公开(公告)号：US6130786A

公开(公告)日：2000-10-10

申请号：US340141

申请日：1999-06-28

申请人： Atsuo Osawa ,  Hiroki Yoshikawa ,  Shigeru Mori ,  Naoyuki Ogura

发明人： Atsuo Osawa ,  Hiroki Yoshikawa ,  Shigeru Mori ,  Naoyuki Ogura

IPC分类号： G02B9/60 ,  G02B13/18 ,  G02B13/24 ,  G02B3/00

CPC分类号： G02B9/60 ,  G02B13/18 ,  G02B13/24

摘要： An image display device which is compact on the whole and low in cost, and which uses a plurality of projection lens systems each of which is constituted by five lens groups including a first aspherical lens group, a second aspherical lens group, a third biconvex lens group, a fourth aspherical lens group and a fifth aspherical lens group which are arranged in this order successively from a screen side, the third lens group having refractive power of not lower than 70% of the total power of the projection lens system, the respective peripheral shapes of the first and second aspherical lens groups being set to have a predetermined relation, a low-dispersion high-index glass material being used for a convex lens of a green projection lens system, a high-dispersion high-index glass material being used for convex lenses of blue and red projection lens systems.

摘要翻译： 一种整体紧凑且成本低的图像显示装置，其使用多个投影透镜系统，每个投影透镜系统由包括第一非球面透镜组，第二非球面透镜组，第三双凸透镜的五个透镜组构成 组，第四非球面透镜组和第五非球面透镜组，其从屏幕侧依次排列，第三透镜​​组的折射力不小于投影透镜系统的总功率的70％，折射率不小于投影透镜系统的总功率的70％ 第一非球面透镜组和第二非球面透镜组的周边形状被设定为具有预定关系，低分散高折射率玻璃材料用于绿色投影透镜系统的凸透镜，高分散高折射率玻璃材料为 用于蓝色和红色投影透镜系统的凸透镜。

公开(公告)号：US5400114A

公开(公告)日：1995-03-21

申请号：US938861

申请日：1992-09-01

申请人： Takahiko Yoshida ,  Koji Hirata ,  Hiroki Yoshikawa ,  Masayuki Muranaka ,  Isao Yoshizaki ,  Atsuo Osawa

发明人： Takahiko Yoshida ,  Koji Hirata ,  Hiroki Yoshikawa ,  Masayuki Muranaka ,  Isao Yoshizaki ,  Atsuo Osawa

IPC分类号： G03B21/62 ,  G03B21/60

CPC分类号： G03B21/625

摘要： A rear-projection screen for a rear-projection image display comprising a Fresnel lens sheet (2) and a lenticular lens sheet (3), or a Fresnel lens sheet (2), a lenticular lens sheet (3) and a light absorbing sheet (4). The entrance surface (21) of the Fresnel lens sheet (2) or the entrance surface (41) of the light absorbing sheet (4) is formed by contiguously and vertically arranging a plurality of horizontally elongate lenticular lenses. The thickness of the Fresnel lens sheet (2) is approximately equal to that of the lenticular lens sheet (3). The entrance surface (31) and the exit surface (32) of the lenticular lens sheet (3) are formed by contiguously and horizontally arranging a plurality of vertically elongate lenticular lenses. Particles of a light diffusing material, which is essential to the prior art rear-projection screen, are not necessarily dispersed in the base sheet (30) of the lenticular lens sheet (3). The rear-projection image display provided with this rear-projection screen has satisfactory focusing characteristics and enhanced vertical directional characteristics and is capable of displaying an image in high brightness and high contrast.

摘要翻译： 一种用于背投影像显示器的背投屏幕，包括菲涅尔透镜片（2）和双凸透镜片（3），或菲涅尔透镜片（2），双凸透镜片（3）和光吸收片 （4）。 菲涅尔透镜片（2）的入射表面（21）或光吸收片（4）的入射表面（41）通过连续且垂直地布置多个水平细长的双凸透镜而形成。 菲涅尔透镜片（2）的厚度大致等于双凸透镜片（3）的厚度。 双凸透镜片（3）的入射表面（31）和出射表面（32）通过连续且水平地布置多个垂直细长的双凸透镜而形成。 对于现有技术的背投屏幕来说，光漫射材料的颗粒不一定分散在双凸透镜片（3）的基片（30）中。 设置有该背投屏幕的背投影像显示器具有令人满意的聚焦特性和增强的垂直方向特性，并且能够以高亮度和高对比度显示图像。

公开(公告)号：US5272540A

公开(公告)日：1993-12-21

申请号：US759518

申请日：1991-09-13

申请人： Koji Hirata ,  Hiroki Yoshikawa ,  Tooru Numata ,  Kiyoshi Wada ,  Masayuki Muranaka ,  Isao Yoshizaki ,  Takahiko Yoshida ,  Shigeru Inaoka

发明人： Koji Hirata ,  Hiroki Yoshikawa ,  Tooru Numata ,  Kiyoshi Wada ,  Masayuki Muranaka ,  Isao Yoshizaki ,  Takahiko Yoshida ,  Shigeru Inaoka

IPC分类号： G02B3/12 ,  G02B13/16 ,  G02B13/18 ,  H04N9/31 ,  H04N5/74

CPC分类号： G02B13/16 ,  G02B13/18 ,  G02B3/12 ,  H04N9/31

摘要： In a projection lens device having at least two plastic lenses for magnification-projecting an original image displayed on a display screen onto a screen, one of the two plastic lens is convex at a center thereof toward the screen and concave at a periphery thereof, and the other lens has a weak positive refractive power toward the screen at a center thereof and a stronger positive refractive power at a periphery thereof. A variation of a lens power due to a change of a surrounding environment is cancelled out by the concave shape at the periphery of the one lens and the positive refractive power at the periphery of the other lens.

摘要翻译： 在具有至少两个用于将显示屏上显示的原始图像放大投影到屏幕上的塑料透镜的投影透镜装置中，两个塑料透镜中的一个在其中心处朝向屏幕凸出并在其周边凹陷，并且 另一个透镜在其中心处具有朝向屏幕的弱正的屈光力，并且在其周边具有更强的正折射光焦度。 由于周围环境的变化引起的透镜光焦度的变化通过在一个透镜的周边处的凹形形状和另一个透镜的周边处的正屈光力被抵消。

公开(公告)号：US08968972B2

公开(公告)日：2015-03-03

申请号：US13883850

申请日：2011-11-18

申请人： Hiroki Yoshikawa ,  Souichi Fukaya ,  Yukio Inazuki ,  Tsuneo Yamamoto ,  Hideo Nakagawa

发明人： Hiroki Yoshikawa ,  Souichi Fukaya ,  Yukio Inazuki ,  Tsuneo Yamamoto ,  Hideo Nakagawa

IPC分类号： G03F1/50 ,  C22C27/06 ,  G03F1/54 ,  G03F1/80 ,  C23C14/06 ,  G03F1/30

CPC分类号： G03F1/80 ,  B32B15/01 ,  C22C27/06 ,  C23C14/0641 ,  C23C14/0676 ,  G03F1/00 ,  G03F1/30 ,  G03F1/50 ,  G03F1/54

摘要： In the chromium-containing material film of the present invention, an element is added thereto and is capable of bringing a mixture of the element and the chromium into a liquid phase at a temperature of 400° C. or lower. The use of such a chromium-containing material film as an optical film (e.g., a light-shielding film, an etching mask film, or an etching stopper film) of a photo mask blank can achieve an improvement in chlorine-dry etching while retaining the same optical characteristics and the like as those of the conventional chromium-containing material film, thereby increasing the patterning precision.

摘要翻译： 在本发明的含铬材料膜中，添加元素，能够使元素和铬的混合物在400℃以下的温度下成为液相。 使用这种含铬材料膜作为光掩模坯料的光学膜（例如遮光膜，蚀刻掩模膜或蚀刻阻挡膜）可以实现氯干蚀刻的改进，同时保持 与常规含铬材料膜相同的光学特性等，从而提高图案形成精度。

公开(公告)号：US08417018B2

公开(公告)日：2013-04-09

申请号：US12750023

申请日：2010-03-30

申请人： Yukio Inazuki ,  Hideo Kaneko ,  Hiroki Yoshikawa

发明人： Yukio Inazuki ,  Hideo Kaneko ,  Hiroki Yoshikawa

IPC分类号： G06K9/00

CPC分类号： G03F1/84 ,  G03F7/70783

摘要： A photomask blank having a film on a substrate is inspected by (A) measuring a surface topography of a photomask blank having a film to be inspected for stress, (B) removing the film from the photomask blank to provide a treated substrate, (C) measuring a surface topography of the treated substrate, and (D) comparing the surface topography of the photomask blank with the surface topography of the treated substrate, thereby evaluating a stress in the film.

摘要翻译： 通过（A）测量具有要检查的应力膜的光掩模坯料的表面形貌来检查在基板上具有膜的光掩模坯料，（B）从光掩模坯料除去膜以提供经处理的基板（C ）测量经处理的基底的表面形貌，以及（D）将光掩模毛坯的表面形貌与经处理的基底的表面形貌进行比较，从而评估膜中的应力。

公开(公告)号：US20120034551A1

公开(公告)日：2012-02-09

申请号：US13196952

申请日：2011-08-03

申请人： Hiroki Yoshikawa ,  Yukio Inazuki ,  Kazuhiro Nishikawa ,  Hideo Kaneko

发明人： Hiroki Yoshikawa ,  Yukio Inazuki ,  Kazuhiro Nishikawa ,  Hideo Kaneko

IPC分类号： G03F1/14

CPC分类号： G03F1/14 ,  G03F1/32 ,  G03F1/50 ,  G03F1/58

摘要： A binary photomask blank has on a transparent substrate a light-shielding film including substrate-side and surface-side compositionally graded layers, having a thickness of 35-60 nm, and composed of a silicon base material containing a transition metal and N and/or O. The substrate-side compositionally graded layer has a thickness of 10-58.5 nm, and a N+O content of 25-40 at % at its lower surface and 10-23 at % at its upper surface. The surface-side compositionally graded layer has a thickness of 1.5-8 nm, and a N+O content of 10-45 at % at its lower surface and 45-55 at % at its upper surface.

摘要翻译： 二元光掩模坯料在透明基板上具有包括厚度为35-60nm的基板侧和表面侧的组成梯度层的遮光膜，由含有过渡金属和N和/ 基底侧组成梯度层的厚度为10-58.5nm，N + O含量在其下表面为25-40at％，在其上表面为10-23at％。 表面侧组成梯度层的厚度为1.5-8nm，其下表面的N + O含量为10-45原子％，其上表面为45-55原子％。

公开(公告)号：US08007964B2

公开(公告)日：2011-08-30

申请号：US12709116

申请日：2010-02-19

申请人： Hiroki Yoshikawa ,  Yukio Inazuki ,  Satoshi Okazaki ,  Takashi Haraguchi ,  Masahide Iwakata ,  Mikio Takagi ,  Yuichi Fukushima ,  Tadashi Saga

发明人： Hiroki Yoshikawa ,  Yukio Inazuki ,  Satoshi Okazaki ,  Takashi Haraguchi ,  Masahide Iwakata ,  Mikio Takagi ,  Yuichi Fukushima ,  Tadashi Saga

IPC分类号： G03F1/00

CPC分类号： G03F1/46 ,  G03F1/58 ,  G03F1/68

摘要： A photomask blank to be used as a material for a photomask is provided with a mask pattern having a transparent area and an effectively opaque area to exposure light on a transparent substrate. On the transparent board, one or more layers of light shielding films are formed with or without other film (A) in between, at least one layer (B) which constitutes the light shielding film includes silicon and a transition metal as main component, and a molar ratio of silicon to the transition metal is silicon:metal=4-15:1 (atomic ratio). The photomask provided with the mask pattern having the transparent area and the effectively opaque area to exposure light on the transparent board is also provided.

摘要翻译： 用作光掩模材料的光掩模坯料设置有对透明基板上的曝光光具有透明区域和有效不透明区域的掩模图案。 在透明板上，形成有一层或多层遮光膜，其中有或没有其它膜（A），构成遮光膜的至少一层（B）包括硅和过渡金属作为主要成分，以及 硅与过渡金属的摩尔比为硅：金属= 4-15:1（原子比）。 还提供了具有掩模图案的光掩模，该掩模图案具有透明区域和透明板上曝光光线的有效不透明区域。

公开(公告)号：US07771893B2

公开(公告)日：2010-08-10

申请号：US11489477

申请日：2006-07-20

申请人： Hiroki Yoshikawa ,  Hiroshi Kubota ,  Yoshinori Kinase ,  Satoshi Okazaki ,  Tamotsu Maruyama ,  Takashi Haraguchi ,  Masahide Iwakata ,  Yuichi Fukushima ,  Tadashi Saga

发明人： Hiroki Yoshikawa ,  Hiroshi Kubota ,  Yoshinori Kinase ,  Satoshi Okazaki ,  Tamotsu Maruyama ,  Takashi Haraguchi ,  Masahide Iwakata ,  Yuichi Fukushima ,  Tadashi Saga

IPC分类号： G03F1/00

CPC分类号： G03F1/32 ,  G03F1/46 ,  G03F1/54 ,  G03F1/58 ,  Y10T428/24917 ,  Y10T428/31616

摘要： A light-shielding film for exposure light is formed on one principal plane of a transparent substrate made of quartz or the like that serves as a photomask substrate. The light-shielding film can serve not only as the so-called “light-shielding film” but also as an anti-reflection film. In addition, the light-shielding film has a total thickness of 100 nm or less, 70% or more of which is accounted for by the thickness of a chromium compound that has an optical density (OD) per unit thickness of 0.025 nm−1 for light having a wavelength of 450 nm. In the case where the photomask blank is used for fabricating a mask designed for ArF exposure, the thickness and composition of the light-shielding film are selected in such a manner that the OD of the light-shielding film is 1.2 to 2.3 for 193 or 248 nm wavelength light.

摘要翻译： 在作为光掩模基板的石英等的透明基板的一个主面上形成曝光用遮光膜。 遮光膜不仅可以用作所谓的“遮光膜”，而且可以用作抗反射膜。 此外，遮光膜的总厚度为100nm以下，其中70％以上的铬化合物的厚度为0.025nm-1，每单位厚度的光密度（OD） 对于波长为450nm的光。 在光掩模坯料用于制造用于ArF曝光的掩模的情况下，遮光膜的厚度和组成选择为使得遮光膜的OD为193或193的屏蔽膜的OD为1.2至2.3 248 nm波长的光。

公开(公告)号：US20100143831A1

公开(公告)日：2010-06-10

申请号：US12709116

申请日：2010-02-19

申请人： Hiroki Yoshikawa ,  Yukio Inazuki ,  Satoshi Okazaki ,  Takashi Haraguchi ,  Masahide Iwakata ,  Mikio Takagi ,  Yuichi Fukushima ,  Tadashi Saga

发明人： Hiroki Yoshikawa ,  Yukio Inazuki ,  Satoshi Okazaki ,  Takashi Haraguchi ,  Masahide Iwakata ,  Mikio Takagi ,  Yuichi Fukushima ,  Tadashi Saga

IPC分类号： G03F1/00

CPC分类号： G03F1/46 ,  G03F1/58 ,  G03F1/68

摘要： A photomask blank to be used as a material for a photomask is provided with a mask pattern having a transparent area and an effectively opaque area to exposure light on a transparent substrate. On the transparent board, one or more layers of light shielding films are formed with or without other film (A) in between, at least one layer (B) which constitutes the light shielding film includes silicon and a transition metal as main component, and a molar ratio of silicon to the transition metal is silicon:metal=4-15:1 (atomic ratio). The photomask provided with the mask pattern having the transparent area and the effectively opaque area to exposure light on the transparent board is also provided.

摘要翻译： 用作光掩模材料的光掩模坯料设置有对透明基板上的曝光光具有透明区域和有效不透明区域的掩模图案。 在透明板上，形成有一层或多层遮光膜，其中有或没有其它膜（A），构成遮光膜的至少一层（B）包括硅和过渡金属作为主要成分，以及 硅与过渡金属的摩尔比为硅：金属= 4-15:1（原子比）。 还提供了具有掩模图案的光掩模，该掩模图案具有透明区域和透明板上曝光光线的有效不透明区域。

公开(公告)号：US07403335B2

公开(公告)日：2008-07-22

申请号：US11011188

申请日：2004-12-15

申请人： Hiroki Yoshikawa ,  Tetsu Ohishi ,  Koji Hirata ,  Daisuke Imafuku

发明人： Hiroki Yoshikawa ,  Tetsu Ohishi ,  Koji Hirata ,  Daisuke Imafuku

IPC分类号： G03B21/60 ,  G03B21/00 ,  G03B21/26 ,  G03B21/14 ,  G03B21/28

CPC分类号： G03B21/10 ,  G03B21/625

摘要： The present invention provides a screen suitable for reducing the longitudinal dimension of a set. The present invention includes two prism sections. One is a totally reflective prism section (10) provided at the image generation source side of a Fresnel lens sheet (6). The other is a refractive prism section (11) provided at the image-watching side of the Fresnel lens sheet. The refractive prism section (11) includes a refractive face (e) for refracting incident light and making the light exit toward the image-watching side, a plane (f) approximately parallel to the principal plane of the Fresnel lens sheet, and a connection face (g) for continuously forming the face (e) and the plane (f).

摘要翻译： 本发明提供了一种适于减小组的纵向尺寸的屏幕。 本发明包括两个棱镜部分。 一个是设置在菲涅耳透镜片（6）的图像生成源侧的全反射棱镜部（10）。 另一个是设置在菲涅尔透镜片的图像观看侧的折射棱镜部分（11）。 折射棱镜部分（11）包括用于折射入射光并使光从摄像侧射出的折射面（e），大致平行于菲涅尔透镜片的主平面的平面（f），以及连接 面（g）用于连续地形成面（e）和平面（f）。