公开(公告)号：US08613985B2

公开(公告)日：2013-12-24

申请号：US13557703

申请日：2012-07-25

申请人： Yukio Kizaki ,  Hajime Yamaguchi ,  Yuko Kizu ,  Masao Tanaka ,  Akiko Hirao

发明人： Yukio Kizaki ,  Hajime Yamaguchi ,  Yuko Kizu ,  Masao Tanaka ,  Akiko Hirao

IPC分类号： C09K19/38 ,  C09K19/54 ,  C09K19/20 ,  G02F1/1334

CPC分类号： C09K19/0275 ,  C09K19/38 ,  C09K19/586 ,  C09K2019/0418 ,  G02F2001/13793

摘要： According to one embodiment, a liquid crystal/polymer complex includes a liquid crystal material, a polymer, and a chiral agent. The liquid crystal material exhibits blue phase and contains liquid crystal molecules that are spirally arranged to form liquid crystal molecular cylinders having a spiral arrangement. The polymer maintains the arrangement and has a dendrimer-type structure including a dendrimer unit and a polymerizable unit bonded to an end of the dendrimer unit. The dendrimer unit contains a central atom and at least two branched structures bonded to the central atom and has a generation of two or more. The polymerizable unit contains a polymerizable group which can bond to a polymerizable group.

摘要翻译： 根据一个实施方案，液晶/聚合物复合物包括液晶材料，聚合物和手性试剂。 液晶材料呈现蓝相，并含有螺旋状排列形成具有螺旋配置的液晶分子柱的液晶分子。 聚合物维持该布置，并且具有包括树枝状大分子单元和结合到树枝状聚合单元的末端的可聚合单元的树枝状聚合物型结构。 树枝状大分子单元包含中心原子和至少两个结合到中心原子的分支结构并具有两个或多个的一代。 可聚合单元包含可以与可聚合基团结合的可聚合基团。

公开(公告)号：US4822716A

公开(公告)日：1989-04-18

申请号：US938874

申请日：1986-12-08

申请人： Yasunobu Onishi ,  Shuji Hayase ,  Rumiko Horiguchi ,  Akiko Hirao

发明人： Yasunobu Onishi ,  Shuji Hayase ,  Rumiko Horiguchi ,  Akiko Hirao

IPC分类号： C08G77/14 ,  C08G77/26 ,  C08G77/48 ,  C08G77/60 ,  C08L83/16 ,  G03F7/075 ,  G03C1/52

CPC分类号： C08L83/16 ,  C08G77/14 ,  C08G77/26 ,  C08G77/48 ,  C08G77/60 ,  G03F7/0754 ,  G03F7/0757

摘要： The polysilanes and polysiloxanes of the present invention are polymers that contain silicon in the principal chain, and contain in the side chains alkaline soluble groups such as phenol-based hydroxy group and carboxyl group.One silicone resist material of the present invention comprises the polysilane or the polysiloxane in the above.Another silicone resist material of the present invention contains the above polysilane or polysiloxane, and an appropriate photosensitive agent.Still another silicone resist material of the present invention does not contain the above photosensitive agent, and in its stead, it contains a group that possesses photosensitive to ultraviolet rays or the like, via a siloxane bonding in the principal chain. As a substance with such photosensitivity, one may mention, for example, o-nitrobenzylsilyl groups that presents alkaline solubility when it is irradiated by ultraviolet rays.Accordingly, the silicone resist materials of the present invention, especially the second and third silicone resist materials, are alkaline developable, and also possess a superior resistance to oxygen plasma. Therefore, they can be used as a top layer film in the two-layered resist system, making it possible to form very fine resist patterns, fast and with a minimum number of processing steps.

摘要翻译： 本发明的聚硅烷和聚硅氧烷是在主链中含有硅并且在侧链中含有碱性可溶性基团如苯酚基羟基和羧基的聚合物。 本发明的一种硅氧烷抗蚀剂材料包含上述聚硅烷或聚硅氧烷。 本发明的另一种硅氧烷抗蚀剂材料含有上述聚硅烷或聚硅氧烷和适当的感光剂。 本发明的另一种硅氧烷抗蚀剂材料不含上述光敏剂，代替其中含有通过主链中的硅氧烷键具有紫外线等感光性的基团。 作为具有这种光敏性的物质，可以提及例如当用紫外线照射时呈现碱溶性的邻硝基苄基甲硅烷基。 因此，本发明的有机硅抗蚀剂材料，特别是第二和第三有机硅抗蚀剂材料是碱显影的，并且还具有优异的耐氧等离子体性。 因此，它们可以用作双层抗蚀剂系统中的顶层膜，使得可以形成非常精细的抗蚀剂图案，并且具有最少数量的加工步骤。

公开(公告)号：US08580403B2

公开(公告)日：2013-11-12

申请号：US13224906

申请日：2011-09-02

申请人： Yukitami Mizuno ,  Isao Amemiya ,  Akiko Hirao ,  Isao Takasu ,  Tomoko Sugizaki ,  Akio Amano ,  Yasushi Shinjo ,  Tomoaki Sawabe ,  Shintaro Enomoto

发明人： Yukitami Mizuno ,  Isao Amemiya ,  Akiko Hirao ,  Isao Takasu ,  Tomoko Sugizaki ,  Akio Amano ,  Yasushi Shinjo ,  Tomoaki Sawabe ,  Shintaro Enomoto

IPC分类号： H01L51/54

CPC分类号： H01L51/004 ,  H01L51/5016

摘要： According to one embodiment, there is provided an organic light-emitting diode including an anode and a cathode which are arranged apart from each other, and an emissive layer interposed between the anode and the cathode and including a host material and an emitting dopant. The host material includes a polymer containing dibenzothiophene backbones represented by the following formula (1) as repeating units: wherein n is an integer of from 20 to 10,000.

摘要翻译： 根据一个实施例，提供了包括彼此分开布置的阳极和阴极的有机发光二极管以及插在阳极和阴极之间并包括主体材料和发射掺杂剂的发光层。 主体材料包括含有由下式（1）表示的二苯并噻吩主链作为重复单元的聚合物：其中n为20至10,000的整数。

公开(公告)号：US20120214272A1

公开(公告)日：2012-08-23

申请号：US13231453

申请日：2011-09-13

申请人： Tsukasa Azuma ,  Ikuo Yoneda ,  Akiko Mimotogi ,  Ryoichi Inanami ,  Mitsunaga Saito ,  Hiroki Iwanaga ,  Akiko Hirao

发明人： Tsukasa Azuma ,  Ikuo Yoneda ,  Akiko Mimotogi ,  Ryoichi Inanami ,  Mitsunaga Saito ,  Hiroki Iwanaga ,  Akiko Hirao

IPC分类号： H01L31/18

CPC分类号： H01L51/0024 ,  H01L51/42 ,  Y02E10/549 ,  Y02P70/521

摘要： Certain embodiments provide a method of manufacturing an organic thin film solar cell comprising forming, on a first electrode, a first transport layer having an uneven pattern and a photoelectric conversion layer provided on a surface of the uneven pattern, forming a second transport layer on a second electrode, and bringing the uneven pattern having the photoelectric conversion layer is formed thereon into contact with the second transport layer to mold the second transport layer.

摘要翻译： 某些实施方案提供一种制造有机薄膜太阳能电池的方法，包括在第一电极上形成具有不均匀图案的第一传输层和设置在不均匀图案的表面上的光电转换层，在第一电极上形成第二传输层 第二电极，并且使具有光电转换层的不均匀图案形成在其上与第二传输层接触以模制第二传输层。

公开(公告)号：US20120228585A1

公开(公告)日：2012-09-13

申请号：US13224906

申请日：2011-09-02

申请人： Yukitami Mizuno ,  Isao Amemiya ,  Akiko Hirao ,  Isao Takasu ,  Tomoko Sugizaki ,  Akio Amano ,  Yasushi Shinjo ,  Tomoaki Sawabe ,  Shintaro Enomoto

发明人： Yukitami Mizuno ,  Isao Amemiya ,  Akiko Hirao ,  Isao Takasu ,  Tomoko Sugizaki ,  Akio Amano ,  Yasushi Shinjo ,  Tomoaki Sawabe ,  Shintaro Enomoto

IPC分类号： H01L51/54

CPC分类号： H01L51/004 ,  H01L51/5016

摘要： According to one embodiment, there is provided an organic light-emitting diode including an anode and a cathode which are arranged apart from each other, and an emissive layer interposed between the anode and the cathode and including a host material and an emitting dopant. The host material includes a polymer containing dibenzothiophene backbones represented by the following formula (1) as repeating units: wherein n is an integer of from 20 to 10,000.

摘要翻译： 根据一个实施例，提供了包括彼此分开布置的阳极和阴极的有机发光二极管以及插在阳极和阴极之间并包括主体材料和发射掺杂剂的发光层。 主体材料包括含有由下式（1）表示的二苯并噻吩主链作为重复单元的聚合物：其中n为20至10,000的整数。

公开(公告)号：US20120307184A1

公开(公告)日：2012-12-06

申请号：US13557703

申请日：2012-07-25

申请人： Yukio KIZAKI ,  Hajime Yamaguchi ,  Yuko Kizu ,  Masao Tanaka ,  Akiko Hirao

发明人： Yukio KIZAKI ,  Hajime Yamaguchi ,  Yuko Kizu ,  Masao Tanaka ,  Akiko Hirao

IPC分类号： C09K19/56 ,  G02F1/1333 ,  B82Y30/00 ,  B82Y40/00

CPC分类号： C09K19/0275 ,  C09K19/38 ,  C09K19/586 ,  C09K2019/0418 ,  G02F2001/13793

摘要： According to one embodiment, a liquid crystal/polymer complex includes a liquid crystal material, a polymer, and a chiral agent. The liquid crystal material exhibits blue phase and contains liquid crystal molecules that are spirally arranged to form liquid crystal molecular cylinders having a spiral arrangement. The polymer maintains the arrangement and has a dendrimer-type structure including a dendrimer unit and a polymerizable unit bonded to an end of the dendrimer unit. The dendrimer unit contains a central atom and at least two branched structures bonded to the central atom and has a generation of two or more. The polymerizable unit contains a polymerizable group which can bond to a polymerizable group.

摘要翻译： 根据一个实施方案，液晶/聚合物复合物包括液晶材料，聚合物和手性试剂。 液晶材料呈现蓝相，并含有螺旋状排列形成具有螺旋配置的液晶分子柱的液晶分子。 聚合物维持该布置，并且具有包括树枝状大分子单元和结合到树枝状聚合单元的末端的可聚合单元的树枝状聚合物型结构。 树枝状大分子单元包含中心原子和至少两个结合到中心原子的分支结构并具有两个或多个的一代。 可聚合单元包含可以与可聚合基团结合的可聚合基团。

公开(公告)号：US5198520A

公开(公告)日：1993-03-30

申请号：US673185

申请日：1991-03-21

申请人： Yasunobu Onishi ,  Shuji Hayase ,  Rumiko Horiguchi ,  Akiko Hirao

发明人： Yasunobu Onishi ,  Shuji Hayase ,  Rumiko Horiguchi ,  Akiko Hirao

IPC分类号： C08G77/14 ,  C08G77/26 ,  C08G77/48 ,  C08G77/60 ,  C08L83/16 ,  G03F7/075

CPC分类号： G03F7/0754 ,  C08G77/14 ,  C08G77/26 ,  C08G77/48 ,  C08G77/60 ,  C08L83/16 ,  G03F7/0757

摘要： The polysilanes and polysiloxanes of the present invention are polymers that contain silicon in the principal chain, and contain in the side chains alkaline soluble groups such as phenol-based hydroxy group and carboxyl group.One silicone resist material of the present invention comprises the polysilane or the polysiloxane in the above.Another silicone resist material of the present invention contains the above polysilane or polysiloxane, and an appropriate photosensitive agent.Still another silicone resist material of the present invention does not contain the above photosensitive agent, and in its stead, it contains a group that possesses photosensitive to ultraviolet rays or the like, via a siloxane bonding in the principal chain. As a substance with such photosensitivity, one may mention, for example, o-nitrobenzylsilyl groups that presents alkaline solubility when it is irradiated by ultraviolet rays.Accordingly, the silicone resist materials of the present invention, especially the second and third silicone resist materials, are alkaline developable, and also possess a superior resistance to oxygen plasma. Therefore, they can be used as a top layer film in the two-layered resist system, making it possible to form very fine resist patterns, fast and with a minimum number of processing steps.

摘要翻译： 本发明的聚硅烷和聚硅氧烷是在主链中含有硅并且在侧链中含有碱性可溶性基团如苯酚基羟基和羧基的聚合物。 本发明的一种硅氧烷抗蚀剂材料包含上述聚硅烷或聚硅氧烷。 本发明的另一种硅氧烷抗蚀剂材料含有上述聚硅烷或聚硅氧烷和适当的感光剂。 本发明的另一种硅氧烷抗蚀剂材料不含上述光敏剂，代替其中含有通过主链中的硅氧烷键具有紫外线等感光性的基团。 作为具有这种光敏性的物质，可以提及例如当用紫外线照射时呈现碱溶性的邻硝基苄基甲硅烷基。 因此，本发明的有机硅抗蚀剂材料，特别是第二和第三有机硅抗蚀剂材料是碱显影的，并且还具有优异的耐氧等离子体性。 因此，它们可以用作双层抗蚀剂系统中的顶层膜，使得可以形成非常精细的抗蚀剂图案，并且具有最少数量的加工步骤。

公开(公告)号：US5017453A

公开(公告)日：1991-05-21

申请号：US304231

申请日：1989-01-31

申请人： Yasunobu Onishi ,  Shuji Hayase ,  Rumiko Horiguchi ,  Akiko Hirao

发明人： Yasunobu Onishi ,  Shuji Hayase ,  Rumiko Horiguchi ,  Akiko Hirao

IPC分类号： C08G77/14 ,  C08G77/26 ,  C08G77/48 ,  C08G77/60 ,  C08L83/16 ,  G03F7/075

CPC分类号： C08L83/16 ,  C08G77/14 ,  C08G77/26 ,  C08G77/48 ,  C08G77/60 ,  G03F7/0754 ,  G03F7/0757

摘要： The polysilanes and polysiloxanes of the present invention are polymers that contain silicon in the principal chain, and contain in the side chains alkaline soluble groups such as phenol-based hydroxy group and carboxyl group.One silicone resist material of the present invention comprises the polysilane or the polysiloxane in the above.Another silicone resist material of the present invention contains the above polysilane or polysiloxane, and an appropriate photosensitive agent.Still another silicone resist material of the present invention does not contain the above photosensitive agent, and in its stead, it contains a group that possesses photosensitive to ultraviolet rays or the like, via a siloxane bonding in the principal chain. As a substance with such photosensitivity, one may mention, for example, o-nitrogenzylsilyl groups that presents alkaline solubility when it is irradiated by ultraviolet rays.Accordingly, the silicone resist materials of the present invention, especially the second and third silicone resist materials, are alkaline developable, and also possess a superior resistance to oxygen plasma. Therefore, they can be used as a top layer film in the two-layered resist system, making it possible to form very fine resist patterns, fast and with a minimum number of processing steps.