公开(公告)号：US20090296062A1

公开(公告)日：2009-12-03

申请号：US12392877

申请日：2009-02-25

Applicant: Sang-Hyun PARK ,  Sang-Don Jang ,  Hi-Kuk Lee ,  Jeong-Min Kim

Inventor： Sang-Hyun PARK ,  Sang-Don Jang ,  Hi-Kuk Lee ,  Jeong-Min Kim

IPC: G03B27/54 ,  G01B9/02

CPC classification number: G03B27/54 ,  G03F7/70291 ,  G03F7/70516 ,  G03F7/7085

Abstract: A method of measuring a position error of a beam of an exposure apparatus and an exposure apparatus using the same are provided. An exposure apparatus using a digital micromirror device (DMD) element instead of a mask measures a radiation amount of a beam that passes through each pinhole using a mask including a pinhole, and when the radiation amount is less than a reference value, it is determined that an exposure beam has a position error. By using the exposure apparatus and a method of measuring a position error of a beam, a measurement time period is reduced, and a position error of a beam is simply and accurately determined.

Abstract translation: 提供了一种测量曝光设备的光束的位置误差和使用其的曝光设备的方法。 使用数字微镜装置（DMD）元件而不是掩模的曝光装置使用包括针孔的掩模测量穿过每个针孔的光束的辐射量，并且当辐射量小于参考值时，确定 曝光光束具有位置误差。 通过使用曝光装置和测量光束的位置误差的方法，测量时间减少，并且简单且准确地确定光束的位置误差。

公开(公告)号：US20090269920A1

公开(公告)日：2009-10-29

申请号：US12420783

申请日：2009-04-08

Applicant: Jeong-Min PARK ,  Hi-Kuk Lee ,  Doo-Hee Jung

Inventor： Jeong-Min PARK ,  Hi-Kuk Lee ,  Doo-Hee Jung

IPC: H01L21/336 ,  H01L23/52

CPC classification number: H01L21/76873 ,  H01L21/0272 ,  H01L21/76804 ,  H01L21/76843 ,  H01L21/76879 ,  H01L27/124 ,  H01L27/1248

Abstract: A method of forming an interconnection line and a method of manufacturing a thin film transistor substrate are provided in accordance with one or more embodiments of the present invention. The method of forming an interconnection line in accordance with one or more embodiments of the present invention includes preparing a substrate, forming a lower organic layer and an upper organic layer on the substrate in lamination, forming trenches in parts of the upper organic layer and the lower organic layer, forming a lower interconnection layer in the trenches formed in parts of the lower organic layer, removing the upper organic layer, and filling the trenches formed in parts of the lower organic layer with an upper interconnection layer.

Abstract translation: 根据本发明的一个或多个实施例，提供形成互连线的方法和制造薄膜晶体管基板的方法。 根据本发明的一个或多个实施例的形成互连线的方法包括在层压中制备衬底，在衬底上形成下有机层和上有机层，在上有机层的一部分中形成沟槽， 在下部有机层的一部分形成的沟槽中形成下部布线层，除去上部有机层，以及在上部互连层上填充下部有机层的部分的沟槽。

公开(公告)号：US20090258497A1

公开(公告)日：2009-10-15

申请号：US12389296

申请日：2009-02-19

Applicant: Jeong-Min Park ,  Doo-Hee Jung ,  Jung-Soo Lee ,  Hi-Kuk Lee ,  Sae-Tae Oh ,  Jae-Young Choi ,  Doek-Man Kang

Inventor： Jeong-Min Park ,  Doo-Hee Jung ,  Jung-Soo Lee ,  Hi-Kuk Lee ,  Sae-Tae Oh ,  Jae-Young Choi ,  Doek-Man Kang

IPC: H01L21/311 ,  G03F7/00

CPC classification number: G03F7/0236 ,  G03F7/0007

Abstract: A photoresist resin composition, a method for forming a pattern and a method for manufacturing a display panel using the photoresist resin composition are disclosed. The photoresist resin composition includes an alkali soluble resin, a photoresist compound, and a solvent, wherein the alkali soluble resin includes a first polymer resin represented by the following Chemical Formula 1, wherein, of R1, R2, R3, R4, R5 and R6, at least one is a hydroxyl group, at least two are methyl groups and any remaining groups are hydrogen, and of R7, R8, R9, R10 and R11, at least one is a hydroxyl group, at least two are methyl groups and any remaining groups are hydrogen.

Abstract translation: 公开了光致抗蚀剂树脂组合物，形成图案的方法和使用该光致抗蚀剂树脂组合物的显示面板的制造方法。 光致抗蚀剂树脂组合物包括碱溶性树脂，光致抗蚀剂化合物和溶剂，其中碱溶性树脂包括由以下化学式1表示的第一聚合物树脂，其中R1，R2，R3，R4，R5和R6 至少一个是羟基，至少两个是甲基，任何剩余的基团是氢，R7，R8，R9，R10和R11中的至少一个是羟基，至少两个是甲基，任何 剩余的基团是氢。

公开(公告)号：US20090237581A1

公开(公告)日：2009-09-24

申请号：US12267164

申请日：2008-11-07

Applicant: Jae-Sung KIM ,  Hoon Kang ,  Yang-Ho Jung ,  Hi-Kuk Lee

Inventor： Jae-Sung KIM ,  Hoon Kang ,  Yang-Ho Jung ,  Hi-Kuk Lee

IPC: G02F1/1368 ,  G02F1/13

CPC classification number: G02F1/1339

Abstract: In accordance with one or more embodiments of the present disclosure, a liquid crystal display includes a first substrate, a plurality of first signal lines formed on the first substrate, a plurality of second signal lines intersecting the first signal lines, a plurality of thin film transistors connected to the first signal lines and the second signal lines, an organic insulator formed on the thin film transistors, a plurality of pixel electrodes formed on the organic insulator, a second substrate facing the first substrate, a common electrode formed on the second substrate, a sealant disposed between the first substrate and the second substrate and formed according to the circumference of the second substrate, and a liquid crystal layer interposed between the first substrate and the second substrate and disposed in a region defined by the sealant. The organic insulator includes an opening formed at a position overlapping the sealant.

Abstract translation: 根据本公开的一个或多个实施例，液晶显示器包括第一基板，形成在第一基板上的多个第一信号线，与第一信号线相交的多个第二信号线，多个薄膜 连接到第一信号线和第二信号线的晶体管，形成在薄膜晶体管上的有机绝缘体，形成在有机绝缘体上的多个像素电极，面对第一基板的第二基板，形成在第二基板上的公共电极 ，设置在所述第一基板和所述第二基板之间并根据所述第二基板的圆周形成的密封剂，以及插入在所述第一基板和所述第二基板之间并且设置在由所述密封剂限定的区域中的液晶层。 有机绝缘体包括形成在与密封剂重叠的位置处的开口。

公开(公告)号：US20090184325A1

公开(公告)日：2009-07-23

申请号：US12331044

申请日：2008-12-09

Applicant: Jeong-Min PARK ,  Doo-Hee JUNG ,  Hi-Kuk LEE ,  Young-Wook LEE

Inventor： Jeong-Min PARK ,  Doo-Hee JUNG ,  Hi-Kuk LEE ,  Young-Wook LEE

IPC: H01L33/00 ,  B44C1/22 ,  H01L21/336

CPC classification number: H01L21/2686 ,  H01L21/31058 ,  H01L27/1248 ,  H01L29/78636

Abstract: A method of planarizing a substrate. An organic layer is formed on a base substrate to cover a metal line formed on the base substrate. A portion of the organic layer is removed to form a pre-planarization layer exposing the metal layer, so that a surface of the base substrate having the metal line is planarized. The pre-planarization layer is cured to flow toward a side surface of the metal line to form a planarization layer making contact with the side surface of the metal line. Therefore, a stepped portion between the base substrate and the metal line can be minimized or substantially eliminated, thereby increasing the surface uniformity of a subsequent layer, thereby improving the reliability of the manufacturing process.

Abstract translation: 平面化基板的方法。 在基底基板上形成有机层，以覆盖形成在基底基板上的金属线。 去除有机层的一部分以形成暴露金属层的预平坦化层，使得具有金属线的基底基板的表面被平坦化。 固化预平坦化层以朝金属线的侧面流动，形成与金属线的侧面接触的平坦化层。 因此，可以将基底基板与金属线之间的阶梯部分最小化或基本上消除，从而提高后续层的表面均匀性，从而提高制造工艺的可靠性。

公开(公告)号：US20090176325A1

公开(公告)日：2009-07-09

申请号：US12200525

申请日：2008-08-28

Applicant: Woo-Seok JEON ,  Jung-In PARK ,  Hi-Kuk LEE

Inventor： Woo-Seok JEON ,  Jung-In PARK ,  Hi-Kuk LEE

IPC: G03F1/00 ,  H01L33/00

CPC classification number: H01L27/1288 ,  G03F1/50 ,  G03F7/70791 ,  H01L27/1214

Abstract: A halftone mask includes a transparent substrate, a light-blocking layer, a first semi-transparent layer and a second semi-transparent layer. The transparent substrate includes a light-blocking area, a light-transmitting area, a first halftone area transmitting first light, and a second halftone area transmitting second light that is less than the first light. The light-blocking layer is formed in the light-blocking area to fully block light from being transmitted. The first and second semi-transparent layers are formed on the transparent substrate. At least one of the first and second semi-transparent layers is formed in the first halftone area, and the first and second semi-transparent layers are overlapped with each other on the second halftone area.

Abstract translation: 半色调掩模包括透明基板，遮光层，第一半透明层和第二半透明层。 透明基板包括遮光区域，透光区域，透射第一光的第一半色调区域和透射比第一光线小的第二光的第二半色调区域。 遮光层形成在遮光区域中，以完全阻止光的透射。 第一和第二半透明层形成在透明基板上。 第一半透明层和第二半透明层中的至少一个形成在第一半色调区域中，并且第一半透明层和第二半透明层在第二半色调区域上彼此重叠。

公开(公告)号：US07537974B2

公开(公告)日：2009-05-26

申请号：US11346047

申请日：2006-02-02

Applicant: Jeong-Min Park ,  Mi-Sun Ryu ,  Hi-Kuk Lee ,  Woo-Seok Jeon

Inventor： Jeong-Min Park ,  Mi-Sun Ryu ,  Hi-Kuk Lee ,  Woo-Seok Jeon

IPC: H01L21/00

CPC classification number: H01L27/1288 ,  G03F7/0007 ,  G03F7/0226 ,  G03F7/0236 ,  H01L27/1214 ,  H01L29/458 ,  H01L29/4908

Abstract: A photoresist composition includes a novolac resin having where each of R1, R2, R3, and R4 is an alkyl group having a hydrogen atom or between one through six carbon atoms and n is an integer ranging from zero through three; and a mercapto compound having Z1-SH, or SH-Z2-SH, where each of Z1 and Z2 is an alkyl group or an alkyl group having one through twenty carbon atoms, a sensitizer, and a solvent.

Abstract translation: 光致抗蚀剂组合物包括酚醛清漆树脂，其中R1，R2，R3和R4各自为具有氢原子或1-6个碳原子的烷基，n为0至3的整数; 和具有<？in-line-formula description =“In-line formula”end =“lead”？> Z1-SH或<？in-line-formula description =“In-line formula”end =“ 尾部“？> <？in-line-formula description =”In-line Formulas“end =”lead“？> SH-Z2-SH，<？in-line-formula description =”In-line Formulas“end = 尾“→>其中Z 1和Z 2各自为烷基或具有20个碳原子的烷基，敏化剂和溶剂。

公开(公告)号：US20090090911A1

公开(公告)日：2009-04-09

申请号：US12220145

申请日：2008-07-22

Applicant: Seung-Ha Choi ,  Min-Seok Oh ,  Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Sang-Gab Kim

Inventor： Seung-Ha Choi ,  Min-Seok Oh ,  Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Sang-Gab Kim

IPC: H01L29/04 ,  H01L21/84

CPC classification number: H01L27/1288 ,  G02F1/133512 ,  G02F1/136209 ,  H01L27/1214 ,  H01L27/124 ,  H01L29/78633

Abstract: A thin film transistor array panel for a flat panel display includes a substrate, a first signal line formed on the substrate, a second signal line intersecting and insulated from the first signal line, a switching element having a first terminal connected to the first signal line, a second terminal connected to the second signal line, and a third terminal, a pixel electrode connected to the third terminal of the switching element, and first and second light blocking members extending parallel to the second signal line, each being disposed on an opposite side of and partially overlapping an respective edge of the second signal line, an interval between the first and second light blocking members being in a range of from more than 1.5 μm to less than 4 μm. The array panel prevents light leakage from the display and improves its transmittance, aperture ratio and color reproducibility.

Abstract translation: 一种用于平板显示器的薄膜晶体管阵列面板包括：衬底，形成在衬底上的第一信号线，与第一信号线相交和绝缘的第二信号线;开关元件，具有连接到第一信号线 ，连接到第二信号线的第二端子，以及第三端子，连接到开关元件的第三端子的像素电极，以及平行于第二信号线延伸的第一和第二遮光部件， 并且部分地与第二信号线的相应边缘重叠，第一和第二遮光构件之间的间隔在大于1.5μm至小于4μm的范围内。 阵列面板可防止显示屏漏光，提高透光率，开口率和色彩再现性。

公开(公告)号：US07371592B2

公开(公告)日：2008-05-13

申请号：US11313150

申请日：2005-12-19

Applicant: Jeong-Min Park ,  Hi-kuk Lee ,  Woo-Seok Jeon ,  Joo-Han Kim ,  Doo-Hee Jung

Inventor： Jeong-Min Park ,  Hi-kuk Lee ,  Woo-Seok Jeon ,  Joo-Han Kim ,  Doo-Hee Jung

IPC: H01L21/66

CPC classification number: H01L27/1288 ,  H01L27/12 ,  H01L27/1214 ,  H01L27/124 ,  H01L27/14692

Abstract: A method for manufacturing a thin film transistor array panel using a photo mask is provided. The photo mask includes: a transmitting area and a translucent area, wherein the translucent area includes a plurality of light blocking portions blocking light, and wherein the light blocking portions have a plurality of areas blocking different amounts of light. By using this type of photo mask, a substantially flat layer of photoresist film can be deposited even on top of an uneven surface to manufacture a thin film transistor array panel. The flat photoresist film reduces processing cost and enhances the reliability of the panel manufacturing process.

Abstract translation: 提供一种使用光掩模制造薄膜晶体管阵列面板的方法。 光掩模包括：透射区域和半透明区域，其中半透明区域包括阻挡光的多个遮光部分，并且其中遮光部分具有阻挡不同量的光的多个区域。 通过使用这种类型的光掩模，即使在不平坦表面的顶部也可沉积基本平坦的光致抗蚀剂层，以制造薄膜晶体管阵列面板。 平坦的光致抗蚀剂膜降低了加工成本并提高了面板制造工艺的可靠性。

公开(公告)号：US20080024415A1

公开(公告)日：2008-01-31

申请号：US11782236

申请日：2007-07-24

Applicant: Doo-Hee JUNG ,  Jeong-Min PARK ,  Kyung-Su MUN ,  Hi-Kuk LEE ,  Joo-Ae YOUN

Inventor： Doo-Hee JUNG ,  Jeong-Min PARK ,  Kyung-Su MUN ,  Hi-Kuk LEE ,  Joo-Ae YOUN

IPC: G09G3/36 ,  H01L21/84

CPC classification number: G02F1/13454 ,  G02F2001/133388 ,  G02F2001/136236

Abstract: A display panel includes a substrate, signal lines, a thin film transistor, a pixel electrode and a dummy opening. The substrate has a display area and a peripheral area surrounding the display area. The signal lines are disposed on the substrate and intersect each other to define a unit pixel. The thin film transistor is electrically connected to the signal lines and disposed at the unit pixel. The pixel electrode is electrically connected to the thin film transistor. The pixel electrode is formed in the unit pixel. The dummy opening is disposed at the peripheral area and spaced apart from the signal lines.

Abstract translation: 显示面板包括基板，信号线，薄膜晶体管，像素电极和虚拟开口。 基板具有显示区域和围绕显示区域的周边区域。 信号线设置在基板上并彼此相交以限定单位像素。 薄膜晶体管电连接到信号线并且设置在单位像素处。 像素电极电连接到薄膜晶体管。 像素电极形成在单位像素中。 虚设开口设置在周边区域并与信号线间隔开。