Triple oxide fill for trench isolation
    64.
    发明授权
    Triple oxide fill for trench isolation 有权
    三重氧化物填充用于沟槽隔离

    公开(公告)号:US06825097B2

    公开(公告)日:2004-11-30

    申请号:US10214510

    申请日:2002-08-07

    IPC分类号: H01L2176

    CPC分类号: H01L21/76264 H01L21/76283

    摘要: In an integrated circuit process for SOI including trench device isolation, the problem of voids in the trench fill is addressed by a triple fill process, in which a thermal oxide sidewall having recesses at the bottom corners is covered with a LPCVD deposition that fills in the recesses, followed by a void-free HDP deposition. Densification results in substantially the same etch rate for the three types of oxide.

    摘要翻译: 在包括沟槽器件隔离的SOI的集成电路工艺中,通过三重填充工艺来解决沟槽填充中的空隙的问题,其中在底部拐角处具有凹陷的热氧化物侧壁被LPCVD沉积覆盖,所述LPCVD沉积填充 凹陷,随后是无空隙的HDP沉积。 致密化导致三种类型氧化物基本上相同的蚀刻速率。

    Anti-spacer structure for self-aligned independent gate implantation
    65.
    发明授权
    Anti-spacer structure for self-aligned independent gate implantation 失效
    用于自对准独立栅极注入的反间隔结构

    公开(公告)号:US06531365B2

    公开(公告)日:2003-03-11

    申请号:US09888160

    申请日:2001-06-22

    IPC分类号: H01L21336

    CPC分类号: H01L21/82345

    摘要: A method for improving the gate activation of metal oxide semiconductor field effect transistor (MOSFET) structures are provided. The method of the present invention includes the steps of forming a plurality of patterned gate stacks atop a layer of gate dielectric material; forming a first planarizing organic film on the gate dielectric material and abutting vertical sidewalls of the patterned gate stacks, said planarizing organic film not being present on top, horizontal surfaces of each of the patterned gate stacks; blocking some of the plurality of patterned gate stacks with a first resist, while leaving other patterned gate stacks of said plurality unblocked; implanting first ions into the unblocked patterned gate stacks; removing the first resist and first planarizing organic film and forming a second planarizing organic film and blocking the previously unblocked patterned gate stacks with a second resist; implanting second ions into the patterned gate stacks that are not blocked by said second resist; and removing the second resist and the second planarizing organic film.

    摘要翻译: 提供了一种用于改善金属氧化物半导体场效应晶体管(MOSFET)结构的栅激活的方法。 本发明的方法包括以下步骤:在栅极电介质材料层的上方形成多个图案化的栅叠层; 在所述栅极电介质材料上形成第一平面化有机膜并邻接所述图案化栅极叠层的垂直侧壁,所述平面化有机膜不存在于每个所述图案化栅极堆叠的顶部水平表面上; 用第一抗蚀剂阻挡多个图案化栅极堆叠中的一些,同时留下所述多个未封装的其它图案化栅极堆叠; 将第一离子注入未封闭的图案化栅极堆叠中; 去除第一抗蚀剂和第一平面化有机膜并形成第二平面化有机膜并用第二抗蚀剂阻挡先前未封闭的图案化栅叠层; 将第二离子注入未被所述第二抗蚀剂阻挡的图案化栅极堆叠中; 并除去第二抗蚀剂和第二平面化有机膜。

    Electrical fuses employing reverse biasing to enhance programming
    66.
    发明授权
    Electrical fuses employing reverse biasing to enhance programming 失效
    采用反向偏置的电气保险丝来加强编程

    公开(公告)号:US06323535B1

    公开(公告)日:2001-11-27

    申请号:US09595764

    申请日:2000-06-16

    IPC分类号: H01L2900

    摘要: A fuse for semiconductor devices, in accordance with the present invention, includes a cathode including a first dopant type, and an anode including a second dopant type where the second dopant type is opposite the first dopant type. A fuse link connects the cathode and the anode and includes the second dopant type. The fuse link and the cathode form a junction therebetween, and the junction is configured to be reverse biased relative to a cathode potential and an anode potential. A conductive layer is formed across the junction such that current flowing at the junction is diverted into the conductive layer to enhance material migration to program the fuse.

    摘要翻译: 根据本发明的用于半导体器件的熔丝包括第一掺杂剂类型的第一掺杂剂类型的阴极和包括第二掺杂剂类型的第二掺杂剂类型的阳极。 熔丝连接器连接阴极和阳极并且包括第二掺杂剂类型。 熔丝链和阴极在它们之间形成一个结,并且该结被配置为相对于阴极电位和阳极电位被反向偏置。 导电层跨越结形成,使得在结处流动的电流被转移到导电层中以增强材料迁移以对熔丝进行编程。