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72 条记录 (耗时 0.038 秒)

    Wafer processing apparatus having a tunable electrical resistivity
    62.
    发明授权
    Wafer processing apparatus having a tunable electrical resistivity 有权
    具有可调电阻率的晶片处理装置

    公开(公告)号：US07929269B2

    公开(公告)日：2011-04-19

    申请号：US12204079

    申请日：2008-09-04

    申请人： David Michael Rusinko, Jr. ,  Marc Schaepkens ,  Wanxue Zeng

    发明人： David Michael Rusinko, Jr. ,  Marc Schaepkens ,  Wanxue Zeng

    IPC分类号： H01T23/00

    CPC分类号： H01L21/683 ,  H01L21/6831 ,  H01L21/6833

    摘要： An article with an etch resistant coating is disclosed. The article is a heating element, wafer carrier, or electrostatic chuck. The article has a base substrate made of a ceramic or other material, and further has one or more electrodes for resistance heating or electromagnetic chucking or both. The eth resistant coating has a plurality of regions made from materials having different electrical volume resistivities, such that the overall coating has a bulk resistivity that can be tailored by varying the relative size of each region.

    摘要翻译： 公开了具有耐蚀刻涂层的物品。 该物品是加热元件，晶片载体或静电卡盘。 该制品具有由陶瓷或其他材料制成的基底，并且还具有用于电阻加热或电磁夹持的两个或更多个电极。 耐腐蚀涂层具有由具有不同电体积电阻率的材料制成的多个区域，使得整个涂层具有可以通过改变每个区域的相对尺寸来调整的体电阻率。

    Heating apparatus with enhanced thermal uniformity and method for making thereof
    63.
    发明授权
    Heating apparatus with enhanced thermal uniformity and method for making thereof 有权
    具有增强的热均匀性的加热装置及其制造方法

    公开(公告)号：US07901509B2

    公开(公告)日：2011-03-08

    申请号：US11549968

    申请日：2006-10-16

    申请人： John Mariner ,  Ajit Sane ,  Toshiki Ebata ,  Marc Schaepkens ,  Xiang Liu ,  Wei Fan

    发明人： John Mariner ,  Ajit Sane ,  Toshiki Ebata ,  Marc Schaepkens ,  Xiang Liu ,  Wei Fan

    IPC分类号： C23C16/00 ,  H01L21/306

    CPC分类号： C23C16/4586 ,  H01L21/67103

    摘要： A heating apparatus for regulating/controlling the surface temperature of a substrate is provided. At least a thermal pyrolytic graphite (TPG) layer is embedded in the heater to diffuse the temperature difference of the various components in the heating apparatus and provide temporal and spatial control of the surface temperature of the substrate, for a relatively uniform substrate temperature with the difference between the maximum and minimum temperature points on the substrate of less than 10° C.

    摘要翻译： 提供一种用于调节/控制基板的表面温度的加热装置。 至少一个热解石墨（TPG）层被嵌入在加热器中以扩散加热装置中的各种组分的温度差，并提供衬底的表面温度的时间和空间控制，对于相对均匀的衬底温度， 基板上最大和最小温度点之间的差值小于10°C

    Limited play optical media device with barrier layers
    65.
    发明授权
    Limited play optical media device with barrier layers 失效
    有限播放具有屏障层的光学介质设备

    公开(公告)号：US07223520B2

    公开(公告)日：2007-05-29

    申请号：US10657631

    申请日：2003-09-08

    申请人： Daniel Robert Olson ,  Marc Brian Wisnudel ,  Marc Schaepkens ,  Robert Franklin Thompson

    发明人： Daniel Robert Olson ,  Marc Brian Wisnudel ,  Marc Schaepkens ,  Robert Franklin Thompson

    IPC分类号： G11B7/26

    CPC分类号： G11B7/252 ,  G11B7/241 ,  G11B7/2534 ,  G11B7/2542 ,  G11B7/2585 ,  G11B23/282 ,  G11B2007/25708 ,  G11B2007/2571 ,  G11B2007/25711 ,  G11B2007/25713 ,  G11B2007/25715 ,  Y10S430/146

    摘要： The present disclosure relates to a limited play optical storage media and a method for limiting access to data thereon. This storage media includes a first substrate; a reflective layer; a data storage layer disposed between said first substrate and said reflective layer; a reactive layer comprising at least one reactive material disposed on said at least one reflective layer; an optically transparent second substrate disposed between the reactive layer and a laser incident surface of the optical storage media; and an oxygen permeable barrier layer disposed between the reactive layer and a laser incident surface of the optical storage media, said reactive layer having an initial percent reflectivity of about 50% or greater and a percent reflectivity of about 45% or less after exposure to oxygen.

    摘要翻译： 本公开涉及有限播放光存储介质和用于限制对其上的数据的访问的方法。 该存储介质包括第一衬底; 反射层; 设置在所述第一基板和所述反射层之间的数据存储层; 反应层，包括设置在所述至少一个反射层上的至少一种反应性材料; 光学透明的第二基板，设置在光学存储介质的反应层和激光入射表面之间; 以及设置在光学存储介质的反应层和激光入射表面之间的透氧阻挡层，所述反应层在暴露于氧气之后具有约50％或更大的初始百分比反射率和约45％或更小的百分比反射率 。

    High temperature chemical vapor deposition apparatus
    66.
    发明申请
    High temperature chemical vapor deposition apparatus 审中-公开
    高温化学气相沉积装置

    公开(公告)号：US20060185590A1

    公开(公告)日：2006-08-24

    申请号：US11291558

    申请日：2005-12-01

    申请人： Marc Schaepkens ,  Demetrius Sarigiannis ,  Lakshmipathy Muralidharan

    发明人： Marc Schaepkens ,  Demetrius Sarigiannis ,  Lakshmipathy Muralidharan

    IPC分类号： C23C16/00

    CPC分类号： C23C16/342 ,  C23C16/45591

    摘要： Embodiments for an apparatus and method for depositing one or more layers onto a substrate or a freestanding shape inside a reaction chamber operating at a temperature of at least 700° C. and 10 torr are provided. The apparatus is provided with means for defining a volume space in the reaction chamber for pre-reacting the reactant feeds forming at least a reaction precursor in a gaseous form, and a volume space for depositing a coating layer of uniform thickness on the substrate from the reacted precursor. In one embodiment, the means for defining the two different zones comprises a distribution medium separating the pre-reaction zone from the deposition zone, for uniform distribution of the reacted precursor on the substrate. In another embodiment, the means for defining the two different zones comprises a plurality of reactant feed jets or injectors, for creating a jet-interaction zone or pre-reactant zone separate from a deposition zone, for deposing the reacted precursor on the substrate.

    摘要翻译： 提供了用于在至少700℃和10托的温度下操作的反应室内将一个或多个层沉积到基底或独立形状上的装置和方法的实施例。 该装置设置有用于限定反应室中的体积空间的装置，用于使至少形成气态反应前体的反应物进料预反应，以及用于在基板上沉积具有均匀厚度的涂层的体积空间 反应前体。 在一个实施方案中，用于限定两个不同区域的装置包括将预反应区域与沉积区域分离的分配介质，用于将反应的前体均匀分布在基底上。 在另一个实施方案中，用于限定两个不同区域的装置包括多个反应物进料射流或喷射器，用于产生与沉积区分离的喷射相互作用区域或预反应物区域，用于使基底上的反应前体脱落。

    Solar cell assembly for use in an outer space environment or a non-earth environment
    70.
    发明申请
    Solar cell assembly for use in an outer space environment or a non-earth environment 审中-公开
    用于外层空间环境或非地球环境的太阳能电池组件

    公开(公告)号：US20050139256A1

    公开(公告)日：2005-06-30

    申请号：US10750114

    申请日：2003-12-31

    申请人： Charles Korman ,  Marc Schaepkens ,  Bastiaan Korevaar

    发明人： Charles Korman ,  Marc Schaepkens ,  Bastiaan Korevaar

    IPC分类号： H01L31/00 ,  H01L31/042 ,  H01L31/052

    CPC分类号： H01L31/052 ,  B64G1/1007 ,  B64G1/443 ,  H01L31/042 ,  Y02E10/50

    摘要： A solar cell assembly for use in an outer space environment or a non-Earth environment and a method for controlling a temperature of the solar cell assembly are provided. The solar cell assembly includes a photovoltaic conversion layer configured to produce an electrical current when receiving photons on a first side of the photovoltaic conversion layer. The solar cell assembly further includes a thermally conductive layer thermally coupled to a second side of the photovoltaic conversion layer. Finally, the solar cell assembly includes a heat radiating layer coupled to the thermally conductive layer to radiate heat energy from the photovoltaic conversion layer.

    摘要翻译： 提供了一种用于外部空间环境或非地球环境的太阳能电池组件以及用于控制太阳能电池组件的温度的方法。 太阳能电池组件包括光电转换层，被配置为当在光伏转换层的第一侧接收光子时产生电流。 太阳能电池组件还包括热耦合到光伏转换层的第二侧的导热层。 最后，太阳能电池组件包括耦合到导热层的散热层，以辐射来自光伏转换层的热能。