公开(公告)号：US07285497B2

公开(公告)日：2007-10-23

申请号：US11093840

申请日：2005-03-30

申请人： Shinichi Yotsuya

发明人： Shinichi Yotsuya

IPC分类号： H01L21/311

CPC分类号： H05B33/10

摘要： A mask includes a silicon member, and a portion defining an opening penetrating the silicon member; and the corner of the opening is rounded.

摘要翻译： 掩模包括硅构件和限定穿透硅构件的开口的部分; 开口的角落是圆形的。

公开(公告)号：US20070222367A1

公开(公告)日：2007-09-27

申请号：US11672389

申请日：2007-02-07

申请人： Toshiko Hosoda ,  Shinichi Yotsuya

发明人： Toshiko Hosoda ,  Shinichi Yotsuya

IPC分类号： H05B33/00 ,  H01L51/50 ,  B05D5/12

CPC分类号： H01L27/3213 ,  H01L27/3244

摘要： A process for producing an emissive device including a first emissive layer composed of a first material that emits light of a first color, a second emissive layer composed of a second material that emits light of a second color different from the first color, and a third emissive layer that emits light of a third color by stacking at least the first material and the second material, the third color being different from both of the first color and the second color, the process includes (1) feeding the first material to a side adjacent to a first face of at least one first electrode by a gas-phase process with a first mask to form films, the first mask having an opening for forming the first emissive layer and having an opening for forming the third emissive layer; (2) feeding the second material to the side adjacent to the first face of each first electrode by a gas-phase process to form the emissive layers while a second mask having an opening for forming the second emissive layer and having an opening for forming the third emissive layer is positioned in such a manner that the position of each film to be the third emissive layer is substantially identical to the position of the opening for forming the third emissive layer; and (3) forming a second electrode at a side of each emissive layer opposite the side adjacent to the first electrode.

摘要翻译： 一种发光装置的制造方法，其包括由发射第一颜色的光的第一材料构成的第一发光层，由发射不同于第一颜色的第二颜色的光的第二材料构成的第二发光层，以及第三发光层 至少通过堆叠第一材料和第二材料来发射第三颜色的光的发光层，第三颜色不同于第一颜色和第二颜色两者，该处理包括（1）将第一材料馈送到侧面 通过与第一掩模的气相工艺相邻于至少一个第一电极的第一面以形成膜，所述第一掩模具有用于形成第一发射层并具有用于形成第三发射层的开口的开口; （2）通过气相工艺将第二材料供给到与每个第一电极的第一面相邻的一侧，以形成发光层，而具有用于形成第二发射层的开口的第二掩模具有用于形成发光层的开口 第三发光层以这样的方式定位，使得作为第三发射层的每个膜的位置基本上与用于形成第三发射层的开口的位置相同; 和（3）在每个发光层的与第一电极相邻的一侧相反的一侧形成第二电极。

公开(公告)号：US20060160026A1

公开(公告)日：2006-07-20

申请号：US11326906

申请日：2006-01-06

申请人： Shinichi Yotsuya ,  Shinji Kanemaru

发明人： Shinichi Yotsuya ,  Shinji Kanemaru

IPC分类号： G03F7/00

CPC分类号： C23C14/042 ,  C23C16/042

摘要： A film forming device includes a mask member that is made of silicon and has first openings of predetermined patterns; a magnetic member that is made of a magnetic material and has a second opening, and that is aligned with the mask member so that the first openings are arranged in the second opening in plan view of the second opening; and a substrate holding member that generates magnetic force between the magnetic member and itself in order to adhere the mask member and a substrate to each other. The mask member and the substrate are interposed between the magnetic member and the substrate holding member in this order from the magnetic member.

摘要翻译： 成膜装置包括由硅制成并具有预定图案的第一开口的掩模构件; 磁性构件，其由磁性材料制成并具有第二开口，并且与所述掩模构件对准，使得所述第一开口在所述第二开口的平面图中布置在所述第二开口中; 以及基板保持构件，其在磁性构件和自身之间产生磁力，以便将掩模构件和基板彼此粘合。 掩模构件和基板从磁性构件依次插入在磁性构件和基板保持构件之间。

公开(公告)号：US20060077560A1

公开(公告)日：2006-04-13

申请号：US11286285

申请日：2005-11-25

申请人： Nobuo Shimizu ,  Shinichi Yotsuya ,  Hideto Yamashita ,  Masami Murata ,  Koichi Akiyama

发明人： Nobuo Shimizu ,  Shinichi Yotsuya ,  Hideto Yamashita ,  Masami Murata ,  Koichi Akiyama

IPC分类号： G02B3/00

CPC分类号： G02B3/0031 ,  B29D11/00278 ,  B29D11/00365 ,  G02B3/0012 ,  G02B3/0025 ,  G02B3/0056 ,  G02B3/0062 ,  G02B3/0068 ,  G02B3/0075

摘要： To provide a micro-lens substrate wherein a higher contrast ratio can be obtained when used in a liquid crystal panel and the like. A micro-lens substrate 1A includes a first substrate 2 with concaves for microlenses having a plurality of first concaves 31 and first aligment marks 71 formed on a first glass substrate 29, a second substrate 8 with concaves for microlenses having a plurality of second concaves 32 and second aligment marks 72 formed on a second glass substrate 89, a resin layer 9, microlenses 4 consisting of doulbe convex lenses formed of a resin filled in between the first and second concaves 31 and 32, and spacers 5.

摘要翻译： 提供一种当在液晶面板等中使用时能够获得较高的对比度的微透镜基板。 微透镜基板1A包括具有多个第一凹部31和形成在第一玻璃基板29上的第一分色标记71的微透镜用凹部的第一基板2，具有多个第二凹部的微透镜凹部的第二基板8 形成在第二玻璃基板89上的32和第二分色标记72，树脂层9，由填充在第一和第二凹部31和32之间的树脂形成的多孔凸透镜构成的微透镜4和间隔物5。

公开(公告)号：US20050282368A1

公开(公告)日：2005-12-22

申请号：US11113920

申请日：2005-04-25

申请人： Shinichi Yotsuya

发明人： Shinichi Yotsuya

IPC分类号： C23C14/04 ,  H01L21/425

CPC分类号： C23C14/042

摘要： A mask includes a first portion having an opening, a second portion disposed in the opening and surrounded by the opening, and a beam connecting the first portion to the second portion.

摘要翻译： 掩模包括具有开口的第一部分，设置在开口中并被开口包围的第二部分，以及将第一部分连接到第二部分的梁。

公开(公告)号：US06930021B2

公开(公告)日：2005-08-16

申请号：US10790219

申请日：2004-03-02

申请人： Shinichi Yotsuya

发明人： Shinichi Yotsuya

IPC分类号： H05B33/10 ,  C23C14/04 ,  H01L51/50 ,  H01L51/56 ,  H05B33/12 ,  H01L21/30 ,  H01L21/46

CPC分类号： C23C14/042 ,  H01L51/56 ,  Y10S438/942

摘要： A method of manufacturing a mask includes: attaching a second substrate having a plurality of penetrating holes to a first substrate having an opening. The second substrate is attached such that the penetrating holes are positioned within the opening. A groove is formed on a surface of the first substrate facing the second substrate. The groove is utilized to form a flow path between the first and second substrates.

摘要翻译： 制造掩模的方法包括：将具有多个穿透孔的第二基板附接到具有开口的第一基板。 第二基板被安装成使得穿透孔位于开口内。 在面向第二基板的第一基板的表面上形成凹槽。 凹槽用于在第一和第二基板之间形成流动路径。

公开(公告)号：US20050136668A1

公开(公告)日：2005-06-23

申请号：US11016516

申请日：2004-12-17

申请人： Shinichi Yotsuya

发明人： Shinichi Yotsuya

IPC分类号： H05B33/10 ,  C23C14/04 ,  C23C14/12 ,  H01L51/00 ,  H01L51/50 ,  H01L21/00 ,  H01L21/332 ,  H01L21/461

CPC分类号： H01L51/0011 ,  C23C14/042 ,  C23C14/12 ,  G03F1/20 ,  H01L51/001 ,  H01L51/56

摘要： A mask is provided including a plurality of through-holes penetrating a silicon substrate with (100) orientation. The walls defining the through-holes include a vertical part and an inclined part. The vertical part extends in a vertical direction relative to a principal plane of the substrate, and the inclined part extends in a predetermined oblique angle from the vertical part.

摘要翻译： 提供一种掩模，其包括穿过具有（100）取向的硅衬底的多个通孔。 限定通孔的壁包括垂直部分和倾斜部分。 垂直部分相对于基板的主平面在垂直方向上延伸，并且倾斜部分从垂直部分以预定的倾斜角度延伸。

公开(公告)号：US20050051516A1

公开(公告)日：2005-03-10

申请号：US10939381

申请日：2004-09-14

申请人： Shinichi Yotsuya

发明人： Shinichi Yotsuya

IPC分类号： H05B33/10 ,  C23C14/04 ,  C30B33/00 ,  G03F1/20 ,  G03F7/12 ,  H01L51/50 ,  H01L51/56 ,  H05B33/12 ,  C23F1/00

CPC分类号： C30B33/00 ,  G03F1/20 ,  G03F7/12 ,  H01L51/56

摘要： A mask has a monocrystal substrate having opposite surfaces which are planes having Miller indices {110}. A plurality of penetrating holes are formed in the monocrystal substrate. An opening shape of each of the penetrating holes is a polygon and each side of the polygon is parallel with a plane in a group of the {111} planes. The wall surfaces of the penetrating holes are the {111} planes. In the method of manufacturing a mask, openings are formed in the etching resistant film corresponding to the shape of the penetrating holes and the monocrystal substrate is etched.

摘要翻译： 掩模具有具有相反表面的单晶基板，其是具有米勒指数{110}的平面。 在单晶衬底中形成多个穿透孔。 每个穿透孔的开口形状是多边形，并且多边形的每一侧与{111}平面的一组中的平面平行。 穿透孔的壁面是{111}面。 在制造掩模的方法中，在耐腐蚀膜中形成与穿透孔的形状相对应的开口，并蚀刻单晶基板。