Safety razor
    71.
    发明授权
    Safety razor 失效
    安全剃须刀

    公开(公告)号:US3950848A

    公开(公告)日:1976-04-20

    申请号:US441007

    申请日:1974-03-18

    申请人: Michael Goldstein

    发明人: Michael Goldstein

    IPC分类号: B26B21/22 B26B21/14

    CPC分类号: B26B21/225

    摘要: A safety razor comprising a razor blade support member connected to a handle through a linkage assembly is disclosed. The linkage assembly maintains the angle of the razor blade support member in relation to the handle at substantially a constant angle to prevent the razor blade from moving in a circular path. The razor blade support member is spring biased and retracts responsive to pressure being applied to it by the force during shaving, and maintains the pressure applied by the safety razor upon the face constant. The spring biasing means associated with the linkage assembly may be adjusted to vary the applied pressure.

    摘要翻译: 公开了一种安全剃刀,其包括通过连杆组件连接到手柄的剃刀刀片支撑构件。 连杆组件以大致恒定的角度保持剃刀刀片支撑构件相对于把手的角度,以防止剃刀刀片在圆形路径中移动。 剃刀刀片支撑构件被弹簧偏置并且响应于在剃刮期间的力施加到其上的压力而回缩,并且将由安全剃刀施加的压力保持在面部常数上。 可以调节与连杆组件相关联的弹簧偏压装置以改变施加的压力。

    Actuator for an Automobile
    75.
    发明申请
    Actuator for an Automobile 审中-公开
    汽车执行机构

    公开(公告)号:US20090165387A1

    公开(公告)日:2009-07-02

    申请号:US12226986

    申请日:2007-04-18

    IPC分类号: E05F15/10 E05F15/00

    摘要: An actuator adapted to actuate an element of an automobile, the actuator comprising at least one gear adapted to rotate eccentrically about a central axis during operation of the actuator.

    摘要翻译: 适于致动汽车元件的致动器,所述致动器包括适于在所述致动器的操作期间围绕中心轴线偏心旋转的至少一个齿轮。

    High reflector tunable stress coating, such as for a MEMS mirror

    公开(公告)号:US07420264B2

    公开(公告)日:2008-09-02

    申请号:US11400301

    申请日:2006-04-07

    申请人: Michael Goldstein

    发明人: Michael Goldstein

    IPC分类号: H01L23/58

    摘要: An optical device having a high reflector tunable stress coating includes a micro-electromechanical system (MEMS) platform, a mirror disposed on the MEMS platform, and a multiple layer coating disposed on the mirror. The multiple layer coating includes a layer of silver (Ag), a layer of silicon dioxide (SiO2) deposited on the layer of Ag, a layer of intrinsic silicon (Si) deposited on the layer of SiO2, and a layer of silicon oxynitride (SiOxNy) deposited on the layer of Si. The concentration of nitrogen is increased and/or decreased to tune the stress (e.g., tensile, none, compressive).

    Light condenser
    77.
    发明授权
    Light condenser 有权
    光冷凝器

    公开(公告)号:US07237914B2

    公开(公告)日:2007-07-03

    申请号:US10713842

    申请日:2003-11-14

    申请人: Michael Goldstein

    发明人: Michael Goldstein

    IPC分类号: G02B5/10 G03B27/54

    CPC分类号: G03F7/702 G03B27/42

    摘要: A light condenser suitable for EUV lithography that includes reflective rings concentric to an optical axis. Each ring has a reflective surface to reflect light rays emanating from a light source so that the light rays converge towards a mask to produce Köhler illumination on the mask. The reflective surface has a curve segment that includes a section of a parabolic curve that is rotated relative to an optical axis and has a focal point at the light source.

    摘要翻译: 适用于EUV光刻的光聚光器,其包括与光轴同心的反射环。 每个环具有反射表面以反射从光源发出的光线,使得光线朝向掩模会聚,以在掩模上产生Köhler照明。 反射表面具有曲线段,该曲线段包括相对于光轴旋转并且在光源处具有焦点的抛物线曲线的一部分。

    Source multiplexing in lithography
    78.
    发明授权
    Source multiplexing in lithography 失效
    光刻中的光源复用

    公开(公告)号:US07183565B2

    公开(公告)日:2007-02-27

    申请号:US11196570

    申请日:2005-08-02

    IPC分类号: G21G5/00

    CPC分类号: G03F7/7005 G03F7/201

    摘要: An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

    摘要翻译: 用于极紫外(EUV)光刻系统的照明系统可以包括多个EUV光源。 当照射面罩时,系统可以组合来自多个源的光。

    Dual hemispherical collectors
    80.
    发明申请

    公开(公告)号:US20060237668A1

    公开(公告)日:2006-10-26

    申请号:US11411971

    申请日:2006-04-25

    IPC分类号: G21G5/00

    CPC分类号: G03F7/70175

    摘要: A system and method for collecting radiation, which may be used in a lithography illumination system. The system comprises a first surface shaped to reflect radiation in a first hemisphere of a source to illuminate in a second hemisphere of the source; and a second surface shaped to reflect radiation in the second hemisphere of the source to an output plane.