Optical element and method for preparing the same, sensor apparatus and sensing method
    71.
    发明授权
    Optical element and method for preparing the same, sensor apparatus and sensing method 有权
    光学元件及其制备方法,传感器装置和感测方法

    公开(公告)号:US07898667B2

    公开(公告)日:2011-03-01

    申请号:US11961216

    申请日:2007-12-20

    IPC分类号: G01N21/00

    CPC分类号: G01N21/554 G01N33/54373

    摘要: In the fields of biosensing and the like, achievement of high sensitivity and high performance has been demanded in the concentration detection of target substances. In order to meet such demand, disclosed is an optical element utilizing the localized surface plasmon resonance, including: a dielectric substrate; a first group of metal microstructures in which a plurality of metal microstructures is supported on a dielectric substrate in an in-plane direction of the substrate; and a second group of metal microstructures in which a plurality of metal microstructures is disposed in the in-plane direction, and each of the metal microstructures is partially exposed to the outside; wherein the first group of metal microstructures and the second group of metal microstructures are laminated so as to be separated from each other by 100 nm or more.

    摘要翻译: 在生物传感等领域中,目标物质的浓度检测中要求达到高灵敏度,高性能。 为了满足这样的要求,公开了利用局部表面等离子体共振的光学元件,包括:电介质基板; 第一组金属微结构,其中多个金属微结构在基板的面内方向上被支撑在电介质基板上; 以及第二组金属微结构,其中多个金属微结构在面内方向上设置,并且每个金属微结构部分暴露于外部; 其中所述第一组金属微结构和所述第二组金属微结构被层压以便彼此分离100nm以上。

    Sensor device and testing method utilizing localized plasmon resonance
    72.
    发明授权
    Sensor device and testing method utilizing localized plasmon resonance 失效
    使用局部等离子体共振的传感器装置和测试方法

    公开(公告)号:US07733491B2

    公开(公告)日:2010-06-08

    申请号:US12131433

    申请日:2008-06-02

    IPC分类号: G12Q1/68 G01N1/02 G01N21/55

    摘要: A sensor device is formed from a metal film having a plurality of openings, a sensor material positioned within each of the openings, a light source that emits light having a first wavelength, and a light detector that detects light emitted from the light source and transmitted through or reflected from the openings. The plurality of openings are arranged periodically in a first direction in the metal film, and both a size of each of the plurality of openings and an interval thereof in the first direction are equal to or less than the wavelength of the light.

    摘要翻译: 传感器装置由具有多个开口的金属膜形成,位于每个开口内的传感器材料,发射具有第一波长的光的光源和检测从光源发出的光并发射的光检测器 从开口穿过或反射。 多个开口在金属膜中沿第一方向周期性地布置,并且多个开口中的每一个的尺寸和第一方向上的间隔都等于或小于光的波长。

    Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same
    73.
    发明授权
    Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same 失效
    检测曝光掩模和待曝光物体的相对位置的方法,对准方法和使用其的曝光方法

    公开(公告)号:US07592108B2

    公开(公告)日:2009-09-22

    申请号:US10529908

    申请日:2004-05-12

    IPC分类号: G03F9/00

    摘要: A near-field exposure method including preparing a photomask for near-field exposure, having a light blocking film provided on a base material constituting a membrane portion and a support member supporting the base material, wherein a first alignment mark for rough alignment is provided on the support member and a second alignment mark for fine alignment is provided on the membrane portion, setting the photomask and an object to be exposed in a near-field exposure apparatus, aligning the photomask and the object using the first alignment mark, flexing the membrane portion to contact with the object and detecting a positional relation between the membrane portion and the object using the second alignment mark, aligning the photomask and the object based on the detected positional relation and flexing the membrane portion to contact with the object, and exposing the object to light from a light source by way of the photomask.

    摘要翻译: 一种近场曝光方法,包括制备用于近场曝光的光掩模,具有设置在构成膜部分的基材上的遮光膜和支撑所述基材的支撑构件,其中用于粗略对准的第一对准标记设置在 在膜部分上设置支撑部件和用于精细对准的第二对准标记,将光掩模和要曝光的物体设置在近场曝光装置中,使用第一对准标记对准光掩模和物体,使膜 与物体接触的部分,并使用第二对准标记检测膜部分和物体之间的位置关系,基于检测到的位置关系对准光掩模和物体,并使膜部分弯曲以与物体接触,并将 通过光掩模来对待来自光源的光。

    SENSOR APPARATUS
    74.
    发明申请
    SENSOR APPARATUS 失效
    传感器装置

    公开(公告)号:US20090021742A1

    公开(公告)日:2009-01-22

    申请号:US12174776

    申请日:2008-07-17

    IPC分类号: G01N21/55

    CPC分类号: G01N21/553

    摘要: A plasmon sensor apparatus using a metallic fine periodic structure designed to reduce the dependences of the resonance wavelength and sensitivity on the incident angle. The plasmon sensor apparatus has a sensing element including a metallic member having periodic slit openings and metallic portions, and a substrate on which the metallic member is held, a light source which emits light so that the light is incident on the sensing element, and a photodetector which detects light obtained from the light source. If the period of the slit openings is Λ; the width of the metallic portions is d; and the thickness of the metallic member is h, the aspect ratio h/(Λ−d) of the slit openings is 3 or higher and the opening width (Λ−d) is equal to or smaller than the wavelength of light applied from the light source to the sensing element.

    摘要翻译: 一种使用金属微细周期结构的等离子体激元传感器装置,其设计用于降低谐振波长和灵敏度对入射角的依赖性。 等离子体激元传感器装置具有感测元件,其包括具有周期性狭缝开口的金属部件和金属部分,以及保持金属部件的基板,发射光以使得光入射到感测元件上的光源,以及 检测从光源获得的光的光电检测器。 如果狭缝开口的周期是λ; 金属部分的宽度为d; 并且金属构件的厚度为h,狭缝开口的长宽比h /(λ-d)为3以上,开口宽度(λ-d)为从 光源传感元件。

    Method and apparatus for detecting relative positional deviation between two objects
    75.
    发明授权
    Method and apparatus for detecting relative positional deviation between two objects 失效
    用于检测两个物体之间的相对位置偏差的方法和装置

    公开(公告)号:US07262851B2

    公开(公告)日:2007-08-28

    申请号:US11166106

    申请日:2005-06-27

    IPC分类号: G01B11/00

    摘要: Disclosed is a method and apparatus for detecting a relative positional deviation between first and second objects. In one preferred form of the invention, the detecting method includes the steps of (i) providing the first and second objects with diffraction gratings, respectively, each having a grating pitch larger than a wavelength of a light source used, (ii) placing the first and second objects so that a dielectric material layer having a thickness smaller than the wavelength of the light source used is interposed between the first and second objects, and so that the diffraction gratings of the first and second objects are opposed to each other, (iii) projecting light from the light source onto the diffraction gratings of the first and second objects, and (iv) detecting the relative positional deviation between the first and second objects on the basis of diffraction light projected from the diffraction gratings to a space.

    摘要翻译: 公开了一种用于检测第一和第二物体之间的相对位置偏差的方法和装置。 在本发明的一个优选形式中,检测方法包括以下步骤:(i)分别为第一和第二物体提供衍射光栅,每个衍射光栅具有大于所使用的光源的波长的光栅间距,(ii) 第一和第二物体,使得具有小于所使用的光源的波长的厚度的介电材料层插入在第一和第二物体之间,并且使得第一和第二物体的衍射光栅彼此相对(( iii)将来自光源的光投射到第一和第二物体的衍射光栅上,以及(iv)基于从衍射光栅投影到衍射光栅的衍射光来检测第一和第二物体之间的相对位置偏差。

    Near-field exposure method and device manufacturing method using the same
    77.
    发明申请
    Near-field exposure method and device manufacturing method using the same 审中-公开
    近场曝光方法及使用其的装置制造方法

    公开(公告)号:US20070082279A1

    公开(公告)日:2007-04-12

    申请号:US10554994

    申请日:2005-06-30

    IPC分类号: G03F7/20

    摘要: Disclosed is a near-field exposure method including a process of bringing a light blocking film with a plurality of small openings each having an opening width not greater than a wavelength of exposure light, into close contact with a photoresist layer provided on a surface of a substrate, and a process of projecting exposure light from an exposure light source to the light blocking film to transfer an opening pattern of the light blocking film to the photoresist layer, wherein, on the basis of a correlation between (a) a distance from a node of a standing wave to be produced in the photoresist layer to the light blocking film and (b) a light intensity distribution of near-field light to be produced in the photoresist layer adjacent the light blocking film, the distance from the standing wave node to the light blocking film is determined so as to provide a desired light intensity distribution.

    摘要翻译: 公开了一种近场曝光方法,包括使具有不大于曝光光的波长的开口宽度的多个小开口的遮光膜与设置在曝光光的表面上的光致抗蚀剂层紧密接触的工艺 以及将曝光光源的曝光光投射到遮光膜以将遮光膜的开口图案转印到光致抗蚀剂层的处理,其中,基于(a)距离 在光致抗蚀剂层中产生的阻挡膜的驻波的节点和(b)在与阻挡膜相邻的光致抗蚀剂层中产生的近场光的光强度分布,与驻波结点的距离 确定遮光膜以提供期望的光强度分布。

    Chemical sensor and chemical sensor apparatus
    79.
    发明申请
    Chemical sensor and chemical sensor apparatus 审中-公开
    化学传感器和化学传感器设备

    公开(公告)号:US20060108219A1

    公开(公告)日:2006-05-25

    申请号:US10530182

    申请日:2004-06-23

    IPC分类号: C12Q1/00

    CPC分类号: G01N21/553 G01N21/554

    摘要: A chemical sensor for detecting a reaction of a sensor material with a specimen on the basis of an intensity of a surface plasmon polariton wave propagated along a surface of a sensor medium including the sensor material is principally constituted by the sensor medium. The sensor medium includes a periodic structure and the sensor material disposed on the periodic structure. The periodic structure has a pitch substantially equal to an integral multiple of a wavelength of the surface plasma polariton wave generated by irradiating an interface between the periodic structure and the sensor material with light.

    摘要翻译: 基于传感器材料的传感器介质的表面传播的表面等离子体激元波的强度,检测传感器材料与试样的反应的化学传感器主要由传感器介质构成。 传感器介质包括周期性结构和设置在周期性结构上的传感器材料。 周期性结构具有基本上等于通过用光照射周期性结构和传感器材料之间的界面而产生的表面等离子体极化子波的波长的整数倍的间距。