公开(公告)号：US20070215178A1

公开(公告)日：2007-09-20

申请号：US11681977

申请日：2007-03-05

申请人： Taro Yamamoto ,  Kousuke Yoshihara

发明人： Taro Yamamoto ,  Kousuke Yoshihara

IPC分类号： B08B7/04 ,  B08B3/04 ,  B08B3/00

CPC分类号： H01L21/6715 ,  H01L21/6708

摘要： The present invention improves recover percentage at which a mixed chemical solution discharged from a protective film removing device.The protective film removing device includes: a recovery line communicating with an atmosphere surrounding a substrate to recover a mixed chemical solution, an intermediate tank connected to the outlet end of the recovery line, a volatilization preventing liquid supply means for supplying a volatilization preventing liquid having a specific gravity smaller than that of the mixed chemical solution into the intermediate tank in advance, a transfer line having an inlet end connected to the intermediate tank and provided with a valve, a recovery tank connected to an outlet end of the transfer line, a liquid quantity monitoring means for monitoring a quantity of a liquid contained in the intermediate tank, and a control means for opening the valve of the transfer line to transfer the liquid contained in the intermediate tank to the recovery tank when it is decided that the quantity of the liquid contained in the intermediate tank reached a predetermined quantity on the basis of a signal provided by the liquid quantity monitoring means.

摘要翻译： 本发明提高从保护膜去除装置排出的混合化学溶液的回收率。 保护膜去除装置包括：与基板周围的气氛连通以回收混合化学溶液的回收管线，连接到回收管线出口端的中间罐，用于供应防挥发液体的挥发防止液体供应装置， 预先将比重小于混合化学溶液的比重，具有连接到中间罐并具有阀的入口端的输送管线，连接到输送管线的出口端的回收罐， 液体监测装置，用于监测包含在中间罐中的液体的量;以及控制装置，用于打开输送管线的阀门，以将包含在中间罐中的液体转移到回收罐中，当确定量 包含在中间罐中的液体基于信号产生器达到预定量 由液量监控装置维持。

公开(公告)号：US20070122551A1

公开(公告)日：2007-05-31

申请号：US10581713

申请日：2004-12-03

申请人： Taro Yamamoto ,  Osamu Hirakawa

发明人： Taro Yamamoto ,  Osamu Hirakawa

IPC分类号： B05D3/12

CPC分类号： H01L21/67271 ,  G03F7/3021 ,  G03F7/70341 ,  H01L21/67034 ,  H01L21/6708 ,  H01L21/67253

摘要： A coating and developing system prevents wetting its component units with water when the coating and developing system forms a resist film on a substrate and processes the substrate processed by immersion exposure by a developing process. A substrate having a surface coated with a resist film and processed by immersion exposure is placed on a substrate support device and a liquid detector detects at least the liquid formed a liquid film for immersion exposure and remaining on the surface of the substrate. A decision is made as to whether or not the substrate needs to be dried on the basis of the result of detection made by the liquid detector. If it is decided that the substrate needs to be dried, the substrate is dried by a drying means. Thus wetting the interior of the coating and developing system with water can be prevented. Since only substrates that need to be dried are subjected to a drying process, the coating and developing system is able to operate at a high throughput.

摘要翻译： 当涂层和显影系统在基底上形成抗蚀剂膜时，涂层和显影系统防止用水润湿其组分单元，并通过显影过程对通过浸渍曝光处理的基底进行处理。 具有涂覆有抗蚀剂膜并通过浸渍曝光处理的表面的基板被放置在基板支撑装置上，并且液体检测器至少检测形成用于浸没曝光的液体膜并保留在基板的表面上的液体。 基于由液体检测器进行的检测结果确定基板是否需要被干燥。 如果确定衬底需要干燥，则通过干燥装置干燥衬底。 因此可以防止涂层和显影系统内部的水分润湿。 由于仅需要干燥的基材经受干燥处理，所以涂层和显影系统能够以高产量进行操作。

公开(公告)号：US20070119479A1

公开(公告)日：2007-05-31

申请号：US11602390

申请日：2006-11-21

申请人： Kousuke Yoshihara ,  Junji Nakamura ,  Hirofumi Takeguchi ,  Taro Yamamoto

发明人： Kousuke Yoshihara ,  Junji Nakamura ,  Hirofumi Takeguchi ,  Taro Yamamoto

IPC分类号： B08B7/04 ,  B08B3/00

CPC分类号： H01L21/67051 ,  H01L21/67253

摘要： A rinse method for rinsing a substrate having an exposure pattern thereon developed includes presetting conditions for a rinse process according to surface states of the substrate, measuring a surface state of the substrate, selecting a corresponding condition for the rinse process based on the measured surface state of the substrate, and performing the rinse process under the selected condition.

摘要翻译： 用于漂洗其上具有曝光图案的基板的冲洗方法包括根据基板的表面状态的冲洗过程的预设条件，测量基板的表面状态，基于测量的表面状态选择冲洗过程的相应条件 并在所选择的条件下进行冲洗过程。

公开(公告)号：US20070044823A1

公开(公告)日：2007-03-01

申请号：US11509737

申请日：2006-08-25

申请人： Taro Yamamoto ,  Hideharu Kyouda ,  Tetsu Kawasaki ,  Satoru Shimura

发明人： Taro Yamamoto ,  Hideharu Kyouda ,  Tetsu Kawasaki ,  Satoru Shimura

IPC分类号： B08B3/02

CPC分类号： H01L21/67051

摘要： A substrate cleaning device and a substrate cleaning method reduces liquid drops remaining on a substrate to prevent the irregular heating of the substrate by a heating process due to liquid drops or water marks remaining on the substrate. A cleaning liquid is poured through a cleaning liquid pouring nozzle onto the surface of a substrate such that a region onto which the cleaning liquid is poured moves from a central part toward the circumference of the substrate. A gas is jetted radially outward at a region on the surface of the substrate behind a region onto which the cleaning liquid is poured with respect to the rotating direction of the substrate. The gas forces a liquid film of the cleaning liquid flowing on the surface of the substrate to flow in a circumferential direction and a radially outward direction. The cleaning liquid poured out onto the surface of the substrate through the cleaning liquid pouring nozzle is restrained from flowing by a liquid damming member held at a height equal to or lower than that of the nozzle exit of the cleaning liquid pouring nozzle to collect a mass of the cleaning liquid. A high centrifugal force acts on the mass of the cleaning liquid to force the mass of the cleaning liquid to flow outward even if the substrate is rotated at a low rotating speed.

摘要翻译： 基板清洁装置和基板清洗方法减少了残留在基板上的液滴，以防止由于基板上残留液滴或水痕而导致的加热过程对基板的不规则加热。 将清洗液通过清洗液注入喷嘴注入到基板的表面上，使清洗液注入的区域从基板的中心部朝向圆周方向移动。 在衬底表面上的相对于衬底的旋转方向倾倒有清洁液体的区域之后的区域处，径向向外喷射气体。 气体迫使在基板表面流动的清洗液体的液膜在圆周方向和径向向外的方向上流动。 清洗液通过清洗液倒出嘴倾倒在基材表面上被限制在保持在与清洗液注入嘴的喷嘴出口相同或更小的高度的液体阻塞构件的流动中，从而收集质量 的清洗液。 即使基板以低转速旋转，高离心力作用在清洁液体上，以迫使清洁液体的质量向外流出。

公开(公告)号：US20060177586A1

公开(公告)日：2006-08-10

申请号：US11346430

申请日：2006-02-03

申请人： Seiki Ishida ,  Masahiro Nakaharada ,  Taro Yamamoto

发明人： Seiki Ishida ,  Masahiro Nakaharada ,  Taro Yamamoto

IPC分类号： B05D3/00 ,  B05C13/00 ,  B05D1/18

CPC分类号： H01L21/67184 ,  H01L21/67051 ,  H01L21/67178 ,  H01L21/67742 ,  H01L21/67745 ,  Y10S134/902

摘要： A coating and developing system is capable of preventing the contamination of a substrate with particles while the same coats a surface of a substrate with a resist film and develops the resist film after the substrate has been processed by immersion exposure. The coating and developing system includes: a processing block including coating units for forming a resist film on a surface of a substrate and developing units for processing the resist film formed on the substrate with a developer, and an interface block connected to the processing block and an exposure system for carrying out an immersion exposure process. The interface block includes: substrate cleaning units for cleaning the substrate processed by the immersion exposure process, a first carrying mechanism and a second carrying mechanism. The first carrying mechanism carries a substrate processed by immersion exposure to the substrate cleaning unit. The second carrying mechanism carries the substrate cleaned by the substrate cleaning unit. Thus the contamination of the substrate with external particles can be prevented and hence the spread of contamination with particles over the processing units of the processing block and substrates processed by the processing units can be prevented.

摘要翻译： 涂覆和显影系统能够防止具有颗粒的基底污染，同时用抗蚀剂膜涂覆基材的表面，并且在通过浸渍曝光处理基板之后显影抗蚀剂膜。 该涂覆和显影系统包括：处理块，其包括用于在基板的表面上形成抗蚀剂膜的涂覆单元和用显影剂处理形成在基板上的抗蚀剂膜的显影单元，以及连接到处理块的界面块和 用于进行浸没曝光处理的曝光系统。 接口块包括：用于清洗通过浸没曝光工艺处理的基板的基板清洁单元，第一承载机构和第二承载机构。 第一携带机构携带通过浸没曝光处理的基板到基板清洁单元。 第二承载机构承载由基板清洁单元清洁的基板。 因此，可以防止基板与外部颗粒的污染，因此可以防止在处理块的处理单元和由处理单元处理的基板上的颗粒污染的扩散。

公开(公告)号：US20060040051A1

公开(公告)日：2006-02-23

申请号：US11201102

申请日：2005-08-11

申请人： Taro Yamamoto ,  Atsushi Ookouchi ,  Hirofumi Takeguchi ,  Kousuke Yoshihara

发明人： Taro Yamamoto ,  Atsushi Ookouchi ,  Hirofumi Takeguchi ,  Kousuke Yoshihara

IPC分类号： B05D5/00

CPC分类号： H01L21/6715 ,  G03F7/3028

摘要： A developing apparatus for developing a substrate whose surface is coated with a coating solution and then exposed includes a substrate supporting unit for horizontally supporting the substrate, a rotation driving mechanism for rotating the substrate supporting unit forwardly or backwardly with respect to a vertical axis, a developer nozzle, disposed to face a surface of the substrate supported by the substrate supporting unit, having a strip-shaped injection opening extended along a direction extending from a periphery of the substrate toward a central portion thereof, a moving unit for moving the developer nozzle from an outer portion of the substrate toward the central portion thereof, and a controller for controlling operations such that while the substrate is rotated forwardly by the rotation driving mechanism, a developer is supplied through the injection opening to the surface of the substrate by moving the developer nozzle and, then, the substrate is rotated backwardly by the rotation driving mechanism.

摘要翻译： 用于显影表面被涂布溶液然后露出的基板的显影装置包括用于水平支撑基板的基板支撑单元，用于相对于垂直轴向前或向后旋转基板支撑单元的旋转驱动机构， 显影剂喷嘴，设置成面对由基板支撑单元支撑的基板的表面，具有沿着从基板的周边朝向其中心部分延伸的方向延伸的条形喷射口;移动单元，用于移动显影剂喷嘴 从基板的外部朝向其中央部分，以及控制器，用于控制操作，使得当基板通过旋转驱动机构向前旋转时，通过将喷射开口移动到基板的表面，将显影剂供应到基板的表面 显影剂喷嘴，然后基板由r向后旋转 驾驶机制

公开(公告)号：US20050053874A1

公开(公告)日：2005-03-10

申请号：US10943840

申请日：2004-09-20

申请人： Kousuke Yoshihara ,  Keiichi Tanaka ,  Taro Yamamoto ,  Hideharu Kyouda ,  Hirofumi Takeguchi ,  Atsushi Ookouchi

发明人： Kousuke Yoshihara ,  Keiichi Tanaka ,  Taro Yamamoto ,  Hideharu Kyouda ,  Hirofumi Takeguchi ,  Atsushi Ookouchi

IPC分类号： G03D3/06 ,  G03F7/30 ,  H01L21/00 ,  H01L21/027 ,  G03C5/18

CPC分类号： H01L21/6715 ,  G03D3/06 ,  G03F7/3021

摘要： In a developing processing of a wafer having a resist film low in the dissolving rate in a developing solution formed thereon and subjected to an exposure treatment, a developing solution of a low concentration is supplied first onto a wafer and the wafer is left to stand for a prescribed time to permit a developing reaction to proceed, followed by further supplying a developing solution having a concentration higher than that of the developing solution supplied first onto the wafer, leaving the substrate to stand and subsequently rinsing the wafer, thereby improving the uniformity of the line width in the central portion and the peripheral portion of the wafer.

摘要翻译： 在其上形成的显影液中的溶解速度低的抗蚀剂膜的显影处理中，首先将低浓度的显影液供给到晶片上，并将晶片放置在 规定的时间以允许显影反应进行，然后进一步提供浓度高于首先提供的显影溶液的显影溶液的显影溶液到晶片上，使基板静置并随后冲洗晶片，由此提高均匀性 晶片的中心部分和周边部分的线宽度。

公开(公告)号：US06372065B1

公开(公告)日：2002-04-16

申请号：US09515851

申请日：2000-02-29

申请人： Masaharu Tabuchi ,  Yukio Seto ,  Taro Yamamoto

发明人： Masaharu Tabuchi ,  Yukio Seto ,  Taro Yamamoto

IPC分类号： B32B3108

CPC分类号： G03C3/02 ,  G03B17/305 ,  Y10T156/1062 ,  Y10T156/133

摘要： Disclosed are a method and an apparatus comprising a film-cutting means for cutting a lengthy photographic film fed from a film roll into those having a length suitable for a film size included in film information, a conveyer apparatus for changing transport operation for a photographic film strip depending on the film size, a timing-changing means for changing transport timing for the photographic film strip to be fed to a winding section depending on the film size, and a timing-changing means for changing transport timing for a shield paper strip to be fed to the winding section depending on the film size.

摘要翻译： 公开了一种方法和装置，其包括用于将从胶片卷供给的长时间的照相胶片切割成具有适合胶片信息中所包括的胶片尺寸的长度的胶片切割装置，用于改变照相胶卷的传送操作的传送装置 取决于胶片尺寸的带条，用于根据胶片尺寸改变要供给到卷绕部分的照相胶片带的传送定时的定时改变装置，以及用于将屏蔽纸条的传送定时改变为 根据胶片尺寸被馈送到卷绕部分。

公开(公告)号：US09052610B2

公开(公告)日：2015-06-09

申请号：US13408302

申请日：2012-02-29

申请人： Seiki Ishida ,  Taro Yamamoto

发明人： Seiki Ishida ,  Taro Yamamoto

IPC分类号： H01L21/311 ,  H01L21/31 ,  H01L21/469 ,  G03C5/00 ,  G03F7/20 ,  H01L21/02

CPC分类号： G03F7/70341 ,  G03F7/70525 ,  G03F7/70991 ,  H01L21/0257

摘要： A coating and developing system for forming a resist film on a substrate by coating the substrate with a liquid resist and developing the resist film after the resist film has been processed by immersion exposure that forms a liquid layer on the surface of the substrate is capable of reducing difference in property among resist films formed on substrates. The coating and developing system includes: a cleaning unit; a carrying means; and a controller. A set time interval is determined such that the substrate is subjected to the immersion exposure process after contact angle drop rate at which contact angle between the cleaning liquid and a surface of the substrate drops has dropped from an initial level at the wetting time point when the surface of the substrate is wetted with the cleaning liquid to a level far lower than the initial level.

摘要翻译： 一种用于在基板上形成抗蚀剂膜的涂覆和显影系统，其中通过用液体抗蚀剂涂覆基板并在抗蚀剂膜已经通过在基板表面上形成液体层的浸渍曝光进行处理之后显影抗蚀剂膜， 降低在基板上形成的抗蚀剂膜之间的性能差异。 涂层和显影系统包括：清洁单元; 携带手段 和控制器。 确定设定的时间间隔，使得在清洗液和基板的表面之间的接触角下降的接触角下降率在浸润时间点的浸润时间点的初始水平之后，基板经受浸渍曝光处理 衬底的表面被清洗液体润湿至远低于初始水平的水平。

公开(公告)号：US08865396B2

公开(公告)日：2014-10-21

申请号：US12472728

申请日：2009-05-27

申请人： Hirofumi Takeguchi ,  Taro Yamamoto ,  Kousuke Yoshihara

发明人： Hirofumi Takeguchi ,  Taro Yamamoto ,  Kousuke Yoshihara

IPC分类号： G03C5/18 ,  G03C5/26 ,  G03F7/30

CPC分类号： G03F7/162 ,  G03F7/3021

摘要： A developing method including a developing step in which, while a wafer horizontally held by a spin chuck is being rotated, the wafer is developed by supplying a developer onto a surface of the wafer, wherein provided before the developing step is a pre-wetting step in which, simultaneously with the developer being supplied from a first nozzle that is located on a position near a central part of the surface of the rotating wafer, a deionized water as a second liquid is supplied from a second nozzle that is located on a position nearer to an outer peripheral part of the wafer than the first nozzle, to thereby spread out the developer in the rotating direction of the wafer by a wall that is formed by the deionized water flowing to the outer peripheral side of the wafer with the rotation of the wafer.

摘要翻译： 一种显影方法，其包括显影步骤，其中当由旋转卡盘水平保持的晶片正在旋转时，通过将显影剂供应到晶片的表面上来显影晶片，其中在显影步骤之前提供预润湿步骤 其中与来自位于旋转晶片表面的中心附近的位置的第一喷嘴一起供给显影剂，作为第二液体的去离子水从位于位置上的第二喷嘴供给 比第一喷嘴更靠近晶片的外周部分，从而通过由去离子水流到晶片的外周侧而形成的壁沿着晶片的旋转方向展开显影剂 晶圆。