摘要:
An active matrix substrate suppresses reduction in production yield and increase in production steps and simultaneously permits both sufficient securing of a storage capacity and improvement of an aperture ratio of a pixel. The active matrix substrate is an active matrix substrate and includes a thin film transistor disposed at an intersection of a scanning signal line with a data signal line on a substrate, the thin film transistor including a gate electrode connected to the scanning signal line, a source electrode connected to the data signal line, and a drain electrode connected to a drain lead-out wiring; a storage capacitor upper electrode connected to the drain lead-out wiring and a pixel electrode; and a storage capacitor wiring overlapping with the storage capacitor upper electrode through an insulating film, wherein the storage capacitor wiring has an extending portion overlapping with the drain lead-out wiring through the insulating film.
摘要:
In an active matrix substrate of the present invention, a gate insulating film for covering a gate electrode of each transistor has a thin portion, having a reduced film thickness, which is provided on a part overlapped on the gate electrode, and the thin portion is formed by using the gate electrode, on which the thin portion is overlapped, as a mask, and each transistor has a first drain electrode section and a second drain electrode section which are respectively provided on both sides of a source electrode, and the thin portion has two edges opposite to each other, and the first drain electrode section is overlapped on the one edge, and the second drain electrode section is overlapped on the other edge. This makes it possible to provide an active matrix substrate which realizes high display quality while suppressing unevenness of parasitic capacitances (particularly, Cgd) of TFTs in the active matrix substrate whose each TFT has a thin portion in its gate insulating film.
摘要:
A color filter substrate according to the present invention includes a transparent substrate; at least three colors of colored layers provided on the transparent substrate; first columnar structure bodies 101 provided in pixel outskirts within a display region, the first columnar structure bodies 101 defining a cell gap; and second columnar structure bodies 102 provided in the pixel outskirts within the display region or outside the display region, the second columnar structure bodies having a smaller height than that of the first columnar structure bodies 101, such that a difference from the height of the first columnar structure bodies 101 exceeds a range of elastic deformation of the first columnar structure bodies 101.
摘要:
In one embodiment of a display device, pixels are arranged in matrix, and a first luminance area (high luminance area) and a second luminance area (low luminance area) which surrounds the first luminance area and has a luminance lower than that of the first luminance area can be formed in each pixel. The display device which can clearly display an image having a high spatial frequency and an active matrix substrate to be used for the display device are provided.
摘要:
An active matrix substrate includes a substrate, a TFT formed on the substrate, a storage capacitor element formed on the substrate, an interlayer insulating film covering the storage capacitor element, and a pixel electrode formed on the interlayer insulating film. The storage capacitor element includes a storage capacitor line, an insulating film formed on the storage capacitor line, and two or more storage capacitor electrodes opposed to the storage capacitor line with the insulating film interposed therebetween. The two or more storage capacitor electrodes are electrically connected via associated contact holes formed in the interlayer insulating film to the pixel electrode and electrically continuous with a drain electrode of the TFT.
摘要:
A display device includes a color filter substrate having a flat upper surface. The color filter substrate of the display device includes a transparent substrate, a color filter layer provided on the transparent substrate and having a plurality of color filters arranged so that gaps are formed between the color filters, a light shielding layer having a plurality of light shielding portions disposed in the gaps between the plurality of color filters, and a light-transmitting resin layer having a plurality of light-transmitting resin portions respectively disposed on the plurality of first light shielding portions on the substrate side of the same. The upper surfaces of the plurality of first light shielding portions and the plurality of color filters form a substantially flat surface.
摘要:
It is an object of the present invention to provide a substrate for liquid crystal display by means of which a generation of air bubbles in a liquid crystal layer after charging a liquid crystal can be prevented, and a liquid crystal display having a good display quality level can be obtained at a high yield, and to provide a liquid crystal display unit provided with such substrate for liquid crystal display. The present invention is directed to a substrate for liquid crystal display, comprising a projection for controlling alignments of liquid crystal molecules, wherein a slit is provided in the projection for controlling alignments of liquid crystal molecules.
摘要:
A color filter substrate is used in a display device including pixels arranged in columns and rows to define a matrix pattern. The color filter substrate includes a transparent substrate and coloring layers, including a first color filter layer, a second color filter layer and an light shielding layer, provided on the transparent substrate. The first and second color filter layers include a first color filter column and a second color filter column, respectively, each of which is arranged for an associated column of pixels. The light shielding layer includes an light shielding column, which is provided for a gap between two adjacent columns of pixels. In a gap between two pixels that are adjacent in a row direction, an intercolumnar overlap area, in which the light shielding column and at least one of the first and second color filter columns overlap each other, and an intercolumnar non-overlap area, in which the light shielding column is overlapped by neither the first nor the second color filter column, are defined, and the intercolumnar non-overlap area is defined so as to extend continuously in the row direction through the gap between the two adjacent pixels.
摘要:
The fabrication method for a color filter substrate of the present invention includes the step of forming a coloring layer, which includes the steps of: forming first coloring lines each including a plurality of first coloring portions lined in a first direction with a gap given between the adjacent first coloring portions; and forming second coloring lines after the formation of the first coloring lines. The step of forming second coloring lines includes the step of pressing a dry film for the second coloring lines against a substrate to stick the dry film on the substrate along a third direction crossing the first direction.
摘要:
An Ta film for use in forming a source electrode and a drain electrode and an amorphous silicon film for use in forming an amorphous silicon semiconductor layer with impurity are continuously etched without setting an etching selectivity ratio. As a result, the source electrode, the drain electrode and the amorphous silicon semiconductor can be formed by a single etching process, and in the meantime, surface protrusions and recessions can be formed in a back channel region on the order of several hundreds of Å reflecting the crystal grain diameters of the Ta film for use in forming the source electrode and the drain electrode. The resulting protrusions and recessions offers an effect of suppressing an increase in OFF-state current value of the thin film transistor, and according to the foregoing method, the thin film transistor can be manufactured through a reduced number of steps at lower cost.