公开(公告)号：US20120188636A1

公开(公告)日：2012-07-26

申请号：US13440226

申请日：2012-04-05

申请人： Wilhelm Ulrich ,  Thomas Okon ,  Norbert Wabra ,  Toralf Gruner ,  Boris Bittner ,  Volker Graeschus

发明人： Wilhelm Ulrich ,  Thomas Okon ,  Norbert Wabra ,  Toralf Gruner ,  Boris Bittner ,  Volker Graeschus

IPC分类号： G02B17/08

CPC分类号： G03F7/70308 ,  G02B17/08 ,  G02B27/0025 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70258 ,  G03F7/70266

摘要： A method for correcting at least one image defect of a projection objective of a lithography projection exposure machine, the projection objective comprising an optical arrangement composed of a plurality of lenses and at least one mirror, the at least one mirror having an optically operative surface that can be defective and is thus responsible for the at least one image defect, comprises the steps of: at least approximately determining a ratio VM of principal ray height hMH to marginal ray height hMR at the optically operative surface of the at least one mirror, at least approximately determining at least one optically operative lens surface among the lens surfaces of the lenses, at which the magnitude of a ratio VL of principal ray height hLH to marginal ray height hLR comes at least closest to the ratio VM, and selecting the at least one determined lens surface for the correction of the image defect.

摘要翻译： 一种用于校正光刻投影曝光机的投影物镜的至少一个图像缺陷的方法，所述投影物镜包括由多个透镜和至少一个反射镜组成的光学装置，所述至少一个反射镜具有光学操作表面， 可能是有缺陷的并且因此对至少一个图像缺陷负责，包括以下步骤：至少近似地确定主光线高度hMH与至少一个反射镜的光学操作表面处的边缘光线高度hMR的比率VM， 至少近似地确定透镜的透镜表面中的至少一个光学透镜表面，其中主光线高度hLH与边缘光线高度hLR的比值VL的大小至少最接近于比率VM，并且至少选择至少 用于校正图像缺陷的一个确定的透镜表面。

公开(公告)号：US20120176591A1

公开(公告)日：2012-07-12

申请号：US13423965

申请日：2012-03-19

申请人： Franz Sorg ,  Peter Deufel ,  Toralf Gruner

发明人： Franz Sorg ,  Peter Deufel ,  Toralf Gruner

IPC分类号： G03B27/32

CPC分类号： G03F7/70308 ,  G03F7/70825 ,  G03F7/70933

摘要： The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and component.

摘要翻译： 本公开涉及具有被配置为修改成像特性以及相关系统和部件的光学校正元件的微光刻投影曝光系统。

公开(公告)号：US08174676B2

公开(公告)日：2012-05-08

申请号：US13187003

申请日：2011-07-20

申请人： Wilhelm Ulrich ,  Thomas Okon ,  Norbert Wabra ,  Toralf Gruner ,  Boris Bittner ,  Volker Graeschus

发明人： Wilhelm Ulrich ,  Thomas Okon ,  Norbert Wabra ,  Toralf Gruner ,  Boris Bittner ,  Volker Graeschus

IPC分类号： G03B27/70

CPC分类号： G03F7/70308 ,  G02B17/08 ,  G02B27/0025 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70258 ,  G03F7/70266

摘要： A method for correcting at least one image defect of a projection objective of a lithography projection exposure machine, the projection objective comprising an optical arrangement composed of a plurality of lenses and at least one mirror, the at least one mirror having an optically operative surface that can be defective and is thus responsible for the at least one image defect, comprises the steps of: at least approximately determining a ratio VM of principal ray height hMH to marginal ray height hMR at the optically operative surface of the at least one mirror, at least approximately determining at least one optically operative lens surface among the lens surfaces of the lenses, at which the magnitude of a ratio VL of principal ray height hLH to marginal ray height hLR comes at least closest to the ratio VM, and selecting the at least one determined lens surface for the correction of the image defect.

摘要翻译： 一种用于校正光刻投影曝光机的投影物镜的至少一个图像缺陷的方法，所述投影物镜包括由多个透镜和至少一个反射镜组成的光学装置，所述至少一个反射镜具有光学操作表面， 可能是有缺陷的并且因此对至少一个图像缺陷负责，包括以下步骤：至少近似地确定主光线高度hMH与至少一个反射镜的光学操作表面处的边缘光线高度hMR的比率VM， 至少近似地确定透镜的透镜表面中的至少一个光学透镜表面，其中主光线高度hLH与边缘光线高度hLR的比值VL的大小至少最接近于比率VM，并且至少选择至少 用于校正图像缺陷的一个确定的透镜表面。

公开(公告)号：US20110279803A1

公开(公告)日：2011-11-17

申请号：US13187003

申请日：2011-07-20

申请人： Wilhelm Ulrich ,  Thomas Okon ,  Norbert Wabra ,  Toralf Gruner ,  Boris Bittner ,  Volker Graeschus

发明人： Wilhelm Ulrich ,  Thomas Okon ,  Norbert Wabra ,  Toralf Gruner ,  Boris Bittner ,  Volker Graeschus

IPC分类号： G03B27/54

CPC分类号： G03F7/70308 ,  G02B17/08 ,  G02B27/0025 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70258 ,  G03F7/70266

摘要： A method for correcting at least one image defect of a projection objective of a lithography projection exposure machine, the projection objective comprising an optical arrangement composed of a plurality of lenses and at least one mirror, the at least one mirror having an optically operative surface that can be defective and is thus responsible for the at least one image defect, comprises the steps of: at least approximately determining a ratio VM of principal ray height hMH to marginal ray height hMR at the optically operative surface of the at least one mirror, at least approximately determining at least one optically operative lens surface among the lens surfaces of the lenses, at which the magnitude of a ratio VL of principal ray height hLH to marginal ray height hLR comes at least closest to the ratio VM, and selecting the at least one determined lens surface for the correction of the image defect.

摘要翻译： 一种用于校正光刻投影曝光机的投影物镜的至少一个图像缺陷的方法，所述投影物镜包括由多个透镜和至少一个反射镜组成的光学装置，所述至少一个反射镜具有光学操作表面， 可能是有缺陷的并且因此对至少一个图像缺陷负责，包括以下步骤：至少近似地确定主光线高度hMH与至少一个反射镜的光学操作表面处的边缘光线高度hMR的比率VM， 至少近似地确定透镜的透镜表面中的至少一个光学透镜表面，其中主光线高度hLH与边缘光线高度hLR的比值VL的大小至少最接近于比率VM，并且至少选择至少 用于校正图像缺陷的一个确定的透镜表面。

公开(公告)号：US20110109893A1

公开(公告)日：2011-05-12

申请号：US13007039

申请日：2011-01-14

申请人： Toralf Gruner ,  Alexander Epple ,  Markus Degünther

发明人： Toralf Gruner ,  Alexander Epple ,  Markus Degünther

IPC分类号： G03F7/20 ,  G03B27/54 ,  G03B27/72

CPC分类号： G03F7/70108 ,  G03F7/70141 ,  G03F7/70191

摘要： A projection exposure apparatus has a projection lens with an object plane, an image plane, an optical axis and a non-telecentric entrance pupil. The apparatus further comprises an illumination system having an intermediate field plane and a field stop. The field stop is positioned in or in close proximity to the intermediate field plane and defines an illuminated field in the object plane that does not contain the optical axis of the projection lens. The illumination system is configured such that, in the object plane, a mean of the angles formed between all principal rays emanating from the intermediate field plane on the one hand and the optical axis of the projection lens on the other hand differs from 0°.

摘要翻译： 投影曝光装置具有物镜面，像面，光轴和非远心入射光瞳的投影透镜。 该装置还包括具有中间场平面和场停止的照明系统。 场停止件位于中间场平面中或紧邻中间场平面，并且在物平面中限定不包含投影透镜的光轴的照明场。 照明系统被配置为使得在物平面中，从一方面从中间场平面发射的所有主光线与另一方面的投影透镜的光轴之间形成的角度的平均值不同于0°。

公开(公告)号：US20110038061A1

公开(公告)日：2011-02-17

申请号：US12562693

申请日：2009-09-18

申请人： Alexander EPPLE ,  Vladimir Kamenov ,  Toralf Gruner ,  Thomas Schicketanz

发明人： Alexander EPPLE ,  Vladimir Kamenov ,  Toralf Gruner ,  Thomas Schicketanz

IPC分类号： G02B17/00 ,  G03B27/52

CPC分类号： G02B17/0892 ,  G02B1/11 ,  G02B17/08 ,  G02B17/0896 ,  G03F7/70 ,  G03F7/70225 ,  G03F7/70275

摘要： Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17), and a third partial objective (19) imaging the second intermediate image onto the image field. The second partial objective is a catadioptric objective having exactly one concave mirror and having at least one lens (L21, L22). A first folding mirror (23) deflects the radiation from the object plane toward the concave mirror and a second folding mirror (25) deflects the radiation from the concave mirror toward the image plane. At least one surface of a lens (L21, L22) of the second partial objective has an antireflection coating having a reflectivity of less than 0.2% for an operating wavelength of between 150 nm and 250 nm and for an angle-of-incidence range of between 0° and 30°. As an alternative or in addition, all the surfaces of the lenses of the second partial objective are configured such that the deviation from the marginal ray concentricity is greater than or equal to 20°.

摘要翻译： 用于微光刻的反折射投影物镜（1），用于将物平面（5）中的物场（3）成像到图像平面（9）中的图像场（7）上。 该目的包括将对象场成像到第一实际中间图像（13）上的第一部分目标（11），将第一中间图像成像到第二实际中间图像（17）上的第二部分目标（15） 物镜（19）将第二中间图像成像到图像场上。 第二部分目标是具有恰好一个凹面镜并具有至少一个透镜（L21，L22）的反射折射物镜。 第一折叠镜（23）将来自物体平面的辐射偏转到凹面镜，并且第二折叠镜（25）将来自凹面镜的辐射偏转到图像平面。 第二部分物镜的透镜（L21，L22）的至少一个表面具有对于150nm至250nm的工作波长具有小于0.2％的反射率的抗反射涂层，并且对于 介于0°和30°之间。 作为替代或另外，第二部分物镜的透镜的所有表面被配置为使得与边缘射线同心度的偏差大于或等于20°。

公开(公告)号：US20100014065A1

公开(公告)日：2010-01-21

申请号：US12552894

申请日：2009-09-02

申请人： Toralf Gruner ,  Yim-Bun Patrick Kwan

发明人： Toralf Gruner ,  Yim-Bun Patrick Kwan

IPC分类号： G03B27/54 ,  G02B7/00 ,  G03B27/70

CPC分类号： G02B7/028 ,  G02B27/0068 ,  G03F7/70258 ,  G03F7/70308 ,  G03F7/706 ,  G03F7/70891

摘要： The disclosure relates to a method for improving optical properties of an optical system. The optical system has a plurality of optical elements for imaging a pattern onto a substrate that is arranged in an image plane of the optical system. The method includes detecting at least one time-dependent, at least partially reversible aberration of the optical system that is caused by heating of at least one of the optical elements. The method also includes at least partially correcting the aberration by replacing at least one optical element from the plurality of optical elements with at least one optical compensation element. The disclosure also relates to such an optical system with improved imaging properties.

摘要翻译： 本公开涉及一种用于改善光学系统的光学特性的方法。 光学系统具有多个光学元件，用于将图案成像到布置在光学系统的图像平面中的基板上。 该方法包括检测由至少一个光学元件的加热引起的光学系统的至少一个依赖于时间的至少部分可逆的像差。 该方法还包括至少部分地通过用至少一个光学补偿元件替换来自多个光学元件的至少一个光学元件来校正像差。 本公开还涉及具有改进的成像特性的这种光学系统。

公开(公告)号：US20090257032A1

公开(公告)日：2009-10-15

申请号：US12402015

申请日：2009-03-11

申请人： Eric Eva ,  Payam Tayebati ,  Michael Thier ,  Markus Hauf ,  Ulrich Schoenhoff ,  Ole Fluegge ,  Arif Kazi ,  Alexander Sauerhoefer ,  Gerhard Focht ,  Jochen Weber ,  Toralf Gruner

发明人： Eric Eva ,  Payam Tayebati ,  Michael Thier ,  Markus Hauf ,  Ulrich Schoenhoff ,  Ole Fluegge ,  Arif Kazi ,  Alexander Sauerhoefer ,  Gerhard Focht ,  Jochen Weber ,  Toralf Gruner

IPC分类号： G03B27/52 ,  G02B7/02

CPC分类号： G03F7/70891 ,  G02B7/028 ,  G02B27/0068 ,  G03F7/70266

摘要： The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.

摘要翻译： 本公开涉及一种光学元件，其被配置为至少部分空间地解决可以应用光辐射的光学系统（例如，用于微光刻的投影曝光设备）的波前像差的校正，以及相关的系统和方法。

公开(公告)号：US20090213356A1

公开(公告)日：2009-08-27

申请号：US12390676

申请日：2009-02-23

申请人： Toralf Gruner ,  Michael Totzeck

发明人： Toralf Gruner ,  Michael Totzeck

IPC分类号： G03B27/72

CPC分类号： G03F7/70566 ,  B82Y10/00 ,  G03F7/70008 ,  G21K2201/061 ,  H05G2/00

摘要： An illumination system for a microlithographic projection exposure apparatus includes an EUV light source which generates an emission beam of linearly polarized EUV illumination light. An illumination optics guides the emission beam along an optical axis which causes an illumination field in a reticle plane to be illuminated by the emission beam. The illumination system also includes an illumination subunit of the illumination system. The illumination subunit includes at least the EUV light source and a polarization setting device for setting a defined polarization of the EUV emission beam of the illumination subunit.

摘要翻译： 用于微光刻投影曝光装置的照明系统包括产生线偏极化EUV照明光的发射光束的EUV光源。 照明光学器件沿着光轴引导发射光束，其使得光栅平面中的照明场被发射光束照射。 照明系统还包括照明系统的照明子单元。 照明子单元至少包括EUV光源和用于设定照明子单元的EUV发射光束的限定极化的偏振设置装置。

公开(公告)号：US20090207487A1

公开(公告)日：2009-08-20

申请号：US12413981

申请日：2009-03-30

申请人： Heiko Feldmann ,  Toralf Gruner ,  Alexander Epple

发明人： Heiko Feldmann ,  Toralf Gruner ,  Alexander Epple

IPC分类号： G02B17/08 ,  G06F17/00

CPC分类号： G03F7/70891 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/705 ,  G03F7/70983

摘要： The disclosure relates to a method of manufacturing a projection objective, and a projection objective, such as a projection objective configured to be used in a microlithographic process. The method can include defining an initial design for the projection objective and optimizing the design using a merit function. The method can be used in the manufacturing of projection objectives which may be used in a microlithographic process of manufacturing miniaturized devices.

摘要翻译： 本公开涉及一种制造投影物镜的方法，以及投影物镜，例如被配置为在微光刻工艺中使用的投影物镜。 该方法可以包括定义投影物镜的初始设计，并使用优值函数优化设计。 该方法可用于制造可用于制造小型化装置的微光刻工艺中的投影物镜。