摘要:
Replacement devices for at least one replaceable optical element mounted at least indirectly in a lithographic projection exposure apparatus are disclosed. Lithography objectives and illumination systems are also disclosed. Methods for positioning a replaceable optical element within a lithographic projection exposure apparatus of this type, and methods for replacing a replaceable optical element within a lithographic projection exposure apparatus via a replacement device are also disclosed.
摘要:
Support device for positioning an optical element (2), in particular a lens, comprising a first frame unit (1.1) and a plurality of support units (1.2) for supporting said optical element (2), each of said support units (2) having a first end for fixedly engaging a part of said first frame unit (1.1) and a second end for supporting said optical element (2), said support units (1.2) being arranged for positioning said optical element (2) along a first direction, a second direction and a third direction in the manner of parallel kinematics, said first direction, said second direction and said third direction being translatory directions arranged mutually transverse to each other, wherein there are provided three support units (1.2) and wherein each of said support units (1.2) provides for restriction of a first degree of freedom and a second degree of freedom to support said optical element (2) in an isostatic manner.
摘要:
In a device (1) for preventing the creeping of an optical element (2), in particular a lens or a mirror, the optical element (2) is connected to a mount (3) via connecting members (4) arranged on the circumference of the optical element (2). The position of the optical element (2) in an objective (PL) deviates from the vertical axial position. In order to compensate the dead weight at least of the optical element (2) at least one holding element (7) via which the optical element (2) is held on a housing part of the objective (PL) is provided in addition to the connecting members (4).
摘要:
An objective (2) with at least one optical element (4), which is mounted in an inner ring (3). The inner ring (3) is connected to an outer mount (1). A manipulator (10) is provided for displacing the optical element (4) in at least a direction perpendicular to an optical axis. The inner ring (3) is connected to the outer mount (1) by means of at least two adjusting joints (5) with manipulators (10) and at least one swivel joint (6). The at least two adjusting joints (5) and the at least one swivel joint (6) are provided with joint arms (8) extending at least approximately in a tangential direction with respect to the inner ring (3), by means of which arms the inner ring (3) is elastically connected to the outer mount (1). The ends of the joint arms (8) are articulated on the inner ring (3) in such a way that temperature-induced changes in length of the joint arms (8) are converted into a uniform turning direction of the inner ring (3) with respect to the outer mount (1) about the center of the optical element.
摘要:
An objective (2) with at least one optical element (4), which is mounted in an inner ring (3). The inner ring (3) is connected to an outer mount (1). A manipulator (10) is provided for displacing the optical element (4) in at least a direction perpendicular to an optical axis. The inner ring (3) is connected to the outer mount (1) by means of at least two adjusting joints (5) with manipulators (10) and at least one swivel joint (6). The at least two adjusting joints (5) and the at least one swivel joint (6) are provided with joint arms (8) extending at least approximately in a tangential direction with respect to the inner ring (3), by means of which arms the inner ring (3) is elastically connected to the outer mount (1). The ends of the joint arms (8) are articulated on the inner ring (3) in such a way that temperature-induced changes in length of the joint arms (8) are converted into a uniform turning direction of the inner ring (3) with respect to the outer mount (1) about the center of the optical element.
摘要:
An energy filter device for beams which are used in the course of ion beam therapy, wherein at least one passive modulator is provided. The modulator comprises a scattering film for the beams and a collimator with an opening for controlling the beams.
摘要:
The invention relates to an apparatus and a method for irradiating tumor tissue (3) of a patient (10) by means of an ion beam (2). For that purpose, the apparatus has a deflecting device (1) for the ion beam (2) for slice-wise and area-wise scanning of the tumor tissue (3) and an ion beam energy control device for slice-wise and depth-wise scanning of the ion beam (2). An electromechanically driven ion-braking device (11, 12) is provided as a depth-wise scanning adaptation apparatus (5) for adapting the range of the ion beam (2) and has faster depth-wise adaptation than the energy control device of an accelerator. The movement of a patient is monitored by means of a movement detection device (7) for detecting a temporal and positional change in the location of the tumor tissue (3) in a treatment space (8). A control device controls the deflecting device (1) and the depth-wise adaptation apparatus (5) for adjusting the ion beam direction and ion beam range, respectively, when scanning the tumor tissue (3) in the course of temporal and positional change in the location of the tumor tissue (3) in the treatment space (8).
摘要:
In the case of an apparatus for tilting an object about at least one axis, in particular an optical element, such as a lens (9), the object in the case of an optical element is supported by an inner ring (7) and connected via at least three bearing points to a mount or an outer ring (8). Tilting of the object (9) is adjustable by means of adjusting elements. A plurality of links (1-6) are provided as adjusting elements, some of which, as supporting links (1-4), bear the inner ring (7) with respect to the outer ring (8) in such a way that the inner ring (7) can rotate only about two mutually perpendicular tilting axes (x, y axis). Two further links, as adjusting links (5, 6), support torsional moments about the mutually perpendicular tilting axes. The tilting angles are adjustable by adjusting the adjusting links (5, 6).