公开(公告)号：US20070012339A1

公开(公告)日：2007-01-18

申请号：US11345529

申请日：2006-02-02

申请人： Masahiro Fukuda ,  Taro Yamamoto

发明人： Masahiro Fukuda ,  Taro Yamamoto

IPC分类号： B08B3/00

CPC分类号： H01L21/67051 ,  H01L21/68742

摘要： A wafer W is held in a horizontal attitude within an airtight container 41 by a vacuum chuck 42 such that small gaps are formed between the wafer W and the inner surfaces of the airtight container 41. A cleaning liquid is supplied toward the center portion of a front surface of the wafer W through a fluid supply port 40 which is an end of a fluid supply path 5, and is discharged through a fluid discharge portion 44 arranged in the bottom portion of the airtight container 41 in a form of a groove running along a circle having its center located on the center axis of the wafer W. The cleaning liquid flows and spreads from the center portion of the wafer W toward the peripheral portion while removing particles adhered to the wafer W, and is discharged through the fluid discharge portion 44. This arrangement allows the particles to be uniformly and reliably removed without rotating the wafer W. The entire cleaning apparatus 4 has a small size.

摘要翻译： 通过真空吸盘42将晶片W保持在气密容器41内的水平姿态，使得在晶片W和气密容器41的内表面之间形成小的间隙。 通过作为流体供给路径5的端部的流体供给口40朝向晶片W的前表面的中央部供给清洗液，通过配置在流体供给路径5的底部的流体排出部44排出 气密容器41是沿其圆周方向延伸的凹槽的形式，其中心位于晶片W的中心轴线上。清洗液体从晶片W的中心部向周边部分流动并扩散，同时除去附着在晶片W上的颗粒 晶片W，并通过流体排出部分44排出。 这种布置允许在不旋转晶片W的情况下均匀且可靠地除去颗粒。整个清洁装置4具有小尺寸。

公开(公告)号：US08770111B2

公开(公告)日：2014-07-08

申请号：US13877278

申请日：2011-09-08

申请人： Taro Yamamoto ,  Yusuke Fujiwara

发明人： Taro Yamamoto ,  Yusuke Fujiwara

IPC分类号： B61B3/00

CPC分类号： H01L21/677 ,  B61B3/02 ,  H01L21/6773 ,  H01L21/67733

摘要： A transport vehicle that reduces shaking of a transport article includes a travelling unit, a transport unit, a fall prevention member, and a shaking reduction member. The travelling unit travels along a rail provided on a ceiling. The transport unit transports a transport article. The fall prevention member is rotatably supported such that it can rotate between a fall prevention position and a retracted position. The fall prevention member is, at the fall prevention position, below the transport article. A pushing portion of the shaking reduction member pushes against a side surface of the transport article with a pushing surface thereof in conjunction with the rotating of the fall prevention member from the retracted position to the fall prevention position. A lever portion of the shaking reduction member has one end supporting the pushing portion and the other end rotatably supported in a manner coaxial with the fall prevention member.

摘要翻译： 减少运输物品晃动的运送车辆包括行驶单元，运送单元，防跌落构件和减震构件。 旅行单位沿着设在天花板上的轨道行进。 运输单位运输运输物品。 防坠落构件被可旋转地支撑，使得其能够在防坠落位置和缩回位置之间旋转。 防坠落成员在防坠落位置处在运输物品的下面。 摇动减速部件的推动部分随着其推动表面与防倒下部件从缩回位置的旋转到防止摔倒位置一起推动输送物品的侧表面。 减震构件的杠杆部分具有支撑推动部分的一端，而另一端以与防坠落构件同轴的方式可旋转地支撑。

公开(公告)号：US08632295B2

公开(公告)日：2014-01-21

申请号：US12183100

申请日：2008-07-31

申请人： Hisashi Onishi ,  Taro Yamamoto ,  Shinji Fujioka ,  Nobuhiro Gunge

发明人： Hisashi Onishi ,  Taro Yamamoto ,  Shinji Fujioka ,  Nobuhiro Gunge

IPC分类号： B66C3/00

CPC分类号： B65G37/02 ,  B65G2201/0297 ,  H01L21/67259 ,  H01L21/67775 ,  H01L21/68707

摘要： A transporting system includes: a track portion; a plurality of loading platforms, disposed along the track portion, whose positions differ from each other in at least one direction; a plurality of transporting vehicles, each having a travelling device travelling along the track portion and a loading device, for loading transported objects; a first detecting device for detecting a first reference position, of the loading device when a reference transporting vehicle loads the transported object; a second detecting device for detecting a second reference position, of the loading device when each of the other transporting vehicles other than the reference transporting vehicle loads the transported object; and a teaching device for providing information on the position of the loading device with respect to each of the other loading platforms when each of the other transporting vehicles loads the transported object, on the basis of the detected first and second reference positions.

摘要翻译： 传送系统包括：轨道部分; 多个装载平台，沿着轨道部分设置，其位置在至少一个方向上彼此不同; 多个运送车辆，每个运送车辆具有沿轨道部分行进的行进装置和用于装载被运送物体的装载装置; 用于检测第一参考位置的第一检测装置;当参考运送车辆装载被运送物体时，装载装置的第一检测装置; 用于检测第二参考位置的第二检测装置，当除了参考运送车辆之外的其它运输车辆中的每一个装载运送的物体时，装载装置; 以及教学装置，用于根据检测到的第一和第二参考位置，提供关于装载装置相对于每个其他装载平台的位置的信息，当每个其他运送车辆装载被运送物体时。

公开(公告)号：US08186298B2

公开(公告)日：2012-05-29

申请号：US12106747

申请日：2008-04-21

申请人： Nobuhiro Ogata ,  Hiroichi Inada ,  Taro Yamamoto ,  Akihiro Fujimoto

发明人： Nobuhiro Ogata ,  Hiroichi Inada ,  Taro Yamamoto ,  Akihiro Fujimoto

IPC分类号： B05B13/04 ,  B05D1/02

CPC分类号： H01L21/67051

摘要： A coating film forming apparatus that holds a substrate upon a spin chuck and forms a coating film by supplying a chemical liquid upon a top surface of said substrate comprises: an outer cup provided detachably to surround the spin chuck; an inner cup provided detachably to surround a region underneath the substrate held upon the chuck; a cleaning nozzle configured to supply a cleaning liquid for cleaning a peripheral edge part of the substrate, such that the cleaning liquid is supplied to a peripheral part of a bottom surface of the substrate; a cutout part for nozzle mounting, the cutout part being provided to the inner cup to engage with the cleaning nozzle; and a cleaning liquid supply tube connected to the cleaning nozzle, the cleaning nozzle being detachable to the cutout part in a state in which the cleaning liquid supply tube is connected.

摘要翻译： 一种涂膜形成装置，其将基板保持在旋转卡盘上并通过在所述基板的顶表面上提供化学液体而形成涂膜，包括：可拆卸地设置以围​​绕旋转卡盘的外杯; 内杯，可拆卸地设置成围绕保持在卡盘上的基底下方的区域; 清洗喷嘴，其构造成供给清洗所述基板的周缘部的清洗液，使得所述清洗液被供给到所述基板的底面的周边部; 用于喷嘴安装的切口部分，所述切口部分设置到所述内杯以与所述清洁喷嘴接合; 以及连接到清洁喷嘴的清洗液供给管，清洗喷嘴在连接清洗液供给管的状态下可拆卸到切口部。

公开(公告)号：US08001983B2

公开(公告)日：2011-08-23

申请号：US12716981

申请日：2010-03-03

申请人： Masahiro Fukuda ,  Taro Yamamoto

发明人： Masahiro Fukuda ,  Taro Yamamoto

IPC分类号： B08B3/04 ,  B08B11/02

CPC分类号： H01L21/67051 ,  H01L21/68742

摘要： A wafer W is held in a horizontal attitude within an airtight container 41 by a vacuum chuck 42 such that small gaps are formed between the wafer W and the inner surfaces of the airtight container 41. A cleaning liquid is supplied toward the center portion of a front surface of the wafer W through a fluid supply port 40 which is an end of a fluid supply path 5, and is discharged through a fluid discharge portion 44 arranged in the bottom portion of the airtight container 41 in a form of a groove running along a circle having its center located on the center axis of the wafer W. The cleaning liquid flows and spreads from the center portion of the wafer W toward the peripheral portion while removing particles adhered to the wafer W, and is discharged through the fluid discharge portion 44. This arrangement allows the particles to be uniformly and reliably removed without rotating the wafer W. The entire cleaning apparatus 4 has a small size.

摘要翻译： 通过真空吸盘42在晶片W与密封容器41的内表面之间形成小间隙，将晶片W保持在气密容器41内的水平位置。向玻璃W的中心部分供给清洗液 通过作为流体供给路径5的端部的流体供给口40将晶片W的前表面通过布置在气密容器41的底部的流体排出部44排出，形成为沿着 其中心位于晶片W的中心轴线上。清洗液体从晶片W的中心部朝向周边部分流动，同时除去附着在晶片W上的微粒，并通过流体排出部 这种布置允许在不旋转晶片W的情况下均匀且可靠地除去颗粒。整个清洁装置4具有小尺寸。

公开(公告)号：US07826032B2

公开(公告)日：2010-11-02

申请号：US11778412

申请日：2007-07-16

申请人： Taro Yamamoto ,  Hitoshi Kosugi ,  Yoshiaki Yamada ,  Yasuhito Saiga

发明人： Taro Yamamoto ,  Hitoshi Kosugi ,  Yoshiaki Yamada ,  Yasuhito Saiga

IPC分类号： G03B27/42 ,  G21K5/10

CPC分类号： G03F7/38 ,  G03F7/168 ,  G03F7/70341 ,  G03F7/70991 ,  Y10S438/908

摘要： A circulation system for a high refractive index liquid includes a first collecting section configured to collect a high refractive index liquid used in an immersion light exposure section; a first supply section configured to supply the high refractive index liquid collected in the first collecting section to a cleaning section as a cleaning liquid; a second collecting section configured to collect the high refractive index liquid used in the cleaning section; and a second supply section configured to supply the high refractive index liquid collected in the second collecting section to the immersion light exposure section, wherein the high refractive index liquid is circulated between the immersion light exposure section and the cleaning section.

摘要翻译： 用于高折射率液体的循环系统包括：第一收集部分，被配置为收集在浸没曝光部分中使用的高折射率液体; 第一供给部构造成将收集在第一收集部中的高折射率液体供给到作为清洗液的清洗部; 第二收集部，其构造成收集在所述清洗部中使用的高折射率液体; 以及第二供给部，被构造成将在第二收集部中收集的高折射率液体供给到浸没曝光部，其中高折射率液体在浸没曝光部和清洁部之间循环。

公开(公告)号：US07714979B2

公开(公告)日：2010-05-11

申请号：US12250902

申请日：2008-10-14

申请人： Taro Yamamoto ,  Hideo Funakoshi ,  Yuichiro Inatomi

发明人： Taro Yamamoto ,  Hideo Funakoshi ,  Yuichiro Inatomi

IPC分类号： G03B27/32 ,  G03D5/00

CPC分类号： H01L21/6715

摘要： A substrate processing apparatus enables an efficient collection of a solvent vapor discharged via a nozzle onto a wafer on which a resist pattern is formed. A retaining base that retains the wafer is moved relative to the nozzle, which includes a nozzle head. A pair of leakage preventing portions are disposed opposite to each other across the nozzle head. Each of the leakage preventing portions has an opening via which the solvent vapor discharged out of the discharge opening can be sucked, or a solvent vapor blocking gas can be discharged selectively. A solvent vapor supply source and a gas supply source are switchably connected to the supply opening of the nozzle head via a first switching valve. An exhaust pump and a solvent-vapor-blocking gas supply source are switchably connected to the openings of the leakage preventing portions via a second switching valve.

摘要翻译： 基板处理装置能够有效地收集经由喷嘴排出的溶剂蒸气到形成有抗蚀剂图案的晶片上。 保持晶片的保持基座相对于包括喷嘴头的喷嘴移动。 一对防漏部分跨越喷嘴头相对设置。 每个防漏部分都有一个开口，通过该开口可以吸出从排出口排出的溶剂蒸气，或者可以选择性地排出溶剂蒸汽阻塞气体。 溶剂蒸气供应源和气体供应源通过第一切换阀可切换地连接到喷嘴头的供应开口。 排气泵和溶剂气体阻断气体供应源经由第二切换阀可切换地连接到防漏部分的开口。

公开(公告)号：US07712475B2

公开(公告)日：2010-05-11

申请号：US11345529

申请日：2006-02-02

申请人： Masahiro Fukuda ,  Taro Yamamoto

发明人： Masahiro Fukuda ,  Taro Yamamoto

IPC分类号： B08B3/04 ,  B05C5/00 ,  B05C5/02 ,  B05C3/02

CPC分类号： H01L21/67051 ,  H01L21/68742

摘要： A wafer W is held in a horizontal attitude within an airtight container 41 by a vacuum chuck 42 such that small gaps are formed between the wafer W and the inner surfaces of the airtight container 41. A cleaning liquid is supplied toward the center portion of a front surface of the wafer W through a fluid supply port 40 which is an end of a fluid supply path 5, and is discharged through a fluid discharge portion 44 arranged in the bottom portion of the airtight container 41 in a form of a groove running along a circle having its center located on the center axis of the wafer W. The cleaning liquid flows and spreads from the center portion of the wafer W toward the peripheral portion while removing particles adhered to the wafer W, and is discharged through the fluid discharge portion 44. This arrangement allows the particles to be uniformly and reliably removed without rotating the wafer W. The entire cleaning apparatus 4 has a small size.

摘要翻译： 通过真空吸盘42在晶片W与密封容器41的内表面之间形成小间隙，将晶片W保持在气密容器41内的水平位置。向玻璃W的中心部分供给清洗液 通过作为流体供给路径5的端部的流体供给口40将晶片W的前表面通过布置在气密容器41的底部的流体排出部44排出，形成为沿着 其中心位于晶片W的中心轴线上。清洗液体从晶片W的中心部朝向周边部分流动，同时除去附着在晶片W上的微粒，并通过流体排出部 这种布置允许在不旋转晶片W的情况下均匀且可靠地除去颗粒。整个清洁装置4具有小尺寸。

公开(公告)号：US07697110B2

公开(公告)日：2010-04-13

申请号：US10585873

申请日：2005-01-14

申请人： Hiroyuki Nagasaka ,  Taro Yamamoto ,  Osamu Hirakawa

发明人： Hiroyuki Nagasaka ,  Taro Yamamoto ,  Osamu Hirakawa

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70891

摘要： An exposure apparatus for emitting exposure light onto a substrate via a projection optical system and a liquid to expose the substrate includes a supply pipe which supplies the liquid; a recovery pipe which recovers the liquid; a connection pipe which connects the supply pipe and the recovery pipe; and a switching device which switches a flow path of the liquid so that when liquid supply is stopped, the liquid that has flowed into the supply pipe flows to the recovery pipe via the connection pipe. The apparatus may further include a temperature regulation apparatus connected to the supply pipe, which performs temperature regulation of the liquid supplied to the supply pipe, and has a rough temperature regulator which roughly regulates the temperature of the liquid, and a fine temperature regulator which is arranged between the rough temperature regulator and the supply pipe and performs fine regulation of this temperature.

摘要翻译： 用于经由投影光学系统和液体将曝光光发射到基板上以暴露基板的曝光装置包括：供给液体的供给管; 一种回收液体的回收管; 连接供给管和回收管的连接管; 以及切换装置，其切换液体的流路，使得当液体供应停止时，流入供给管的液体经由连接管流向回收管。 该装置还可以包括连接到供应管的温度调节装置，其对供应管供给的液体进行温度调节，并且具有大致调节液体的温度的粗略温度调节器，以及微调温度调节器， 布置在粗调温器和供水管之间，并对该温度进行微调。

公开(公告)号：US07651285B2

公开(公告)日：2010-01-26

申请号：US11907131

申请日：2007-10-09

申请人： Hitoshi Kosugi ,  Taro Yamamoto ,  Yoshiaki Yamada ,  Yasuhito Saiga

发明人： Hitoshi Kosugi ,  Taro Yamamoto ,  Yoshiaki Yamada ,  Yasuhito Saiga

IPC分类号： G03D5/00 ,  G03B27/32 ,  B05C11/02

CPC分类号： G03B27/52 ,  G03F7/2028

摘要： An edge exposure apparatus performing an exposure process on an edge portion of a wafer having a coating film (resist film) formed thereon includes position detection means for detecting positional data of an outer edge of a wafer held by a spin chuck, an exposure portion for performing an exposure process on the edge portion of the wafer, a development nozzle supplying a developer to the exposed region, and alignment means for horizontally moving the spin chuck. An exposure process is performed by the exposure portion on the edge portion of the wafer held by the spin chuck while the alignment means is controlled, based on the positional data of the outer edge of the wafer which is detected by the position detection means, such that the positional relation between the outer edge of the wafer and the exposure portion is kept constant.

摘要翻译： 在其上形成有涂膜（抗蚀剂膜）的晶片的边缘部分进行曝光处理的边缘曝光装置包括位置检测装置，用于检测由旋转卡盘保持的晶片的外边缘的位置数据， 对晶片的边缘部分进行曝光处理，将显影剂供应到曝光区域的显影喷嘴以及用于使旋转卡盘水平移动的对准装置。 基于由位置检测装置检测到的晶片的外边缘的位置数据，通过控制对准装置的由旋转卡盘保持的晶片的边缘部分上的曝光部分进行曝光处理， 晶片的外边缘与曝光部分之间的位置关系保持恒定。