公开(公告)号：US4822716A

公开(公告)日：1989-04-18

申请号：US938874

申请日：1986-12-08

申请人： Yasunobu Onishi ,  Shuji Hayase ,  Rumiko Horiguchi ,  Akiko Hirao

发明人： Yasunobu Onishi ,  Shuji Hayase ,  Rumiko Horiguchi ,  Akiko Hirao

IPC分类号： C08G77/14 ,  C08G77/26 ,  C08G77/48 ,  C08G77/60 ,  C08L83/16 ,  G03F7/075 ,  G03C1/52

CPC分类号： C08L83/16 ,  C08G77/14 ,  C08G77/26 ,  C08G77/48 ,  C08G77/60 ,  G03F7/0754 ,  G03F7/0757

摘要： The polysilanes and polysiloxanes of the present invention are polymers that contain silicon in the principal chain, and contain in the side chains alkaline soluble groups such as phenol-based hydroxy group and carboxyl group.One silicone resist material of the present invention comprises the polysilane or the polysiloxane in the above.Another silicone resist material of the present invention contains the above polysilane or polysiloxane, and an appropriate photosensitive agent.Still another silicone resist material of the present invention does not contain the above photosensitive agent, and in its stead, it contains a group that possesses photosensitive to ultraviolet rays or the like, via a siloxane bonding in the principal chain. As a substance with such photosensitivity, one may mention, for example, o-nitrobenzylsilyl groups that presents alkaline solubility when it is irradiated by ultraviolet rays.Accordingly, the silicone resist materials of the present invention, especially the second and third silicone resist materials, are alkaline developable, and also possess a superior resistance to oxygen plasma. Therefore, they can be used as a top layer film in the two-layered resist system, making it possible to form very fine resist patterns, fast and with a minimum number of processing steps.

摘要翻译： 本发明的聚硅烷和聚硅氧烷是在主链中含有硅并且在侧链中含有碱性可溶性基团如苯酚基羟基和羧基的聚合物。 本发明的一种硅氧烷抗蚀剂材料包含上述聚硅烷或聚硅氧烷。 本发明的另一种硅氧烷抗蚀剂材料含有上述聚硅烷或聚硅氧烷和适当的感光剂。 本发明的另一种硅氧烷抗蚀剂材料不含上述光敏剂，代替其中含有通过主链中的硅氧烷键具有紫外线等感光性的基团。 作为具有这种光敏性的物质，可以提及例如当用紫外线照射时呈现碱溶性的邻硝基苄基甲硅烷基。 因此，本发明的有机硅抗蚀剂材料，特别是第二和第三有机硅抗蚀剂材料是碱显影的，并且还具有优异的耐氧等离子体性。 因此，它们可以用作双层抗蚀剂系统中的顶层膜，使得可以形成非常精细的抗蚀剂图案，并且具有最少数量的加工步骤。

公开(公告)号：US5198520A

公开(公告)日：1993-03-30

申请号：US673185

申请日：1991-03-21

申请人： Yasunobu Onishi ,  Shuji Hayase ,  Rumiko Horiguchi ,  Akiko Hirao

发明人： Yasunobu Onishi ,  Shuji Hayase ,  Rumiko Horiguchi ,  Akiko Hirao

IPC分类号： C08G77/14 ,  C08G77/26 ,  C08G77/48 ,  C08G77/60 ,  C08L83/16 ,  G03F7/075

CPC分类号： G03F7/0754 ,  C08G77/14 ,  C08G77/26 ,  C08G77/48 ,  C08G77/60 ,  C08L83/16 ,  G03F7/0757

摘要： The polysilanes and polysiloxanes of the present invention are polymers that contain silicon in the principal chain, and contain in the side chains alkaline soluble groups such as phenol-based hydroxy group and carboxyl group.One silicone resist material of the present invention comprises the polysilane or the polysiloxane in the above.Another silicone resist material of the present invention contains the above polysilane or polysiloxane, and an appropriate photosensitive agent.Still another silicone resist material of the present invention does not contain the above photosensitive agent, and in its stead, it contains a group that possesses photosensitive to ultraviolet rays or the like, via a siloxane bonding in the principal chain. As a substance with such photosensitivity, one may mention, for example, o-nitrobenzylsilyl groups that presents alkaline solubility when it is irradiated by ultraviolet rays.Accordingly, the silicone resist materials of the present invention, especially the second and third silicone resist materials, are alkaline developable, and also possess a superior resistance to oxygen plasma. Therefore, they can be used as a top layer film in the two-layered resist system, making it possible to form very fine resist patterns, fast and with a minimum number of processing steps.

摘要翻译： 本发明的聚硅烷和聚硅氧烷是在主链中含有硅并且在侧链中含有碱性可溶性基团如苯酚基羟基和羧基的聚合物。 本发明的一种硅氧烷抗蚀剂材料包含上述聚硅烷或聚硅氧烷。 本发明的另一种硅氧烷抗蚀剂材料含有上述聚硅烷或聚硅氧烷和适当的感光剂。 本发明的另一种硅氧烷抗蚀剂材料不含上述光敏剂，代替其中含有通过主链中的硅氧烷键具有紫外线等感光性的基团。 作为具有这种光敏性的物质，可以提及例如当用紫外线照射时呈现碱溶性的邻硝基苄基甲硅烷基。 因此，本发明的有机硅抗蚀剂材料，特别是第二和第三有机硅抗蚀剂材料是碱显影的，并且还具有优异的耐氧等离子体性。 因此，它们可以用作双层抗蚀剂系统中的顶层膜，使得可以形成非常精细的抗蚀剂图案，并且具有最少数量的加工步骤。

公开(公告)号：US5017453A

公开(公告)日：1991-05-21

申请号：US304231

申请日：1989-01-31

申请人： Yasunobu Onishi ,  Shuji Hayase ,  Rumiko Horiguchi ,  Akiko Hirao

发明人： Yasunobu Onishi ,  Shuji Hayase ,  Rumiko Horiguchi ,  Akiko Hirao

IPC分类号： C08G77/14 ,  C08G77/26 ,  C08G77/48 ,  C08G77/60 ,  C08L83/16 ,  G03F7/075

CPC分类号： C08L83/16 ,  C08G77/14 ,  C08G77/26 ,  C08G77/48 ,  C08G77/60 ,  G03F7/0754 ,  G03F7/0757

摘要： The polysilanes and polysiloxanes of the present invention are polymers that contain silicon in the principal chain, and contain in the side chains alkaline soluble groups such as phenol-based hydroxy group and carboxyl group.One silicone resist material of the present invention comprises the polysilane or the polysiloxane in the above.Another silicone resist material of the present invention contains the above polysilane or polysiloxane, and an appropriate photosensitive agent.Still another silicone resist material of the present invention does not contain the above photosensitive agent, and in its stead, it contains a group that possesses photosensitive to ultraviolet rays or the like, via a siloxane bonding in the principal chain. As a substance with such photosensitivity, one may mention, for example, o-nitrogenzylsilyl groups that presents alkaline solubility when it is irradiated by ultraviolet rays.Accordingly, the silicone resist materials of the present invention, especially the second and third silicone resist materials, are alkaline developable, and also possess a superior resistance to oxygen plasma. Therefore, they can be used as a top layer film in the two-layered resist system, making it possible to form very fine resist patterns, fast and with a minimum number of processing steps.

公开(公告)号：US08613985B2

公开(公告)日：2013-12-24

申请号：US13557703

申请日：2012-07-25

申请人： Yukio Kizaki ,  Hajime Yamaguchi ,  Yuko Kizu ,  Masao Tanaka ,  Akiko Hirao

发明人： Yukio Kizaki ,  Hajime Yamaguchi ,  Yuko Kizu ,  Masao Tanaka ,  Akiko Hirao

IPC分类号： C09K19/38 ,  C09K19/54 ,  C09K19/20 ,  G02F1/1334

CPC分类号： C09K19/0275 ,  C09K19/38 ,  C09K19/586 ,  C09K2019/0418 ,  G02F2001/13793

摘要： According to one embodiment, a liquid crystal/polymer complex includes a liquid crystal material, a polymer, and a chiral agent. The liquid crystal material exhibits blue phase and contains liquid crystal molecules that are spirally arranged to form liquid crystal molecular cylinders having a spiral arrangement. The polymer maintains the arrangement and has a dendrimer-type structure including a dendrimer unit and a polymerizable unit bonded to an end of the dendrimer unit. The dendrimer unit contains a central atom and at least two branched structures bonded to the central atom and has a generation of two or more. The polymerizable unit contains a polymerizable group which can bond to a polymerizable group.

摘要翻译： 根据一个实施方案，液晶/聚合物复合物包括液晶材料，聚合物和手性试剂。 液晶材料呈现蓝相，并含有螺旋状排列形成具有螺旋配置的液晶分子柱的液晶分子。 聚合物维持该布置，并且具有包括树枝状大分子单元和结合到树枝状聚合单元的末端的可聚合单元的树枝状聚合物型结构。 树枝状大分子单元包含中心原子和至少两个结合到中心原子的分支结构并具有两个或多个的一代。 可聚合单元包含可以与可聚合基团结合的可聚合基团。

公开(公告)号：US07593304B2

公开(公告)日：2009-09-22

申请号：US11209800

申请日：2005-08-24

申请人： Kazuki Matsumoto ,  Akiko Hirao ,  Rumiko Hayase ,  Takayuki Tsukamoto

发明人： Kazuki Matsumoto ,  Akiko Hirao ,  Rumiko Hayase ,  Takayuki Tsukamoto

IPC分类号： G11B7/00

CPC分类号： G11B7/128 ,  G11B7/0065 ,  G11B7/083

摘要： A hologram recording/reproducing apparatus includes a recording/reproducing optical system that guides at least one of an information beam and a reference beam to an optical recording medium; a spatial light modulator that is arranged in an optical path of the recording/reproducing optical system, and spatially modulates a beam guided via the recording/reproducing optical system to generate the information beam; a first misalignment detecting unit that detects a first misalignment between the recording/reproducing optical system and the spatial light modulator using a beam for detecting the first misalignment; and a first misalignment correcting unit that corrects the first misalignment based on the first misalignment detected by the first misalignment detecting unit.

摘要翻译： 一种全息记录/重放装置，包括将信息光束和参考光束中的至少一个引导至光学记录介质的记录/再现光学系统; 布置在记录/再现光学系统的光路中的空间光调制器，并且空间调制经由记录/再现光学系统引导的光束以产生信息光束; 第一未对准检测单元，使用用于检测第一未对准的光束来检测记录/再现光学系统和空间光调制器之间的第一未对准; 以及第一未对准校正单元，其基于由第一未对准检测单元检测到的第一未对准来校正第一未对准。

公开(公告)号：US20090226822A1

公开(公告)日：2009-09-10

申请号：US12369573

申请日：2009-02-11

申请人： Norikatsu SASAO ,  Akiko Hirao ,  Rumiko Hayase ,  Satoshi Mikoshiba ,  Kazuki Matsumoto ,  Takahiro Kamikawa ,  Masahiro Kanamaru

发明人： Norikatsu SASAO ,  Akiko Hirao ,  Rumiko Hayase ,  Satoshi Mikoshiba ,  Kazuki Matsumoto ,  Takahiro Kamikawa ,  Masahiro Kanamaru

IPC分类号： G03F7/004

CPC分类号： G03F7/001 ,  G03F7/033 ,  G03F7/0382 ,  G03F7/0388

摘要： A holographic recording medium is provided, which includes a recording layer including a radically polymerizable monomer having an ethylenically unsaturated bond, a photo-acid generator, a photo-radical polymerization initiator, and a polymeric matrix. The polymeric matrix includes a repeating unit expressed by any one of the following chemical formulae.

摘要翻译： 提供一种全息记录介质，其包括包含具有烯属不饱和键的自由基聚合单体，光酸发生剂，光自由基聚合引发剂和聚合物基质的记录层。 聚合物基质包括由以下化学式中的任何一种表示的重复单元。

公开(公告)号：US07545729B2

公开(公告)日：2009-06-09

申请号：US11674506

申请日：2007-02-13

申请人： Yuichiro Yamamoto ,  Shinichi Tatsuta ,  Yuji Kubota ,  Akiko Hirao ,  Kazuki Matsumoto

发明人： Yuichiro Yamamoto ,  Shinichi Tatsuta ,  Yuji Kubota ,  Akiko Hirao ,  Kazuki Matsumoto

IPC分类号： G11B7/24

CPC分类号： G11B7/0065 ,  G11B7/00781 ,  G11B7/083 ,  G11B7/126 ,  G11B7/131 ,  G11B7/1353 ,  G11B7/1362 ,  G11B7/1374

摘要： An optical-information recording medium includes a substrate that includes a servo surface; an information recording layer laminated on the servo surface of the substrate capable of recording information as a hologram produced by interference between an information beam containing the information and a reference beam; a tracking servo area that is formed in a track direction on the servo surface, and that records therein tracking information for tracking servo control; and a following up servo area that is formed in the track direction on the servo surface, and that is to be irradiated by a beam emitted from an optical-information recording apparatus for recording the information in the information recording layer so as to make the beam follow a rotation of the optical-information recording medium.

摘要翻译： 光信息记录介质包括：包括伺服表面的基板; 层叠在基板的伺服表面上的信息记录层，其能够记录由包含信息的信息光束和参考光束之间的干涉而产生的全息图的信息; 跟踪伺服区域，其在伺服表面上沿轨道方向形成，并且在其中记录用于跟踪伺服控制的跟踪信息; 以及在伺服表面上沿轨道方向形成的后跟伺服区域，并且由从用于将信息记录在信息记录层中的光信息记录装置发射的光束照射以使光束 遵循光学信息记录介质的旋转。

公开(公告)号：US20070201339A1

公开(公告)日：2007-08-30

申请号：US11680334

申请日：2007-02-28

申请人： Akiko Yaoita ,  Kazuki Matsumoto ,  Akiko Hirao ,  Shinichi Tatsuta

发明人： Akiko Yaoita ,  Kazuki Matsumoto ,  Akiko Hirao ,  Shinichi Tatsuta

IPC分类号： G11B7/00

CPC分类号： G11B7/0065 ,  G11B7/083 ,  G11B7/0938 ,  G11B7/126 ,  G11B7/128 ,  G11B7/1398 ,  G11B7/24044

摘要： An optical disk recording apparatus and method utilize a recording beam source, a spatial light modulator that modulates a recording radiation beam into an information beam carrying information and a reference beam, a focusing unit that focuses the information beam and the reference beam on an information recording layer, an image sensing device that detects the intensity distribution of the information beam, and a control unit. The control unit controls the spatial light modulator on the basis of the intensity distribution detected by the image sensing device. A recording/reproducing apparatus can check the amount of information capable of being recorded onto an optical disk, and an optical disk therefor.

摘要翻译： 光盘记录装置和方法利用记录光束源，将记录辐射束调制成携带信息的信息光束和参考光束的空间光调制器，将信息光束和参考光束聚焦在信息记录上的聚焦单元 层，用于检测信息光束的强度分布的图像感测装置，以及控制单元。 控制单元基于由图像感测装置检测的强度分布来控制空间光调制器。 记录/再现装置可以检查能够记录到光盘上的信息量以及用于其的光盘。

公开(公告)号：US07061852B2

公开(公告)日：2006-06-13

申请号：US09956972

申请日：2001-09-21

申请人： Takayuki Tsukamoto ,  Kazuki Matsumoto ,  Hideyuki Nishizawa ,  Akiko Hirao

发明人： Takayuki Tsukamoto ,  Kazuki Matsumoto ,  Hideyuki Nishizawa ,  Akiko Hirao

IPC分类号： G11B7/00

CPC分类号： G11B7/1353 ,  G11B7/0065 ,  G11B7/09 ,  G11B7/127

摘要： A recording apparatus for holographic recording medium having an alignment mark and designed to irradiate a recording light beam onto a recording region of holographic recording medium to record information as a hologram. This apparatus comprises a recording laser recording the hologram onto the medium, an alignment laser irradiating an alignment light beam onto the medium, the alignment light beam being less absorbed than the recording light beam by the medium, and being reflected by the medium, a first lens converging the recording light beam and directing it toward the medium, a second lens converging the alignment light beam and directing it toward the medium, a photodetector detecting a light intensity of the alignment light beam reflected from the medium to recognize the alignment mark, and a driving mechanism adjusting a region to be irradiated with the recording light beam relative to the medium based on the alignment mark.

摘要翻译： 一种用于全息记录介质的记录装置，具有对准标记并被设计成将记录光束照射到全息记录介质的记录区上以记录信息作为全息图。 该装置包括将全息图记录到介质上的记录激光器，将对准光束照射到介质上的对准激光器，对准光束被介质吸收的比记录光束更少，并被介质反射，第一 记录光束会聚并将其引向介质，第二透镜会聚对准光束并将其引向介质;光电检测器，检测从介质反射的对准光束的光强度以识别对准标记;以及 基于对准标记调节相对于介质照射记录光束的区域的驱动机构。

公开(公告)号：US20050002311A1

公开(公告)日：2005-01-06

申请号：US10835614

申请日：2004-04-30

申请人： Katsutaro Ichihara ,  Urara Ichihara ,  Akiko Hirao ,  Kazuki Matsumoto

发明人： Katsutaro Ichihara ,  Urara Ichihara ,  Akiko Hirao ,  Kazuki Matsumoto

IPC分类号： G03H1/18 ,  G03H1/22 ,  G11B7/00 ,  G11B7/0065 ,  G11B7/007 ,  G11B7/09 ,  G11B7/135 ,  G11B7/24

CPC分类号： G11B7/00781 ,  G11B7/0065 ,  G11B7/0938 ,  G11B7/24079

摘要： A hologram recording medium has a transparent substrate having an incidence surface, on which a write beam and a reference beam are made incident, and a servo surface opposite to the incidence surface, the servo surface including a header section and a data section, a reflecting layer formed on the servo surface of the transparent substrate, and a hologram recording layer provided on the incidence surface of the transparent substrate, the servo surface having intermittent tracking grooves in the data section except for recording positions, and a width of the tracking grooves being set at a value to less than an e−2 diameter of the reference beam.

摘要翻译： 全息记录介质具有透明基板，具有写入光束和参考光束入射的入射面和与该入射面相反的伺服面，该伺服面包括标题部和数据部，反射 形成在所述透明基板的伺服面上的层，以及设置在所述透明基板的入射面上的所述全息图记录层，所述伺服面在所述数据部中除了记录位置之外具有间歇跟踪槽，所述跟踪槽的宽度为 设置为小于参考光束的e <-2>直径的值。