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公开(公告)号：US20080316444A1
公开(公告)日：2008-12-25
申请号：US12171394
申请日：2008-07-11
申请人： Franz Sorg , Peter Deufel , Toralf Gruner
发明人： Franz Sorg , Peter Deufel , Toralf Gruner
IPC分类号： G03B27/68
CPC分类号： G03F7/70308 , G03F7/70825 , G03F7/70933
摘要： The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and components.
摘要翻译： 本公开涉及具有被配置为修改成像特性以及相关系统和组件的光学校正元件的微光刻投影曝光系统。
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公开(公告)号：US08159648B2
公开(公告)日：2012-04-17
申请号：US12171394
申请日：2008-07-11
申请人： Franz Sorg , Peter Deufel , Toralf Gruner
发明人： Franz Sorg , Peter Deufel , Toralf Gruner
CPC分类号： G03F7/70308 , G03F7/70825 , G03F7/70933
摘要： The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and components.
摘要翻译： 本公开涉及具有被配置为修改成像特性以及相关系统和组件的光学校正元件的微光刻投影曝光系统。
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公开(公告)号：US20120176591A1
公开(公告)日：2012-07-12
申请号：US13423965
申请日：2012-03-19
申请人： Franz Sorg , Peter Deufel , Toralf Gruner
发明人： Franz Sorg , Peter Deufel , Toralf Gruner
IPC分类号： G03B27/32
CPC分类号： G03F7/70308 , G03F7/70825 , G03F7/70933
摘要： The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and component.
摘要翻译： 本公开涉及具有被配置为修改成像特性以及相关系统和部件的光学校正元件的微光刻投影曝光系统。
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公开(公告)号：US20100141912A1
公开(公告)日：2010-06-10
申请号：US12703068
申请日：2010-02-09
申请人： Albrecht Ehrmann , Ulrich Wegmann , Rainer Hoch , Joerg Mallmann , Karl-Heinz Schuster , Ulrich Loering , Toralf Gruner , Bernhard Kneer , Bernhard Geuppert , Franz Sorg , Jens Kugler , Norbert Wabra
发明人： Albrecht Ehrmann , Ulrich Wegmann , Rainer Hoch , Joerg Mallmann , Karl-Heinz Schuster , Ulrich Loering , Toralf Gruner , Bernhard Kneer , Bernhard Geuppert , Franz Sorg , Jens Kugler , Norbert Wabra
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70591 , G03F7/70691 , G03F7/7085 , G03F7/70875 , G03F7/70891 , G03F7/70991
摘要： A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.
摘要翻译： 微光刻投影曝光装置包括配置为浸没操作的投影透镜。 为此，将浸没液体引入位于图像侧的投影透镜的最后一个透镜与待曝光的感光层之间的浸没空间中。 为了减少由浸没液体内发生的温度梯度引起的折射率的波动，投影曝光装置包括加热或冷却浸没液的部分体积的传热元件，以便达到至少基本均匀或至少基本上旋转对称的温度 在浸液中的分布。
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5.发明申请MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS 审中-公开投影镜头的微观投影曝光装置和测量装置公开(公告)号：US20070070316A1
公开(公告)日：2007-03-29
申请号：US11458216
申请日：2006-07-18
申请人： Albrecht Ehrmann , Ulrich Wegmann , Rainer Hoch , Joerg Mallmann , Karl-Heinz Schuster , Ulrich Loering , Toralf Gruner , Bernhard Kneer , Bernhard Geuppert , Franz Sorg , Jens Kugler , Norbert Wabra
发明人： Albrecht Ehrmann , Ulrich Wegmann , Rainer Hoch , Joerg Mallmann , Karl-Heinz Schuster , Ulrich Loering , Toralf Gruner , Bernhard Kneer , Bernhard Geuppert , Franz Sorg , Jens Kugler , Norbert Wabra
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/70591 , G03F7/70691 , G03F7/7085 , G03F7/70875 , G03F7/70891 , G03F7/70991
摘要： A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.
摘要翻译： 微光刻投影曝光装置包括配置为浸没操作的投影透镜。 为此，将浸没液体引入位于图像侧的投影透镜的最后一个透镜与待曝光的感光层之间的浸没空间中。 为了减少由浸没液体内发生的温度梯度引起的折射率的波动，投影曝光装置包括加热或冷却浸没液的部分体积的传热元件，以便达到至少基本均匀或至少基本上旋转对称的温度 在浸液中的分布。
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公开(公告)号：US08330935B2
公开(公告)日：2012-12-11
申请号：US12703068
申请日：2010-02-09
申请人： Albrecht Ehrmann , Ulrich Wegmann , Rainer Hoch , Joerg Mallmann , Karl-Heinz Schuster , Ulrich Loering , Toralf Gruner , Bernhard Kneer , Bernhard Geuppert , Franz Sorg , Jens Kugler , Norbert Wabra
发明人： Albrecht Ehrmann , Ulrich Wegmann , Rainer Hoch , Joerg Mallmann , Karl-Heinz Schuster , Ulrich Loering , Toralf Gruner , Bernhard Kneer , Bernhard Geuppert , Franz Sorg , Jens Kugler , Norbert Wabra
CPC分类号： G03F7/70341 , G03F7/70591 , G03F7/70691 , G03F7/7085 , G03F7/70875 , G03F7/70891 , G03F7/70991
摘要： A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.
摘要翻译： 微光刻投影曝光装置包括配置为浸没操作的投影透镜。 为此，将浸没液体引入位于图像侧的投影透镜的最后一个透镜与待曝光的感光层之间的浸没空间中。 为了减少由浸没液体内发生的温度梯度引起的折射率的波动，投影曝光装置包括加热或冷却浸没液的部分体积的传热元件，以便达到至少基本均匀或至少基本上旋转对称的温度 在浸液中的分布。
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7.发明申请MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS 审中-公开投影镜头的微观投影曝光装置和测量装置公开(公告)号：US20080309894A1
公开(公告)日：2008-12-18
申请号：US12195566
申请日：2008-08-21
申请人： Albrecht Ehrmann , Ulrich Wegmann , Rainer Hoch , Joerg Mallmann , Karl-Heinz Schuster , Ulrich Loering , Toralf Gruner , Bernhard Kneer , Bernhard Geuppert , Franz Sorg , Jens Kugler , Norbert Wabra
发明人： Albrecht Ehrmann , Ulrich Wegmann , Rainer Hoch , Joerg Mallmann , Karl-Heinz Schuster , Ulrich Loering , Toralf Gruner , Bernhard Kneer , Bernhard Geuppert , Franz Sorg , Jens Kugler , Norbert Wabra
CPC分类号： G03F7/70341 , G03F7/70591 , G03F7/70691 , G03F7/7085 , G03F7/70875 , G03F7/70891 , G03F7/70991
摘要： A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.
摘要翻译： 微光刻投影曝光装置包括配置为浸没操作的投影透镜。 为此，将浸没液体引入位于图像侧的投影透镜的最后一个透镜与待曝光的感光层之间的浸没空间中。 为了减少由浸没液体内发生的温度梯度引起的折射率的波动，投影曝光装置包括加热或冷却浸没液的部分体积的传热元件，以便达到至少基本均匀或至少基本上旋转对称的温度 在浸液中的分布。
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8.发明授权Lithographic apparatus, device manufacturing method and exchangeable optical element 有权光刻设备，器件制造方法和可交换光学元件公开(公告)号：US07724351B2
公开(公告)日：2010-05-25
申请号：US11341894
申请日：2006-01-30
申请人： Erik Roelof Loopstra , Adrianus Franciscus Petrus Engelen , Bernardus Antonius Johannes Luttikhuis , Maria Johanna Agnes Rubingh , Johannes Martinus Andreas Hazenberg , Laurentius Catrinus Jorritsma , Johannes Wilhelmus De Klerk , Bernhard Geuppert , Aart Adrianus Van Beuzekom , Petrus Franciscus Wilhelmus Maria Mandigers , Franz Sorg , Peter Deufel , Peter Schaap
发明人： Erik Roelof Loopstra , Adrianus Franciscus Petrus Engelen , Bernardus Antonius Johannes Luttikhuis , Maria Johanna Agnes Rubingh , Johannes Martinus Andreas Hazenberg , Laurentius Catrinus Jorritsma , Johannes Wilhelmus De Klerk , Bernhard Geuppert , Aart Adrianus Van Beuzekom , Petrus Franciscus Wilhelmus Maria Mandigers , Franz Sorg , Peter Deufel , Peter Schaap
CPC分类号： G03F7/70308 , G03F7/70825 , G03F7/70933
摘要： A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.
摘要翻译： 光刻设备具有在其投影系统的光瞳平面中交换光学元件的组件。 光学元件可以是光瞳滤光器，并且可以符合对于掩模版标准规定的物理尺寸，例如。 侧面基本上等于5,6或9英寸。
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9.发明申请Lithographic apparatus, device manufacturing method and exchangeable optical element 有权光刻设备，器件制造方法和可交换光学元件公开(公告)号：US20070177122A1
公开(公告)日：2007-08-02
申请号：US11341894
申请日：2006-01-30
申请人： Erik Loopstra , Adrianus Engelen , Bernardus Luttikhuis , Maria Rubingh , Johannes Hazenberg , Laurentius Jorritsma , Johannes Klerk , Bernhard Geuppert , Aart Van Beuzekom , Petrus Franciscus Mandigers , Franz Sorg , Peter Deufel
发明人： Erik Loopstra , Adrianus Engelen , Bernardus Luttikhuis , Maria Rubingh , Johannes Hazenberg , Laurentius Jorritsma , Johannes Klerk , Bernhard Geuppert , Aart Van Beuzekom , Petrus Franciscus Mandigers , Franz Sorg , Peter Deufel
IPC分类号： G03B27/54
CPC分类号： G03F7/70308 , G03F7/70825 , G03F7/70933
摘要： A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.
摘要翻译： 光刻设备具有在其投影系统的光瞳平面中交换光学元件的组件。 光学元件可以是光瞳滤光器，并且可以符合对于掩模版标准规定的物理尺寸，例如。 侧面基本上等于5,6或9英寸。
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公开(公告)号：US20110255181A1
公开(公告)日：2011-10-20
申请号：US13170951
申请日：2011-06-28
IPC分类号： G02B7/02
CPC分类号： G03F7/70191 , G02B7/00 , G02B7/02 , G02B7/023 , G02B7/14 , G02B13/14 , G03F7/7015 , G03F7/70258 , G03F7/70825
摘要： A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same.
摘要翻译： 安装在光刻物镜中的两个相邻光学元件之间的光学元件的替换装置具有用于待更换的光学元件的保持器，该保持器可以通过其外壳中的侧向开口移动到光刻物镜中。
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