Abstract:
Overlay measurements for a semiconductor wafer are obtained by forming a periodic grating on the wafer having a first set of ridges and a second set of ridges. The first and second sets of ridges are formed on the wafer using a first mask and a second mask, respectively. After forming the first and second sets of gratings, zero-order cross polarization measurements of a portion of the periodic grating are obtained. Any overlay error between the first and second masks used to form the first and second sets of gratings is determined based on the obtained zero-order cross polarization measurements.
Abstract:
An ellipsometric apparatus provides two impinging focused probe beams directed to reflect off the sample along two mutually distinct and preferably substantially perpendicular directions. A rotating stage rotates sections of the wafer into the travel area defined by two linear axes of two perpendicularly oriented linear stages. As a result, an entire wafer is accessed for measurement with the linear stages having a travel range of only half the wafer diameter. The reduced linear travel results in a small travel envelope occupied by the wafer and consequently in a small footprint of the apparatus. The use of two perpendicularly directed probe beams permits measurement of periodic structures along a preferred direction while permitting the use of a reduced motion stage.
Abstract:
An ellipsometer apparatus and method for use in providing an image of at least a portion of a sample includes an objective lens having a focal plane at which a sample plane of a sample is positioned. Linearly polarized light normal to the sample plane incident on the objective lens is provided, and the incident linearly polarized light is focused onto the sample. At least a portion of the focused incident polarized light is reflected by the sample resulting in reflected light. Spatial filtering is used to modify at least a portion of the incident or the reflected light. An analyzer portion is operable to generate polarization information based on the reflected light.
Abstract:
The present invention relates to a method and system for efficiently determining grating profiles using dynamic learning in a library generation process. The present invention also relates to a method and system for searching and matching trial grating profiles to determine shape, profile, and spectrum data information associated with an actual grating profile.
Abstract:
A method and an apparatus for measuring the density variations, static and dynamic, in substances that are at least partially transparent to electromagnetic waves is disclosed. A special birefringement crystal phase shifting assembly encodes the angle of incidence resulting from the refractive effects of the electromagnetic waves having passed through a density variation. The angle of incidence is encoded as a poralization phase shift. Specifically, the poralization phase shift is between the ordinary and the extraordinary rays. That poralization phase shift has a known and definable relationship to the gas density experienced by the electromagnetic wave during its path.
Abstract:
Methods and apparatus for optical Stokes polarimetry are provided. A polarimeter according to this invention includes a rotatable waveplate, including a variable birefringent material, and a polarizer optically downstream from the waveplate. The polarimeter can be integrated into a guided wave structure.
Abstract:
A spectroscopic ellipsometer having a multiwavelength light source, spectrometer (or wavelength-scanning monochromator and photodetector), a polarizer and polarization analyzer, and one or more objectives in the illumination and collection light paths, further comprises a stationary polarization modulator that modulates the light polarization versus wavelength. Modulator can be an optically active crystal rotating the linear polarization plane by a different angle for each wavelength or a non-achromatic waveplate retarder that varies the relative phase delay of the polarization components periodically over wavelength. The measured spectrum can be used to characterize selected features or parameters of a sample, e.g. by comparison with one or more theoretical spectra.
Abstract:
This invention relates to a method of measuring the internal structure (packing structure or dispersion condition of particulate material) of a composite filled with particles having an irregular matrix by observations based on its optical anisotropy, in which the internal structure (packing structure or dispersion condition of particulate material) of the composite obtained by mixing particulate material as raw material with a liquid material is made visible by utilizing the photoelasticity based on local rearrangement of liquid material molecules or difference of refractive indices of the particulate material and liquid material, and the structure thereof are observed, and an evaluation device using this principle of measurement.
Abstract:
A polarimeter system that averages multiple retardance measurement samples to cancel the effects of system birefringence in the diagnostic path. The retardance measurement errors arising from system birefringence have a symmetry that repeats over each complete cycle of optical signal rotation cycle. This symmetry is such that averaging the four retardance measurements collected over one complete rotation cycle cancels the effects of system birefringence, leaving a mean retardance measurement free of residual polarization bias. Apparatus is provided for determining the birefringence, thickness, and fiber orientation of the nerve fiber layer at the fundus of the eye by measuring the polarization bias induced in a return beam of polarized light that is reflected at the ocular fundus from an incident beam of a known polarization state. A corneal polarization compensator cancels the birefringent effects of the cornea and other portions of the eye anterior to the fundus.
Abstract:
An ellipsometer and ellipsometry method uses radial symmetry. For example, circularly polarized light may be focused to a spot on a sample using an objective lens and reflected therefrom. A radially symmetric ellipsometric signal based on the reflected light and representative of at least one characteristic of the sample may be attained using a radially symmetric analyzer apparatus, e.g., a pure Polarization rotator such as two half wave plates and a radially symmetric analyzer such as a birefringent lens.