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公开(公告)号：US08507116B2
公开(公告)日：2013-08-13
申请号：US13175485
申请日：2011-07-01
IPC分类号： G11B5/127
CPC分类号： G11B5/8404 , G11B5/746 , G11B5/82 , G11B5/855 , Y10T428/11
摘要： According to one embodiment, a magnetic recording medium includes a substrate, a soft magnetic layer, an underlayer, a magnetic recording layer, and a protective layer, wherein the magnetic recording layer is provided with a pattern including recording portions and non-recording portions, the non-recording portions have a composition that is equal to a composition obtained by demagnetizing the recording portions, the non-recording portions contain at least one metal element selected from the group consisting of vanadium and zirconium and at least one element selected from the group consisting of nitrogen, carbon, boron and oxygen, and the at least one element selected from the group consisting of nitrogen, carbon, boron and oxygen is contained in the non-recording portions at a higher content than the content of the at least one element selected from the group consisting of nitrogen, carbon, boron and oxygen in the recording portions.
摘要翻译： 根据一个实施例，磁记录介质包括衬底，软磁层，底层，磁记录层和保护层，其中磁记录层设置有包括记录部分和非记录部分的图案， 非记录部分的组成等于通过使记录部分退磁获得的组合物，非记录部分含有至少一种选自钒和锆的金属元素和至少一种选自组中的元素 由氮，碳，硼和氧组成，并且所述至少一种选自氮，碳，硼和氧的元素以比所述至少一种元素的含量更高的含量包含在非记录部分中 在记录部分中选自氮，碳，硼和氧。
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公开(公告)号：US08440091B2
公开(公告)日：2013-05-14
申请号：US12638841
申请日：2009-12-15
CPC分类号： G11B5/855
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium comprises forming a protective film on a ferromagnetic recording layer containing Cobalt (Co) on a substrate and forming a recess in both the protective film and the ferromagnetic recording layer at a part where a nonmagnetic layer is to be formed. The method further comprises removing Co from a part of the recess of the ferromagnetic recording layer to form the nonmagnetic layer that separates magnetic patterns made of the ferromagnetic recording layer containing Co. The nonmagnetic layer has an identical chemical composition as the ferromagnetic recording layer, except for the nonmagnetic layer having a lower Co concentration than the magnetic patterns.
摘要翻译： 根据一个实施例，制造磁记录介质的方法包括在包含钴（Co）的铁磁记录层上形成保护膜，并在保护膜和铁磁记录层中形成凹部， 将形成非磁性层。 该方法还包括从铁磁记录层的凹部的一部分去除Co以形成分离由含有Co的铁磁记录层制成的磁图案的非磁性层。非磁性层具有与铁磁记录层相同的化学成分， 对于具有比磁图案低的Co浓度的非磁性层。
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63.发明授权公开(公告)号：US08318331B2
公开(公告)日：2012-11-27
申请号：US11942904
申请日：2007-11-20
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/59688 , G11B5/743 , G11B5/855
摘要： According to one embodiment, a magnetic recording medium includes a substrate, and a magnetic recording layer formed on the substrate and having patterns of protrusions and recesses corresponding to a servo area and a recording area, in which the magnetic recording layer located in each of the recesses in the recording area has a thickness smaller than two thirds of a thickness of the magnetic recording layer corresponding to each of the protrusions, the magnetic recording layer remaining in each of the recesses in the recording area has a thickness of 1 nm or more, and a difference in height on a surface of the magnetic recording medium is 7 nm or less.
摘要翻译： 根据一个实施例，磁记录介质包括基板和形成在基板上并具有对应于伺服区域和记录区域的突起和凹槽的图案的磁记录层，其中磁记录层位于每个 记录区域中的凹部的厚度小于与每个突起相对应的磁记录层的厚度的三分之二，记录区域中每个凹槽中残留的磁记录层的厚度为1nm以上， 并且磁记录介质的表面上的高度差为7nm以下。
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公开(公告)号：US20120082800A1
公开(公告)日：2012-04-05
申请号：US13216555
申请日：2011-08-24
IPC分类号： C23C14/04
CPC分类号： C23C14/0605 , C23C14/0635 , C23C14/0658 , C23C14/5893 , G11B5/855
摘要： According to one embodiment, there is provided a method for manufacturing a magnetic recording medium, the method including: depositing a magnetic recording layer on a substrate; forming a mask on a region of the magnetic recording layer corresponding to a recording area; irradiating another region of the magnetic recording layer where the mask is not formed with an ion beam using a C-containing gas as a source gas to deactivate the another region and to thereby form a non-recording area; and forming a protective film over an entire surface of the substrate.
摘要翻译： 根据一个实施例，提供了一种用于制造磁记录介质的方法，所述方法包括：在基板上沉积磁记录层; 在对应于记录区域的磁记录层的区域上形成掩模; 使用含C气体作为源气体照射没有形成掩模的磁记录层的另一个区域，使离子束使其另一区域失活，从而形成非记录区域; 以及在所述基板的整个表面上形成保护膜。
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公开(公告)号：US20110235212A1
公开(公告)日：2011-09-29
申请号：US13007395
申请日：2011-01-14
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/743 , G11B5/855 , Y10T428/12465
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming on a magnetic recording layer a first hard mask, a second hard mask, a third hard mask and a resist, imprinting the resist with a stamper, removing a residue left in the recesses of the patterned resist, etching the third hard mask by use of the patterned resist as a mask, etching the second hard mask by use of the third hard mask as a mask, etching the first hard mask by use of the second hard mask as a mask, forming a pattern of the magnetic recording layer with ion beam irradiation, and removing the first hard mask by use of a remover liquid with higher reactivity to the metal material of the first hard mask than to a constituent element of the magnetic recording layer.
摘要翻译： 根据一个实施例，制造磁记录介质的方法包括在磁记录层上形成第一硬掩模，第二硬掩模，第三硬掩模和抗蚀剂，用压模压印抗蚀剂，除去留在 图案化抗蚀剂的凹部，通过使用图案化的抗蚀剂作为掩模蚀刻第三硬掩模，通过使用第三硬掩模作为掩模蚀刻第二硬掩模，通过使用第二硬掩模蚀刻第一硬掩模 作为掩模，通过离子束照射形成磁记录层的图案，并且通过使用对第一硬掩模的金属材料具有较高反应性的去除剂液体除去第一硬掩模，而不是磁记录的构成元件 层。
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公开(公告)号：US07993536B2
公开(公告)日：2011-08-09
申请号：US12636610
申请日：2009-12-11
IPC分类号： B44C1/22
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist film on a magnetic recording layer, imprinting a stamper on the resist film to transfer patterns of recesses and protrusions, removing residues remained in recess of the patterned resist film, etching the second hard mask using the patterned resist film as a mask to transfer patterns of recesses and protrusions, etching the first hard mask using the patterned second hard mask as a mask to transfer patterns of recesses and protrusions, and deactivating magnetism of the magnetic recording layer exposed in the recesses together with removing the second hard mask by ion-beam etching.
摘要翻译： 根据一个实施例，制造磁记录介质的方法包括在磁记录层上形成第一硬掩模，第二硬掩模和抗蚀剂膜，在抗蚀剂膜上压印印模以转印凹凸图案，去除 残留物保留在图案化抗蚀剂膜的凹部中，使用图案化的抗蚀剂膜作为掩模蚀刻第二硬掩模以转移凹凸和突起的图案，使用图案化的第二硬掩模作为掩模蚀刻第一硬掩模以转移凹槽的图案 和突起，并且通过离子束蚀刻去除第二硬掩模，使暴露于凹部中的磁记录层的磁性失活。
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67.发明申请公开(公告)号：US20110132754A1
公开(公告)日：2011-06-09
申请号：US12950235
申请日：2010-11-19
CPC分类号： C25D1/10 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G11B5/82 , G11B5/855 , Y10T428/24612
摘要： According to one embodiment, patterns of protrusions and recesses includes a substrate including a conductive region on at least one major surface, and a projecting pattern layer formed on the conductive region on the major surface, and made of a microcrystalline material, a polycrystalline material, an amorphous material, or an oxide of the microcrystalline, polycrystalline, or amorphous material.
摘要翻译： 根据一个实施例，突起和凹陷的图案包括在至少一个主表面上包括导电区域的基板和形成在主表面上的导电区域上并由微晶材料制成的突出图案层，多晶材料， 非晶材料或微晶，多晶或无定形材料的氧化物。
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68.发明申请公开(公告)号：US20050282038A1
公开(公告)日：2005-12-22
申请号：US11135258
申请日：2005-05-24
CPC分类号： B82Y10/00 , G11B5/012 , G11B5/72 , G11B5/743 , G11B5/82 , G11B5/855 , G11B2005/0029 , Y10T428/1164
摘要： A magnetic recording medium is obtained by easily patterning a magnetic recording layer without deteriorating its electromagnetic conversion characteristics, by forming a silicon-based protective film between the magnetic recording layer and a photoresist, and performing dry etching and oxygen plasma processing.
摘要翻译： 通过在磁记录层和光致抗蚀剂之间形成硅基保护膜，进行干法蚀刻和氧等离子体处理，可以通过在不损害其电磁转换特性的情况下容易地构图磁记录层而获得磁记录介质。
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69.发明授权公开(公告)号：US08372253B2
公开(公告)日：2013-02-12
申请号：US12950235
申请日：2010-11-19
CPC分类号： C25D1/10 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G11B5/82 , G11B5/855 , Y10T428/24612
摘要： According to one embodiment, patterns of protrusions and recesses includes a substrate including a conductive region on at least one major surface, and a projecting pattern layer formed on the conductive region on the major surface, and made of a microcrystalline material, a polycrystalline material, an amorphous material, or an oxide of the microcrystalline, polycrystalline, or amorphous material.
摘要翻译： 根据一个实施例，突起和凹陷的图案包括在至少一个主表面上包括导电区域的基板和形成在主表面上的导电区域上并由微晶材料制成的突出图案层，多晶材料， 非晶材料或微晶，多晶或无定形材料的氧化物。
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公开(公告)号：US20120251655A1
公开(公告)日：2012-10-04
申请号：US13492681
申请日：2012-06-08
IPC分类号： B29C59/02
CPC分类号： G11B7/261 , B29C33/424 , B29C2033/426 , B82Y10/00 , B82Y40/00 , C25D1/10 , G03F7/0002 , G11B7/263 , H01F41/34
摘要： According to one embodiment, a stamper is described with a surface that comprises patterns of protrusions and recessed. The arithmetic average roughness Ra of the surface is 1 nanometer (nm) or more and 5 nm or less.
摘要翻译： 根据一个实施例，用包括突起图案和凹陷的表面描述压模。 表面的算术平均粗糙度Ra为1nm以上且5nm以下。
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