摘要:
The invention provides organosilane compounds of a novel class having one or two (phenyl dimethyl carbinyl) groups bonded to the silicon atom as represented by the general formula (PhMe.sub.2 C).sub.p R.sub.q X.sub.r Si, in which Ph is a phenyl group, Me is a methyl group, R is a monovalent hydrocarbon group selected from the class consisting of alkyl, alkenyl and aryl groups, X is a halogen atom or an alkoxy group, p is 1 or 2, q is zero, 1 or 2 and r is zero, 1, 2 or 3 with the proviso that p+q+r=4. The compound can be prepared by the reaction of a Grignard reagent PhMe.sub.2 C. MgY, in which Y is a halogen atom, with a silane compound represented by the general formula R.sub.q SiX.sub.4-q in an organic solvent.
摘要:
The precursor composition of silicon carbide fibers provided by the invention has greatly improved spinnability and can be spun at a very high spinning velocity to give a green filament which has a much larger tensile strength than those of conventional precursor materials and is capable of giving silicon carbide fibers having increased tensile strength by the infusibilization and calcination of the green filament of the composition under tension. The composition comprises from 80 to 99.9 parts by weight of a polycarbosilane polymer and from 20 to 0.01 part by weight of a silmethylene polymer having a degree of polymerization larger than the specified lower limit.
摘要:
The negative-working photoresist composition of the invention comprises, as the polymeric constituent thereof, a polymeric compound obtained by the anionic living polymerization of a vinylphenyl substituted-vinyl dimethyl silane compound represented by the general formulaCH.sub.2 .dbd.CH--C.sub.6 H.sub.4 --SiMe.sub.2 --CR.sup.1 .dbd.CR.sup.2 R.sup.3,in which Me is a methyl group and R.sup.1, R.sup.2 and R.sup.3 are each a hydrogen atom, methyl group or ethyl group, at least one of the R.sup.1, R.sup.2 and R.sup.3 being not a hydrogen atom, to cause the polymerization only at the styrenic double bond, the other double bond in the same molecule remaining unpolymerized. By virtue of the high density of the double bonds in the polymer molecules, the photoresist composition is highly sensitive to irradiation with actinic rays and capable of giving a patterned photoresist layer having excellent resolving power and resistance against dry etching.
摘要:
A tert-hydrocarbyl, e.g. tert-butyl, silyl compound can be synthesized easily according to the method of the invention in which a tert-hydrocarbylmagnesium halide as a Grignard reagent is reacted with a silane compound having at least one silicon-bonded hydrogen atom and at least one silicon-bonded halogen atom simultaneously in a molecule in a suitable organic solvent so that the halogen atom in the latter reactant is replaced with the tert-hydrocarbyl group in the former reactant to give the desired tert-hydrocarbyl silyl compound in a high yield without the safety problem in the conventional method using a tert-alkyl lithium as the reactant.
摘要:
The invention provides a novel substituted polyacetylene copolymer having an outstandingly large oxygen permeation coefficient of 6.times.10.sup.-8 cm.sup.3 (STP).multidot.cm/cm.sup.2 .multidot.sec.multidot.cmHg or larger and a separation factor between oxygen and nitrogen of 2.0 or larger along with a high tensile strength of 200 kg/cm.sup.2 or larger in the form of a film and useful as a gas permeation element in the separation or enrichment of oxygen from or in air. The copolymer is obtained by the copolymerization of 1-trimethylsilyl-1-propyne and 1-(1',1',3',3'-tetramethyl-1',3'-disilabutyl)-1-propyne in a molar ratio of 30:70 to 95:5 and the copolymer should preferably have a number-average molecular weight of at least 1.times.10.sup.4.
摘要翻译:本发明提供了一种新颖的取代聚乙炔共聚物,具有优异的氧渗透系数为6×10 -8 cm 3(STP)×cm / cm 2×sec×cmHg以上,氧与氮之间的分离系数为2.0以上,高拉伸强度为200kg / cm2或更大,并且可用作气体渗透元件,用于从空气中分离或富集氧气。 该共聚物通过1-甲基甲硅烷基-1-丙炔与1-(1',1',3',3'-四甲基-1',3'-二丁基丁-1-炔)的摩尔比 30:70〜95:5,共聚物的数均分子量优选为1×10 4以上。
摘要:
The invention provides a novel diorganopolysiloxane compound composed of dimethysiloxane units, methyl (2-perfluoroalkylethyl)siloxane units and methyl acyloxyalkylsiloxane units. The novel diorganopolysiloxane compounds of the invention have excellent lubricating properties so that they are useful as an additive ingredient in various materials such as coating compositions, magnetic layer of recording tapes and the like where lubricity or mold releasability is essential.
摘要:
The invention provides a novel class of organopolysiloxane compounds having at least one benzoin group represented by the general formula ##STR1## in which Ph is a phenyl group and R is a hydrogen atom or an alkyl group, bonded to the silicon atom in a molecule. The benzoin-bonded organopolysiloxane compounds can readily be prepared by the dehydrohalogenation, dehydrogenation, dehydration or dealkoholation condensation reaction between a corresponding organopolysiloxane having silicon-bonded halogen atoms, hydrogen atoms, hydroxy groups or alkoxy groups and an .alpha.-substituted or unsubstituted benzoin compound in the presence of a suitable reaction promotor or a condensation catalyst.
摘要:
Novel and improved paperboards useful for making gypsum wallboards, which are sized with a specific organopolysiloxane comprising mercaptoalkyl containing organosiloxane units and, optionally, methacryloxy-containing organosiloxane units in its molecular structure. The sizing compound is used in a relatively small amount and yet can exhibit an excellent effect within a very short time. The sized paperboards have adequately controllable moisture absorption as well as air permeability. They are used to cover or sandwitch a gypsum core to form a complete wallboard in a convenient and economical manner.
摘要:
Novel organosilicon compounds having in a molecule at least one maleimido group bonded to a silicon atom through a Si-C linkage, synthesized by reaction of a derivative of maleic anhydride with an organosilicon compound having an amino-substituted hydrocarbon group bonded to the silicon atom. The reaction proceeds in two steps, the first step being addition of the amino group to the maleic anhydride derivative to form an amide structure and the second step being dehydration of the amide structure to form a maleimido ring. The organosilicon compounds having remarkable photosensitivity can be polymerized and cured on exposure to ultraviolet light, and the cured films are insoluble in organic solvents.