摘要:
In the fields of biosensing and the like, achievement of high sensitivity and high performance has been demanded in the concentration detection of target substances. In order to meet such demand, disclosed is an optical element utilizing the localized surface plasmon resonance, including: a dielectric substrate; a first group of metal microstructures in which a plurality of metal microstructures is supported on a dielectric substrate in an in-plane direction of the substrate; and a second group of metal microstructures in which a plurality of metal microstructures is disposed in the in-plane direction, and each of the metal microstructures is partially exposed to the outside; wherein the first group of metal microstructures and the second group of metal microstructures are laminated so as to be separated from each other by 100 nm or more.
摘要:
A sensor device is formed from a metal film having a plurality of openings, a sensor material positioned within each of the openings, a light source that emits light having a first wavelength, and a light detector that detects light emitted from the light source and transmitted through or reflected from the openings. The plurality of openings are arranged periodically in a first direction in the metal film, and both a size of each of the plurality of openings and an interval thereof in the first direction are equal to or less than the wavelength of the light.
摘要:
A near-field exposure method including preparing a photomask for near-field exposure, having a light blocking film provided on a base material constituting a membrane portion and a support member supporting the base material, wherein a first alignment mark for rough alignment is provided on the support member and a second alignment mark for fine alignment is provided on the membrane portion, setting the photomask and an object to be exposed in a near-field exposure apparatus, aligning the photomask and the object using the first alignment mark, flexing the membrane portion to contact with the object and detecting a positional relation between the membrane portion and the object using the second alignment mark, aligning the photomask and the object based on the detected positional relation and flexing the membrane portion to contact with the object, and exposing the object to light from a light source by way of the photomask.
摘要:
A plasmon sensor apparatus using a metallic fine periodic structure designed to reduce the dependences of the resonance wavelength and sensitivity on the incident angle. The plasmon sensor apparatus has a sensing element including a metallic member having periodic slit openings and metallic portions, and a substrate on which the metallic member is held, a light source which emits light so that the light is incident on the sensing element, and a photodetector which detects light obtained from the light source. If the period of the slit openings is Λ; the width of the metallic portions is d; and the thickness of the metallic member is h, the aspect ratio h/(Λ−d) of the slit openings is 3 or higher and the opening width (Λ−d) is equal to or smaller than the wavelength of light applied from the light source to the sensing element.
摘要:
Disclosed is a method and apparatus for detecting a relative positional deviation between first and second objects. In one preferred form of the invention, the detecting method includes the steps of (i) providing the first and second objects with diffraction gratings, respectively, each having a grating pitch larger than a wavelength of a light source used, (ii) placing the first and second objects so that a dielectric material layer having a thickness smaller than the wavelength of the light source used is interposed between the first and second objects, and so that the diffraction gratings of the first and second objects are opposed to each other, (iii) projecting light from the light source onto the diffraction gratings of the first and second objects, and (iv) detecting the relative positional deviation between the first and second objects on the basis of diffraction light projected from the diffraction gratings to a space.
摘要:
A near-field photoresist for formation of a fine pattern with by near-field exposure includes an alkali-soluble novalac resin, a diazyde-type photosensitizer which is photoreactive by near-field exposure, a photoacid generator which generates acid by the near-field exposure, and a solvent.
摘要:
Disclosed is a near-field exposure method including a process of bringing a light blocking film with a plurality of small openings each having an opening width not greater than a wavelength of exposure light, into close contact with a photoresist layer provided on a surface of a substrate, and a process of projecting exposure light from an exposure light source to the light blocking film to transfer an opening pattern of the light blocking film to the photoresist layer, wherein, on the basis of a correlation between (a) a distance from a node of a standing wave to be produced in the photoresist layer to the light blocking film and (b) a light intensity distribution of near-field light to be produced in the photoresist layer adjacent the light blocking film, the distance from the standing wave node to the light blocking film is determined so as to provide a desired light intensity distribution.
摘要:
A device for detecting a target substance in a fluid is provided. This device comprises a periodic structure having a vacant portion for passing the fluid containing the target substance and a solid portion arranged regularly and capable of transmitting an electromagnetic wave, an electro-magnetic wave-projecting means for projecting the electromagnetic wave to the periodic structure, and a detecting means for measuring the magnetic wave emitted from the periodic structure to detect a change in periodic distribution of a refractive index. This sensor is highly sensitive in a small size.
摘要:
A chemical sensor for detecting a reaction of a sensor material with a specimen on the basis of an intensity of a surface plasmon polariton wave propagated along a surface of a sensor medium including the sensor material is principally constituted by the sensor medium. The sensor medium includes a periodic structure and the sensor material disposed on the periodic structure. The periodic structure has a pitch substantially equal to an integral multiple of a wavelength of the surface plasma polariton wave generated by irradiating an interface between the periodic structure and the sensor material with light.
摘要:
A near-field photoresist for formation of a fine pattern with by near-field exposure includes an alkali-soluble novalac resin, a diazyde-type photosensitizer which is photoreactive by near-field exposure, a photoacid generator which generates acid by the near-field exposure, and a solvent.