摘要:
The invention generally encompasses a method for forming a pattern on a substrate. The method comprises applying a precursor comprising at least one metal to a substrate to form a precursor layer, exposing a predetermined portion of the precursor layer and developing the predetermined portion of the precursor layer. The developing step removes, or at least substantially removes, the predetermined portion from the substrate, thereby forming a pattern on the substrate that comprises a remaining portion of the precursor. In one embodiment, the precursor layer comprises Ti(PriO)2(EAA)2.
摘要翻译:本发明通常包括在衬底上形成图案的方法。 该方法包括将包含至少一种金属的前体施加到基底以形成前体层,暴露前体层的预定部分并显影前体层的预定部分。 显影步骤从衬底去除或至少基本上除去预定部分,从而在包含前体的剩余部分的衬底上形成图案。 在一个实施方案中,前体层包含Ti(Pr O)2(EAA)2 N 2。
摘要:
The present invention provides, in one embodiment, a method of fabricating a semiconductor device (100). The method comprises growing an oxide layer (120) on a gate structure (114) and a substrate (102) and implanting a dopant (124) into the substrate (102) and the oxide layer (120). Implantation is such that a portion of the dopant (124) remains in the oxide layer (120) to form an implanted oxide layer (126). The method further includes depositing a protective oxide layer (132) on the implanted oxide layer (126) and forming etch-resistant off-set spacers (134). The etch-resistant off-set spacers (134) are formed adjacent sidewalls of the gate structure (114) and on the protective oxide layer (132). The etch resistant off-set spacers having an inner perimeter (135) adjacent the sidewalls and an opposing outer perimeter (136). The method also comprises removing portions of the protective oxide layer (132) lying outside the outer perimeter (136) of the etch-resistant off-set spacers (134). Other embodiments of the present invention include a transistor device (200) and method of manufacturing an integrated circuit (300).
摘要:
A process for forming aluminum based interconnect structures, with a reduced risk of void formation, occurring during photoresist removal and clean up procedures, has been developed. The process features removing the photoresist layer, used as a mask for patterning of an aluminum based layer, using a two phase, in situ photoresist removal procedure, followed by a cold water rinse. An aluminum oxide layer, formed during the initial phase of the two phase, in situ photoresist removal procedure, protects the sides of the aluminum based interconnect structure, during post-clean procedures, reducing the risk of galvanic corrosion and void formation. In addition the temperature of a DI water, post-clean procedure, has also been decreased to between about 5 to 10.degree. C., reduced, also reducing the risk of galvanic corrosion, that can occur during the post clean procedures.
摘要:
A MEMS microphone has a backplate with a given backplate aperture, and a diaphragm having a diaphragm aperture. The given backplate aperture is substantially aligned with the diaphragm aperture.
摘要:
A report indicating a user-reported probability of a successful outcome is received. A behavior and information model is estimated based on the report. The behavior and information model includes a behavior model component having a bias parameter and a consistency parameter. The behavior and information model includes an information model component having a first user-believed probability of a successful outcome and a second user-believed probability of a successful outcome. The behavior and information model is used to yield a model-determined probability of a successful outcome that more accurately reflects a probability of a successful outcome than the user-reported probability of a successful outcome does.
摘要:
Nanoparticles for insect RNAi via oral delivery are provided, along with methods of silencing a target gene in a target insect using RNAi are provided. The nanoparticles comprise a polymer matrix and insect dsRNA. The dsRNA comprises at least one sequence having a region of complementarity substantially complementary to at least a portion of an mRNA transcript of the target gene. Insect baits comprising the nanoparticles are also provided. Methods of screening target gene functions are also provided using the methods disclosed herein.
摘要:
An apparatus for tuning a parameter of a Kalman filter in a wheel inspection for a vehicle is disclosed. The apparatus includes an association module that associates wheel inspection data of the vehicle with locations of corresponding wheels in the vehicle; an evaluation module that evaluates a wheel stable score of the vehicle based on the wheel inspection data and the association, where the wheel stable score indicates reliability of the wheel inspection; and a parameter tuning module that tunes a measurement error covariance of the Kalman filter according to the evaluated wheel stable score.
摘要:
A host processing apparatus (100) and a user removable memory (40) are disclosed. The host processing apparatus (100) and the user removable memory (40) are, in use, connected to one another by respective connectors. The user removable memory (40) is provided in the form of a secure digital (SD) memory card with an expanded subscriber identity module (SIM) function. The host processing apparatus (100) is configured to convert SIM- related request signals to file access signals which identify a location or locations on the user removable memory (40) and one or more file access functions. The file access signals are transferred to the user removable memory (40) via the connectors. The user removable memory (40) comprises a flash memory (59), a SIM (42) programmed with data associated with a communications system, and interface means (52) for receiving the file access signals from the host processing apparatus (100), and configured to identify from the location(s) therein whether a memory or SIM function is to be applied. If the latter, the received file access function(s) are converted to SIM function(s) which are applied to the SIM (42) for transferring results back to the host processing apparatus (100).