公开(公告)号：US07537974B2

公开(公告)日：2009-05-26

申请号：US11346047

申请日：2006-02-02

申请人： Jeong-Min Park ,  Mi-Sun Ryu ,  Hi-Kuk Lee ,  Woo-Seok Jeon

发明人： Jeong-Min Park ,  Mi-Sun Ryu ,  Hi-Kuk Lee ,  Woo-Seok Jeon

IPC分类号： H01L21/00

CPC分类号： H01L27/1288 ,  G03F7/0007 ,  G03F7/0226 ,  G03F7/0236 ,  H01L27/1214 ,  H01L29/458 ,  H01L29/4908

摘要： A photoresist composition includes a novolac resin having where each of R1, R2, R3, and R4 is an alkyl group having a hydrogen atom or between one through six carbon atoms and n is an integer ranging from zero through three; and a mercapto compound having Z1-SH, or SH-Z2-SH, where each of Z1 and Z2 is an alkyl group or an alkyl group having one through twenty carbon atoms, a sensitizer, and a solvent.

摘要翻译： 光致抗蚀剂组合物包括酚醛清漆树脂，其中R1，R2，R3和R4各自为具有氢原子或1-6个碳原子的烷基，n为0至3的整数; 和具有<？in-line-formula description =“In-line formula”end =“lead”？> Z1-SH或<？in-line-formula description =“In-line formula”end =“ 尾部“？> <？in-line-formula description =”In-line Formulas“end =”lead“？> SH-Z2-SH，<？in-line-formula description =”In-line Formulas“end = 尾“→>其中Z 1和Z 2各自为烷基或具有20个碳原子的烷基，敏化剂和溶剂。

公开(公告)号：US20060188808A1

公开(公告)日：2006-08-24

申请号：US11346047

申请日：2006-02-02

申请人： Jeong-Min Park ,  Mi-Sun Ryu ,  Hi-Kuk Lee ,  Woo-Seok Jeon

发明人： Jeong-Min Park ,  Mi-Sun Ryu ,  Hi-Kuk Lee ,  Woo-Seok Jeon

IPC分类号： G03C1/76 ,  G03C1/492 ,  G03C1/494

CPC分类号： H01L27/1288 ,  G03F7/0007 ,  G03F7/0226 ,  G03F7/0236 ,  H01L27/1214 ,  H01L29/458 ,  H01L29/4908

摘要： A photoresist composition includes a novolac resin having where each of R1, R2, R3, and R4 is an alkyl group having a hydrogen atom or between one through six carbon atoms and n is an integer ranging from zero through three; and a mercapto compound having Z1-SH, or SH-Z2-SH, where each of Z1 and Z2 is an alkyl group or an allyl group having one through twenty carbon atoms, a sensitizer, and a solvent.

摘要翻译： 光致抗蚀剂组合物包括其中R 1，R 2，R 3和R 4各自的酚醛清漆树脂 是具有氢原子或1至6个碳原子的烷基，n是0至3的整数; 和具有<？in-line-formula description =“In-line Formulas”end =“lead”？> Z _{-SH的巯基化合物，或<？in-line-formula description =“ 在线公式“end =”tail“？> <？in-line-formula description =”In-line Formulas“end =”lead“？> SH-Z <2> -SH，<？ 在线公式描述=“在线公式”end =“tail”？>其中Z 1和Z 2中的每一个是烷基或烯丙基 具有一至二十个碳原子，敏化剂和溶剂。}

公开(公告)号：US20070009833A1

公开(公告)日：2007-01-11

申请号：US11483794

申请日：2006-07-07

申请人： Jeong-Min Park ,  Hi-Kuk Lee ,  Jin-Ho Ju ,  Woo-Seok Jeon ,  Doo-Hee Jung ,  Dong-Min Kim ,  Ki-Sik Choi

发明人： Jeong-Min Park ,  Hi-Kuk Lee ,  Jin-Ho Ju ,  Woo-Seok Jeon ,  Doo-Hee Jung ,  Dong-Min Kim ,  Ki-Sik Choi

IPC分类号： G03C1/00

CPC分类号： G03F7/022 ,  G03F7/0045

摘要： A photoresist composition, a method for forming a film pattern using the photoresist composition, and a method for manufacturing a thin film transistor array panel using the photoresist composition are provided. In one embodiment, a photoresist composition includes an alkali-soluble resin, a photosensitive compound, and an additive, for advantageously providing a uniform photoresist in a channel region.

公开(公告)号：US07371592B2

公开(公告)日：2008-05-13

申请号：US11313150

申请日：2005-12-19

申请人： Jeong-Min Park ,  Hi-kuk Lee ,  Woo-Seok Jeon ,  Joo-Han Kim ,  Doo-Hee Jung

发明人： Jeong-Min Park ,  Hi-kuk Lee ,  Woo-Seok Jeon ,  Joo-Han Kim ,  Doo-Hee Jung

IPC分类号： H01L21/66

CPC分类号： H01L27/1288 ,  H01L27/12 ,  H01L27/1214 ,  H01L27/124 ,  H01L27/14692

摘要： A method for manufacturing a thin film transistor array panel using a photo mask is provided. The photo mask includes: a transmitting area and a translucent area, wherein the translucent area includes a plurality of light blocking portions blocking light, and wherein the light blocking portions have a plurality of areas blocking different amounts of light. By using this type of photo mask, a substantially flat layer of photoresist film can be deposited even on top of an uneven surface to manufacture a thin film transistor array panel. The flat photoresist film reduces processing cost and enhances the reliability of the panel manufacturing process.

摘要翻译： 提供一种使用光掩模制造薄膜晶体管阵列面板的方法。 光掩模包括：透射区域和半透明区域，其中半透明区域包括阻挡光的多个遮光部分，并且其中遮光部分具有阻挡不同量的光的多个区域。 通过使用这种类型的光掩模，即使在不平坦表面的顶部也可沉积基本平坦的光致抗蚀剂层，以制造薄膜晶体管阵列面板。 平坦的光致抗蚀剂膜降低了加工成本并提高了面板制造工艺的可靠性。

公开(公告)号：US07955784B2

公开(公告)日：2011-06-07

申请号：US11554194

申请日：2006-10-30

申请人： Hi-Kuk Lee ,  Woo-Seok Jeon ,  Doo-Hee Jung ,  Jeong-Min Park ,  Deok-Man Kang ,  Si-Young Jung ,  Jae-Young Choi

发明人： Hi-Kuk Lee ,  Woo-Seok Jeon ,  Doo-Hee Jung ,  Jeong-Min Park ,  Deok-Man Kang ,  Si-Young Jung ,  Jae-Young Choi

IPC分类号： G03F7/30

CPC分类号： H01L27/1288 ,  G03F7/0233 ,  G03F7/0236 ,  H01L27/1214

摘要： A photoresist composition includes about 100 parts by weight of resin mixture including novolak resin and acryl resin and about 10 parts to about 50 parts by weight of naphthoquinone diazosulfonic acid ester. A weight-average molecular weight of the novolak resin is no less than about 30,000. A weight-average molecular weight of the acryl resin is no less than about 20,000. The acryl resin makes up about 1% to about 15% of the total weight of the resin mixture. When a photoresist film formed using the photoresist composition is heated, a profile variation of the photoresist composition is relatively small. Therefore, a residual photoresist film has a uniform thickness, and a short circuit and/or an open defect in a TFT substrate may be reduced.

摘要翻译： 光致抗蚀剂组合物包括约100重量份的包括酚醛清漆树脂和丙烯酸树脂的树脂混合物和约10重量份至约50重量份的萘醌重氮磺酸酯。 酚醛清漆树脂的重均分子量不小于约30,000。 丙烯酸树脂的重均分子量不小于约20,000。 丙烯酸树脂占树脂混合物总重量的约1％至约15％。 当使用光致抗蚀剂组合物形成的光致抗蚀剂膜被加热时，光致抗蚀剂组合物的轮廓变化相对较小。 因此，残留的光致抗蚀剂膜具有均匀的厚度，并且可能减小TFT基板中的短路和/或开路缺陷。

公开(公告)号：US07291439B2

公开(公告)日：2007-11-06

申请号：US11483794

申请日：2006-07-07

申请人： Jeong-Min Park ,  Hi-Kuk Lee ,  Jin-Ho Ju ,  Woo-Seok Jeon ,  Doo-Hee Jung ,  Dong-Min Kim ,  Ki-Sik Choi

发明人： Jeong-Min Park ,  Hi-Kuk Lee ,  Jin-Ho Ju ,  Woo-Seok Jeon ,  Doo-Hee Jung ,  Dong-Min Kim ,  Ki-Sik Choi

IPC分类号： G03F7/004

CPC分类号： G03F7/022 ,  G03F7/0045

摘要： A photoresist composition, a method for forming a film pattern using the photoresist composition, and a method for manufacturing a thin film transistor array panel using the photoresist composition are provided. In one embodiment, a photoresist composition includes an alkali-soluble resin, a photosensitive compound, and an additive, for advantageously providing a uniform photoresist in a channel region.

摘要翻译： 提供光致抗蚀剂组合物，使用光致抗蚀剂组合物形成膜图案的方法，以及使用光致抗蚀剂组合物制造薄膜晶体管阵列面板的方法。 在一个实施方案中，光致抗蚀剂组合物包括碱溶性树脂，光敏化合物和添加剂，用于在沟道区域中有利地提供均匀的光致抗蚀剂。

公开(公告)号：US20080199788A1

公开(公告)日：2008-08-21

申请号：US12105918

申请日：2008-04-18

申请人： Jeong-Min Park ,  Hi-kuk Lee ,  Woo-Seok Jeon ,  Joo-Han Kim ,  Doo-Hee Jung

发明人： Jeong-Min Park ,  Hi-kuk Lee ,  Woo-Seok Jeon ,  Joo-Han Kim ,  Doo-Hee Jung

IPC分类号： G03F1/14

CPC分类号： H01L27/1288 ,  H01L27/12 ,  H01L27/1214 ,  H01L27/124 ,  H01L27/14692

摘要： A photo mask is provided. The mask includes: a transmitting area and a translucent area, wherein the translucent area includes a plurality of light blocking portions blocking light, and wherein the light blocking portions have a plurality of areas blocking different amounts of light. By using this type of photo mask, a substantially flat layer of photoresist film can be deposited even on top of an uneven surface. The flat photoresist film reduces processing cost and enhances the reliability of the panel manufacturing process.

摘要翻译： 提供照片面具。 掩模包括：透射区域和半透明区域，其中半透明区域包括阻挡光的多个遮光部分，并且其中遮光部分具有阻挡不同量的光的多个区域。 通过使用这种类型的光掩模，即使在不平坦表面的顶部也可沉积基本平坦的光致抗蚀剂层。 平坦的光致抗蚀剂膜降低了加工成本并提高了面板制造工艺的可靠性。

公开(公告)号：US20060160279A1

公开(公告)日：2006-07-20

申请号：US11313150

申请日：2005-12-20

申请人： Jeong-Min Park ,  Hi-kuk Lee ,  Woo-Seok Jeon ,  Joo-Han Kim ,  Doo-Hee Jung

发明人： Jeong-Min Park ,  Hi-kuk Lee ,  Woo-Seok Jeon ,  Joo-Han Kim ,  Doo-Hee Jung

IPC分类号： H01L21/84 ,  H01L27/148

CPC分类号： H01L27/1288 ,  H01L27/12 ,  H01L27/1214 ,  H01L27/124 ,  H01L27/14692

摘要： A photo mask is provided. The mask includes: a transmitting area and a translucent area, wherein the translucent area includes a plurality of light blocking portions blocking light, and wherein the light blocking portions have a plurality of areas blocking different amounts of light. By using this type of photo mask, a substantially flat layer of photoresist film can be deposited even on top of an uneven surface. The flat photorseist film reduces processing cost and enhances the reliability of the panel manufacturing process.

摘要翻译： 提供照片面具。 掩模包括：透射区域和半透明区域，其中半透明区域包括阻挡光的多个遮光部分，并且其中遮光部分具有阻挡不同量的光的多个区域。 通过使用这种类型的光掩模，即使在不平坦表面的顶部也可沉积基本平坦的光致抗蚀剂层。 扁平光子膜降低了加工成本，提高了面板制造工艺的可靠性。

公开(公告)号：US07951631B2

公开(公告)日：2011-05-31

申请号：US12200525

申请日：2008-08-28

申请人： Woo-Seok Jeon ,  Jung-In Park ,  Hi-Kuk Lee

发明人： Woo-Seok Jeon ,  Jung-In Park ,  Hi-Kuk Lee

IPC分类号： H01L21/00 ,  G03F1/00

CPC分类号： H01L27/1288 ,  G03F1/50 ,  G03F7/70791 ,  H01L27/1214

摘要： A halftone mask includes a transparent substrate, a light-blocking layer, a first semi-transparent layer and a second semi-transparent layer. The transparent substrate includes a light-blocking area, a light-transmitting area, a first halftone area transmitting first light, and a second halftone area transmitting second light that is less than the first light. The light-blocking layer is formed in the light-blocking area to fully block light from being transmitted. The first and second semi-transparent layers are formed on the transparent substrate. At least one of the first and second semi-transparent layers is formed in the first halftone area, and the first and second semi-transparent layers are overlapped with each other on the second halftone area.

摘要翻译： 半色调掩模包括透明基板，遮光层，第一半透明层和第二半透明层。 透明基板包括遮光区域，透光区域，透射第一光的第一半色调区域和透射比第一光线小的第二光的第二半色调区域。 遮光层形成在遮光区域中，以完全阻止光的透射。 第一和第二半透明层形成在透明基板上。 第一半透明层和第二半透明层中的至少一个形成在第一半色调区域中，并且第一半透明层和第二半透明层在第二半色调区域上彼此重叠。

公开(公告)号：US20100055851A1

公开(公告)日：2010-03-04

申请号：US12389031

申请日：2009-02-19

申请人： Hi-Kuk Lee ,  Sang-Hyun Yun ,  Jung-In Park ,  Woo-Seok Jeon ,  Pil-Soon Hong ,  Doek-Man Kang ,  Sae-Tae Oh ,  Chang-Ik Lee

发明人： Hi-Kuk Lee ,  Sang-Hyun Yun ,  Jung-In Park ,  Woo-Seok Jeon ,  Pil-Soon Hong ,  Doek-Man Kang ,  Sae-Tae Oh ,  Chang-Ik Lee

IPC分类号： H01L21/336 ,  C08F118/16 ,  G03F7/00

CPC分类号： H01L29/66765 ,  G03F7/0388

摘要： The present invention relates to a photoresist composition that comprises a resin that is represented by Formula 1, a method for forming a thin film pattern, and a method for manufacturing a thin film transistor array panel by using the same. Herein, R is a methylene group, and n is an integer of 1 or more.

摘要翻译： 本发明涉及一种光致抗蚀剂组合物，其包含由式1表示的树脂，薄膜图案的形成方法以及使用该薄膜晶体管阵列板的方法。 这里，R为亚甲基，n为1以上的整数。