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公开(公告)号：US20120214272A1
公开(公告)日：2012-08-23
申请号：US13231453
申请日：2011-09-13
申请人： Tsukasa Azuma , Ikuo Yoneda , Akiko Mimotogi , Ryoichi Inanami , Mitsunaga Saito , Hiroki Iwanaga , Akiko Hirao
发明人： Tsukasa Azuma , Ikuo Yoneda , Akiko Mimotogi , Ryoichi Inanami , Mitsunaga Saito , Hiroki Iwanaga , Akiko Hirao
IPC分类号： H01L31/18
CPC分类号： H01L51/0024 , H01L51/42 , Y02E10/549 , Y02P70/521
摘要： Certain embodiments provide a method of manufacturing an organic thin film solar cell comprising forming, on a first electrode, a first transport layer having an uneven pattern and a photoelectric conversion layer provided on a surface of the uneven pattern, forming a second transport layer on a second electrode, and bringing the uneven pattern having the photoelectric conversion layer is formed thereon into contact with the second transport layer to mold the second transport layer.
摘要翻译： 某些实施方案提供一种制造有机薄膜太阳能电池的方法，包括在第一电极上形成具有不均匀图案的第一传输层和设置在不均匀图案的表面上的光电转换层，在第一电极上形成第二传输层 第二电极，并且使具有光电转换层的不均匀图案形成在其上与第二传输层接触以模制第二传输层。
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公开(公告)号：US20120068372A1
公开(公告)日：2012-03-22
申请号：US13233426
申请日：2011-09-15
申请人： Akiko Mimotogi , Ryoichi Inanami , Kentaro Kasa , Masato Suzuki , Manabu Takakuwa , Yohko Furutono , Yumi Nakajima
发明人： Akiko Mimotogi , Ryoichi Inanami , Kentaro Kasa , Masato Suzuki , Manabu Takakuwa , Yohko Furutono , Yumi Nakajima
CPC分类号： G03F7/002 , G03F9/7042
摘要： According to one embodiment, a nanoimprint template using a pattern transcription to a substrate by a nanoimprint technique, the template includes a transcription pattern and an alignment mark on a main surface of a main body, wherein the alignment mark comprises a polarizer.
摘要翻译： 根据一个实施方案，使用通过纳米压印技术将图案转录到底物的纳米压印模板，所述模板包括在主体的主表面上的转录图案和对准标记，其中所述对准标记包括偏振器。
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3.发明申请IMPRINTING METHOD, SEMICONDUCTOR INTEGRATED CIRCUIT MANUFACTURING METHOD AND DROP RECIPE CREATING METHOD 审中-公开印刷方法，半导体集成电路制造方法和DROP RECIPE创建方法公开(公告)号：US20120072003A1
公开(公告)日：2012-03-22
申请号：US13208638
申请日：2011-08-12
申请人： Yasuo MATSUOKA , Ryoichi Inanami , Akiko Mimotogi
发明人： Yasuo MATSUOKA , Ryoichi Inanami , Akiko Mimotogi
IPC分类号： G06F19/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： According to one embodiment, a defect inspection is made on a pattern transferred on substrates to be processed, thereby generating defect image data. When a defect is detected, a defect contour is extracted from the generated image data, the extracted defect contour is reflected on a pattern of the semiconductor integrated circuit and a first drop recipe is generated based on the pattern data on which the defect contour is reflected. A drop recipe used for applying a hardening resin material is updated with the generated first drop recipe.
摘要翻译： 根据一个实施例，对要处理的基板上转印的图案进行缺陷检查，从而生成缺陷图像数据。 当检测到缺陷时，从生成的图像数据中提取出缺陷轮廓，将所提取的缺陷轮廓反映在半导体集成电路的图案上，并且基于反映了缺陷轮廓的图案数据生成第一丢弃配方 。 用于施加硬化树脂材料的滴剂配方用生成的第一滴剂配方更新。
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公开(公告)号：US20130080991A1
公开(公告)日：2013-03-28
申请号：US13428276
申请日：2012-03-23
IPC分类号： G06F11/22
CPC分类号： G03F7/70383
摘要： According to one embodiment, a pattern forming apparatus includes a control unit. The control unit is configured to execute a test patterning to same patterns using probes under same conditions, obtain a position error and a size error by comparing a position and a size of the same patterns with a target value, select a normal probe in which the position error and the size error is in an allowable range among the probes, execute a correction process which adjusts sub patterning areas which are patterned by the normal probe among a main patterning area of a substrate, and execute a patterning of the sub patterning areas using the normal probe.
摘要翻译： 根据一个实施例，图案形成装置包括控制单元。 控制单元被配置为在相同条件下使用探针对相同图案进行测试图案化，通过将相同图案的位置和尺寸与目标值进行比较来获得位置误差和尺寸误差，选择其中 位置误差和尺寸误差在探针之间的允许范围内，执行校正处理，该校正处理调整在基板的主图案化区域中通过普通探针图案化的子图案形成区域，并且使用 正常探针。
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5.发明申请公开(公告)号：US20100264113A1
公开(公告)日：2010-10-21
申请号：US12724819
申请日：2010-03-16
申请人： Ikuo YONEDA , Takuya Kono , Tetsuro Nakasugi , Ryoichi Inanami
发明人： Ikuo YONEDA , Takuya Kono , Tetsuro Nakasugi , Ryoichi Inanami
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： There is provided a template in which a gap region of a substrate to be processed can be covered with an imprint resist, a method of manufacturing the same, and a method of forming a pattern.A template used in an optical imprint method includes a substrate, a pattern forming region that is provided on the substrate and includes an imprint pattern, a first step portion that is provided outside the pattern forming region and is disposed below the pattern forming region, a first side portion that connects the pattern forming region and the first step portion, a second step portion that is provided outside the first step portion and is disposed below the first step portion, and a second side portion that connects the first step portion and the second step portion and has a surface roughness more than that of the first side portion.
摘要翻译： 提供了一种模板，其中待加工的基板的间隙区域可以用抗蚀刻剂覆盖，其制造方法和形成图案的方法。 在光学印记法中使用的模板包括基板，设置在基板上的图案形成区域，并且包括印模图案，设置在图案形成区域的外侧并设置在图案形成区域下方的第一台阶部， 连接图案形成区域和第一台阶部的第一侧面部分，设置在第一台阶部分的外侧并设置在第一台阶部下方的第二台阶部，以及将第一台阶部和第二台阶部 并且具有比第一侧部的表面粗糙度更多的表面粗糙度。
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6.发明授权Method of designing a template pattern, method of manufacturing a template and method of manufacturing a semiconductor device 有权设计模板图案的方法，制造模板的方法和制造半导体器件的方法公开(公告)号：US08468480B2
公开(公告)日：2013-06-18
申请号：US12725202
申请日：2010-03-16
申请人： Ryoichi Inanami , Hiroshi Tokue , Ikuo Yoneda
发明人： Ryoichi Inanami , Hiroshi Tokue , Ikuo Yoneda
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G06F2217/12 , Y02P90/265
摘要： A method of designing a template pattern used for imprint lithography, includes generating data of a dummy template pattern to be formed in a third area between first and second areas of a template based on data of a design pattern of the template, the data of the dummy template pattern being generated so that a third surface area ratio showing a ratio of a surface area of the third area to an area of the third area is set smaller than a first surface area ratio showing a ratio of a surface area of the first area to an area of the first area and larger than a second surface area ratio showing a ratio of a surface area of the second area to an area of the second area.
摘要翻译： 一种设计用于压印光刻的模板图案的方法，包括基于模板的设计图案的数据，生成要形成在模板的第一和第二区域之间的第三区域中的虚拟模板图案的数据， 生成虚拟模板图案，使得将表示第三区域的表面积与第三区域的面积的比率的第三表面积比设定为小于表示第一区域的表面积的比率的第一表面积比 相对于第一区域的面积大于表示第二区域的表面积与第二区域的面积的比率的第二表面积比。
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7.发明申请公开(公告)号：US20100075443A1
公开(公告)日：2010-03-25
申请号：US12553906
申请日：2009-09-03
申请人： Ikuo YONEDA , Tetsuro Nakasugi , Masamitsu Itoh , Ryoichi Inanami
发明人： Ikuo YONEDA , Tetsuro Nakasugi , Masamitsu Itoh , Ryoichi Inanami
CPC分类号： G01N21/956 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A template inspection method for performing defect inspection of a template, by bringing a pattern formation surface of a template used to form a pattern close to a first fluid coated on a flat substrate, filling the first fluid into a pattern of the template, and by performing optical observation of the template in a state that the first fluid is sandwiched between the template and the substrate, wherein a difference between an optical constant of the first fluid and an optical constant of the template is larger than a difference between an optical constant of air and the optical constant of the template.
摘要翻译： 一种用于对模板进行缺陷检查的模板检查方法，通过将用于形成图案的模板的图案形成表面靠近涂覆在平坦基板上的第一流体，将第一流体填充到模板的图案中，以及通过 在第一流体夹在模板和基板之间的状态下进行模板的光学观察，其中第一流体的光学常数与模板的光学常数之间的差异大于模板的光学常数之间的差异 空气和模板的光学常数。
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公开(公告)号：US08444889B2
公开(公告)日：2013-05-21
申请号：US12726503
申请日：2010-03-18
申请人： Hiroshi Tokue , Ikuo Yoneda , Ryoichi Inanami
发明人： Hiroshi Tokue , Ikuo Yoneda , Ryoichi Inanami
CPC分类号： G03F7/0002 , B29C33/00 , B29C43/021 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5808 , B82Y10/00 , B82Y40/00
摘要： An imprint pattern forming method includes contacting a template with a pattern in a front surface with an imprint material formed in a substrate to fill the imprint material into the pattern, curing the imprint material filled in the pattern to form an imprint material pattern, and after forming the imprint material pattern, separating the template from the imprint material pattern while applying pressure to the back surface of the template.
摘要翻译： 压印图案形成方法包括使模板与前表面中的图案与形成在基板中的压印材料接触以将压印材料填充到图案中，固化填充在图案中的压印材料以形成压印材料图案，并且之后 形成压印材料图案，将模板与压印材料图案分离，同时向模板的背面施加压力。
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9.发明授权公开(公告)号：US08227267B2
公开(公告)日：2012-07-24
申请号：US12553906
申请日：2009-09-03
申请人： Ikuo Yoneda , Tetsuro Nakasugi , Masamitsu Itoh , Ryoichi Inanami
发明人： Ikuo Yoneda , Tetsuro Nakasugi , Masamitsu Itoh , Ryoichi Inanami
IPC分类号： H01L21/66
CPC分类号： G01N21/956 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A template inspection method for performing defect inspection of a template, by bringing a pattern formation surface of a template used to form a pattern close to a first fluid coated on a flat substrate, filling the first fluid into a pattern of the template, and by performing optical observation of the template in a state that the first fluid is sandwiched between the template and the substrate, wherein a difference between an optical constant of the first fluid and an optical constant of the template is larger than a difference between an optical constant of air and the optical constant of the template.
摘要翻译： 一种用于对模板进行缺陷检查的模板检查方法，通过将用于形成图案的模板的图案形成表面靠近涂覆在平坦基板上的第一流体，将第一流体填充到模板的图案中，以及通过 在第一流体夹在模板和基板之间的状态下进行模板的光学观察，其中第一流体的光学常数与模板的光学常数之间的差异大于模板的光学常数之间的差异 空气和模板的光学常数。
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公开(公告)号：US20100244326A1
公开(公告)日：2010-09-30
申请号：US12726503
申请日：2010-03-18
申请人： Hiroshi Tokue , Ikuo Yoneda , Ryoichi Inanami
发明人： Hiroshi Tokue , Ikuo Yoneda , Ryoichi Inanami
CPC分类号： G03F7/0002 , B29C33/00 , B29C43/021 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5808 , B82Y10/00 , B82Y40/00
摘要： An imprint pattern forming method includes contacting a template with a pattern in a front surface with an imprint material formed in a substrate to fill the imprint material into the pattern, curing the imprint material filled in the pattern to form an imprint material pattern, and after forming the imprint material pattern, separating the template from the imprint material pattern while applying pressure to the back surface of the template.
摘要翻译： 压印图案形成方法包括使模板与前表面中的图案与形成在基板中的压印材料接触以将压印材料填充到图案中，固化填充在图案中的压印材料以形成压印材料图案，并且之后 形成压印材料图案，将模板与压印材料图案分离，同时向模板的背面施加压力。
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