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    Process for self-aligned flare point and shield throat definition prior to main pole patterning
    2.
    发明授权
    Process for self-aligned flare point and shield throat definition prior to main pole patterning 有权
    在主极图案化之前，自对准耀斑和屏蔽喉定义的过程

    公开(公告)号：US07881010B2

    公开(公告)日：2011-02-01

    申请号：US11956277

    申请日：2007-12-13

    申请人： Hung-Chin Guthrie ,  Ming Jiang ,  Edward Hin Pong Lee ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

    发明人： Hung-Chin Guthrie ,  Ming Jiang ,  Edward Hin Pong Lee ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

    IPC分类号： G11B5/187

    CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3146 ,  G11B5/315

    摘要： A method for manufacturing a magnetic write head having a write pole with a flared step feature that defines a secondary flare point. The method involves depositing a magnetic write pole material on a substrate and then depositing a magnetic material over the write pole material followed by a non-magnetic material. A first mask is formed having a front edge to define the location of the secondary flare point, and one or more material removal processes are used to remove portions of the magnetic layer and non-magnetic layer that are not protected by this first mask. The first mask is replaced by a second mask that is configured to define a write pole, and an ion milling is performed to define the write pole. Shadowing from the magnetic layer and non-magnetic layer form a flared secondary flare point.

    摘要翻译： 一种用于制造具有定义二次闪光点的具有扩口步骤特征的写极的磁写头的方法。 该方法包括将磁性写入极材料沉积在衬底上，然后将磁性材料沉积在写入极材料上，随后是非磁性材料。 形成第一掩模，其具有前边缘以限定次级火炬点的位置，并且使用一个或多个材料去除过程来去除未被该第一掩模保护的磁性层和非磁性层的部分。 第一个掩模由配置为定义写入极的第二个掩模代替，并且执行离子铣削来定义写入极点。 从磁性层和非磁性层的阴影形成扩张的次级耀斑点。

    PROCESS FOR SELF-ALIGNED FLARE POINT AND SHIELD THROAT DEFINITION PRIOR TO MAIN POLE PATTERNING
    5.
    发明申请
    PROCESS FOR SELF-ALIGNED FLARE POINT AND SHIELD THROAT DEFINITION PRIOR TO MAIN POLE PATTERNING 有权
    自动对准点的过程和主要绘图前的屏蔽定义

    公开(公告)号：US20090152234A1

    公开(公告)日：2009-06-18

    申请号：US11956277

    申请日：2007-12-13

    申请人： Hung-Chin Guthrie ,  Ming Jiang ,  Edward Hin Pong Lee ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

    发明人： Hung-Chin Guthrie ,  Ming Jiang ,  Edward Hin Pong Lee ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

    IPC分类号： B44C1/22

    CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3146 ,  G11B5/315

    摘要： A method for manufacturing a magnetic write head having a write pole with a flared step feature that defines a secondary flare point. The method involves depositing a magnetic write pole material on a substrate and then depositing a magnetic material over the write pole material followed by a non-magnetic material. A first mask is formed having a front edge to define the location of the secondary flare point, and one or more material removal processes are used to remove portions of the magnetic layer and non-magnetic layer that are not protected by this first mask. The first mask is replaced by a second mask that is configured to define a write pole, and an ion milling is performed to define the write pole. Shadowing from the magnetic layer and non-magnetic layer form a flared secondary flare point.

    摘要翻译： 一种用于制造具有定义二次闪光点的具有扩口步骤特征的写极的磁写头的方法。 该方法包括将磁性写入极材料沉积在衬底上，然后将磁性材料沉积在写入极材料上，随后是非磁性材料。 形成第一掩模，其具有前边缘以限定次级火炬点的位置，并且使用一个或多个材料去除过程来去除未被该第一掩模保护的磁性层和非磁性层的部分。 第一个掩模由配置为定义写入极的第二个掩模代替，并且执行离子铣削来定义写入极点。 从磁性层和非磁性层的阴影形成扩张的次级耀斑点。

    Method for creating inductive write head with steep shoulder at notch
    9.
    发明授权
    Method for creating inductive write head with steep shoulder at notch 失效
    在凹口处创建具有陡肩的感应写头的方法

    公开(公告)号：US07083738B2

    公开(公告)日：2006-08-01

    申请号：US10632631

    申请日：2003-07-31

    申请人： Edward Hin Pong Lee ,  Aron Pentek ,  Wen-Chien David Hsiao

    发明人： Edward Hin Pong Lee ,  Aron Pentek ,  Wen-Chien David Hsiao

    IPC分类号： B29D11/00 ,  H01L21/00

    CPC分类号： G11B5/1877 ,  G11B5/3163

    摘要： A method for fabricating a magnetic head using a modified P1 cap process. A first pole is formed. A cap is formed above the first pole. A gap layer is formed above the cap. A second pole is formed above the gap layer. Exposed portions of the gap layer are removed. The cap and first pole are milled for creating a shoulder of the first pole tapered upwardly towards the cap. Another method for fabricating a magnetic head includes forming a first pole, forming a gap layer above the first pole, forming a second pole above the gap layer, forming a layer of photoresist above the second pole, patterning the photoresist such that the photoresist covers areas of the gap layer positioned towards the second pole, removing exposed portions of the gap layer, removing part of exposed portions of the first pole for forming steps in the first pole on opposite sides of the photoresist, removing the photoresist, and milling for creating a shoulder of the first pole tapering upwardly towards the cap.

    摘要翻译： 一种使用改进的P 1帽工艺制造磁头的方法。 形成第一极。 在第一极上方形成帽。 在盖上形成间隙层。 在间隙层上方形成第二极。 去除间隙层的露出部分。 铣头和第一杆被铣削以产生第一杆的肩部向上朝向帽部锥形。 制造磁头的另一方法包括形成第一极，在第一极上方形成间隙层，在间隙层上方形成第二极，在第二极上形成光致抗蚀剂层，使光致抗蚀剂覆盖区域 间隔层定位成朝向第二极，去除间隙层的暴露部分，去除第一极的暴露部分的一部分，以在光致抗蚀剂的相对侧上的第一极中形成台阶，去除光致抗蚀剂，并研磨以产生 第一杆的肩部朝向帽部向上逐渐变细。

    Methods for creating a magnetic main pole with side shield and systems thereof
    10.
    发明授权
    Methods for creating a magnetic main pole with side shield and systems thereof 有权
    用于制造具有侧面屏蔽的磁性主极和其系统的方法

    公开(公告)号：US08059367B2

    公开(公告)日：2011-11-15

    申请号：US12341925

    申请日：2008-12-22

    申请人： Edward Hin Pong Lee ,  Aron Pentek

    发明人： Edward Hin Pong Lee ,  Aron Pentek

    IPC分类号： G11B5/127

    CPC分类号： G11B5/3116 ,  G11B5/3163 ,  Y10T428/1186

    摘要： A method according to another embodiment includes forming a side shield layer of ferromagnetic material above a substrate; masking the side shield layer; milling an unmasked region of the side shield layer for forming a pole trench therein; and forming a pole layer in the pole trench. A structure according to one embodiment includes a substrate; a side shield layer of ferromagnetic material on the substrate, wherein the substrate has a region covered by the side shield layer and a region not covered by the side shield layer; a pole trench in the side shield layer and the region of the substrate not covered by the side shield layer; a layer of nonmagnetic material in the pole trench; and a pole layer in the pole trench, wherein the pole layer has a greater thickness above the region of the substrate not covered by the side shield layer than above the region of the substrate covered by the side shield layer.

    摘要翻译： 根据另一实施例的方法包括在基板上形成铁磁材料的侧屏蔽层; 遮蔽侧面屏蔽层; 研磨用于在其中形成极沟槽的侧屏蔽层的未掩模区域; 以及在所述极沟槽中形成极层。 根据一个实施例的结构包括基底; 在所述基板上的铁磁材料的侧屏蔽层，其中所述基板具有被所述侧屏蔽层覆盖的区域和未被所述侧屏蔽层覆盖的区域; 侧屏蔽层中的极沟槽和未被侧屏蔽层覆盖的衬底的区域; 在磁极沟中的一层非磁性材料; 以及在所述极沟槽中的极层，其中所述极层在不被所述侧屏蔽层覆盖的所述衬底的区域之上具有比在所述侧屏蔽层覆盖的衬底的区域之上更大的厚度。