公开(公告)号：US07281226B2

公开(公告)日：2007-10-09

申请号：US10377341

申请日：2003-02-27

申请人： Shao-Po Wu ,  Yao-Ting Wang

发明人： Shao-Po Wu ,  Yao-Ting Wang

IPC分类号： G06F17/50

CPC分类号： G03F1/30 ,  G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： Phase shifting allows generating very narrow features in a printed features layer. Thus, forming a fabrication layout for a physical design layout having critical features typically includes providing a layout for shifters. Specifically, pairs of shifters can be placed to define critical features, wherein the pairs of shifters conform to predetermined design rules. After placement, phase information for the shifters associated with the set of critical features can be assigned. Complex designs can lead to phase-shift conflicts among shifters in the fabrication layout. An irresolvable conflict can be passed to the design process earlier than in a conventional processes, thereby saving valuable time in the fabrication process for printed circuits.

摘要翻译： 相移允许在打印的要素图层中生成非常窄的特征。 因此，形成具有关键特征的物理设计布局的制造布局通常包括为移位器提供布局。 具体地，可以放置移位器对以定义关键特征，其中移位器对符合预定的设计规则。 放置后，可以分配与该组关键特征相关联的移位器的相位信息。 复杂的设计可能导致制造布局中移位器之间的相移冲突。 可以比传统方法更早地将设计过程传递给设计过程，从而节省印刷电路制造过程中的宝贵时间。

公开(公告)号：US06904587B2

公开(公告)日：2005-06-07

申请号：US10327446

申请日：2002-12-20

申请人： Chi-Ming Tsai ,  Chin-Hsen Lin ,  Yao-Ting Wang

发明人： Chi-Ming Tsai ,  Chin-Hsen Lin ,  Yao-Ting Wang

IPC分类号： G03F1/36 ,  G06F9/45 ,  G06F17/50

CPC分类号： G06F17/5081 ,  G03F1/36 ,  G03F1/68

摘要： A lithography mask layout is designed and verified incrementally to help reduce the amount of time to produce the mask layout. For one embodiment, a layout defining a target pattern may be processed to produce a mask layout, and the mask layout may be verified to identify errors. Rather than processing and verifying the entire mask layout for error correction over one or more subsequent iterations, sub-layouts having errors may be removed or copied from the mask layout for separate processing and verification. Because the amount of data defining a sub-layout is relatively small, the time to design and verify the mask layout is reduced. The resulting mask layout having one or more processed and verified sub-layout(s) may then be used to manufacture a mask set to help print the target pattern in manufacturing integrated circuits (ICs), for example.

摘要翻译： 光刻掩模布局被设计和逐步验证，以帮助减少产生掩模布局的时间量。 对于一个实施例，可以处理定义目标图案的布局以产生掩模布局，并且可以验证掩模布局以识别错误。 不是通过在一个或多个后续迭代处理和验证整个掩模布局进行纠错，而是可以从掩模布局去除或复制具有错误的子布局以进行单独的处理和验证。 由于定义子布局的数据量相对较小，所以减少了设计和验证掩码布局的时间。 然后，可以使用具有一个或多个经处理和验证的子布局的所得到的掩模布局来制造掩模组，以帮助例如在制造集成电路（IC）中打印目标图案。

公开(公告)号：US06622288B1

公开(公告)日：2003-09-16

申请号：US09823146

申请日：2001-03-29

申请人： Yao-Ting Wang ,  Kent Richardson ,  Shao-Po Wu ,  Christophe Pierrat ,  Michael Sanie

发明人： Yao-Ting Wang ,  Kent Richardson ,  Shao-Po Wu ,  Christophe Pierrat ,  Michael Sanie

IPC分类号： G06F1750

CPC分类号： G03F1/30

摘要： Techniques for forming a design layout with phase-shifted features, such as an integrated circuit layout, include receiving information about a particular phase-shift conflict in a first physical design layout. The information indicates one or more features logically associated with the particular phase-shift conflict. Then the first physical design layout is adjusted based on that information to produce a second design layout. The adjustments rearrange features in a unit of the design layout to collect free space around a selected feature associated with the phase-shift conflict. With these techniques, a unit needing more space for additional shifters can obtain the needed space during the physical design process making the adjustment. The needed space so obtained allows the fabrication design process to avoid or resolve phase conflicts while forming a fabrication layout, such as a mask, for substantiating the design layout in a printed features layer, such as in an actual integrated circuit.

摘要翻译： 用于形成具有诸如集成电路布局的相移特征的设计布局的技术包括在第一物理设计布局中接收关于特定相移冲突的信息。 该信息指示与特定相移冲突逻辑关联的一个或多个特征。 然后根据该信息调整第一个物理设计布局以产生第二个设计布局。 调整重新排列设计布局中的功能，以收集与相移冲突相关的所选功能周围的可用空间。 利用这些技术，在进行调整的物理设计过程中，需要更多空间的单元可以获得额外的移位器的空间。 如此获得的所需空间允许制造设计过程避免或解决相位冲突，同时形成诸如掩模的制造布局，用于证实印刷特征层（例如在实际集成电路中）的设计布局。

公开(公告)号：US06584610B1

公开(公告)日：2003-06-24

申请号：US09823380

申请日：2001-03-29

申请人： Shao-Po Wu ,  Yao-Ting Wang

发明人： Shao-Po Wu ,  Yao-Ting Wang

IPC分类号： G06F1750

CPC分类号： G03F1/30 ,  G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： Phase shifting generates features in a printed features layer, such as a printed circuit, that are narrower than the features on a fabrication layout, such as a mask, projected onto the printed features layer using the same optical system without phase shifting. Techniques for forming a fabrication layout for a physical design layout having critical features employing phase shifting include techniques for providing a layout for shifters. The techniques include establishing placement of multiple pairs of shifters for a set of critical features. A critical feature employs phase shifting. The set of critical features constitutes a subset of all critical features in a layout. After establishing placement of the pairs of shifters, phase information for the shifters associated with the set of critical features is assigned. This and related techniques expedite resolving phase-shift conflicts in fabrication layouts for phase-shifted features. Complex designs can lead to phase-shift conflicts among shifters in the fabrication layout. According to these techniques, a conflict that cannot be resolved by a fabrication design process is passed to the design process earlier than in a conventional processes, saving valuable time in the fabrication process for printed circuits.

摘要翻译： 相移产生诸如印刷电路的印刷特征层中的特征，其比制造布局（例如掩模）上的特征窄，使用相同的没有相移的光学系统投影到印刷特征层上。 用于形成具有采用相移的关键特征的物理设计布局的制造布局的技术包括用于为移位器提供布局的技术。 这些技术包括为一组关键特征建立多对移位器的放置。 关键特征是采用相移。 一组关键特征构成布局中所有关键特征的一个子集。 在建立移位器对之后，分配与该组关键特征相关联的移位器的相位信息。该相关技术加速了相移特征制造布局中的相移冲突。 复杂的设计可能导致制造布局中移位器之间的相移冲突。 根据这些技术，制造设计过程无法解决的冲突比传统工艺更早地传递给设计过程，从而节省印刷电路制造过程中的宝贵时间。

公开(公告)号：US06420074B2

公开(公告)日：2002-07-16

申请号：US09732407

申请日：2000-12-07

申请人： Yao-Ting Wang ,  Yagyensh Pati

发明人： Yao-Ting Wang ,  Yagyensh Pati

IPC分类号： G03F900

CPC分类号： G03F7/70283 ,  G03F1/26 ,  G03F1/30 ,  G03F1/34 ,  G03F1/36 ,  G03F1/70 ,  G03F7/2022 ,  G03F7/70433 ,  G03F7/70441 ,  G03F7/705 ,  G06F17/5068

摘要： A method and apparatus for creating a phase shifting mask and a structure mask for shrinking integrated circuit designs. One embodiment of the invention includes using a two mask process. The first mask is a phase shift mask and the second mask is a single phase structure mask. The phase shift mask primarily defines regions requiring phase shifting. The single phase structure mask primarily defines regions not requiring phase shifting. The single phase structure mask also prevents the erasure of the phase shifting regions and prevents the creation of undesirable artifact regions that would otherwise be created by the phase shift mask. Both masks are derived from a set of masks used in a larger minimum dimension process technology.

摘要翻译： 一种用于产生相移掩模和用于收缩集成电路设计的结构掩模的方法和装置。 本发明的一个实施例包括使用两个掩模过程。 第一掩模是相移掩模，第二掩模是单相结构掩模。 相移掩模主要限定需要相移的区域。 单相结构掩模主要限定不需要相移的区域。 单相结构掩模还防止相移区域的擦除，并且防止产生否则将由相移掩模产生的不期望的伪影区域。 两个掩模都是从一个更大的最小尺寸工艺技术中使用的一组掩模派生出来的。

公开(公告)号：US08517775B1

公开(公告)日：2013-08-27

申请号：US13372351

申请日：2012-02-13

申请人： Yao-Ting Wang ,  Yu-Hung Su

发明人： Yao-Ting Wang ,  Yu-Hung Su

IPC分类号： H01R24/00

CPC分类号： H01R24/64 ,  H01R2107/00

摘要： An electrical connector includes an insulating housing which defines an inserting mouth penetrating through a front side thereof and terminal grooves communicating with the inserting mouth and each extending longitudinally to penetrate rearward through the insulating housing. A plurality of electrical terminals is assembled in the terminal grooves and each has a contact arm elastically stretching into the inserting mouth and defining a contact end. The insulating housing further defines a plurality of through holes penetrating vertically therethrough to connect with the inserting mouth and arranged in accordance with the contact ends of the electrical terminals. The through holes are used to provide action space for meeting movements of the contact ends and receiving the contact ends therein, when a mating part is inserted into the inserting mouth and pressure contacts with the contact ends.

摘要翻译： 电连接器包括绝缘壳体，其限定穿过其前侧的插入口和与插入口连通的端子槽，并且每个延伸纵向以穿过绝缘壳体向后穿透。 多个电端子组装在端子槽中，并且每个电端子具有弹性地拉伸到插入口中并限定接触端的接触臂。 绝缘壳体还限定了垂直贯穿其中的多个通孔，以与插入口连接并根据电气端子的接触端设置。 当将配合部分插入插入口并与接触端部进行压力接触时，通孔用于提供用于满足接触端部的移动并且接收其中的接触端的动作空间。

公开(公告)号：US20130210284A1

公开(公告)日：2013-08-15

申请号：US13372351

申请日：2012-02-13

申请人： Yao-Ting Wang ,  Yu-Hung Su

发明人： Yao-Ting Wang ,  Yu-Hung Su

IPC分类号： H01R24/00

CPC分类号： H01R24/64 ,  H01R2107/00

摘要： An electrical connector includes an insulating housing which defines an inserting mouth penetrating through a front side thereof and terminal grooves communicating with the inserting mouth and each extending longitudinally to penetrate rearward through the insulating housing. A plurality of electrical terminals is assembled in the terminal grooves and each has a contact arm elastically stretching into the inserting mouth and defining a contact end. The insulating housing further defines a plurality of through holes penetrating vertically therethrough to connect with the inserting mouth and arranged in accordance with the contact ends of the electrical terminals. The through holes are used to provide action space for meeting movements of the contact ends and receiving the contact ends therein, when a mating part is inserted into the inserting mouth and pressure contacts with the contact ends.

摘要翻译： 电连接器包括绝缘壳体，其限定穿过其前侧的插入口和与插入口连通的端子槽，并且每个延伸纵向以穿过绝缘壳体向后穿透。 多个电端子组装在端子槽中，并且每个电端子具有弹性地拉伸到插入口中并限定接触端的接触臂。 绝缘壳体还限定了垂直贯穿其中的多个通孔，以与插入口连接并根据电气端子的接触端设置。 当将配合部分插入插入口并与接触端部进行压力接触时，通孔用于提供用于满足接触端部的移动并且接收其中的接触端的动作空间。

公开(公告)号：USD671896S1

公开(公告)日：2012-12-04

申请号：US29411157

申请日：2012-01-17

申请人： Yao-Ting Wang ,  Yu-Hung Su

设计人： Yao-Ting Wang ,  Yu-Hung Su

公开(公告)号：USD671895S1

公开(公告)日：2012-12-04

申请号：US29408636

申请日：2011-12-14

申请人： Yao-Ting Wang ,  Yu-Hung Su

设计人： Yao-Ting Wang ,  Yu-Hung Su

公开(公告)号：US08215996B2

公开(公告)日：2012-07-10

申请号：US12841835

申请日：2010-07-22

申请人： Yu-Hung Su ,  Yao-Ting Wang

发明人： Yu-Hung Su ,  Yao-Ting Wang

IPC分类号： H01R24/00

CPC分类号： H01R24/64 ,  H01R13/506 ,  H01R13/6593 ,  H01R2107/00

摘要： An electrical connector includes a first insulating body having a base board and a tongue board extending rearward from the base board, and a second insulating body having a base portion and fingers extending forward from the base portion. Two opposite sides of the tongue board protrude upward to form two clipping walls and oppositely protrude outward to form two restraining portions spaced from the clipping walls. A receiving space is formed among the tongue board, the base board and the clipping walls for receiving the second insulating body therein. The base portion is clipped between the clipping walls. Front ends of the fingers prop against the base board. Each side surface of the base portion defines an elastic arm having a top connected with the side surface and a bottom beyond a bottom surface of the base portion to be restrained between the restraining portion and the clipping wall.

摘要翻译： 电连接器包括：第一绝缘体，其具有基板和从基板向后延伸的舌板;以及第二绝缘体，具有从基部向前延伸的基部和指状物。 舌板的两个相对的侧面向上突出以形成两个夹持壁并且相对地向外突出以形成与夹持壁间隔开的两个约束部分。 在舌板，基板和夹板之间形成有用于在其中容纳第二绝缘体的接收空间。 基部被夹在夹壁之间。 手指的前端支撑在基板上。 基部的每个侧表面限定弹性臂，其具有与侧表面连接的顶部和超过基部的底表面的底部，以限制在限制部分和夹持壁之间。