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    Scanned-spot-array DUV lithography system
    1.
    发明授权
    Scanned-spot-array DUV lithography system 有权

    公开(公告)号：US09651874B2

    公开(公告)日：2017-05-16

    申请号：US14906875

    申请日：2014-06-20

    申请人： Kenneth C. Johnson

    发明人： Kenneth C. Johnson

    IPC分类号： G03B27/42 ,  G03F7/20

    CPC分类号： G03F7/704 ,  G03F7/70291

    摘要： A DUV scanned-spot-array lithography system comprises an array of phase- Fresnel microlenses, which focus multiple radiation beams through intermediate foci at the object surface of a projection system. The intermediate foci are imaged by the projection system onto corresponding focused-radiation spots on an image plane, and the spots expose a photosensitive layer proximate the image plane as the layer is scanned in synchronization with modulation of the beams. The modulators may comprise micromechanical shutters proximate the intermediate foci for ON/OFF switching, in series with transmission grating modulators for gray-level control, and the microlenses may also be actuated to provide dynamic beam centering control. A nodal line printing technique may be used to provide ultra-high-resolution and high-throughput maskless printing capability in conjunction with multi-patterning or dual-wavelength recording processes.

    STACKED-GRATING LIGHT MODULATOR
    2.
    发明申请
    STACKED-GRATING LIGHT MODULATOR 失效
    堆叠光调制器

    公开(公告)号：US20120200909A1

    公开(公告)日：2012-08-09

    申请号：US13198512

    申请日：2011-08-04

    申请人： Kenneth C. Johnson

    发明人： Kenneth C. Johnson

    IPC分类号： G02B26/00

    CPC分类号： G11B7/1353 ,  G02B26/0808

    摘要： A “Stacked-Grating Light Modulator” (“SGLM”) comprises two diffraction grating elements, a reflection grating and a transmission grating, in close parallel proximity. An incident beam transmits through the transmission grating and is reflected by the reflection grating back through the transmission grating. The relative lateral position of the two gratings is varied to modulate the beam's zero-order reflectance.

    摘要翻译： “堆叠光栅调制器”（“SGLM”）包括两个衍射光栅元件，反射光栅和透射光栅，并联接近。 入射光束通过透射光栅传播并被反射光栅反射回透射光栅。 改变两个光栅的相对横向位置以调制光束的零级反射率。

    Focus and alignment sensors and methods for use with scanning microlens-array printer
    3.
    发明授权
    Focus and alignment sensors and methods for use with scanning microlens-array printer 失效
    聚焦和对准传感器以及用于扫描微透镜阵列打印机的方法

    公开(公告)号：US07295315B2

    公开(公告)日：2007-11-13

    申请号：US10871101

    申请日：2004-06-18

    申请人： Kenneth C. Johnson

    发明人： Kenneth C. Johnson

    IPC分类号： G01B11/00

    CPC分类号： G03F9/7019 ,  B41J2/451 ,  G02B5/1814 ,  G02B27/4255 ,  G03F9/7011 ,  G03F9/7026 ,  G03F9/7049 ,  G03F9/7076

    摘要： A scanning microlens-array printer comprises an optical focus/alignment subsystem in which the optical sensor elements are integrated within a microlens printhead unit. The unit also incorporates an integrated spatial light modulator; thus the printhead incorporates all the critical optomechanical components necessary for high-resolution, maskless, lithographic printing. Alignment is detected by an interferometric process in which a reference diffraction grating on a printing surface coherently combines two optical beams to generate an interference signal that is sensitive to the grating's lateral position. Focus sensing is effected by using the reference grating to divide a normally-incident convergent beam into two obliquely-directed reflected beams, and detecting the focus-induced translational shift in the reflected beams' focal points.

    摘要翻译： 扫描微透镜阵列打印机包括光学对准/对准子系统，其中光学传感器元件集成在微透镜打印头单元内。 该单元还集成了一个集成的空间光调制器; 因此打印头包含高分辨率，无掩模，平版印刷所需的所有关键光学机械部件。 通过干涉测量过程检测对准，其中在打印表面上的参考衍射光栅相干地组合两个光束以产生对光栅的横向位置敏感的干涉信号。 通过使用参考光栅将正常入射的会聚光束分成两个倾斜定向的反射光束并检测反射光束的焦点中的焦点引导的平移位移来实现聚焦感测。

    Small-spot spectrometry instrument with reduced polarization and multiple-element depolarizer therefor
    4.
    发明授权
    Small-spot spectrometry instrument with reduced polarization and multiple-element depolarizer therefor 失效
    具有减少极化的小点光谱仪器和多元素去极化器

    公开(公告)号：US07248362B2

    公开(公告)日：2007-07-24

    申请号：US11599906

    申请日：2006-11-15

    申请人： Adam E. Norton ,  Kenneth C. Johnson ,  Fred E. Stanke

    发明人： Adam E. Norton ,  Kenneth C. Johnson ,  Fred E. Stanke

    IPC分类号： G01J3/28

    CPC分类号： G01J3/02 ,  G01J3/0224 ,  G01J3/0243 ,  G01J3/28 ,  G01N21/21 ,  G01N21/31 ,  G01N21/956 ,  G01N2021/213 ,  G02B5/3083 ,  G02B27/28 ,  G02B27/286 ,  G02B27/288 ,  G03F7/70625 ,  G03F7/70991

    摘要： A small-spot imaging, spectrometry instrument for measuring properties of a sample has a polarization-scrambling element, such as a birefringent plate depolarizer, incorporated between the polarization-introducing components of the system, such as the beamsplitter, and the microscope objective of the system. The plate depolarizer varies polarization with wavelength, and may be a Lyot depolarizer with two plates, or a depolarizer with more than two plates (such as a three-plate depolarizer). Sinusoidal perturbation in the resulting measured spectrum can be removed by data processing techniques or, if the depolarizer is thick or highly birefringent, the perturbation may be narrower than the wavelength resolution of the instrument.

    摘要翻译： 用于测量样品性质的小点成像光谱仪器具有结合在系统的偏振引导部件（例如分束器）之间的偏振加扰元件，例如双折射板去偏振器，以及显微镜物镜 系统。 板去极化器可以使波长偏振，并且可以是具有两个板的Lyot去极化器或具有多于两个板（例如三板去极化器）的去极化器。 可以通过数据处理技术去除所得测量光谱中的正弦扰动，或者如果消偏振器是厚的或高度双折射的，则扰动可能比仪器的波长分辨率窄。

    CD metrology method
    6.
    发明授权
    CD metrology method 有权
    CD测量方法

    公开(公告)号：US07069153B2

    公开(公告)日：2006-06-27

    申请号：US10764792

    申请日：2004-01-26

    申请人： Kenneth C. Johnson

    发明人： Kenneth C. Johnson

    IPC分类号： G01N21/00

    CPC分类号： G01N21/956 ,  G01B11/24 ,  G01N21/8851

    摘要： A method for rapidly analyzing data gathered during scatterometry and related methods uses a combination of database lookup, database interpolation and theoretical model evaluation. Database lookup is used to provide an initial mapping between a measured optical response and a set of associated measurement parameters. Interpolation is then used to refine the optical response and parameters. A theoretical model is then repeatedly evaluated to refine the optical response and parameters previously refined by the interpolation. In this way, the present invention avoids the inaccuracies associated with traditional interpolation-based analysis and without incurring the computational complexity associated with real-time database supplementation.

    摘要翻译： 用于快速分析在散射测量和相关方法期间收集的数据的方法使用数据库查找，数据库插值和理论模型评估的组合。 数据库查找用于提供测量的光学响应和一组相关测量参数之间的初始映射。 然后使用插值来细化光学响应和参数。 然后重复评估理论模型，以细化先前通过插值精炼的光学响应和参数。 以这种方式，本发明避免了与传统的基于插值的分析相关联的不准确性，并且不会导致与实时数据库补充相关联的计算复杂度。

    Focus and alignment sensors and methods for use with scanning microlens-array printer
    7.
    发明申请
    Focus and alignment sensors and methods for use with scanning microlens-array printer 失效
    聚焦和对准传感器以及用于扫描微透镜阵列打印机的方法

    公开(公告)号：US20040263860A1

    公开(公告)日：2004-12-30

    申请号：US10871101

    申请日：2004-06-18

    申请人： Kenneth C. Johnson

    发明人： Kenneth C. Johnson

    IPC分类号： G01B009/02

    CPC分类号： G03F9/7019 ,  B41J2/451 ,  G02B5/1814 ,  G02B27/4255 ,  G03F9/7011 ,  G03F9/7026 ,  G03F9/7049 ,  G03F9/7076

    摘要： A scanning microlens-array printer comprises an optical focus/alignment subsystem in which the optical sensor elements are integrated within a microlens printhead unit. The unit also incorporates an integrated spatial light modulator; thus the printhead incorporates all the critical optomechanical components necessary for high-resolution, maskless, lithographic printing. Alignment is detected by an interferometric process in which a reference diffraction grating on a printing surface coherently combines two optical beams to generate an interference signal that is sensitive to the grating's lateral position. Focus sensing is effected by using the reference grating to divide a normally-incident convergent beam into two obliquely-directed reflected beams, and detecting the focus-induced translational shift in the reflected beams' focal points.

    Method of measuring meso-scale structures on wafers
    8.
    发明授权
    Method of measuring meso-scale structures on wafers 有权

    公开(公告)号：US06623991B2

    公开(公告)日：2003-09-23

    申请号：US09999410

    申请日：2001-10-31

    申请人： Kenneth C. Johnson ,  Fred E. Stanke

    发明人： Kenneth C. Johnson ,  Fred E. Stanke

    IPC分类号： H01L2100

    CPC分类号： H01L21/67 ,  G01B11/0625 ,  G01B11/30 ,  G01N21/211 ,  H01L22/12

    摘要： A method of measuring at least one parameter associated with a portion of a sample having formed thereon one or more structures with at least two zones each having an associated zone reflectance property. The method includes the steps of illuminating the zones with broadband light, and measuring at least one reflectance property of light reflected from the at least two zones. The measurement includes a substantial portion of non-specularly scattered light, thereby increasing the quality of the measurement. The method further includes the step of fitting a parameterized model to the measured reflectance property. The parameterized model mixes the zone reflectance properties of the zones to account for partially coherent light interactions between the two zones.

    Maskless, microlens EUV lithography system
    9.
    发明授权
    Maskless, microlens EUV lithography system 失效
    无掩模，微透镜EUV光刻系统

    公开(公告)号：US06498685B1

    公开(公告)日：2002-12-24

    申请号：US09478233

    申请日：2000-01-04

    申请人： Kenneth C. Johnson

    发明人： Kenneth C. Johnson

    IPC分类号： G02B2710

    CPC分类号： G02B21/0056 ,  B81C1/0038 ,  B82Y10/00 ,  F25J2215/36 ,  G02B3/0056 ,  G02B3/0062 ,  G02B21/0028 ,  G02B21/004 ,  G02B21/0044 ,  G02B21/14 ,  G03F7/70033 ,  G03F7/70291 ,  G03F7/704 ,  G03F9/70 ,  G21K1/06

    摘要： A maskless, extreme ultraviolet (EUV) lithography system uses microlens arrays to focus EUV radiation (at an operating wavelength of 11.3 nm) onto diffraction-limited (58-nm FWHM) focused spots on a wafer printing surface. The focus spots are intensity-modulated by means of microshutter modulators and are raster-scanned across a wafer surface to create a digitally synthesized exposure image. The system uses a two-stage microlens configuration to achieve both a high fill factor and acceptable transmission efficiency. EUV illumination is supplied by a 6 kHz xenon plasma source, and the illumination optics comprise an aspheric condenser mirror, a spherical collimating mirror, and two sets of flat, terraced fold mirrors that partition the illumination into separate illumination fields covering individual microlens arrays. (The system has no projection optics, because the image modulator elements are integrated with the microlens arrays.) The printing throughput is estimated to be 62 (300-mm) wafers per hour (assuming a resist exposure threshold of 20 mJ/cm2), and print resolution is estimated at 70 nanometers for mixed positive- and negative-tone patterns (at k1=0.6).

    摘要翻译： 无掩模，极紫外（EUV）光刻系统使用微透镜阵列将EUV辐射（在11.3nm的工作波长）聚焦到晶片印刷表面上的衍射限制（58-nm FWHM）聚焦点上。 聚焦点通过微振荡调制器进行强度调制，并在晶片表面上进行光栅扫描，以产生数字合成的曝光图像。 该系统使用两级微透镜配置来实现高填充因子和可接受的传输效率。 EUV照明由6kHz氙等离子体源提供，并且照明光学器件包括非球面聚光镜，球面准直镜和两组平坦的梯形折叠镜，其将照明分成分开的照明场，覆盖各个微透镜阵列。 （该系统没有投影光学器件，因为图像调制器元件与微透镜阵列集成。）打印吞吐量估计为每小时62（300mm）晶片（假定抗蚀剂曝光阈值为20mJ / cm 2）， 并且对于混合的正负色调图案（k1 = 0.6），印刷分辨率估计为70纳米。