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149 条记录 (耗时 0.039 秒)

    Slit mechanism apparatus and X-ray computed tomography apparatus
    74.
    发明授权
    Slit mechanism apparatus and X-ray computed tomography apparatus 有权
    狭缝机构装置和X射线计算机断层摄影装置

    公开(公告)号：US08199884B2

    公开(公告)日：2012-06-12

    申请号：US12762693

    申请日：2010-04-19

    申请人： Sun Junjie ,  Zhang Jingjing ,  Wei He

    发明人： Sun Junjie ,  Zhang Jingjing ,  Wei He

    IPC分类号： G21K1/04

    CPC分类号： G21K1/04 ,  G21K1/046 ,  G21K2201/067

    摘要： According to one embodiment, a slit mechanism apparatus includes, two slit plates configured to adjust a thickness of X-rays, two slit link bars which are pivotally supported on two ends of each of the two slit plates to interlock the two slit plates, two shafts on which the two slit link bars are respectively mounted to rotate the two slit link bars, two shutter plates configured to block/pass the X-rays, and two shutter link bars which are pivotally supported on two ends of each of the two shutter plates to interlock the two shutter plates and are mounted on the two shafts together with the two slit link bars.

    摘要翻译： 根据一个实施例，狭缝机构装置包括：两个狭缝板，其被配置为调节X射线的厚度;两个狭缝连杆，其被枢转地支撑在两个狭缝板中的每一个的两端以互锁两个狭缝板;两个 分别安装有两个狭缝连杆杆的轴以旋转两个狭缝连杆，配置成阻挡/通过X射线的两个挡板以及枢转地支撑在两个挡板中的每一个的两个端部上的两个挡板连杆 板以互锁两个快门板，并与两个狭缝连杆一起安装在两个轴上。

    POLYGRAIN ENGINEERING BY ADDING IMPURITIES IN THE GAS PHASE DURING CHEMICAL VAPOR DEPOSITION OF POLYSILICON
    77.
    发明申请
    POLYGRAIN ENGINEERING BY ADDING IMPURITIES IN THE GAS PHASE DURING CHEMICAL VAPOR DEPOSITION OF POLYSILICON 审中-公开
    通过在多晶硅化学气相沉积期间在气相中添加污染物进行聚合工程

    公开(公告)号：US20090269926A1

    公开(公告)日：2009-10-29

    申请号：US12110594

    申请日：2008-04-28

    申请人： Abhishek Dube ,  Ashima B. Chakravarti ,  Anthony I. Chou ,  Wei He ,  Dominic J. Schepis

    发明人： Abhishek Dube ,  Ashima B. Chakravarti ,  Anthony I. Chou ,  Wei He ,  Dominic J. Schepis

    IPC分类号： H01L21/44

    CPC分类号： H01L21/28035 ,  H01L29/4925

    摘要： A method of forming at least one gate conductor of a complementary metal oxide semiconductor performs a chemical vapor deposition process of polysilicon over a surface where a polysilicon gate is to be located. This deposition can be performed through a mask to form gate structures directly, or a later patterning process can pattern the polysilicon into gate structures. During the chemical vapor deposition process, the method adds impurities in the chemical vapor deposition process to optimize the grain size of the polysilicon according to a number of different methods.

    摘要翻译： 形成互补金属氧化物半导体的至少一个栅极导体的方法在多晶硅栅极位于的表面上进行多晶硅的化学气相沉积处理。 该沉积可以通过掩模进行直接形成栅极结构，或者后来的图案化工艺可以将多晶硅图案化成栅极结构。 在化学气相沉积过程中，该方法根据多种不同的方法在化学气相沉积工艺中添加杂质以优化多晶硅的晶粒尺寸。

    Process Generation Approach and System for an Integrated Telecom Platform
    78.
    发明申请
    Process Generation Approach and System for an Integrated Telecom Platform 审中-公开
    集成电信平台的流程生成方法和系统

    公开(公告)号：US20090249312A1

    公开(公告)日：2009-10-01

    申请号：US11721682

    申请日：2006-06-09

    申请人： Yongkun Liao ,  Junhua Luo ,  Wei He

    发明人： Yongkun Liao ,  Junhua Luo ,  Wei He

    IPC分类号： G06F9/45 ,  H04L29/02

    CPC分类号： G06F8/41 ,  H04M7/0012

    摘要： An approach for process generation for computer telephony integration (CTI) of an integrated telecom platform, including the following steps. Step 1: The process input module receives the flow chart input by a user and saves it as a flow chart record file; Step 2: the process coversion module coverts the flow chart record file into the equivalent source codes and saves them as a flow chart coversion output file; Step 3: the process compilation module compiles the flow chart coversion output file and saves it as a flow chart compilation output file. The invention also announces a process generation system for an integrated telecom platform, including the process input module, the process coversion module and the process compilation module. The invention is an ideal system for various CTI applications, allowing easy and fast subsequent development as well as convenient system upgrade and maintenance.

    摘要翻译： 一种集成电信平台的计算机电话集成（CTI）过程生成方法，包括以下步骤。 步骤1：进程输入模块接收用户输入的流程图，并将其保存为流程图记录文件; 步骤2：流程转换模块将流程图记录文件覆盖到等效的源代码中，并将它们保存为流程图转换输出文件; 步骤3：进程编译模块编译流程图转换输出文件，并将其保存为流程图编译输出文件。 本发明还公布了一种用于集成电信平台的过程生成系统，包括过程输入模块，过程转换模块和过程编译模块。 本发明是各种CTI应用的理想系统，可以方便快捷的后续开发，方便系统升级和维护。

    Device for Monitoring and Recording Driver's Operations and the Peripheral Scene of a Motor Vehicle
    79.
    发明申请
    Device for Monitoring and Recording Driver's Operations and the Peripheral Scene of a Motor Vehicle 审中-公开
    用于监控和记录驾驶员操作的装置和机动车辆的周边场景

    公开(公告)号：US20090240394A1

    公开(公告)日：2009-09-24

    申请号：US11793326

    申请日：2005-12-20

    申请人： Dake He ,  Wei He ,  Yu Zheng

    发明人： Dake He ,  Wei He ,  Yu Zheng

    IPC分类号： G06F19/00

    CPC分类号： H04N5/76 ,  B60R2300/106 ,  B60R2300/302 ,  B60R2300/406 ,  B60R2300/8053 ,  B60W2050/0089 ,  G07C5/0841 ,  H04N5/765 ,  H04N5/77 ,  H04N5/907 ,  H04N9/8205

    摘要： A recording device for monitoring and recording the driver's operations and the peripheral scene of a motor vehicle, comprising information acquisition units and a central processing unit. The information acquisition units capture information such as image data, while the central processing unit stores and process the information captured by the information acquisition units. The device can record the driver's operations and the peripheral scene of the motor vehicle when an accident happens. The recorded information can be used for analyzing the accident.

    摘要翻译： 一种记录装置，用于监视和记录驾驶员的操作和机动车辆的周边场景，包括信息获取单元和中央处理单元。 信息获取单元捕获诸如图像数据的信息，而中央处理单元存储和处理由信息获取单元捕获的信息。 当事故发生时，该设备可以记录驾驶员的操作和机动车辆的周边场景。 记录的信息可用于分析事故。