公开(公告)号：USRE41350E1

公开(公告)日：2010-05-25

申请号：US11183303

申请日：2005-07-15

申请人： David R. Shafer ,  Alois Herkommer ,  Karl-Heinz Schuster ,  Gerd Füerter ,  Rudolph Von Büenau ,  Wilhelm Ulrich

发明人： David R. Shafer ,  Alois Herkommer ,  Karl-Heinz Schuster ,  Gerd Füerter ,  Rudolph Von Büenau ,  Wilhelm Ulrich

IPC分类号： G02B17/00

CPC分类号： G02B17/0892 ,  G02B17/0812 ,  G03F7/70225 ,  G03F7/70275

摘要： An objective comprising axial symmetry, at least one curved mirror and at least one lens and two intermediate images. The objective includes two refractive partial objectives and one catadioptric partial objective. The objective includes a first partial objective, a first intermediate a image, a second partial objective, a second intermediate image, and a third partial objective. At least one of the partial objectives is purely refractive. One of the partial objectives is purely refractive and one is purely catoptric.

摘要翻译： 包括轴向对称的目标，至少一个曲面镜和至少一个透镜和两个中间图像。 目标包括两个折射部分目标和一个反射折射部分目标。 目标包括第一部分目标，第一中间图像，第二部分目标，第二中间图像和第三部分目标。 部分目标中的至少一个纯粹是折射的。 其中一个部分目标是纯粹的折射，一个纯粹是反射的。

公开(公告)号：US07697198B2

公开(公告)日：2010-04-13

申请号：US10576265

申请日：2004-10-15

申请人： David Shafer ,  Alexander Epple ,  Aurelian Dodoc ,  Wilhelm Ulrich ,  Karl-Heinz Schuster

发明人： David Shafer ,  Alexander Epple ,  Aurelian Dodoc ,  Wilhelm Ulrich ,  Karl-Heinz Schuster

IPC分类号： G02B17/08

CPC分类号： G02B13/143 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/70275

摘要： A catadioptric projection objective for projecting a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, having: a first objective part for projecting an object field lying in the object plane into a first real intermediate image; a second objective part for generating a second real intermediate image with the radiation coming from the first objective part; a third objective part for generating a third real intermediate image with the radiation coming from the second objective part; and a fourth objective part for projecting the third real intermediate image into the image plane.

摘要翻译： 一种反折射投射物镜，用于将布置在投影物镜的物平面中的图案投影到投影物镜的像平面中，具有：第一物镜部分，用于将物平面中的物场投影到第一实际中间像中; 第二目标部分，用于利用来自第一目标部分的辐射产生第二实际中间图像; 第三目标部分，用于利用来自第二目标部分的辐射产生第三实际中间图像; 以及用于将第三实际中间图像投影到图像平面中的第四目标部分。

公开(公告)号：US07692868B2

公开(公告)日：2010-04-06

申请号：US12265090

申请日：2008-11-05

申请人： Ulrich Loering ,  Vladan Blahnik ,  Wilhelm Ulrich ,  Daniel Kraehmer ,  Norbert Wabra

发明人： Ulrich Loering ,  Vladan Blahnik ,  Wilhelm Ulrich ,  Daniel Kraehmer ,  Norbert Wabra

IPC分类号： G02B9/00 ,  G03B27/42 ,  G03F7/00

CPC分类号： G03F7/70341 ,  G03F7/7015

摘要： Projection objectives, as well as related components, systems and methods, are disclosed. In general, a projection objective is configured to image radiation from an object plane to an image plane. A projection objective can include a plurality of optical elements along the optical axis. The plurality of optical elements can include a group of optical elements and a last optical element which is closest to the image plane, and a positioning device configured to move the last optical element relative to the image plane. Typically, a projection objective is configured to be used in a microlithography projection exposure machine.

摘要翻译： 公开了投影目标以及相关组件，系统和方法。 通常，投影物镜被配置成将来自物体平面的辐射图像到图像平面。 投影物镜可以包括沿着光轴的多个光学元件。 多个光学元件可以包括一组光学元件和最靠近图像平面的最后一个光学元件，以及被配置为相对于图像平面移动最后一个光学元件的定位装置。 通常，投影物镜被配置为用于微光刻投影曝光机。

公开(公告)号：US07532306B2

公开(公告)日：2009-05-12

申请号：US10917371

申请日：2004-08-13

申请人： Aurelian Dodoc ,  Karl Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

发明人： Aurelian Dodoc ,  Karl Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/54

CPC分类号： G03F7/7015 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70833 ,  G03F7/70916 ,  G03F7/70975 ,  G03F7/70983

摘要： A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.

摘要翻译： 微光刻投影曝光装置包括用于产生投影光（13）和投影透镜（20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120）的照明系统（12） 能够布置在投影透镜的物平面（22）中的光源（24）可以被成像到能够被布置在投影透镜的像平面（28）中的感光层（26）上。 投影透镜被设计用于浸没模式，其中在像侧的投影透镜的最终透镜元件（L5; L205; L605; L705; L805; L905; L1005; L1105）浸没在浸没液体（34; 334a ; 434a; 534a）。 关于投影光（13）透明的终端元件（44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144）被紧固在图像侧的最终透镜元件与光 敏感层。

公开(公告)号：US20090073392A1

公开(公告)日：2009-03-19

申请号：US11855359

申请日：2007-09-14

申请人： Hans-Juergen Mann ,  Wilhelm Ulrich ,  Daniel Kraemer ,  Toralf Gruner ,  Aurelian Dodoc

发明人： Hans-Juergen Mann ,  Wilhelm Ulrich ,  Daniel Kraemer ,  Toralf Gruner ,  Aurelian Dodoc

IPC分类号： G03B21/28 ,  G03B21/06

CPC分类号： G03F7/70233 ,  G03F7/702

摘要： In general, in one aspect, the invention features a system that includes a catoptric projection objective having an optical axis and including a plurality of projection objective elements positioned between an object plane and an image plane, the object and image planes being orthogonal to the optical axis, the projection objective being configured so that during operation the projection objective directs radiation reflected at the object plane to the image plane to form an image at the image plane of an object positioned in a field at the object plane, the field having a first dimension of 8 mm or more and a second dimension of 8 mm or more, the first and second dimensions being along orthogonal directions. The system also includes an illumination system including a plurality of illumination system elements, the illumination system being configured so that during operation the illumination system directs the radiation to the field at the object plane, where a chief ray of the radiation has an angle of incidence of 10° or less at the object plane.

摘要翻译： 通常，在一个方面，本发明的特征在于一种系统，其包括具有光轴并且包括位于物平面和图像平面之间的多个投影物镜元件的反射投影物镜，物体和像平面正交于光学 所述投影物镜被配置为使得在操作期间，投影物镜将在物平面处反射的辐射引导到像平面以在位于物平面处的场中的物体的像平面处形成图像，该场具有第一 尺寸为8mm以上，第二尺寸为8mm以上，第一尺寸和第二尺寸沿正交方向。 该系统还包括包括多个照明系统元件的照明系统，照明系统被配置为使得在操作期间照明系统将辐射引导到物平面处的场，其中辐射的主射线具有入射角 在物平面上为10°以下。

公开(公告)号：US20090052073A1

公开(公告)日：2009-02-26

申请号：US12233384

申请日：2008-09-18

申请人： Hans-Juergen Mann ,  Wilhelm Ulrich

发明人： Hans-Juergen Mann ,  Wilhelm Ulrich

IPC分类号： G02B17/06

CPC分类号： G03F7/702 ,  G02B17/08 ,  G03F1/62 ,  G03F7/70058 ,  G03F7/70233

摘要： In some embodiments, a catoptric microlithgraphy projection optical system includes a plurality of reflective optical elements arranged to image radiation from an object field in an object plane to an image field in an image plane. The image field can have a size of at least 1 mm×1 mm. This optical system can have an object-image shift (OIS) of about 75 mm or less. Metrology and testing can be easily implemented despite rotations of the optical system about a rotation axis. Such a catoptric microlithgraphy projection optical system can be implemented in a microlithography tool. Such a microlithography tool can be used to produce microstructured components.

摘要翻译： 在一些实施例中，反射微结构投影光学系统包括多个反射光学元件，其被布置成将来自物体平面中的物场的辐射图像映像到图像平面中的图像场。 图像场可以具有至少1mm×1mm的尺寸。 该光学系统可以具有约75mm或更小的物体图像偏移（OIS）。 尽管光学系统围绕旋转轴旋转，但可以容易地实现测量和测试。 这种反射式微立方体投影光学系统可以在微光刻工具中实现。 这种微光刻工具可用于生产微结构化组件。

公开(公告)号：US20090051890A1

公开(公告)日：2009-02-26

申请号：US12235957

申请日：2008-09-23

申请人： Hans-Juergen Mann ,  Wilhelm Ulrich

发明人： Hans-Juergen Mann ,  Wilhelm Ulrich

IPC分类号： G03B27/54

CPC分类号： G03F7/702 ,  G02B17/08 ,  G03F1/62 ,  G03F7/70058 ,  G03F7/70233

摘要： A microlithography projection optical system is disclosed. The system can include a plurality of optical elements arranged to image radiation having a wavelength λ from an object field in an object plane to an image field in an image plane. The plurality of optical elements can have an entrance pupil located more than 2.8 m from the object plane. A path of radiation through the optical system can be characterized by chief rays having an angle of 3° or more with respect to the normal to the object plane. This can allow the use of face shifting masks as objects to be imaged, in particular for EUV wavelengths.

摘要翻译： 公开了一种微光刻投影光学系统。 该系统可以包括多个光学元件，其布置成将具有波长λ的辐射从物体平面中的物体场图像映像到图像平面中的图像场。 多个光学元件可以具有距离物面大于2.8μm的入射光瞳。 通过光学系统的辐射路径的特征在于主要光线相对于物平面的法线具有3°或更大的角度。 这可以允许使用面部移动掩模作为要成像的对象，特别是对于EUV波长。

公开(公告)号：US20090046357A1

公开(公告)日：2009-02-19

申请号：US12166406

申请日：2008-07-02

申请人： Hans-Juergen Mann ,  Wilhelm Ulrich ,  Marco Pretorius

发明人： Hans-Juergen Mann ,  Wilhelm Ulrich ,  Marco Pretorius

IPC分类号： G02B17/06

CPC分类号： G03F7/70233 ,  G02B13/0065 ,  G02B13/16 ,  G02B17/0621 ,  G02B17/0663 ,  G02B17/08 ,  G02B17/0804 ,  G02B21/04 ,  G03F7/70308

摘要： In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength λ from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about λ or more at one or more locations of the rotationally-asymmetric surface.

摘要翻译： 通常，在第一方面，本发明的特征在于包括微光刻投影光学系统的系统。 微光刻投影光学系统包括多个元件，其被布置成使得在操作期间，多个元件将从物体平面到像平面的波长λ的图像辐射。 元件中的至少一个是具有位于辐射路径中的旋转非对称表面的反射元件。 旋转非对称表面在旋转对称表面的一个或多个位置处偏离旋转对称的参考表面约λ或更大的距离。

公开(公告)号：US20080316451A1

公开(公告)日：2008-12-25

申请号：US12198344

申请日：2008-08-26

申请人： Hans-Jurgen Mann ,  David Shafer ,  Wilhelm Ulrich

发明人： Hans-Jurgen Mann ,  David Shafer ,  Wilhelm Ulrich

IPC分类号： G03F7/20

CPC分类号： G03F7/70233 ,  G02B13/143 ,  G02B17/061 ,  G02B17/0652 ,  G02B17/0657

摘要： In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.

摘要翻译： 通常，在一个方面，本发明的特征在于设置成将从物体平面到图像平面的辐射成像的目标，包括布置成将来自物体平面的辐射引导到图像平面的多个元件，其中物镜具有图像 侧面数值孔径大于0.55，最大像侧场尺寸大于1 mm，目标是一个反射目标。

公开(公告)号：US20080297889A1

公开(公告)日：2008-12-04

申请号：US12184818

申请日：2008-08-01

申请人： David Shafer ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Rudolf Von Buenau ,  Hans-Juergen Mann ,  Alexander Epple

发明人： David Shafer ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Rudolf Von Buenau ,  Hans-Juergen Mann ,  Alexander Epple

IPC分类号： G02B17/08

CPC分类号： G02B17/0804 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/0844 ,  G02B17/0856 ,  G02B17/0892 ,  G03F7/70225

摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.