5/23 ,  G11B5/235

CPC分类号： G11B5/23 ,  G11B5/187 ,  G11B5/3116 ,  G11B5/313

摘要： A magnetic write head having a metal, non-magnetic write gap that extends only partially to the magnetic back gap, the remainder of the distance between the pole tip and the back gap being a magnetic material. The elimination of the seed layer reduces the amount of milling required to perform the desired notching needed to form a self aligned pedestal on the first pole and voids electrolytic corrosion of the back gap during plating.

摘要翻译： 一种具有仅部分地延伸到磁背隙的金属非磁性写入间隙的磁性写头，磁极末端和后间隙之间的距离的其余部分是磁性材料。 种子层的消除减少了在第一极上形成自对准基座所需的所需切口所需的铣削量，并避免了电镀期间后隙的电解腐蚀。

公开(公告)号：US07075094B2

公开(公告)日：2006-07-11

申请号：US10930277

申请日：2004-08-30

申请人： Michael Feldbaum ,  Hung-Chin Guthrie ,  Wipul Pemsiri Jayasekara ,  Aron Pentek

发明人： Michael Feldbaum ,  Hung-Chin Guthrie ,  Wipul Pemsiri Jayasekara ,  Aron Pentek

IPC分类号： H01J37/305

CPC分类号： H01L22/20 ,  H01J2237/3114 ,  H01L21/31116 ,  H01L21/32136

摘要： A system for improving drift compensation for ion mill applications defines a reference step for purposes of time duration. The reference step is controlled by an end point detector and monitored for use with subsequent process steps. The time duration for a subsequent step is adjusted as a percentage of the reference step. A time scaling factor determines the actual duration of the subsequent step. Rather than directly using times of step duration, the system uses a percentage of the reference step for the latter step. The duration of the reference step varies depending on the tool drift. The overall duration is changed in the same proportion as the duration of the reference step, and thereby compensates for the influence of drift on the end product.

摘要翻译： 用于改进离子磨应用的漂移补偿的系统为了持续时间而定义了参考步骤。 参考步骤由端点检测器控制，并被监控以用于随后的处理步骤。 后续步骤的持续时间作为参考步骤的百分比进行调整。 时间缩放因子确定后续步骤的实际持续时间。 而不是直接使用步骤持续时间，系统使用后一步骤的参考步骤百分比。 参考步骤的持续时间取决于刀具漂移。 整个持续时间以与参考步骤的持续时间相同的比例改变，从而补偿漂移对最终产品的影响。

公开(公告)号：US6131271A

公开(公告)日：2000-10-17

申请号：US344071

申请日：1999-06-25

申请人： Robert Edward Fontana, Jr. ,  Hung-Chin Guthrie ,  William Leslie Guthrie ,  Eric James Lee ,  Li-Chung Lee ,  Francisco Agustin Martin

发明人： Robert Edward Fontana, Jr. ,  Hung-Chin Guthrie ,  William Leslie Guthrie ,  Eric James Lee ,  Li-Chung Lee ,  Francisco Agustin Martin

IPC分类号： G11B5/31 ,  G11B5/42

CPC分类号： G11B5/3173 ,  G11B5/3116 ,  G11B5/3163 ,  G11B5/3109 ,  Y10T29/49044 ,  Y10T29/49046

摘要： A method planarizes a first pole piece layer of a write head by lapping without delaminating the first pole piece layer from an underlying second read gap layer on a wafer substrate. This is accomplished by separating or dicing the first pole piece material layer in a field region about rows and columns of first pole piece layers of magnetic head assemblies so as to reduce the stress of the first pole piece material layer in the field. Accordingly, when the wafer substrate is lapped, such as by chemical mechanical polishing (CMP), a reduced stress prevents the first pole piece material layer from delaminating from the second read gap layer during the lapping operation.

摘要翻译： 方法通过研磨平面化写入头的第一极片层，而不使第一极片层与晶片衬底上的下面的第二读取间隙层分层。 这是通过在围绕磁头组件的第一极片层的行和列的场区域中分离或切割第一极片材料层来实现的，以便减小现场中第一极片材料层的应力。 因此，当通过化学机械抛光（CMP）研磨晶片衬底时，减小的应力在研磨操作期间防止第一极片材料层与第二读取间隙层分层。

公开(公告)号：US20060043280A1

公开(公告)日：2006-03-02

申请号：US10930277

申请日：2004-08-30

申请人： Michael Feldbaum ,  Hung-Chin Guthrie ,  Wipul Jayasekara ,  Aron Pentek

发明人： Michael Feldbaum ,  Hung-Chin Guthrie ,  Wipul Jayasekara ,  Aron Pentek

IPC分类号： B01D59/44

CPC分类号： H01L22/20 ,  H01J2237/3114 ,  H01L21/31116 ,  H01L21/32136

摘要： A system for improving drift compensation for ion mill applications defines a reference step for purposes of time duration. The reference step is controlled by an end point detector and monitored for use with subsequent process steps. The time duration for a subsequent step is adjusted as a percentage of the reference step. A time scaling factor determines the actual duration of the subsequent step. Rather than directly using times of step duration, the system uses a percentage of the reference step for the latter step. The duration of the reference step varies depending on the tool drift. The overall duration is changed in the same proportion as the duration of the reference step, and thereby compensates for the influence of drift on the end product.

公开(公告)号：US07509729B2

公开(公告)日：2009-03-31

申请号：US11380189

申请日：2006-04-25

申请人： Donald G. Allen ,  Amanda Baer ,  Michael Feldbaum ,  Hung-Chin Guthrie ,  Aron Pentek

发明人： Donald G. Allen ,  Amanda Baer ,  Michael Feldbaum ,  Hung-Chin Guthrie ,  Aron Pentek

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： G11B5/3163 ,  G11B5/112 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  Y10T29/49021 ,  Y10T29/49039 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A method for making a write pole in a perpendicular magnetic recording write head uses a metal mask to pattern the primary resist and only ion milling during the subsequent patterning steps. A layer of primary resist is deposited over the magnetic write pole material and a metal mask layer is deposited on the primary resist layer. An imaging resist layer is formed on the metal mask layer and lithographically patterned generally in the desired shape of the write pole. Ion milling without a reactive gas is then performed over the imaging resist pattern to pattern the underlying metal mask layer, which is then used as the mask to define the shape of the primary resist pattern. Ion milling with oxygen is then performed over the metal mask pattern to pattern the underlying primary resist. Ion milling without a reactive gas is then performed over the primary resist pattern to form the underlying write pole.

摘要翻译： 用于在垂直磁记录写头中制作写极的方法使用金属掩模对主抗蚀剂进行图案化，并且在随后的图案化步骤期间仅使用离子铣削。 一层主抗蚀剂沉积在磁写磁极材料上，并且金属掩模层沉积在主抗蚀剂层上。 在金属掩模层上形成成像抗蚀剂层，并且通常以写入极的所需形状进行光刻图案化。 然后在成像抗蚀剂图案上进行无反应气体的离子研磨以对下面的金属掩模层进行图案化，然后将其用作掩模以限定主抗蚀剂图案的形状。 然后在金属掩模图案上进行用氧离子研磨以对下面的主抗蚀剂进行图案化。 然后在主抗蚀剂图案上执行没有反应气体的离子研磨以形成下面的写极。

公开(公告)号：US07108588B1

公开(公告)日：2006-09-19

申请号：US11099397

申请日：2005-04-05

申请人： Hung-Chin Guthrie ,  James Craig Nystrom

发明人： Hung-Chin Guthrie ,  James Craig Nystrom

IPC分类号： B24B55/12

CPC分类号： B24B57/02

摘要： A moisturizing process for slurry delivery tubes in chemical mechanical polishing is disclosed. A mist of deionized water is dispensed directly into the tubes each time a high pressure spray bar automatically cycles. The tips of the tubes are kept wet enough to prevent the slurry from drying in and clogging the tubes. A fan-type spray nozzle is located in the bar and, when pressurized, dispenses a fine mist. A direction of the nozzle is modified to avoid overspraying the tool. Only the tips of the delivery tubes and part of the polishing pad receive the misted spray. The slurry is moisturized and never dries at the point of use as the mist is dispensed with each cycle of a pad rinse feature.

摘要翻译： 公开了用于化学机械抛光中的浆料输送管的保湿方法。 每当高压喷射杆自动循环时，去离子水的雾直接分配到管中。 管的尖端保持足够湿，以防止浆料干燥并堵塞管。 一个风扇式喷嘴位于酒吧中，加压时，会分散细雾。 修改喷嘴的方向以避免过度喷涂工具。 只有输送管的尖端和抛光垫的一部分接收到雾化的喷雾。 浆料被润湿，并且在使用时不会干燥，因为在每次循环洗涤垫漂洗特征时不再喷雾。