Method of manufacturing master mold
    63.
    发明授权
    Method of manufacturing master mold 有权
    主模制造方法

    公开(公告)号:US09434093B2

    公开(公告)日:2016-09-06

    申请号:US14557712

    申请日:2014-12-02

    Abstract: A method of manufacturing a master mold includes forming a plurality of replica resin layers using a mold; forming a replica template by bonding the plurality of replica resin layers on a template; forming a replica mold layer having a pattern corresponding to a pattern of the plurality of replica resin layers using the replica template; forming a flexible stamp having a pattern formed on a surface thereof using the replica mold layer; transferring the pattern formed on the surface of the flexible stamp to a mold resin; and forming a large area master mold by etching a surface of a substrate based on a pattern shape of the mold resin.

    Abstract translation: 制造母模的方法包括使用模具形成多个复制树脂层; 通过将多个复制树脂层粘合在模板上来形成复制模板; 使用复制模板形成具有与多个复制树脂层的图案对应的图案的复制模具层; 使用复制模具层形成具有在其表面上形成的图案的柔性印模; 将形成在柔性印模的表面上的图案转印到模制树脂上; 并且通过基于模制树脂的图案形状蚀刻基板的表面来形成大面积的母模。

    2D/3D SWITCHABLE BACKLIGHT UNIT AND IMAGE DISPLAY APPARATUS USING THE SAME
    64.
    发明申请
    2D/3D SWITCHABLE BACKLIGHT UNIT AND IMAGE DISPLAY APPARATUS USING THE SAME 审中-公开
    2D / 3D可切换背光单元和使用其的图像显示装置

    公开(公告)号:US20160216433A1

    公开(公告)日:2016-07-28

    申请号:US15000183

    申请日:2016-01-19

    Abstract: A two-dimensional (2D)/three-dimensional (3D) switchable backlight unit and an image display apparatus using the 2D/3D switchable backlight unit are provided. The 2D/3D switchable backlight unit includes: a light source unit; a first light guide plate, within which light from the light source unit is totally internally reflected; and a plurality of refraction patterns, each having a trapezoidal form. The light source unit may include a first light source and a second light source.

    Abstract translation: 提供二维(2D)/三维(3D)可切换背光单元和使用2D / 3D可切换背光单元的图像显示装置。 2D / 3D可切换背光单元包括:光源单元; 第一导光板,其中来自光源单元的光被全内反射; 和多个折射图案,每个具有梯形形式。 光源单元可以包括第一光源和第二光源。

    PATTERNING METHOD USING IMPRINT MOLD, PATTERN STRUCTURE FABRICATED BY THE METHOD, AND IMPRINTING SYSTEM
    65.
    发明申请
    PATTERNING METHOD USING IMPRINT MOLD, PATTERN STRUCTURE FABRICATED BY THE METHOD, AND IMPRINTING SYSTEM 有权
    使用印花模型的方法,通过方法制作的图案结构和印刷系统

    公开(公告)号:US20150321415A1

    公开(公告)日:2015-11-12

    申请号:US14633272

    申请日:2015-02-27

    Abstract: A patterning method using an imprint mold, to form an imprinted pattern structure, includes providing a resist layer from which the pattern structure will be formed, performing a first imprint process on a first area of the resist layer by using the imprint mold to form a first pattern of the pattern structure through deformation of the resist layer in the first area, and performing a second imprint process on a second area of the resist layer by using the imprint mold to form a second pattern of the pattern structure through deformation of the resist layer in the second area. The first and second areas are overlapped with each other in a third area of the resist layer, and the performing the second imprint process deforms a first portion of the first pattern in the third area to form the second pattern

    Abstract translation: 使用压印模具形成压印图案结构的图案化方法包括提供抗蚀剂层,从其形成图案结构,通过使用压印模具在抗蚀剂层的第一区域上进行第一压印处理,以形成 通过使第一区域中的抗蚀剂层变形而形成图案结构的第一图案,并且通过使用压印模具在抗蚀剂层的第二区域上进行第二压印处理,以通过抗蚀剂的变形形成图案结构的第二图案 在第二个区域。 第一和第二区域在抗蚀剂层的第三区域中彼此重叠,并且执行第二压印处理使第三区域中的第一图案的第一部分变形以形成第二图案

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