Light-emitting device, electronic device, and lighting device

    公开(公告)号:US10276826B2

    公开(公告)日:2019-04-30

    申请号:US15861899

    申请日:2018-01-04

    摘要: A lightweight flexible light-emitting device that is less likely to be broken is provided. The light-emitting device includes a first flexible substrate, a second flexible substrate, an element layer, a first bonding layer, and a second bonding layer. The element layer includes a light-emitting element. The element layer is provided between the first flexible substrate and the second flexible substrate. The first bonding layer is provided between the first flexible substrate and the element layer. The second bonding layer is provided between the second flexible substrate and the element layer. The first and second bonding layers are in contact with each other on the outer side of an end portion of the element layer. The first and second flexible substrates are in contact with each other on the outer side of the end portions of the element layer, the first bonding layer, and the second bonding layer.

    Semiconductor Device
    66.
    发明申请
    Semiconductor Device 审中-公开
    半导体器件

    公开(公告)号:US20160056140A1

    公开(公告)日:2016-02-25

    申请号:US14929715

    申请日:2015-11-02

    IPC分类号: H01L27/02 H01L23/66

    摘要: To solve a problem in that an antenna or a circuit including a thin film transistor is damaged due to discharge of electric charge accumulated in an insulator (a problem of electrostatic discharge), a semiconductor device includes a first insulator, a circuit including a thin film transistor provided over the first insulator, an antenna which is provided over the circuit and is electrically connected to the circuit, and a second insulator provided over the antenna, a first conductive film provided between the first insulator and the circuit, and a second conductive film provided between the second insulator and the antenna.

    摘要翻译: 为了解决由于蓄积在绝缘体中的电荷的放电(静电放电的问题)导致包括薄膜晶体管的天线或电路的电池损坏的问题,半导体器件包括第一绝缘体,包括薄膜的电路 提供在第一绝缘体上的晶体管,设置在电路上并与电路电连接的天线,以及设置在天线上的第二绝缘体,设置在第一绝缘体和电路之间的第一导电膜,以及第二导电膜 设置在第二绝缘体和天线之间。

    Semiconductor Device, Input/output Device, and Electronic Appliance
    67.
    发明申请
    Semiconductor Device, Input/output Device, and Electronic Appliance 有权
    半导体器件,输入/输出设备和电子设备

    公开(公告)号:US20150317015A1

    公开(公告)日:2015-11-05

    申请号:US14700527

    申请日:2015-04-30

    摘要: A flexible input/output device and an input/output device having high resistance to repeated bending are provided. The input/output device includes a first flexible substrate, a first insulating layer over the first substrate, a first transistor over the first insulating layer, a light-emitting element over and electrically connected to the first transistor and including an EL layer between first and second electrodes, a first bonding layer over the light-emitting element, a sensing element and a second transistor over the first bonding layer and electrically connected to each other, a second insulating layer over the sensing element and the second transistor, and a second flexible substrate over the second insulating layer. In the input/output device, B/A is greater than or equal to 0.7 and less than or equal to 1.7, where A is a thickness between the EL layer and the first insulating layer and B is a thickness between the EL layer and the second insulating layer.

    摘要翻译: 提供了具有高抗重复弯曲能力的灵活的输入/输出装置和输入/输出装置。 所述输入/输出装置包括第一柔性基板,在所述第一基板上的第一绝缘层,所述第一绝缘层上的第一晶体管,位于所述第一晶体管之上并电连接到所述第一晶体管的发光元件, 第二电极,在发光元件上方的第一结合层,在第一接合层上方的感测元件和第二晶体管,并且彼此电连接,感测元件和第二晶体管上的第二绝缘层,以及第二柔性 衬底在第二绝缘层上。 在输入/输出装置中,B / A大于或等于0.7且小于或等于1.7,其中A是EL层和第一绝缘层之间的厚度,B是EL层和 第二绝缘层。

    Film Formation Apparatus, Method for Forming Film and Method for Cleaning Shadow Mask
    70.
    发明申请
    Film Formation Apparatus, Method for Forming Film and Method for Cleaning Shadow Mask 审中-公开
    成膜装置,薄膜​​形成方法及清洁阴影面具的方法

    公开(公告)号:US20130216709A1

    公开(公告)日:2013-08-22

    申请号:US13768150

    申请日:2013-02-15

    IPC分类号: B05C21/00

    摘要: A film formation apparatus that can remove a film formation material attached to a shadow mask is provided. Alternatively, a method for forming a film and a method for cleaning a shadow mask are provided. The film formation apparatus includes a film formation chamber including an evaporation source; a shadow mask transfer mechanism; and a plasma source. The shadow mask transfer mechanism includes a first mode in which a film is formed on an object to be film-formed with a film formation material ejected by the evaporation source while the object to be film-formed and a shadow mask are transferred, and a second mode in which plasma irradiation is performed by the plasma source to remove the film formation material attached to the shadow mask while the evaporation source is parted from the plasma source by a sluice valve and the shadow mask is transferred.

    摘要翻译: 提供了可以去除附着在荫罩上的成膜材料的成膜装置。 或者,提供了一种用于形成膜的方法和用于清洁荫罩的方法。 成膜装置包括:成膜室,包括蒸发源; 荫罩传输机制; 和等离子体源。 荫罩传送机构包括第一模式,其中在要成膜的物体和荫罩被转印的情况下,在由蒸发源喷射的成膜材料的成膜物上形成膜,并且 第二模式,其中通过等离子体源执行等离子体照射以除去附着到荫罩的成膜材料,同时通过闸阀将蒸发源从等离子体源分离并且荫罩被传送。