公开(公告)号：US07057686B2

公开(公告)日：2006-06-06

申请号：US10897456

申请日：2004-07-23

申请人： Kenneth C. Ho ,  Minhua Lu ,  Alan E. Rosenbluth ,  Kei-Hsiung Yang

发明人： Kenneth C. Ho ,  Minhua Lu ,  Alan E. Rosenbluth ,  Kei-Hsiung Yang

IPC分类号： G02F1/1335

CPC分类号： H04N9/3105 ,  G02B27/283 ,  G02F1/134336 ,  G02F1/1396

摘要： A liquid crystal (LC) lightvalve comprising a twisted nematic LC layer whose molecules are aligned with pixel edges at the mirror backplane, thereby providing improved contrast and efficiency, and reduced visibility of post spacers in black state. The present invention is directed to an LC structure wherein the backplane is rubbed in a direction rectilinear with pixel edges. The LC layer is given the same twist rotation and birefringence as in the conventional TN lightvalve. Polarization control is maintained by illuminating the lightvalve with light whose polarization is rotated by the twist angle relative to the x,y, pixel axes, and by collecting the orthogonally polarized component of the reflected light. The lightvalve top glass is thus rubbed in a direction which is rotated by the twist angle from the horizontal or vertical direction at which the backplane is rubbed.

摘要翻译： 一种液晶（LC）光阀，其包括扭曲向列LC层，其分子与镜面背板上的像素边缘对准，从而提供改善的对比度和效率，并降低后隔片在黑色状态下的可视性。 本发明涉及一种LC结构，其中背板沿着具有像素边缘的直线方向摩擦。 给出LC层与常规TN光阀相同的扭转旋转和双折射。 通过用偏振相对于x，y，像素轴旋转扭转角的光并通过收集反射光的正交偏振分量来照射光阀来维持极化控制。 因此，光阀顶玻璃沿着背板被摩擦的水平或垂直方向旋转扭转角的方向摩擦。

公开(公告)号：US07010776B2

公开(公告)日：2006-03-07

申请号：US10694466

申请日：2003-10-27

申请人： Gregg M. Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark A. Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan E. Rosenbluth ,  Shlomo Shlafman

发明人： Gregg M. Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark A. Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan E. Rosenbluth ,  Shlomo Shlafman

IPC分类号： G06F17/50

CPC分类号： G03F1/36 ,  G03F1/70

摘要： A method for calculating long-range image contributions from mask polygons. An algorithm is introduced having application to Optical Proximity Correction in optical lithography. A finite integral for each sector of a polygon replaces an infinite integral. Integrating over two triangles, rather than integrating on the full sector, achieves a finite integral. An analytical approach is presented for a power law kernel to reduce the numerical integration of a sector to an analytical expression evaluation. The mask polygon is divided into regions to calculate interaction effects, such as intermediate-range and long-range effects, by truncating the mask instead of truncating the kernel function.

摘要翻译： 一种用于从掩模多边形计算长距离图像贡献的方法。 引入了一种应用于光学光刻中的光学邻近校正的算法。 多边形的每个扇区的有限积分代替无限积分。 整合在两个三角形上，而不是整体上整合，实现了一个有限积分。 针对幂律内核提出了一种分析方法，以减少一个部门与分析表达式评估的数值整合。 掩模多边形被划分为区域，以通过截断掩码而不是截断内核函数来计算交互效应，例如中间范围和远程效果。

公开(公告)号：US06869739B1

公开(公告)日：2005-03-22

申请号：US10353900

申请日：2003-01-28

申请人： Christopher P. Ausschnitt ,  Ronald L. Gordon ,  Christopher J. Progler ,  Alan E. Rosenbluth

发明人： Christopher P. Ausschnitt ,  Ronald L. Gordon ,  Christopher J. Progler ,  Alan E. Rosenbluth

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F7/705 ,  G03F7/70625 ,  G03F7/70641 ,  G03F7/70666 ,  G03F7/70683

摘要： A method of modeling dose and focus response in lithographic imaging to simulate an optical critical dimension (OCD) metrology system creates simulated aerial images of the object pattern to be transferred to a resist film on the substrate at different focus settings of the metrology imaging system. The method then successively creates simulated images, at different exposure dose and focus settings of the metrology imaging system, of the latent and developed image of the object pattern in the resist film on the substrate, and the etched image of the object pattern in the substrate. The method converts the simulated images into polygons having more than four sides and determines the Fourier spectrum of the polygons simulating the images of the object pattern. Using the spectrum of the polygons simulating the images of the object pattern, the method then creates simulated aerial images of the object pattern developed in the resist film, at different dose and focus settings, as viewed by the OCD metrology system.

摘要翻译： 在光刻成像中建模剂量和聚焦响应的模拟模拟光学关键尺寸（OCD）计量系统的方法，在计量成像系统的不同聚焦设置下，将物体图案的模拟空间图像转印到衬底上的抗蚀剂膜上。 然后，在基板上的抗蚀剂膜中的目标图案的潜像和显影图像的不同曝光剂量和测量成像系统的焦点设置上依次创建模拟图像，以及基板中的对象图案的蚀刻图像 。 该方法将模拟图像转换成具有四边以上的多边形，并且确定模拟对象图案的图像的多边形的傅里叶谱。 使用模拟对象图案图像的多边形的光谱，该方法然后在不同的剂量和聚焦设置下，由OCD测量系统观察，产生在抗蚀剂膜中开发的对象图案的模拟空间图像。

公开(公告)号：US06665033B2

公开(公告)日：2003-12-16

申请号：US09726951

申请日：2000-11-30

申请人： Alessandro C. Callegari ,  Praveen Chaudhari ,  Fuad E. Doany ,  James P. Doyle ,  Eileen A. Galligan ,  James H. Glownia ,  Gareth G. Hougham ,  James A. Lacey ,  Shui-Chih Lien ,  Minhua Lu ,  Alan E. Rosenbluth ,  Kei-Hsiung Yang

发明人： Alessandro C. Callegari ,  Praveen Chaudhari ,  Fuad E. Doany ,  James P. Doyle ,  Eileen A. Galligan ,  James H. Glownia ,  Gareth G. Hougham ,  James A. Lacey ,  Shui-Chih Lien ,  Minhua Lu ,  Alan E. Rosenbluth ,  Kei-Hsiung Yang

IPC分类号： G02F11337

CPC分类号： G02F1/13378

摘要： A method for preparing an alignment layer surface provides a surface on the alignment layer. The surface is bombarded with ions, and reactive gas is introduced to the ion beam to saturate dangling bonds on the surface. Another method for preparing an alignment layer surface provides a surface on the alignment layer. The surface is bombarded with ions and quenched with a reactive component to saturate dangling bonds on the surface.

摘要翻译： 制备取向层表面的方法提供了取向层上的表面。 用离子轰击表面，并将反应性气体引入离子束以饱和表面上的悬挂键。 制备取向层表面的另一种方法提供了取向层上的表面。 表面被离子轰击并用反应性组分淬火以使表面上的悬挂键饱和。

公开(公告)号：US06323834B1

公开(公告)日：2001-11-27

申请号：US09168456

申请日：1998-10-08

申请人： Evan G. Colgan ,  Laura L. Kosbar ,  Alan E. Rosenbluth

发明人： Evan G. Colgan ,  Laura L. Kosbar ,  Alan E. Rosenbluth

IPC分类号： G09G334

CPC分类号： G09G3/3433 ,  G02B26/0841 ,  G09G3/346 ,  G09G2300/0473 ,  G09G2300/08 ,  Y10S359/90

摘要： A display device, in accordance with the present invention includes a transparent substrate and an array of pixels formed on the substrate, each pixel comprises a transparent electrode and a deformable member electrically actuated between a first state and a second state, wherein in the first state a liquid including a dye is disposed in a gap between the transparent electrode and the deformable member and wherein in the second state the deformable member reduces the gap between the transparent electrode and the deformable member such that the liquid is substantially removed between the deformable layer and the transparent electrode in the area of contact. A plurality of switches are formed on the substrate for supplying control signals to the array of pixels to selectively actuate the deformable members of the pixels, wherein each switch comprises an actuating member movable between an active state and an inactive state, whereby in the active state any control signal supplied to the switch passes through the switch, and in the inactive state any control signal supplied to the switch is prevented from passing through the switch. Fabrication methods are also disclosed.

摘要翻译： 根据本发明的显示装置包括透明基板和形成在基板上的像素阵列，每个像素包括在第一状态和第二状态之间电致动的透明电极和可变形部件，其中在第一状态 包括染料的液体设置在透明电极和可变形部件之间的间隙中，并且其中在第二状态下，可变形部件减小了透明电极和可变形部件之间的间隙，使得液体在可变形层和 透明电极在接触区域。 多个开关形成在基板上，用于向像素阵列提供控制信号以选择性地致动像素的可变形构件，其中每个开关包括可在活动状态和非活动状态之间移动的致动构件，由此在活动状态 提供给开关的任何控制信号通过开关，并且在非活动状态下，防止提供给开关的任何控制信号通过开关。 还公开了制造方法。

公开(公告)号：US4896952A

公开(公告)日：1990-01-30

申请号：US185187

申请日：1988-04-22

申请人： Alan E. Rosenbluth

发明人： Alan E. Rosenbluth

IPC分类号： G02B5/04 ,  G02B17/00 ,  G02B17/08 ,  G02B27/10 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

CPC分类号： G02B17/008 ,  G02B17/08 ,  G02B27/142 ,  G03F7/70225

摘要： A beamsplitter optical element, including a triangular substrate, such as a prism, having a plane face corresponding to the hypotenuse of the prism which is coated with a thin film structure having materials and thicknesses, which effect a division of each light beam such as into a reflected and a transmitted portion, in such a way that the beams suffer no net aberration as a result of multiple reflections within the thin film structure, and a second triangular substrate, such as a prism having a plane face, corresponding to the hypotenuse, optically bonded to the thin film structure deposited on the hypotenuse of the first prism.

公开(公告)号：US08271910B2

公开(公告)日：2012-09-18

申请号：US12748513

申请日：2010-03-29

申请人： Jaione Tirapu-Azpiroz ,  Timothy A. Brunner ,  Michael S. Hibbs ,  Alan E. Rosenbluth

发明人： Jaione Tirapu-Azpiroz ,  Timothy A. Brunner ,  Michael S. Hibbs ,  Alan E. Rosenbluth

IPC分类号： G06F17/50

CPC分类号： G03F1/38 ,  G03F1/70 ,  G03F7/70283 ,  G03F7/70441

摘要： A computer-implemented method is provided for generating an electromagnetic field (EMF) correction boundary layer (BL) model corresponding to a mask, which can include using a computer to perform a method, in which asymmetry factor data is determined from aerial image measurements of a plurality of different gratings representative of features provided on a mask, wherein the aerial image measurements having been made at a plurality of different focus settings. The method may also include determining boundary layer (BL) model parameters of an EMF correction BL model corresponding to the mask by fitting to the asymmetry factor measurements. Alternatively, the asymmetry factor data can be determined from measurements of line widths of photoresist patterns, wherein the photoresist patterns correspond to images cast by a plurality of gratings at a plurality of different defocus distances, and the gratings can be representative of features of a mask.

摘要翻译： 提供了一种计算机实现的方法，用于产生对应于掩模的电磁场（EMF）校正边界层（BL）模型，其可以包括使用计算机执行一种方法，其中由不确定因素数据从空间图像测量 代表提供在掩模上的特征的多个不同光栅，其中已经在多个不同焦点设置进行了空间图像测量。 该方法还可以包括通过拟合不对称因子测量来确定对应于掩模的EMF校正BL模型的边界层（BL）模型参数。 或者，可以通过对光致抗蚀剂图案的线宽度的测量来确定不对称因子数据，其中光致抗蚀剂图案对应于由多个不同散焦距离处的多个光栅投射的图像，并且光栅可以代表掩模的特征 。

公开(公告)号：US08238644B2

公开(公告)日：2012-08-07

申请号：US11378536

申请日：2006-03-17

申请人： Timothy A. Brunner ,  Gregg M. Gallatin ,  Ronald L. Gordon ,  Kafai Lai ,  Alan E. Rosenbluth ,  Nakgeuon Seong

发明人： Timothy A. Brunner ,  Gregg M. Gallatin ,  Ronald L. Gordon ,  Kafai Lai ,  Alan E. Rosenbluth ,  Nakgeuon Seong

IPC分类号： G06K9/00

CPC分类号： G03F7/70441 ,  G03F1/36 ,  G03F1/70 ,  G03F7/70575

摘要： A method for determining an image of a patterned object formed by a polychromatic lithographic projection system having a laser radiation source of a finite spectral bandwidth and a lens for imaging the patterned object to an image plane within a resist layer. The method comprises providing patterns for the object, a spectrum of the radiation source to be used in the lithographic projection system, an intensity and polarization distribution of the radiation source, and a lens impulse response in the spatial domain or in the spatial frequency domain of the image. The method then includes forming a polychromatic 4D bilinear vector kernel comprising a partially coherent polychromatic joint response between pairs of points in the spatial domain or in the spatial frequency domain, determining the dominant polychromatic 2D kernels of the polychromatic 4D bilinear vector kernel, and determining the image of the patterned object from convolutions of the object patterns with the dominant polychromatic 2D kernels.

摘要翻译： 一种用于确定由具有有限光谱带宽的激光辐射源的多色光刻投影系统形成的图案化物体的图像的方法和用于将图案化物体成像到抗蚀剂层内的图像平面的透镜。 该方法包括提供对象的图案，在光刻投影系统中使用的辐射源的光谱，辐射源的强度和偏振分布以及在空间域或空间频域中的透镜脉冲响应 图片。 该方法然后包括形成多色4D双线性矢量核，其包括在空间域或空间频域中的点对之间的部分相干多色联合响应，确定多色4D双线性向量核的显性多色2D内核，并确定 图形对象的图像与目标图案与显性多色2D内核的卷积。

公开(公告)号：US07844938B2

公开(公告)日：2010-11-30

申请号：US12109400

申请日：2008-04-25

申请人： Alan E. Rosenbluth ,  Ian P. Stobert

发明人： Alan E. Rosenbluth ,  Ian P. Stobert

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G03F1/36

摘要： A solution for performing a data correction on a hierarchical integrated circuit layout is provided. A method includes: receiving a CD compensation map for the long range critical dimension variation prior to the data correction; grouping compensation amounts of the CD compensation into multiple compensation ranges; generating multiple target layers corresponding to the multiple compensation ranges; super-imposing a region of the CD compensation map having a compensation amount falling into a compensation range over a respective target layer to generate a target shape; performing the data correction on the layout to generate a data corrected layout; performing the data correction on the target shape separately to generate a data corrected target shape; and combining the data corrected layout and the data corrected target shape based on the CD compensation map.

摘要翻译： 提供了一种用于在分层集成电路布局上执行数据校正的解决方案。 一种方法包括：在数据校正之前接收用于长距离临界尺寸变化的CD补偿图; 将CD补偿的补偿量分组为多个补偿范围; 产生对应于多个补偿范围的多个目标层; 超级CD补偿图的区域具有落在相应目标层上的补偿范围内的补偿量以产生目标形状; 在布局上执行数据校正以生成数据校正布局; 分别对目标形状进行数据校正，生成数据校正对象形状; 并且基于CD补偿图组合数据校正布局和数据校正目标形状。

公开(公告)号：US07587702B2

公开(公告)日：2009-09-08

申请号：US11627418

申请日：2007-01-26

申请人： Alan E. Rosenbluth

发明人： Alan E. Rosenbluth

IPC分类号： G06F17/50 ,  G03C5/00

CPC分类号： G03F1/36

摘要： A set of candidate global optima is identified, one of which is a global solution for making a mask for printing a lithographic pattern. A solution space is formed from dominant joint eigenvectors that is constrained for bright and dark areas of the printed pattern. The solution space is mapped to identify regions each containing at most one local minimum intensity. For each selected region, stepped intensity contours are generated for intensity of the dark areas and stepped constraint surfaces are generated for a target exposure dose at an individual test point. An individual test point is stepped toward a lowest intensity contour along the stepped constraint surfaces of each selected region. Further lowering of the intensities of these points is also detailed, where possible in adjacent regions, to yield final test points. The set of candidate global optima is the final test points at their respective lowest intensity contour of the respective selected regions.

摘要翻译： 确定一组候选全局最优值，其中之一是制作用于印刷光刻图案的掩模的全球解决方案。 由占优的联合特征向量形成解决空间，该特征向量被限制在印刷图案的明暗区域。 映射空间被映射以识别每个最多包含一个局部最小强度的区域。 对于每个选择的区域，针对暗区的强度产生阶梯强度轮廓，并且在单个测试点处针对目标曝光剂量产生阶梯式约束表面。 单个测试点沿着每个选定区域的阶梯式约束表面朝向最低强度轮廓。 在相邻区域可能的情况下，这些点的强度进一步降低也是详细的，以产生最终的测试点。 候选全局最优的集合是各自选定区域各自最低强度轮廓的最终测试点。